公开(公告)号：US07206375B2

公开(公告)日：2007-04-17

申请号：US11291349

申请日：2005-12-01

Applicant: Zewu Chen ,  Walter Gibson

Inventor： Zewu Chen ,  Walter Gibson

IPC: G01F23/06

CPC classification number: G01N23/02 ,  G01N23/06 ,  G21K2201/062 ,  G21K2201/064

Abstract: Compact, low-power-consuming systems and methods for exposing samples to high-energy radiation, for example, for exposing samples to x-rays for implementing x-ray absorption near edge analysis (XANES). The systems and methods include a low-power-consuming radiation source, such as an x-ray tube; one or more tunable crystal optics for directing and varying the energy of the radiation onto a sample under analysis; and a radiation detecting device, such as an x-ray detector, for detecting radiation emitted by the sample. The one or more tunable crystal optics may be doubly-curved crystal optics. The components of the system may be arranged in a collinear fashion. The disclosed systems and methods are particularly applicable to XANES analysis, for example, XANES analysis of the chemical state of chromium or another transition metal in biological processes.

Abstract translation: 用于将样品暴露于高能辐射的紧凑，低功耗系统和方法，例如将样品暴露于X射线以实现近边缘分析（XANES）的X射线吸收。 该系统和方法包括低功耗辐射源，例如x射线管; 一个或多个可调晶体光学器件，用于将辐射的能量引导和分析到分析的样品上; 以及用于检测样品发射的辐射的诸如x射线检测器的放射线检测装置。 一个或多个可调晶体光学器件可以是双曲面晶体光学器件。 系统的组件可以以共线的方式布置。 所公开的系统和方法特别适用于XANES分析，例如，XANES分析生物过程中铬或其他过渡金属的化学状态。

公开(公告)号：US07084412B2

公开(公告)日：2006-08-01

申请号：US10952412

申请日：2004-09-28

Applicant: Markus Weiss

Inventor： Markus Weiss

IPC: H01J21/425

CPC classification number: B82Y10/00 ,  G03F7/70166 ,  G21K1/06 ,  G21K2201/064

Abstract: There is provided a collector unit for illumination systems with a wavelength of ≦193 nm, preferably ≦126 nm, and especially preferably in the region of EUV wavelengths. Rays of a beam bundle impinge on the collector unit, and the beam bundle emerges from an object in an object plane. The collector unit includes at least one mirror shell that receives the rays of the beam bundle emerging from the object and shows an optical effect, and a periodic structure with at least one grating period applied to at least a part of the mirror shell. An illumination system and an EUV projection exposure system are also provided.

Abstract translation: 为波长<= 193nm，优选<= 126nm，特别优选在EUV波长区域的照明系统提供收集器单元。 束束的射线照射在收集器单元上，并且束束从物平面中的物体出射。 收集器单元包括至少一个镜壳，其接收从物体出射的束束的光线并且显示光学效应，以及具有施加到镜壳的至少一部分的至少一个光栅周期的周期性结构。 还提供照明系统和EUV投影曝光系统。

公开(公告)号：US20060120508A1

公开(公告)日：2006-06-08

申请号：US11291349

申请日：2005-12-01

Applicant: Zewu Chen ,  Walter Gibson

Inventor： Zewu Chen ,  Walter Gibson

IPC: G21K1/06

CPC classification number: G01N23/02 ,  G01N23/06 ,  G21K2201/062 ,  G21K2201/064

Abstract: Compact, low-power-consuming systems and methods for exposing samples to high-energy radiation, for example, for exposing samples to x-rays for implementing x-ray absorption near edge analysis (XANES). The systems and methods include a low-power-consuming radiation source, such as an x-ray tube; one or more tunable crystal optics for directing and varying the energy of the radiation onto a sample under analysis; and a radiation detecting device, such as an x-ray detector, for detecting radiation emitted by the sample. The one or more tunable crystal optics may be doubly-curved crystal optics. The components of the system may be arranged in a collinear fashion. The disclosed systems and methods are particularly applicable to XANES analysis, for example, XANES analysis of the chemical state of chromium or another transition metal in biological processes.

