公开(公告)号：US20040038454A1

公开(公告)日：2004-02-26

申请号：US10298389

申请日：2002-11-14

Applicant: KLA-Tencor Technologies Corporation

Inventor： David Bruce Coldren ,  Prashant A. Aji ,  David Winslow Randall ,  Sharon Marie McCauley

IPC: G06F019/00

CPC classification number: G05B19/41875 ,  G05B2219/32197 ,  G05B2219/45031 ,  H01L21/67276 ,  Y02P90/20 ,  Y02P90/22

Abstract: Techniques for efficiently setting up inspection, metrology, and review systems for operating upon semiconductor wafers are described. Specifically, this involves setting up recipes that allows each system to accurately inspect semiconductor wafers. The invention gathers pertinent information from these tools and presents the information to users in a way that greatly reduces the time required to complete a recipe. One system embodiment includes an inspection system and a review station that is communicatively linked such that the review station can read from and write to an entire set of data stored at the inspection system. The set of data includes image files of features detected by the inspection system.

Abstract translation: 描述了用于有效地设置用于在半导体晶片上操作的检查，计量和检查系统的技术。 具体来说，这涉及设置允许每个系统准确检查半导体晶片的配方。 本发明从这些工具收集相关信息，并以大大减少完成配方所需时间的方式向用户提供信息。 一个系统实施例包括检查系统和通信链接的检查站，使得检查站可以读取和写入存储在检查系统中的整个数据集合。 该组数据包括由检查系统检测到的特征的图像文件。

公开(公告)号：US20030155927A1

公开(公告)日：2003-08-21

申请号：US10390502

申请日：2003-03-13

Applicant: KLA Tencor Technologies Corporation

Inventor： Gustavo A. Pinto ,  Brian C. Leslie ,  David L. Adler ,  Akella V.S. Satya ,  Robert Thomas Long ,  David J. Walker

IPC: G01R031/00 ,  G01R027/08

CPC classification number: H01L22/34 ,  G01N21/66 ,  G01N21/956 ,  G01N23/04 ,  G01R31/2884 ,  G01R31/307 ,  H01J2237/2817 ,  Y10S977/849

Abstract: Disclosed is a method of inspecting a sample. The sample is scanned in a first direction with at least one particle beam. The sample is scanned in a second direction with at least one particle beam. The second direction is at an angle to the first direction. The number of defects per an area of the sample are found as a result of the first scan, and the position of one or more of the found defects is determined from the second scan. In a specific embodiment, the sample includes a test structure having a plurality of test elements thereon. A first portion of the test elements is exposed to the beam during the first scan to identify test elements having defects, and a second portion of the test elements is exposed during the second scan to isolate and characterize the defect.

Abstract translation: 公开了一种检查样品的方法。 用至少一个粒子束沿第一方向扫描样品。 用至少一个粒子束在第二个方向上扫描样品。 第二方向与第一方向成一个角度。 作为第一扫描的结果，发现样品的每个区域的缺陷数，并且从第二次扫描确定发现的一个或多个缺陷的位置。 在具体实施例中，样本包括其上具有多个测试元件的测试结构。 测试元件的第一部分在第一次扫描期间暴露于光束以识别具有缺陷的测试元件，并且第二部分测试元件在第二次扫描期间暴露以分离和表征缺陷。

公开(公告)号：US20030062477A1

公开(公告)日：2003-04-03

申请号：US09990170

申请日：2001-11-21

Applicant: KLA-Tencor Technologies Corporation

Inventor： Mehran Nasser-Ghodsi ,  Jeffrey Reichert

IPC: G01N023/00

CPC classification number: H01J37/268 ,  G01N23/2252 ,  H01J2237/24592 ,  H01J2237/2817

Abstract: The present invention includes a system for localization of defects in test samples. A sample is scanned using a particle beam. Some particles interact with conductive elements and may cause the emission of x-rays. Other particles can pass through the sample entirely and generate a current that can be measured. A higher current generated indicates less conductive material at the scan target that may mean a void, dishing, or erosion is present. Localization of a defect can be confirmed using an x-ray emission detector.

