公开(公告)号：US20070125970A1

公开(公告)日：2007-06-07

申请号：US11646938

申请日：2006-12-27

Applicant: Igor Fomenkov ,  Alexander Ershov

Inventor： Igor Fomenkov ,  Alexander Ershov

IPC: G01J3/10

CPC classification number: G03F7/70033 ,  B82Y10/00 ,  G03F7/70175 ,  G03F7/70916 ,  G21K1/062 ,  G21K2201/061 ,  G21K2201/065 ,  G21K2201/067 ,  H05G2/003 ,  H05G2/005 ,  H05G2/006 ,  H05G2/008

Abstract: An apparatus and method for EUV light production is disclosed which may comprise a laser produced plasma (“LPP”) extreme ultraviolet (“EUV”) light source control system comprising a target delivery system adapted to deliver moving plasma initiation targets and an EUV light collection optic having a focus defining a desired plasma initiation site, comprising: a target tracking and feedback system comprising: at least one imaging device providing as an output an image of a target stream track, wherein the target stream track results from the imaging speed of the camera being too slow to image individual plasma formation targets forming the target stream imaged as the target stream track; a stream track error detector detecting an error in the position of the target stream track in at least one axis generally perpendicular to the target stream track from a desired stream track intersecting the desired plasma initiation site. At least one target crossing detector may be aimed at the target track and detecting the passage of a plasma formation target through a selected point in the target track. A drive laser triggering mechanism utilizing an output of the target crossing detector to determine the timing of a drive laser trigger in order for a drive laser output pulse to intersect the plasma initiation target at a selected plasma initiation site along the target track at generally its closest approach to the desired plasma initiation site. A plasma initiation detector may be aimed at the target track and detecting the location along the target track of a plasma initiation site for a respective target. An intermediate focus illuminator may illuminate an aperture formed at the intermediate focus to image the aperture in the at least one imaging device. The at least one imaging device may be at least two imaging devices each providing an error signal related to the separation of the target track from the vertical centerline axis of the image of the intermediate focus based upon an analysis of the image in the respective one of the at least two imaging devices. A target delivery feedback and control system may comprise a target delivery unit; a target delivery displacement control mechanism displacing the target delivery mechanism at least in an axis corresponding to a first displacement error signal derived from the analysis of the image in the first imaging device and at least in an axis corresponding to a second displacement error signal derived from the analysis of the image in the second imaging device.

公开(公告)号：US20070012890A1

公开(公告)日：2007-01-18

申请号：US11486042

申请日：2006-07-14

Applicant: Kaku Irisawa

Inventor： Kaku Irisawa

IPC: G21K4/00 ,  H04N7/18

CPC classification number: G21K4/00 ,  B82Y10/00 ,  G21K2004/04 ,  G21K2004/06 ,  G21K2201/061

Abstract: A radiation image detector includes an up-conversion phosphor layer for emitting fluorescence by irradiation with infrared light, a first electrode layer for transmitting the infrared light, the fluorescence and radiation carrying a radiation image, a photoconductive layer for recording, a charge storage portion, a photoconductive layer for readout, and a second electrode layer for transmitting the infrared light and the readout light. Radiation is recorded as latent image charge in the charge storage portion. The electric charge is read out from the charge storage portion by irradiating the photoconductive layer for readout with the readout light from the second electrode layer side. The up-conversion phosphor layer is irradiated with the infrared light from the second electrode layer side and remaining charge in the vicinity of the first electrode layer is erased by fluorescence emitted from the up-conversion phosphor layer by irradiation with the infrared light.

Abstract translation: 放射线图像检测器包括用红外光照射发射荧光的上转换磷光体层，用于透射红外光的第一电极层，承载放射线图像的荧光和辐射，用于记录的光电导层，电荷存储部分， 用于读出的光电导层，以及用于传输红外光和读出光的第二电极层。 在电荷存储部分中将辐射记录为潜像电荷。 通过用来自第二电极层侧的读出光照射用于读出的光电导层，从电荷存储部读出电荷。 上转换荧光体层被来自第二电极层侧的红外光照射，并且通过用红外光照射从上转换荧光体层发出的荧光来擦除第一电极层附近的剩余电荷。

