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公开(公告)号：TW201625935A
公开(公告)日：2016-07-16
申请号：TW104128217
申请日：2015-08-27
Applicant: 荷蘭VU基金會 , STICHTING VU , 荷蘭阿姆斯特丹大學 , UNIVERSITEIT VAN AMSTERDAM , 物質基礎研究基金會 , STICHTING VOOR FUNDAMENTEEL ONDERZOEK DER MATERIE , ASML荷蘭公司 , ASML NETHERLANDS B. V.
Inventor： 丹 波夫 亞瑞 傑佛瑞 , DEN BOEF, ARIE JEFFREY , 瑪庸傑席恩 賽門 吉傑斯柏特 裘瑟胡斯 , MATHIJSSEN, SIMON GIJSBERT JOSEPHUS , 帕迪 尼特許 , PANDEY, NITESH , 懷特 史堤芬 密卻爾 , WITTE, STEFAN MICHIEL , 艾奇瑪 卡傑德 , EIKEMA, KJELD
IPC: G01N21/956 , G03F7/20 , G01B11/00
CPC classification number: G01N21/956 , G01B11/00 , G01N2201/12 , G03F7/70141 , G03F7/70625 , G03F7/70633 , G03F7/70641 , G03H1/0443 , G03H2001/0033 , G03H2001/0204 , G03H2001/0458
Abstract: 藉由一微影程序在一基板(W)上形成度量目標。在不同條件下，使用空間同調輻射來照射包括一或多個光柵結構之一目標(T)。由該目標區域繞射之輻射(650)干涉參考輻射(652)以在一影像偵測器(623)處形成一干涉圖案。擷取該干涉圖案之一或多個影像。自該(等)擷取影像及自該參考輻射之知識計算該偵測器處之該收集散射輻射之一複合場。自該複合場計算由各光柵繞射之輻射之一合成輻射量測影像(814)。自該光柵之一繞射光譜之相反部分之該等合成輻射量測影像(814、814')獲得該光柵之一不對稱性量測。使用適合目標，可自該量測不對稱性計算該微影程序之重疊及其他效能參數。
Abstract in simplified Chinese: 借由一微影进程在一基板(W)上形成度量目标。在不同条件下，使用空间同调辐射来照射包括一或多个光栅结构之一目标(T)。由该目标区域绕射之辐射(650)干涉参考辐射(652)以在一影像侦测器(623)处形成一干涉图案。截取该干涉图案之一或多个影像。自该(等)截取影像及自该参考辐射之知识计算该侦测器处之该收集散射辐射之一复合场。自该复合场计算由各光栅绕射之辐射之一合成辐射量测影像(814)。自该光栅之一绕射光谱之相反部分之该等合成辐射量测影像(814、814')获得该光栅之一不对称性量测。使用适合目标，可自该量测不对称性计算该微影进程之重叠及其他性能参数。
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公开(公告)号：TW201725355A
公开(公告)日：2017-07-16
申请号：TW105141921
申请日：2016-12-16
Applicant: 荷蘭VU基金會 , STICHTING VU , 荷蘭阿姆斯特丹大學 , UNIVERSITEIT VAN AMSTERDAM , 物質基礎研究基金會 , STICHTING VOOR FUNDAMENTEEL ONDERZOEK DER MATERIE , ASML荷蘭公司 , ASML NETHERLANDS B.V.
Inventor： 懷特 史堤芬 密卻爾 , WITTE, STEFAN MICHIEL , 艾奇瑪 卡傑德 希傑布蘭 艾德華 , EIKEMA, KJELD SIJBRAND EDUARD
CPC classification number: G03F9/7042 , G01B15/00 , G01N23/2055 , G03F7/70625 , H05G2/008
Abstract: 本發明提供一種微影裝置，其係將一所欲圖案施加至一基板上(通常施加至該基板之一目標部分上)之一機器。一微影裝置可用於(例如)積體電路(IC)之製造中。該微影裝置具有一檢測裝置，該檢測裝置具有一EUV輻射源。該輻射源發射包括一特定波長之相干輻射之一輻射光束。該光束傳播至照明光學系統，該照明光學系統將該輻射光束聚焦成照明輻射之一經聚焦光束。該照明光學系統照明該基板上之一三維產品結構，該產品結構散射使該照明輻射散射。在一偵測器之該表面上，藉由該產品結構散射之該輻射形成用於重新建構描述該三維產品結構之資料之一繞射圖案。
Abstract in simplified Chinese: 本发明提供一种微影设备，其系将一所欲图案施加至一基板上(通常施加至该基板之一目标部分上)之一机器。一微影设备可用于(例如)集成电路(IC)之制造中。该微影设备具有一检测设备，该检测设备具有一EUV辐射源。该辐射源发射包括一特定波长之相干辐射之一辐射光束。该光束传播至照明光学系统，该照明光学系统将该辐射光束聚焦成照明辐射之一经聚焦光束。该照明光学系统照明该基板上之一三维产品结构，该产品结构散射使该照明辐射散射。在一侦测器之该表面上，借由该产品结构散射之该辐射形成用于重新建构描述该三维产品结构之数据之一绕射图案。
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公开(公告)号：TW201719301A
公开(公告)日：2017-06-01
申请号：TW105127588
申请日：2016-08-26
Applicant: 荷蘭VU基金會 , STICHTING VU , 荷蘭阿姆斯特丹大學 , UNIVERSITEIT VAN AMSTERDAM , 物質基礎研究基金會 , STICHTING VOOR FUNDAMENTEEL ONDERZOEK DER MATERIE , ASML荷蘭公司 , ASML NETHERLANDS B.V.