公开(公告)号：WO2009032681A1

公开(公告)日：2009-03-12

申请号：PCT/US2008/074435

申请日：2008-08-27

Applicant: KLA-TENCOR TECHNOLOGIES CORPORATION ,  MEHANIAN, Courosh ,  HANSEN, Hans, J. ,  WANG, Yingjian ,  BEN-DOV, Yuval ,  LI, Zheng-Wu ,  HILL, Andrew, V. ,  VAEZ-IRAVANI, Mehdi ,  ZIMMERMANN, Kurt

Inventor： MEHANIAN, Courosh ,  HANSEN, Hans, J. ,  WANG, Yingjian ,  BEN-DOV, Yuval ,  LI, Zheng-Wu ,  HILL, Andrew, V. ,  VAEZ-IRAVANI, Mehdi ,  ZIMMERMANN, Kurt

IPC: H01L21/66

CPC classification number: G02B21/18 ,  G01N21/8806 ,  G01N21/9501 ,  G01N2021/8825 ,  G02B21/367

Abstract: A system is provided herein for inspecting a specimen. In one embodiment, the system may include a dual-channel microscope, two illuminators, each coupled for illuminating a different channel of the dual-channel microscope and two detectors, each coupled to a different channel of the dual-channel microscope for acquiring images of the specimen. Means are provided for separating the channels of the dual-channel microscope, so that the two detectors can acquire the images of the specimen at substantially the same time. In one embodiment, the channels of the dual-channel microscope may be spectrally separated by configuring the two illuminators, so that they produce light in two substantially non-overlapping spectral ranges. In another embodiment, the channels of the dual-channel microscope may be spatially separated by positioning the two detectors, so that the illumination light do not overlap and the fields of view of the two detectors do not overlap within a field of view of an objective lens included within the system.

Abstract translation: 本文提供了用于检查样本的系统。 在一个实施例中，系统可以包括双通道显微镜，两个照明器，每个照明器被耦合用于照亮双通道显微镜和两个检测器的不同通道，每个检测器耦合到双通道显微镜的不同通道，用于获取 标本。 提供了用于分离双通道显微镜的通道的装置，使得两个检测器可以在基本上同时获取样本的图像。 在一个实施例中，双通道显微镜的通道可以通过配置两个照明器进行光谱分离，使得它们产生两个基本上非重叠的光谱范围的光。 在另一个实施例中，双通道显微镜的通道可以通过定位两个检测器在空间上分离，使得照明光不重叠，并且两个检测器的视场在目标的视场内不重叠 镜头包含在系统内。

公开(公告)号：WO2009029851A2

公开(公告)日：2009-03-05

申请号：PCT/US2008/074872

申请日：2008-08-29

Applicant: KLA-TENCOR TECHNOLOGIES CORPORATION ,  IZIKSON, Pavel

Inventor： IZIKSON, Pavel

IPC: H01L21/66

CPC classification number: G05B13/027 ,  G03F7/70625 ,  G03F7/70633 ,  H01L22/12

Abstract: Apparatus and methods are provided for predicting a plurality of unknown parameter values (e.g. overlay error or critical dimension) using a plurality of known parameter values. In one embodiment, the method involves training a neural network to predict the plurality of parameter values (114, 700, 800, 900). In other embodiments, the prediction process does not depend on an optical property of a photolithography tool. Such predictions may be used to determine wafer lot disposition (114).

Abstract translation: 提供了使用多个已知参数值来预测多个未知参数值（例如重叠误差或临界尺寸）的装置和方法。 在一个实施例中，该方法包括训练神经网络以预测多个参数值（114,700,800,900）。 在其他实施例中，预测过程不依赖于光刻工具的光学特性。 这种预测可以用于确定晶片批次布置（114）。

公开(公告)号：WO2008156690A1

公开(公告)日：2008-12-24

申请号：PCT/US2008/007431

申请日：2008-06-12

Applicant: KLA-TENCOR TECHNOLOGIES CORPORATION ,  ARMSTRONG, Joseph, J.

Inventor： ARMSTRONG, Joseph, J.

IPC: G02B17/00

CPC classification number: G02B17/0812 ,  G02B17/0856 ,  G02B17/0892 ,  G02B21/04 ,  G03F7/70225 ,  G03F7/70341

Abstract: An objective for imaging specimens is disclosed. The objective receives light energy from a light energy source configured to provide light energy in a wavelength range of approximately 480 to 660 nanometers, employs a Mangin mirror arrangement in conjunction with an immersion liquid to provide a numerical aperture in excess of 1.0 and a field size in excess of 0.05 millimeters, where every element in the objective has a diameter of less than approximately 40 millimeters.

Abstract translation: 公开了成像试样的目的。 该目的是从被配置为在大约480至660纳米的波长范围内提供光能的光能源接收光能，使用与浸没液相结合的Mangin镜结构以提供超过1.0的数值孔径和场尺寸 超过0.05毫米，其中物镜中的每个元件的直径小于约40毫米。

公开(公告)号：WO2007146798A2

公开(公告)日：2007-12-21

申请号：PCT/US2007/070749

申请日：2007-06-08

Applicant: KLA-TENCOR TECHNOLOGIES CORPORATION ,  LESLIE, Brian ,  KULKARNI, Ashok

Inventor： LESLIE, Brian ,  KULKARNI, Ashok

IPC: G06K9/00

CPC classification number: G01N21/9501 ,  G01N2021/8825

Abstract: Various methods, carrier media, and systems for detecting defects on a specimen using a combination of bright field channel data and dark field channel data are provided. One computer-implemented method includes combining pixel-level data acquired for the specimen by a bright field channel and a dark field channel of an inspection system. The method also includes detecting defects on the specimen by applying a two-dimensional threshold to the combined data. The two-dimensional threshold is defined as a function of a threshold for the data acquired by the bright field channel and a threshold for the data acquired by the dark field channel.