Abstract translation: 用于将样品暴露于高能辐射的紧凑，低功耗系统和方法，例如将样品暴露于X射线以实现近边缘分析（XANES）的X射线吸收。 该系统和方法包括低功耗辐射源，例如x射线管; 一个或多个可调晶体光学器件，用于将辐射的能量引导和分析到分析的样品上; 以及用于检测样品发射的辐射的诸如x射线检测器的放射线检测装置。 一个或多个可调晶体光学器件可以是双曲面晶体光学器件。 系统的组件可以以共线的方式布置。 所公开的系统和方法特别适用于XANES分析，例如，XANES分析生物过程中铬或其他过渡金属的化学状态。

公开(公告)号：US20050117705A1

公开(公告)日：2005-06-02

申请号：US10957878

申请日：2004-10-04

Applicant: Timothy Morrison ,  Ivan Nesch ,  Gocha Khelashvili

Inventor： Timothy Morrison ,  Ivan Nesch ,  Gocha Khelashvili

IPC: G21K1/06 ,  H01J35/06 ,  H01J35/08

CPC classification number: H01J35/06 ,  G21K1/06 ,  G21K2201/062 ,  G21K2201/064 ,  H01J35/08 ,  H01J2235/086

Abstract: An x-ray source for producing a uniformly intense area x-ray beam. The x-ray source includes a vacuum chamber. An area electron emitter is disposed at a first end of the vacuum chamber. A target material is disposed at a second end of the vacuum chamber and spaced apart from the area electron emitter. The area electron emitter and the target material are correspondingly shaped and/or correspondingly curved. The x-ray source also includes at least one high voltage power source. The area electron emitter is electrically connected to a negative pole of one of the at least one high voltage power source and the target electrically connected to a positive pole of one of the at least one high voltage power source.

Abstract translation: 用于产生均匀强烈区域X射线束的x射线源。 x射线源包括真空室。 区域电子发射体设置在真空室的第一端。 目标材料设置在真空室的第二端并与区域电子发射体间隔开。 区域电子发射器和靶材料相应地成形和/或相应地弯曲。 x射线源还包括至少一个高压电源。 区域电子发射体电连接到至少一个高电压电源中的一个的负极和电连接到至少一个高压电源之一的正极的目标。

公开(公告)号：US20040131146A1

公开(公告)日：2004-07-08

申请号：US10742414

申请日：2003-12-19

Applicant: X-Ray Optical Systems, Inc.

Inventor： Zewu Chen ,  David M. Gibson

IPC: G21K004/00

CPC classification number: G21K1/062 ,  B82Y10/00 ,  G01N23/223 ,  G01N2223/076 ,  G21K1/06 ,  G21K2201/064

Abstract: X-ray fluorescence (XRF) spectroscopy systems and methods are provided. One system includes a source of x-ray radiation and an excitation optic disposed between the x-ray radiation source and the sample for collecting x-ray radiation from the source and focusing the x-ray radiation to a focal point on the sample to incite at least one analyte in the sample to fluoresce. The system further includes an x-ray fluorescence detector and a collection optic comprising a doubly curved diffracting optic disposed between the sample and the x-ray fluorescence detector for collecting x-ray fluorescence from the focal point on the sample and focusing the fluorescent x-rays towards the x-ray fluorescence detector.

Abstract translation: 提供X射线荧光（XRF）光谱系统和方法。 一个系统包括x射线辐射源和设置在x射线辐射源和样本之间的激发光学器件，用于收集来自源的x射线辐射并将x射线辐射聚焦到样品上的焦点以煽动 样品中至少有一种分析物发出荧光。 该系统还包括x射线荧光检测器和收集光学器件，其包括设置在样品和x射线荧光检测器之间的双曲面衍射光学器件，用于从样品上的焦点收集X射线荧光，并将荧光x- 射线朝向X射线荧光检测器。

公开(公告)号：US20040107731A1

公开(公告)日：2004-06-10

申请号：US10636717

申请日：2003-08-07

Inventor： Thorsten Doehring ,  Ralf Jedamzik ,  Hauke Esemann ,  Eva Hoelzel

IPC: C03B023/035 ,  C03C010/12

CPC classification number: C03B23/0357 ,  C03B19/02 ,  C03B23/025 ,  C03B23/0252 ,  C03B32/02 ,  C03B40/00 ,  C03C10/0027 ,  G21K1/067 ,  G21K2201/064 ,  G21K2201/067

Abstract: A process for forming glass or glass ceramics is disclosed, wherein a glass ceramics form (12) is made from a starting glass by molding, which is transformed by a heat treatment into a keatite glass ceramic comprising predominantly keatite mixed crystals. With such a keatite glass ceramics form (12) formed bodies can be prepared from blank parts by sagging under gravity force at a temperature above the glass transition temperature of the blank part (14).