Inventor： 麥提森 賽門 吉司伯 喬瑟佛思 , MATHIJSSEN, SIMON GIJSBERT JOSEPHUS , 丹 伯夫 艾瑞 傑佛瑞 , DEN BOEF, ARIE JEFFREY , 帕迪 尼特許 , PANDEY, NITESH , 提那曼斯 派翠西斯 阿若瑟斯 約克伯 , TINNEMANS, PATRICIUS ALOYSIUS JACOBUS , 懷特 史堤芬 密卻爾 , WITTE, STEFAN MICHIEL , 艾奇瑪 卡傑德 希傑布蘭 艾德華 , EIKEMA, KJELD SIJBRAND EDUARD
CPC classification number: G03F9/7088 , G03F9/7046 , G03F9/7092
Abstract: 本發明係關於一種微影裝置，其包含：一基板台，其經建構以固持一基板；及一感測器，其經組態以感測提供至由該基板台固持之該基板上之一對準標記之一位置。該感測器包含：一輻射源，其經組態以藉由一輻射光束照明該對準標記；一偵測器，其經組態以偵測已與該對準標記相互作用後的作為一離焦光學圖案之該輻射光束；及一資料處理系統。該資料處理系統經組態以接收表示該離焦光學圖案之影像資料，及處理該影像資料以用於判定對準資訊，該處理包含將一無透鏡成像演算法應用於該離焦光學圖案。
Abstract in simplified Chinese: 本发明系关于一种微影设备，其包含：一基板台，其经建构以固持一基板；及一传感器，其经组态以传感提供至由该基板台固持之该基板上之一对准标记之一位置。该传感器包含：一辐射源，其经组态以借由一辐射光束照明该对准标记；一侦测器，其经组态以侦测已与该对准标记相互作用后的作为一离焦光学图案之该辐射光束；及一数据处理系统。该数据处理系统经组态以接收表示该离焦光学图案之影像数据，及处理该影像数据以用于判定对准信息，该处理包含将一无透镜成像算法应用于该离焦光学图案。
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公开(公告)号：US09632039B2
公开(公告)日：2017-04-25
申请号：US14838268
申请日：2015-08-27
Applicant: Vrije Universiteit Amsterdam , Universiteit van Amsterdam , Stichting voor Fundamenteel Onderzoek der Materie , ASML Netherlands B.V.
Inventor： Arie Jeffrey Den Boef , Simon Gijsbert Josephus Mathijssen , Nitesh Pandey , Stefan Michiel Witte , Kjeld Eikema
CPC classification number: G01N21/956 , G01B11/00 , G01N2201/12 , G03F7/70141 , G03F7/70625 , G03F7/70633 , G03F7/70641 , G03H1/0443 , G03H2001/0033 , G03H2001/0204 , G03H2001/0458
Abstract: Metrology targets are formed on a substrate (W) by a lithographic process. A target (T) comprising one or more grating structures is illuminated with spatially coherent radiation under different conditions. Radiation (650) diffracted by from said target area interferes with reference radiation (652) interferes with to form an interference pattern at an image detector (623). One or more images of said interference pattern are captured. From the captured image(s) and from knowledge of the reference radiation a complex field of the collected scattered radiation at the detector. A synthetic radiometric image (814) of radiation diffracted by each grating is calculated from the complex field. From the synthetic radiometric images (814, 814′) of opposite portions of a diffractions spectrum of the grating, a measure of asymmetry in the grating is obtained. Using suitable targets, overlay and other performance parameters of the lithographic process can be calculated from the measured asymmetry.