Abstract translation: 提供了使用明场通道数据和暗场通道数据的组合来检测样本上的缺陷的各种方法，载体介质和系统。 一种计算机实现的方法包括将通过亮场通道获取的像素级数据和检查系统的暗场通道组合。 该方法还包括通过对组合数据应用二维阈值来检测样本上的缺陷。 二维阈值被定义为由亮场通道获取的数据的阈值和由暗场通道获取的数据的阈值的函数。

公开(公告)号：WO2007143449A3

公开(公告)日：2007-12-13

申请号：PCT/US2007/069867

申请日：2007-05-29

Applicant: KLA-TENCOR TECHNOLOGIES CORPORATION ,  MALIK, Irfan ,  NAG, Somnath

Inventor： MALIK, Irfan ,  NAG, Somnath

IPC: G06K9/00

Abstract: Various computer-implemented methods are provided. One computer-implemented method for determining information about a defect detected on a wafer after an immersion lithography (IL) process is performed on the wafer includes comparing inspection results for the defect to data in a defect library for different types of IL defects and determining the information about the defect based on results of the comparison. One computer-implemented method (figure 4) for binning defects detected on a wafer after an IL process is performed on the wafer includes comparing one or more characteristics of the defects (48) to one or more characteristics of IL defects (50) and one or more characteristics of non-IL defects (52). The method also includes binning the defects having one or more characteristics that substantially match the one or more characteristics of the IL defects and the non-IL defects in different groups.

公开(公告)号：WO2007137261A3

公开(公告)日：2007-11-29

申请号：PCT/US2007/069465

申请日：2007-05-22

Applicant: KLA-TENCOR TECHNOLOGIES CORPORATION ,  CHEN, David K. ,  STEINBACH, Andrew ,  KAVALDJIEV, Daniel ,  BELYAEV, Alexander ,  REICH, Juergen

Inventor： CHEN, David K. ,  STEINBACH, Andrew ,  KAVALDJIEV, Daniel ,  BELYAEV, Alexander ,  REICH, Juergen

IPC: G06K9/00 ,  G01N21/88 ,  G01N21/00

Abstract: Methods and systems for detecting pinholes in a film formed on a wafer or for monitoring a thermal process tool are provided. One method for detecting pinholes in a film formed on a wafer includes generating output responsive to light from the wafer using an inspection system. The output includes first output corresponding to defects on the wafer and second output that does not correspond to the defects. This method also includes detecting the pinholes in the film formed on the wafer using the second output. One method for monitoring a thermal process tool includes generating output responsive to light from a wafer using an inspection system. The output includes the first and second output described above. The wafer was processed by the thermal process tool prior to generating the output. The method also includes monitoring the thermal process tool using the second output.

公开(公告)号：WO2007126559A2

公开(公告)日：2007-11-08

申请号：PCT/US2007/006031

申请日：2007-03-08

Applicant: KLA-TENCOR TECHNOLOGIES CORPORATION ,  KANDEL, Daniel ,  MIEHER, Walter, D. ,  GOLOVANEVSKY, Boris

Inventor： KANDEL, Daniel ,  MIEHER, Walter, D. ,  GOLOVANEVSKY, Boris

IPC: G01B11/00

CPC classification number: G03F7/70633

Abstract: Embodiments of the invention include a scatterometry target for use in determining the alignment between substrate layers. A target arrangement is formed on a substrate and comprises a plurality of target cells. Each cell has two layers of periodic features constructed such that an upper layer is arranged above a lower layer and configured so that the periodic features of the upper layer have an offset and/or different pitch than periodic features of the lower layer. The pitches are arranged to generate a periodic signal when the target is exposed to an illumination source. The target also includes disambiguation features arranged between the cells and configured to resolve ambiguities caused by the periodic signals generated by the cells when exposed to the illumination source.

Abstract translation: 本发明的实施例包括用于确定衬底层之间的对准的散射仪。 目标装置形成在基板上并且包括多个目标单元。 每个单元具有两层周期性特征，其被构造为使得上层布置在下层上方并且被配置为使得上层的周期特征具有与下层的周期特征相比偏移和/或不同的间距。 当目标暴露于照明源时，间距被布置成产生周期性信号。 目标还包括布置在单元之间的消歧特征，并被配置为解决由暴露于照明源时由单元产生的周期性信号引起的模糊。