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    DEVICE FOR PRODUCING AN ELECTRON BEAM
    145.
    发明申请
    DEVICE FOR PRODUCING AN ELECTRON BEAM 有权
    用于生产电子束的装置

    公开(公告)号：US20130162134A1

    公开(公告)日：2013-06-27

    申请号：US13821887

    申请日：2011-09-08

    Applicant: Goesta Mattausch ,  Peter Feinaeugle ,  Volker Kirchhoff ,  Dieter Weiske ,  Henrik Flaske ,  Rainer Zeibe

    Inventor： Goesta Mattausch ,  Peter Feinaeugle ,  Volker Kirchhoff ,  Dieter Weiske ,  Henrik Flaske ,  Rainer Zeibe

    IPC: H01J29/56 ,  H01J29/00

    CPC classification number: H01J37/075 ,  H01J3/025 ,  H01J37/077 ,  H01J2237/3104 ,  H01J2237/3128 ,  H01J2237/3132

    Abstract: The invention relates to a device for producing an electron beam, comprising a housing (12), which delimits a space (13) that can be evacuated and has an electron beam outlet opening; an inlet (16) for feeding a process gas into the space (13) that can be evacuated; a planar cathode (14) and an anode (15), which are arranged in the space (13) that can be evacuated and between which a glow-discharge plasma can be produced by means of an applied electrical voltage, wherein ions can be accelerated from the glow-discharge plasma onto the surface of the cathode (14). The cathode has a first part (14a) made of a first material, which forms a centrally arranged first surface region of the cathode (14), and a second part (14b) made of a second material, which forms a second surface region of the cathode (14) that encloses the first surface region. The first material can be heated by the impingement with accelerated ions to a temperature at which electrons escape the first material predominantly due to thermionic emission.

    Abstract translation: 本发明涉及一种用于制造电子束的装置，包括：外壳（12），其限定可抽真空并具有电子束出口的空间（13）; 用于将处理气体进料到可以抽空的空间（13）中的入口（16）; 平面阴极（14）和阳极（15），其布置在可以抽真空的空间（13）中，并且可以通过施加的电压产生辉光放电等离子体，其中可以加速离子 从辉光放电等离子体到阴极（14）的表面。 阴极具有由第一材料制成的第一部分（14a），其形成阴极（14）的居中布置的第一表面区域和由第二材料制成的第二部分（14b），第二部分形成第二表面区域 封闭第一表面区域的阴极（14）。 主要由于热离子发射，第一种材料可以通过加速离子的冲击加热至电子逸出第一种材料的温度。

    DEVICE FOR GENERATING PLASMA AND FOR DIRECTING AN FLOW OF ELECTRONS TOWARDS A TARGET
    146.
    发明申请
    DEVICE FOR GENERATING PLASMA AND FOR DIRECTING AN FLOW OF ELECTRONS TOWARDS A TARGET 有权
    用于产生等离子体和用于指导电流流向目标的装置

    公开(公告)号：US20120081006A1

    公开(公告)日：2012-04-05

    申请号：US13259953

    申请日：2010-03-23

    Applicant: Riccardo Lotti ,  Petr Nozar ,  Carlo Taliani

    Inventor： Riccardo Lotti ,  Petr Nozar ,  Carlo Taliani

    IPC: H05H1/24

    CPC classification number: H01J3/025

    Abstract: Various embodiments include a device for generating plasma and for directing an flow of electrons towards a specific target; the device comprises a hollow cathode; a main electrode at least partially placed inside the cathode; a resistor, electrically earthing the main electrode; a substantially dielectric tubular element extending through a wall of the cathode; a ring-shaped anode placed around the tubular element and earthed; and an activation group which is electrically connected to the cathode and is able to reduce the electric potential of the cathode of at least 8 kV in about 10 ns.

    Abstract translation: 各种实施例包括用于产生等离子体并用于将电子流引向特定目标的装置; 该装置包括中空阴极; 至少部分地放置在阴极内的主电极; 一个电阻器，电接地主电极; 延伸穿过阴极的壁的基本介电的管状元件; 围绕管状元件放置的环形阳极并接地; 以及电连接到阴极并且能够在约10ns内降低至少8kV的阴极的电位的激活基团。

    Time continuous ion-ion plasma
    147.
    发明授权
    Time continuous ion-ion plasma 有权
    时间连续离子离子等离子体

    公开(公告)号：US07510666B2

    公开(公告)日：2009-03-31

    申请号：US11239432

    申请日：2005-09-20

    Applicant: Scott G. Walton ,  Robert Meger ,  Richard Fernsler ,  Darrin Leenhardt

    Inventor： Scott G. Walton ,  Robert Meger ,  Richard Fernsler ,  Darrin Leenhardt

    IPC: C23F1/00

    CPC classification number: H01J37/32623 ,  H01J3/025 ,  H01J37/3233 ,  H01J37/3266 ,  H05H2001/488

    Abstract: An ion-ion plasma source, that features a processing chamber containing a large concentration of halogen or halogen-based gases. A second chamber is coupled to the processing chamber and features an electron source which produces a high energy electron beam. The high energy electron beam is injected into the processing chamber where it is shaped and confined by a means for shaping and confining the high energy electron beam. The high energy electron beam produced in the second chamber when injected into the processing chamber ionizes the halogen gas creating a dense, ion-ion plasma in the processing chamber that is continuous in time.