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公开(公告)号：US10551330B2
公开(公告)日：2020-02-04
申请号：US15305329
申请日：2015-04-22
Applicant: THE BOARD OF TRUSTEES OF THE LELAND STANFORD JUNIOR UNIVERSITY , STICHTING VOOR FUNDAMENTEEL ONDERZOEK DER MATERIE , Ashwin C. Atre , Jennifer A. Dionne , Benjamin Brenny , Toon Coenen , Albert Polman
Inventor： Ashwin C. Atre , Jennifer A. Dionne , Benjamin Brenny , Toon Coenen , Albert Polman
IPC: G01N23/2254 , A61B5/00 , G01J3/44
Abstract: In one aspect, a cathodoluminescence (CL) spectroscopic tomography device includes a sample stage to support a sample. An electron beam source scans an electron beam over the sample to yield light emission by the sample. A reflective element directs the light emission by the sample to a light detector. A controller controls operation of the sample stage, the electron beam source, and the light detector. In one aspect, a CL spectroscopic tomography device includes an electron beam source which directs an electron beam at an object to yield an emission by the object. A detector detects the emission. A controller receives information from the detector related to the detected emission. The controller derives a two-dimensional (2D) CL map from the information related to the detected emission, and derives a three-dimensional (3D) CL tomogram from the 2D CL map.
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Patent Agency Ranking
公开(公告)号：US20170269482A1
公开(公告)日：2017-09-21
申请号：US15453049
申请日：2017-03-08
Applicant: Stichting VU , Universiteit van Amsterdam , Stichting voor Fundamenteel Onderzoek der Materie , ASML Netherlands B.V.
IPC: G03F7/20 , G01B11/00 , G01N21/956 , G01N21/47
CPC classification number: G03F7/7065 , G01B11/00 , G01N21/4788 , G01N21/956 , G01N2201/061 , G01N2201/0635 , G02B21/16 , G03F7/70625 , G03F7/70633 , H05G2/003 , H05G2/008
Abstract: In an inspection apparatus, a target on the surface is illuminated with illuminating radiation that comprises first and second illuminating components. The illuminating components form one or more periodic illuminating patterns on the surface. A plurality of scattered radiation patterns formed by the illuminating radiation after scattering by the target is captured at a detector for a number of values of a controllable characteristic of at least one of the illuminating components. The captured radiation is then used to reconstruct data describing the target.
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公开(公告)号：US20170176879A1
公开(公告)日：2017-06-22
申请号：US15381980
申请日：2016-12-16
Applicant: Stichting VU , Universiteit van Amsterdam , Stichting voor Fundamenteel Onderzoek der Materie , ASML Netherlands B.V.
Inventor： Stefan Michiel WITTE , Kjeld Sijbrand Eduard EIKEMA
IPC: G03F9/00 , G01B15/00 , H05G2/00 , G01N23/205
CPC classification number: G03F9/7042 , G01B15/00 , G01N23/2055 , G03F7/70625 , H05G2/008
Abstract: A lithographic apparatus is a machine that applies a desired pattern onto a substrate, usually onto a target portion of the substrate. A lithographic apparatus can be used, for example, in the manufacture of integrated circuits (ICs). The lithographic apparatus has an inspection apparatus with an EUV radiation source. The radiation source emits a radiation beam that includes coherent radiation of a specific wavelength. The beam propagates to illumination optical system, which focuses the radiation beam into a focused beam of illuminating radiation. The illumination optical system illuminates a three-dimensional product structure on the substrate, which scatters the illuminating radiation. On the surface of a detector, the radiation scattered by the product structure forms a diffraction pattern that is used to reconstruct data describing the three-dimensional product structure.
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公开(公告)号：US20170052130A1
公开(公告)日：2017-02-23
申请号：US15305329
申请日：2015-04-22
Applicant: Ashwin C. ATRE , Jennifer A. DIONNE , Benjamin BRENNY , Toon COENEN , Albert POLMAN , THE BOARD OF TRUSTEES OF THE LELAND STANFORD JUNIOR UNIVERSITY , STICHTING VOOR FUNDAMENTEEL ONDERZOEK DER MATERIE
Inventor： Ashwin C. Atre , Jennifer A. Dionne , Benjamin Brenny , Toon Coenen , Albert Polman
IPC: G01N23/225 , A61B5/00
Abstract: In one aspect, a cathodoluminescence (CL) spectroscopic tomography device includes a sample stage to support a sample. An electron beam source scans an electron beam over the sample to yield light emission by the sample. A reflective element directs the light emission by the sample to a light detector. A controller controls operation of the sample stage, the electron beam source, and the light detector. In one aspect, stage a CL spectroscopic tomography device includes an electron beam source which directs an electron beam at an object to yield an emission by the object. A detector detects the emission. A controller receives information from the detector related to the detected emission. The controller derives a two-dimensional (2D) CL map from the information related to the detected emission, and derives a three-dimensional (3D) CL tomogram from the 2D CL map.