公开(公告)号：US07164144B2

公开(公告)日：2007-01-16

申请号：US10900839

申请日：2004-07-27

Applicant: William N. Partlo ,  Norbert Bowering ,  Alexander I. Ershov ,  Igor V. Fomenkov ,  David W. Myers ,  Ian Roger Oliver ,  John Viatella ,  Robert N. Jacques

Inventor： William N. Partlo ,  Norbert Bowering ,  Alexander I. Ershov ,  Igor V. Fomenkov ,  David W. Myers ,  Ian Roger Oliver ,  John Viatella ,  Robert N. Jacques

IPC: H01J35/20

CPC classification number: G03F7/70033 ,  B82Y10/00 ,  G03F7/70175 ,  G03F7/70916 ,  G21K1/062 ,  G21K2201/061 ,  G21K2201/065 ,  G21K2201/067 ,  H05G2/003 ,  H05G2/005 ,  H05G2/006 ,  H05G2/008

Abstract: A laser produced plasma (“LPP”) extreme ultraviolet (“EUV”) light source control system comprises a target delivery system adapted to deliver moving plasma initiation targets and an EUV light collection optic having a focus defining a desired plasma initiation site, a target tracking and feedback system comprising: at least one imaging device providing as an output an image of a target stream track, and a stream track error detector detecting an error in the position of the target stream track in at least one axis generally perpendicular to the target stream track from a desired stream track intersecting the desired plasma initiation site.

Abstract translation: 激光产生的等离子体（“LPP”）极紫外（“EUV”）光源控制系统包括适于传送移动等离子体引发目标的目标传送系统和具有定义所需等离子体起始位置的焦点的EUV光收集光学元件，靶 跟踪和反馈系统，包括：至少一个成像装置，其提供目标流轨迹的图像作为输出;以及流轨道误差检测器，其检测目标流轨迹在大致垂直于目标的至少一个轴上的位置的误差 来自与期望的等离子体起始位点相交的所需流道的流轨道。

公开(公告)号：US20070002474A1

公开(公告)日：2007-01-04

申请号：US11082404

申请日：2005-03-17

Applicant: Mitsuaki Amemiya ,  Akira Miyake

Inventor： Mitsuaki Amemiya ,  Akira Miyake

IPC: G02B5/08

CPC classification number: G02B17/0631 ,  B82Y10/00 ,  G02B5/22 ,  G02B17/0642 ,  G02B17/0663 ,  G21K2201/061

Abstract: Disclosed is a measuring apparatus for measuring the position, size and/or shape of a light convergent point of an EUV light source. In one preferred form, the apparatus includes a light receiving device for receiving EUV light diverging from a light convergent point, an optical system for directing the EUV light toward the light receiving device, a light blocking member disposed in a portion of light path for the EUV light and having a plurality of openings, and a system for detecting a spatial distribution of the EUV light at the light convergent point, on the basis of reception of EUV light by the light receiving device. In another preferred from, the apparatus includes a light receiving device for receiving EUV light diverging from a light convergent point, a gas filter disposed in a portion of a light path of the EUV light and being filled with a predetermined gas, and a system for detecting a spatial distribution of the EUV light at the light convergent point, on the basis of the reception of EUV light by the light receiving device.

Abstract translation: 公开了一种用于测量EUV光源的聚光点的位置，大小和/或形状的测量装置。 在一个优选形式中，该装置包括用于接收从光会聚点发散的EUV光的光接收装置，用于将EUV光引向光接收装置的光学系统，设置在光路的一部分中的遮光构件，用于 EUV光并且具有多个开口，以及用于基于光接收装置的EUV光的接收来检测在聚光点处的EUV光的空间分布的系统。 在另一个优选的实施例中，该装置包括用于接收从光会聚点发散的EUV光的光接收装置，设置在EUV光的光路部分中并被预定气体填充的气体过滤器的系统， 基于由光接收装置接收到的EUV光，在光会聚点检测EUV光的空间分布。

公开(公告)号：US20050122603A1

公开(公告)日：2005-06-09

申请号：US10499968

申请日：2002-12-25

Applicant: Yoshiyuki Takizawa ,  Yoshiyuki Takahashi ,  Hirohiko Shimizu ,  Chiko Otani ,  Toshikazu Ebisuzaki

