中科微点-全球专利检索

  1. Login
  2. Sign Up

Search Results

220 records (took 0.027 seconds)

    AN AEROSOL GENERATOR
    151.
    发明公开
    AN AEROSOL GENERATOR 审中-公开

    公开(公告)号：EP3308864A1

    公开(公告)日：2018-04-18

    申请号：EP17197095.7

    申请日：2011-10-03

    Applicant: Stamford Devices Limited

    Inventor： HOGAN, Brendan ,  HYLAND, Kieran ,  REDMOND, Anthony

    IPC: B05B17/06 ,  A61M11/00 ,  A61M15/00 ,  H01R13/24

    CPC classification number: B05B17/0646 ,  A61M11/001 ,  A61M11/005 ,  A61M15/0085

    Abstract: An aerosol generator (100) has a vibratable plate (1) with apertures therein and an annular piezo (2) which causes movement of the vibratable plate (1). An annular support member (3) supports the piezo (2) and the vibratable plate (1). A first electrical power conducting pin (10) engages directly with a first, top, surface of the piezo (2). A second electrical power conducting pin (11) indirectly conducts electrical power to a second surface of the piezo (2), by contacting an extension tab (103) of the support member (20), also on its top side. There is a film of cured epoxy adhesive on the tab (103), providing excellent gripping force between the pin (11) and the support (3). The aerosol generator (100) avoids need for soldered joints for electrical contact, and the pins are conveniently mounted parallel to each on the on the same lateral and top side of the piezo and support member. The pins may have multipoint tips (50) for particularly effective electrical contact.

    A METHOD FOR PRODUCING AN APERTURE PLATE
    153.
    发明公开
    A METHOD FOR PRODUCING AN APERTURE PLATE 有权
    一种生产孔板的方法

    公开(公告)号：EP3146090A1

    公开(公告)日：2017-03-29

    申请号：EP15727907.6

    申请日：2015-05-21

    Applicant: STAMFORD DEVICES LIMITED

    Inventor： HOGAN, Brendan ,  XU, Hong

    IPC: C25D1/08 ,  A61M15/00 ,  B05B17/00 ,  A61M11/00

    CPC classification number: B05B1/02 ,  A61M11/005 ,  A61M15/0085 ,  A61M2207/00 ,  B05B17/0638 ,  B05B17/0653 ,  C25D1/08 ,  C25D7/04

    Abstract: An aperture plate is manufactured by plating metal around a mask of resist columns having a desired size, pitch, and profile, which yields a wafer about 60 μm thickness. This is approximately the full desired target aperture plate thickness. The plating is continued so that the metal overlies the top surfaces of the columns until the desired apertures are achieved. This needs only one masking/plating cycle to achieve the desired plate thickness. Also, the plate has passageways formed beneath the apertures, formed as an integral part of the method, by mask material removal. These are suitable for entrainment of aerosolized droplets exiting the apertures.

    Abstract translation: 通过在具有所需尺寸，间距和轮廓的抗蚀剂柱的掩模周围电镀金属来制造孔板，其产生约60μm厚的晶片。 这大约是全部期望的目标孔板厚度。 继续电镀，使金属覆盖在柱的顶面上，直到达到所需的孔。 这只需要一个掩模/电镀循环来达到所需的板厚。 而且，通过去除掩模材料，该板具有形成在该孔下方的通道，该通道形成为该方法的组成部分。 这些适合夹带离开孔的雾化液滴。

    PHOTODEFINED APERTURE PLATE AND METHOD FOR PRODUCING THE SAME
    154.
    发明公开
    PHOTODEFINED APERTURE PLATE AND METHOD FOR PRODUCING THE SAME 审中-公开
    VERFAHREN ZU IHRER HERSTELLUNG LICHTDEFINIERTE APERTURPLATTE

    公开(公告)号：EP2658719A1

    公开(公告)日：2013-11-06

    申请号：EP11817258.4

    申请日：2011-12-23

    Applicant: STAMFORD DEVICES LIMITED

    Inventor： XU, Hong

    IPC: B41J2/16 ,  B05B17/06 ,  C25D5/02 ,  C25D5/10

    CPC classification number: C25D7/00 ,  B05B17/0646 ,  B41J2/162 ,  B41J2/1625 ,  B41J2/1629 ,  B41J2/1631 ,  C25D1/003 ,  C25D3/38 ,  C25D3/46 ,  C25D3/48 ,  C25D3/54 ,  C25D5/022 ,  C25D5/10 ,  C25D5/34 ,  C25D5/48 ,  C25D5/54

    Abstract: In one embodiment, a method for manufacturing an aperture plate includes depositing a releasable seed layer above a substrate, applying a first patterned photolithography mask above the releasable seed layer, the first patterned photolithography mask having a negative pattern to a desired aperture pattern, electroplating a first material above the exposed portions of the releasable seed layer and defined by the first mask, applying a second photolithography mask above the first material, the second photolithography mask having a negative pattern to a first cavity, electroplating a second material above the exposed portions of the first material and defined by the second mask, removing both masks, and etching the releasable seed layer to release the first material and the second material. The first and second material form an aperture plate for use in aerosolizing a liquid. Other aperture plates and methods of producing aperture plates are described according to other embodiments.