Abstract translation: 一方面，阴极发光（CL）光谱断层摄影装置包括支持样品的样品台。 电子束源扫描样品上的电子束以产生样品的光发射。 反射元件将样品的发光引导到光检测器。 控制器控制样品台，电子束源和光检测器的操作。 在一个方面，阶段CL光谱层析成像装置包括电子束源，其引导物体处的电子束以产生物体的发射。 检测器检测发射。 控制器从与检测到的发射相关的检测器接收信息。 控制器从与检测到的发射相关的信息中导出二维（2D）CL图，并从2D CL图导出三维（3D）CL断层图像。
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公开(公告)号：US20160061750A1
公开(公告)日：2016-03-03
申请号：US14838268
申请日：2015-08-27
Applicant: Vrije Universiteit Amsterdam , Universiteit van Amsterdam , Stichting voor Fundamenteel Onderzoek der Materie , ASML Netherlands B.V.
Inventor： Arie Jeffrey DEN BOEF , Simon Gijsbert Josephus MATHIJSSEN , Nitesh PANDEY , Stefan Michiel WITTE , Kjeld EIKEMA
IPC: G01N21/956 , G03F7/20 , G01B11/00
CPC classification number: G01N21/956 , G01B11/00 , G01N2201/12 , G03F7/70141 , G03F7/70625 , G03F7/70633 , G03F7/70641 , G03H1/0443 , G03H2001/0033 , G03H2001/0204 , G03H2001/0458
Abstract: Metrology targets are formed on a substrate (W) by a lithographic process. A target (T) comprising one or more grating structures is illuminated with spatially coherent radiation under different conditions. Radiation (650) diffracted by from said target area interferes with reference radiation (652) interferes with to form an interference pattern at an image detector (623). One or more images of said interference pattern are captured. From the captured image(s) and from knowledge of the reference radiation a complex field of the collected scattered radiation at the detector. A synthetic radiometric image (814) of radiation diffracted by each grating is calculated from the complex field. From the synthetic radiometric images (814, 814′) of opposite portions of a diffractions spectrum of the grating, a measure of asymmetry in the grating is obtained. Using suitable targets, overlay and other performance parameters of the lithographic process can be calculated from the measured asymmetry.
Abstract translation: 通过光刻工艺在基板（W）上形成计量目标。 包括一个或多个光栅结构的靶（T）在不同条件下被空间相干辐射照射。 从参考辐射（652）干涉的所述目标区域衍射的辐射（650）干扰以在图像检测器（623）处形成干涉图案。 捕获所述干涉图案的一个或多个图像。 从捕获的图像和参考辐射的知识中，在检测器处收集的散射辐射的复杂场。 从复场计算由每个光栅衍射的辐射的合成辐射图像（814）。 从光栅的衍射光谱的相对部分的合成辐射图像（814,814'）获得光栅中的不对称度。 使用合适的目标，可以从测量的不对称性计算光刻过程的覆盖层和其他性能参数。
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公开(公告)号：WO2003025661A1
公开(公告)日：2003-03-27
申请号：PCT/NL2001/000747
申请日：2001-10-10
Applicant: UNIVERSITEIT VAN AMSTERDAM , STICHTING VOOR FUNDAMENTEEL ONDERZOEK DER MATERIE , VOS, Willem, Lambertus , KOENDERINK, Albert, Femius , JOHNSON, Patrick, Michael
IPC: G02F1/01
CPC classification number: G02F1/0126 , B82Y10/00 , B82Y20/00 , G02F2202/13 , G02F2202/32
Abstract: The present invention provides a method and a device for changing at least locally the density of states of a photonic composite material (1), by supplying radiation energy (5), which changes the refractive index of at least one of the materials of the composite material (1). The method allows very fast switching of band gaps, and hence of transmission and other optical properties of such photonic composite materials. For example controlled emission and capturing of single photons, or transport thereof becomes possible, through excitation of impurities (4) with a band gap energy, and subsequent shifting of said band gap through supply of radiation energy.
Abstract translation: 本发明提供一种用于通过提供辐射能量（5）来至少局部地改变光子复合材料（1）的状态密度的方法和装置，该辐射能量（5）改变复合材料的至少一种材料的折射率 材料（1）。 该方法允许带隙的非常快速的切换，从而允许这种光子复合材料的透射和其它光学性质的非常快速的切换。 例如，通过用带隙能量激发杂质（4），以及通过提供辐射能量随后移动所述带隙，可以控制发射和捕获单个光子或其传输。
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