Inventor： Yoshiyuki Takizawa ,  Yoshiyuki Takahashi ,  Hirohiko Shimizu ,  Chiko Otani ,  Toshikazu Ebisuzaki

IPC: G02B23/00 ,  G02B5/26 ,  G02B5/28 ,  G02B17/00 ,  G02B23/02 ,  G02B23/06 ,  G02B5/08

CPC classification number: B82Y10/00 ,  G02B23/02 ,  G02B23/06 ,  G21K2201/061

Abstract: The light of a broad energy band can be observed by reflecting the light of the broad energy band, for example, the light from the visible light region to the x-ray region at a high reflectance respectively, by a composite telescope including a normal incidence optical system and an oblique incidence optical system. A broadband telescope comprise an oblique incidence optical system unit in which the light is obliquely incident on a surface part for reflecting the incident light, a normal incidence optical system unit in which the light is substantially vertically incident on a surface part for reflecting the incident light, and an analyzer for spectrum analysis of the light reflected by the surface part of the obliquely incidence optical system unit and the light reflected by the surface part of the normal incidence optical system unit.

Abstract translation: 通过复合望远镜，通过将包括正常入射的宽能带的光例如以可见光区域的光反射到高反射率的X射线区域，能够观察到宽能带的光 光学系统和倾斜入射光学系统。 宽带望远镜包括倾斜入射光学系统单元，其中光倾斜地入射在用于反射入射光的表面部分上;法线入射光学系统单元，其中光基本垂直地入射在表面部分上以反射入射光 以及用于对由倾斜入射光学系统单元的表面部分反射的光和由入射光学系统单元的表面部分反射的光进行光谱分析的分析仪。

公开(公告)号：US20020080916A1

公开(公告)日：2002-06-27

申请号：US09366028

申请日：1999-08-02

Inventor： LICAI JIANG ,  BORIS VERMAN

IPC: G21K001/00

CPC classification number: B82Y10/00 ,  G02B5/0891 ,  G21K1/062 ,  G21K2201/061 ,  G21K2201/067

Abstract: An electromagnetic reflector having a multilayer structure where the electromagnetic reflector is configured to reflect multiple electromagnetic frequencies.

Abstract translation: 具有多层结构的电磁反射器，其中电磁反射器被配置为反射多个电磁频率。

公开(公告)号：US5799056A

公开(公告)日：1998-08-25

申请号：US755294

申请日：1996-11-22

Applicant: George Gutman

Inventor： George Gutman

IPC: G21K1/06

CPC classification number: B82Y10/00 ,  G21K1/062 ,  G21K2201/061 ,  G21K2201/064 ,  G21K2201/067 ,  G21K2201/068

Abstract: This invention relates to novel methods of producing flat and curved optical elements with laterally and depth graded multilayer thin films, in particular multilayers of extremely high precision, for use with soft and hard x-rays and neutrons and the optical elements achieved by these methods. In order to improve the performance of an optical element, errors in d spacing and curvature are isolated and subsequently compensated.

Abstract translation: 本发明涉及生产具有横向和深度梯度多层薄膜的平面和弯曲光学元件的新方法，特别是具有极高精度的多层，用于软和硬x射线和中子以及通过这些方法实现的光学元件。 为了提高光学元件的性能，分离出d间隔和曲率的误差并随后进行补偿。

公开(公告)号：US5310603A

公开(公告)日：1994-05-10

申请号：US75350

申请日：1993-06-14

Applicant: Yasuaki Fukuda ,  Yutaka Watanabe ,  Shigetaro Ogura ,  Takashi Iizuka

Inventor： Yasuaki Fukuda ,  Yutaka Watanabe ,  Shigetaro Ogura ,  Takashi Iizuka

IPC: B32B15/08 ,  G02B1/10 ,  G21K1/06 ,  G01K1/06 ,  B32B15/04

CPC classification number: G21K1/062 ,  B32B15/08 ,  B82Y10/00 ,  G02B5/0891 ,  G02B5/26 ,  G21K2201/061 ,  Y10S428/913

Abstract: A multi-layer reflection mirror for soft X-ray to vacuum ultraviolet ray, comprises a substrate, a plurality of first layers, and a plurality of second layers formed on the substrate alternately with the first layers. The first layer primarily consists of at least one of single elements, such as ruthenium or of a boride, carbide, silicide, nitride oxide of a transition metal. The second layer primarily consists of at least one of compounds of carbon, silicon (e.g. carbide, nitride and oxide of silicon), boron (e.g. carbide, nitride and oxide of boron), beryllium (e.g. carbide, nitride and oxide of beryllium) and aluminum (e.g. carbide, nitride and oxide of aluminum).