    Abstract translation: 离子离子源，其特征在于包含大量卤素或卤素气体的处理室。 第二室耦合到处理室并且具有产生高能电子束的电子源。 高能电子束被注入到处理室中，在其中被高能电子束成形和限制的装置成形和限制。 当注入到处理室中时，在第二室中产生的高能电子束使卤素气体离子化，从而在处理室中产生致密的离子等离子体，其在时间上是连续的。

    Cylindrical electron beam generating/triggering device and method for generation of electrons
    148.
    发明授权
    Cylindrical electron beam generating/triggering device and method for generation of electrons 有权
    圆柱形电子束产生/触发装置及其产生方法

    公开(公告)号：US07122949B2

    公开(公告)日：2006-10-17

    申请号：US10870992

    申请日：2004-06-21

    Applicant: Mikhail Strikovski

    Inventor： Mikhail Strikovski

    IPC: H01J17/26 ,  H01J61/28

    CPC classification number: H01J3/025

    Abstract: A surface discharge device performing functions of a trigger and electron beam generator includes a cylinder shaped member formed from a dielectric material with dielectric constant ε>100, in which a central opening is formed having a conical or cylindrical shape. An internal electrode is electrically coupled to the internal surface of the cylinder shaped member. An external electrode covers the external surface of the cylinder shaped member. A triggering pulse is applied between the external and internal electrodes to generate emission of electrons in the central opening and formation of the conducting plasma to ignite the device and serve as a source of electrons for generating an electron beam. The conducting plasma charges a capacitor formed by the cylinder shaped dielectric member and the external electrode. The cylinder shaped member is positioned in a hollow cathode having a central bore hole in the bottom. An anode is positioned remotely from the cathode and an electric field exists dynamically in space between the cathode and anode for at least a portion of the duration of the triggering pulse.

    Abstract translation: 执行触发和电子束发生器的功能的表面放电装置包括由介电常数ε> 100的电介质材料形成的圆柱形构件，其中形成具有圆锥形或圆柱形形状的中心开口。 内部电极电耦合到圆筒形构件的内表面。 外部电极覆盖圆筒形构件的外表面。 在外部和内部电极之间施加触发脉冲以在中心开口中产生电子的发射并且形成导电等离子体以点燃该器件并且用作用于产生电子束的电子源。 导电等离子体对由圆柱形电介质构成的电容器和外部电极进行充电。 圆筒形构件位于底部具有中心孔的空心阴极中。 阳极远离阴极定位，并且电场在触发脉冲的持续时间的至少一部分之间动态地存在于阴极和阳极之间的空间中。

    Inductively coupled high-frequency electron source with a reduced power requirement as a result of an electrostatic inclusion of electrons
    150.
    发明申请
    Inductively coupled high-frequency electron source with a reduced power requirement as a result of an electrostatic inclusion of electrons 有权
    由于电子的静电夹杂，电感耦合高频电子源具有降低的功率需求

    公开(公告)号：US20020101159A1

    公开(公告)日：2002-08-01

    申请号：US09988818

    申请日：2001-11-20

    Inventor： Martin Closs ,  Johann Muller

    IPC: H01J011/00

    CPC classification number: H01J37/077 ,  H01J3/025 ,  H01J2237/0041

    Abstract: An inductively coupled high-frequency electron source is disclosed having a plasma chamber, which is open at least at a first end, the total surface of the open regions of the plasma chamber defined by Ao, and having a gas inlet for a gas to be ionized, as well as a high-frequency coil. The interior wall of the plasma chamber is formed at least partially by conductive regions which are connected with a current source, the total surface of the conductive regions defined by Ac, and the ratio of the surface amounts Ao to Ac not exceeding a defined maximal value.

    Abstract translation: 公开了一种电感耦合高频电子源，其具有等离子体室，该等离子体室至少在第一端开放由Ao限定的等离子体室的开口区域的总表面，并具有用于气体的气体入口 电离，以及高频线圈。 等离子体室的内壁至少部分地由与电流源连接的导电区域，由Ac限定的导电区域的总表面，以及表面量Ao与Ac的比值不超过规定的最大值 。

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