Abstract translation: 公开了一种用于形成玻璃或玻璃陶瓷的方法，其中玻璃陶瓷形式（12）由起始玻璃通过模塑制成，其通过热处理转变成主要包含酮钛矿混晶的酮铁玻璃陶瓷。 通过这样的酮铁玻璃陶瓷形式（12），可以通过在高于坯料部分（14）的玻璃化转变温度的温度下在重力作用下垂而由坯件制备成形体。

公开(公告)号：US06606371B2

公开(公告)日：2003-08-12

申请号：US09745236

申请日：2000-12-19

Applicant: Michael Antonell ,  Erik Cho Houge ,  John Martin McIntosh ,  Larry E. Plew ,  Catherine Vartuli

Inventor： Michael Antonell ,  Erik Cho Houge ,  John Martin McIntosh ,  Larry E. Plew ,  Catherine Vartuli

IPC: G21K106

CPC classification number: G21K1/06 ,  G21K2201/062 ,  G21K2201/064 ,  G21K2201/067

Abstract: A reflective lens with at least one curved surface formed of polycrystalline material. In one embodiment, a lens structure includes a substrate having a surface of predetermined curvature and a film formed along a surface of the substrate with multiple individual members each having at least one similar orientation relative to the portion of the substrate surface adjacent the member such that collectively the members provide predictable angles for diffraction of x-rays generated from a common source. A system is also provided for performing an operation with x-rays. In one embodiment, a system includes a source for generating the x-rays, a polycrystalline surface region having crystal spacing suitable for reflecting a plurality of x-rays at the same Bragg angle along the region, and transmitting the reflected x-rays to a reference position. An associated method includes providing x-rays to polycrystalline surface region having crystal spacings suitable for reflecting a plurality of x-rays at the same Bragg angle along the region, transmitting the reflected x-rays to a reference position and positioning a sample between the surface region and the reference position so that the x-rays are transmitted through the sample.

Abstract translation: 具有由多晶材料形成的至少一个曲面的反射透镜。 在一个实施例中，透镜结构包括具有预定曲率的表面的基底和沿着基底的表面形成的膜，多个单独的构件各自具有相对于邻近构件的基底表面的部分的至少一个相似的取向，使得 共同地，这些构件为从公共源产生的x射线的衍射提供可预测的角度。 还提供了一种用于使用X射线进行操作的系统。 在一个实施例中，系统包括用于产生x射线的源，具有适合于沿着该区域以相同的布拉格角反射多个x射线的晶体间距的多晶表面区域，以及将反射的x射线透射到 参考位置。 相关联的方法包括向具有晶体间距的多晶表面区域提供x射线，该晶体间距适于沿着该区域以相同的布拉格角反射多个x射线，将反射的x射线透射到参考位置，并将样品定位在表面 区域和参考位置，使得x射线透射通过样品。

公开(公告)号：US06438199B1

公开(公告)日：2002-08-20

申请号：US09679718

申请日：2000-09-29

Applicant: Jörg Schultz ,  Johannes Wangler ,  Karl-Heinz Schuster ,  Udo Dinger ,  Wolfgang Singer ,  Martin Antoni

Inventor： Jörg Schultz ,  Johannes Wangler ,  Karl-Heinz Schuster ,  Udo Dinger ,  Wolfgang Singer ,  Martin Antoni

IPC: G21K504

CPC classification number: G21K1/06 ,  B82Y10/00 ,  G03F7/70075 ,  G03F7/70083 ,  G03F7/70091 ,  G03F7/70108 ,  G03F7/70166 ,  G03F7/702 ,  G03F7/70233 ,  G03F7/70358 ,  G03F7/708 ,  G03F7/70891 ,  G21K1/067 ,  G21K2201/06 ,  G21K2201/064

Abstract: The invention concerns an illumination system, particularly for microlithography with wavelengths ≦193 nm, comprising a light source, a first optical component, a second optical component, an image plane and an exit pupil. The first optical component transforms the light source into a plurality of secondary light sources being imaged by the second optical component in said exit pupil. The first optical component comprises a first optical element having a plurality of first raster elements, which are imaged into said image plane producing a plurality of images being superimposed at least partially on a field in said image plane. The first raster elements deflect incoming ray bundles with first deflection angles, wherein at least two of the first deflection angles are different. The first raster elements are preferably rectangular, wherein the field is a segment of an annulus. To transform the rectangular images of the first raster elements into the segment of the annulus, the second optical component comprises a first field mirror for shaping the field to the segment of the annulus.