    Abstract translation: 在一个实施例中，用于制造孔板的方法包括在衬底上沉积可释放种子层，在可释放种子层上方施加第一图案化光刻掩模，将第一图案化光刻掩模具有到所需孔径图案的负图案，电镀a 在可释放种子层的暴露部分上方并由第一掩模限定的第一材料，在第一材料上方施加第二光刻掩模，第二光刻掩模具有负图案到第一空腔，将第二材料电镀在第二材料的暴露部分之上 第一材料并由第二掩模限定，去除两个掩模，以及蚀刻可释放种子层以释放第一材料和第二材料。 第一和第二材料形成用于使液体雾化的孔板。 根据其他实施例描述其它孔板和制造孔板的方法。

    MOUNTING OF AN AEROSOL GENERATOR APERTURE PLATE TO A SUPPORT
    155.
    发明公开
    MOUNTING OF AN AEROSOL GENERATOR APERTURE PLATE TO A SUPPORT 审中-公开

    公开(公告)号：EP4529988A2

    公开(公告)日：2025-04-02

    申请号：EP25157402.6

    申请日：2018-11-27

    Applicant: Stamford Devices Limited

    Inventor： AHERNE, Michael ,  COYE, Colga ,  SCANLON, Philip

    IPC: B05B17/00

    Abstract: An aperture plate (1) is attached at its rim (203) to a support washer (3) by adhesive. Anchor grooves (204) having a zig-zag pattern in plan are machined in the lower surface of the rim (203 of the aperture plate before application of the adhesive. The grooves (204) extend out to the edge of the aperture plate (1). The anchor grooves have a depth in the range of 10µm to 40µm, and a width in the range of 20µm to 150µm, and an angular pitch in the range of 2.5° to 12.5°. Excellent bonding strength is achieved for long term reliable attachment in an environment of high frequency vibration and moisture and chemical corrosion.

    GAS THERAPY SYSTEM FOR DELIVERY OF MEDICAMENT
    156.
    发明公开
    GAS THERAPY SYSTEM FOR DELIVERY OF MEDICAMENT 审中-公开

    公开(公告)号：EP4309718A2

    公开(公告)日：2024-01-24

    申请号：EP23213965.9

    申请日：2018-07-03

    Applicant: Stamford Devices Limited

    Inventor： MACLOUGHLIN, Ronan ,  PORTER, Shaun ,  DUFFY, Conor ,  POWER, John

    IPC: A61M16/16

    Abstract: A gas therapy system (1) has a flow line (3, 2), a coupler (6) to a gas source, and an aerosol generator (4) for aerosol delivery, and a patient interface such as a nasal interface (2). A controller (10) is configured to modulate gas flow and aerosol delivery in real time. The controller changes gas flow rate and dynamically reduces aerosol delivery during upper gas flow rates such as 60 LPM, and activates aerosol delivery during lower gas flow rates of for example 10 LPM. The control may also include sensors to detect breathing, so that there is a bias towards increased aerosol delivery during inhalation in addition to during lower level gas flow.

    PHOTODEFINED APERTURE PLATE AND METHOD FOR PRODUCING THE SAME
    159.
    发明公开
    PHOTODEFINED APERTURE PLATE AND METHOD FOR PRODUCING THE SAME 审中-公开

    公开(公告)号：EP3795361A1

    公开(公告)日：2021-03-24

    申请号：EP20205363.3

    申请日：2011-12-23

    Applicant: Stamford Devices Limited

    Inventor： XU, Hong

    IPC: B41J2/16 ,  B05B17/06 ,  C25D5/02 ,  C25D5/10

    Abstract: In one embodiment, a method for manufacturing an aperture plate includes depositing a releasable seed layer above a substrate, applying a first patterned photolithography mask above the releasable seed layer, the first patterned photolithography mask having a negative pattern to a desired aperture pattern, electroplating a first material above the exposed portions of the releasable seed layer and defined by the first mask, applying a second photolithography mask above the first material, the second photolithography mask having a negative pattern to a first cavity, electroplating a second material above the exposed portions of the first material and defined by the second mask, removing both masks, and etching the releasable seed layer to release the first material and the second material. The first and second material form an aperture plate for use in aerosolizing a liquid. Other aperture plates and methods of producing aperture plates are described according to other embodiments.

Patent Agency Ranking