Abstract translation: 用于软X射线至真空紫外线的多层反射镜包括与第一层交替地形成在基板上的基板，多个第一层和多个第二层。 第一层主要由单一元素，例如钌或硼化物，碳化物，硅化物，过渡金属的氮氧化物中的至少一种组成。 第二层主要由碳，硅（例如碳化物，氮化物和硅的氧化物），硼（例如碳化物，氮化物和硼的氧化物），铍（例如碳化物，氮化物和铍氧化物）的化合物中的至少一种和 铝（例如碳化物，氮化物和铝的氧化物）。

公开(公告)号：US5203977A

公开(公告)日：1993-04-20

申请号：US666971

申请日：1991-03-11

Applicant: Daniel M. Makowiecki ,  Alan F. Jankowski

Inventor： Daniel M. Makowiecki ,  Alan F. Jankowski

IPC: C23C14/06 ,  C23C14/18 ,  C23C14/34 ,  G21K1/06

CPC classification number: B82Y10/00 ,  C23C14/0635 ,  C23C14/0647 ,  C23C14/18 ,  C23C14/185 ,  C23C14/3414 ,  G21K1/062 ,  G21K2201/061 ,  G21K2201/067 ,  Y10T428/265 ,  Y10T428/31678

Abstract: A method is described for the production of thin boron and titanium/boron films by magnetron sputter deposition. The amorphous boron films contain no morphological growth features, unlike those found when thin films are prepared by various physical vapor deposition processes. Magnetron sputter deposition method requires the use of a high density crystalline boron sputter target which is prepared by hot isostatic pressing. Thin boron films prepared by this method are useful for ultra-thin band pass filters as well as the low Z element in low Z/high Z mirrors which enhance reflectivity from grazing to normal incidence.

Abstract translation: 描述了通过磁控溅射沉积生产薄硼和钛/硼膜的方法。 不同于当通过各种物理气相沉积工艺制备薄膜时，无定形硼膜不含形态生长特征。 磁控溅射沉积法需要使用通过热等静压制备的高密度结晶硼溅射靶。 通过该方法制备的薄硼膜对于超薄带通滤波器以及低Z /高Z反射镜中的低Z元件是有用的，其增强了从放牧到正常入射的反射率。

公开(公告)号：US4737973A

公开(公告)日：1988-04-12

申请号：US941647

申请日：1986-12-15

Applicant: Taro Ogawa ,  Shinji Kuniyoshi ,  Yoshinori Nakayama ,  Takeshi Kimura

Inventor： Taro Ogawa ,  Shinji Kuniyoshi ,  Yoshinori Nakayama ,  Takeshi Kimura

IPC: G01N23/00 ,  G03F7/20 ,  G21K1/06 ,  G01T1/36

CPC classification number: B82Y10/00 ,  G03F7/70158 ,  G03F7/70575 ,  G21K1/062 ,  G21K2201/061 ,  G21K2201/062 ,  G21K2201/067

Abstract: A focusing X-ray crystal monochromator in which one or more crystal layers having different spacings of lattice plane are stacked on a crystal base. Due to different spacings of lattice plane, the angle of reflection and diffraction of a diverging incident X-ray beam can be so changed that the beam takes a parallel or focusing direction for monochromatization. Thus, the monochromator of the present invention can be applied to the X-ray lithography for transferring a pattern of high resolution or the X-ray analysis such as the fine X-ray diffraction.

Abstract translation: 将其中具有不同晶格面间隔的一个或多个晶体层堆叠在晶体基底上的聚焦X射线晶体单色仪。 由于晶格面的不同间隔，发散的入射X射线束的反射角和衍射角可以如此改变，使得束取平行或聚焦方向进行单色化。 因此，本发明的单色仪可以应用于用于转印高分辨率图案或X射线分析的精细X射线衍射的X射线光刻。