Abstract translation: 本发明涉及一种照明系统，特别是对于具有波长<= 193nm的微光刻，其包括光源，第一光学部件，第二光学部件，图像平面和出射光瞳。 第一光学部件将光源变换成由所述出射光瞳中的第二光学部件成像的多个次级光源。 第一光学部件包括具有多个第一光栅元件的第一光学元件，其被成像到所述图像平面中，产生至少部分地叠加在所述图像平面中的场上的多个图像。 第一光栅元件以第一偏转角偏转入射光束，其中第一偏转角中的至少两个是不同的。 第一光栅元件优选地是矩形的，其中该场是环的一段。 为了将第一光栅元件的矩形图像变换成环形的区段，第二光学部件包括用于将场成形为环形部分的第一场镜。

公开(公告)号：US20010031034A1

公开(公告)日：2001-10-18

申请号：US09854054

申请日：2001-05-12

Inventor： David B. Wittry

IPC: G21K001/06

CPC classification number: G21K1/06 ,  G21K2201/062 ,  G21K2201/064 ,  G21K2201/067

Abstract: A method and apparatus for fabricating x-ray optics of the type having a doubly curved crystal lamella attached to a backing plate that is positioned and aligned for use in a spectrometer, monochromator or point-focusing instrument. The fabrication method is an improvement over the one described in U.S. Pat. No. 6,236,710 and provides for simpler and more accurate prepositioning the crystal lamella relative to the backing plate. This method utilizes an apparatus with a removable top and a removable liner; said top containing one or more micrometer screws, and said liner being made of a material to which the bonding agent does not adhere. During fabrication of the optic by pressing the crystal against a doubly curved mold via the viscous bonding agent, excess bonding agent escapes through channels in the liner. The liner is suitably configured so that the completed optic can be easily removed and the mold and fabrication apparatus can be reused many times.

Abstract translation: 一种用于制造这种类型的X射线光学器件的方法和装置，该方法和装置具有连接到背板的双曲面晶片，其被定位和对准以用于光谱仪，单色仪或点聚焦仪器。 制造方法是比美国专利中描述的方法更好的改进。 No.6,236,710并且提供了相对于背板更简单和更准确地预定晶片。 该方法利用具有可拆卸顶部和可拆卸衬垫的装置; 所述顶部包含一个或多个千分尺螺钉，并且所述衬垫由粘合剂不粘附到的材料制成。 在通过粘性粘合剂将晶体压靠双曲模具制造光学元件期间，过量的粘合剂通过衬管中的通道逸出。 该衬套适当地构造成使得完整的光学元件能够容易地移除，并且模具和制造装置可以被重复使用多次。

公开(公告)号：US6038285A

公开(公告)日：2000-03-14

申请号：US16891

申请日：1998-02-02

Applicant: Zhong Zhong ,  Leroy Dean Chapman ,  William C. Thomlinson

Inventor： Zhong Zhong ,  Leroy Dean Chapman ,  William C. Thomlinson

IPC: G21K1/06

CPC classification number: G21K1/06 ,  G21K2201/062 ,  G21K2201/064

Abstract: A method and apparatus for producing a monochromatic beam. A plurality of beams are generated from a polyenergetic source. The beams are then transmitted through a bent crystal, preferably a bent Laue crystal, having a non-cylindrical shape. A position of the bent crystal is rocked with respect to the polyenergetic source until a plurality of divergent monochromatic beams are emitted from the bent crystal.

Abstract translation: 一种用于产生单色光束的方法和装置。 从多能源产生多个光束。 然后将光束透过具有非圆柱形状的弯曲晶体，优选弯曲的Laue晶体。 弯曲晶体的位置相对于多能源摇摆，直到从弯曲晶体发射多个发散单色光束。