公开(公告)号：US20160278195A1

公开(公告)日：2016-09-22

申请号：US14995398

申请日：2016-01-14

Applicant: Sung-Joo Kim ,  Jin-Seok Heo ,  Do-Hyun Seo ,  Da-Hae Lee ,  Jae-Pil Lee ,  Sung-Jo Hwang

Inventor： Sung-Joo Kim ,  Jin-Seok Heo ,  Do-Hyun Seo ,  Da-Hae Lee ,  Jae-Pil Lee ,  Sung-Jo Hwang

IPC: H05G2/00 ,  H01S3/223

CPC classification number: H05G2/006 ,  G21K2201/065 ,  H01S3/2232 ,  H05G2/005 ,  H05G2/008

Abstract: An apparatus for generating extreme ultraviolet light includes a droplet generator which provides a droplet to react with light from a light source to generate extreme ultraviolet light, a droplet collector which collects the droplet, and a droplet detector which includes a plurality of pressure sensors, the pressure sensors detect a position of the droplet provided to the droplet collecting unit.

Abstract translation: 用于产生极紫外光的装置包括：液滴发生器，其提供液滴以与来自光源的光反应以产生极紫外光;收集液滴的液滴收集器;以及包括多个压力传感器的液滴检测器， 压力传感器检测提供给液滴收集单元的液滴的位置。

公开(公告)号：US09041900B2

公开(公告)日：2015-05-26

申请号：US12261798

申请日：2008-10-30

Applicant: Alton H. Phillips

Inventor： Alton H. Phillips

IPC: G03B27/52 ,  G02B7/18 ,  G02B5/08 ,  G03F7/20 ,  G21K1/06

CPC classification number: G02B7/1815 ,  G02B5/0891 ,  G03F7/70825 ,  G03F7/70891 ,  G21K1/06 ,  G21K2201/065

Abstract: Methods and apparatus for cooling mirrors in an extreme ultraviolet (EUV) lithography system using a liquid metal interface are described. According to one aspect of the present invention, an apparatus which may be used in an EUV lithography system includes a heat exchanger, a mirror assembly, and a first liquid metal interface. The heat exchanger including at least a first surface. The mirror assembly includes a first mirror block having a first mirrored surface, as well as at least a first well. Finally, the first liquid metal interface includes liquid metal which is contained in the first well. The first surface is in contact with the liquid metal such that heat may be transferred from the first mirror block to the heat exchanger.

Abstract translation: 描述了使用液态金属界面的极紫外（EUV）光刻系统中冷却反射镜的方法和装置。 根据本发明的一个方面，可以在EUV光刻系统中使用的装置包括热交换器，反射镜组件和第一液态金属界面。 所述热交换器至少包括第一表面。 镜组件包括具有第一镜面的第一镜块以及至少第一孔。 最后，第一液态金属界面包括容纳在第一井中的液态金属。 第一表面与液体金属接触，使得热量可以从第一反射镜块传递到热交换器。

公开(公告)号：US09007559B2

公开(公告)日：2015-04-14

申请号：US13214470

申请日：2011-08-22

Applicant: Michael Layh ,  Udo Dinger

Inventor： Michael Layh ,  Udo Dinger

IPC: G03B27/52 ,  G03B27/54 ,  G21K1/06 ,  G03F7/20

CPC classification number: G21K1/06 ,  G03F7/70175 ,  G03F7/70891 ,  G21K2201/065 ,  G21K2201/067

Abstract: An EUV collector for collecting and transmitting radiation from an EUV radiation source includes at least one collector mirror for reflecting an emission of the EUV radiation source, which is rotationally symmetric with respect to a central axis. The EUV collector also includes a cooling device for cooling the at least one collector mirror. The cooling device has at least one cooling element, which has a course with respect to the collector mirror, in each case, such that the projection of the course into a plane perpendicular to the central axis has a main direction, which encloses an angle of at most 20° with respect to a predetermined preferred direction. The collector transmits improved quality radiation to illuminate an object field.

Abstract translation: 用于收集和发射来自EUV辐射源的辐射的EUV收集器包括至少一个收集器反射镜，用于反射相对于中心轴旋转对称的EUV辐射源的发射。 EUV收集器还包括用于冷却至少一个收集器反射镜的冷却装置。 冷却装置具有至少一个冷却元件，该冷却元件在每种情况下具有相对于收集器反射镜的过程，使得该过程的投影垂直于中心轴线的平面具有主方向，该主方向包围 相对于预定的优选方向为至多20°。 收集器传输改进的质量辐射以照亮物体场。

公开(公告)号：US08872137B2

公开(公告)日：2014-10-28

申请号：US13619837

申请日：2012-09-14

Applicant: Doug Childers

Inventor： Doug Childers

IPC: G21K5/00 ,  C03C25/12

CPC classification number: G21K5/00 ,  C03C25/12 ,  F26B3/28 ,  F26B13/00 ,  G21K1/067 ,  G21K2201/064 ,  G21K2201/065

Abstract: A device for UV curing a coating or printed ink on an workpiece such as an optical fiber comprises dual elliptical reflectors arranged to have a co-located focus. The workpiece is centered at the co-located focus such that the dual elliptical reflectors are disposed on opposing sides of the workpiece. Two separate light sources are positioned at a second focus of each elliptical reflector, wherein light irradiated from the light sources is substantially concentrated onto the surface of the workpiece at the co-located focus.

Abstract translation: 用于UV固化诸如光纤的工件上的涂层或印刷油墨的装置包括布置成具有共同定焦点的双椭圆形反射器。 工件在同一焦点处居中，使得双椭圆形反射器设置在工件的相对侧上。 两个单独的光源被定位在每个椭圆形反射器的第二焦点处，其中从光源照射的光在共同定位的焦点处基本集中在工件的表面上。

公开(公告)号：US20130068969A1

公开(公告)日：2013-03-21

申请号：US13619837

申请日：2012-09-14

Applicant: Doug Childers

Inventor： Doug Childers

IPC: G21K5/00

CPC classification number: G21K5/00 ,  C03C25/12 ,  F26B3/28 ,  F26B13/00 ,  G21K1/067 ,  G21K2201/064 ,  G21K2201/065

Abstract: A device for UV curing a coating or printed ink on an workpiece such as an optical fiber comprises dual elliptical reflectors arranged to have a co-located focus. The workpiece is centered at the co-located focus such that the dual elliptical reflectors are disposed on opposing sides of the workpiece. Two separate light sources are positioned at a second focus of each elliptical reflector, wherein light irradiated from the light sources is substantially concentrated onto the surface of the workpiece at the co-located focus.

Abstract translation: 用于UV固化诸如光纤的工件上的涂层或印刷油墨的装置包括布置成具有共同定焦点的双椭圆形反射器。 工件在同一焦点处居中，使得双椭圆形反射器设置在工件的相对侧上。 两个单独的光源被定位在每个椭圆形反射器的第二焦点处，其中从光源照射的光在共同定位的焦点处基本集中在工件的表面上。

公开(公告)号：US20130003167A1

公开(公告)日：2013-01-03

申请号：US13635851

申请日：2011-03-16

Applicant: Franz Dieterich ,  Reza Abhari ,  Andrea Giovannini ,  Vipluv Aga

Inventor： Franz Dieterich ,  Reza Abhari ,  Andrea Giovannini ,  Vipluv Aga

IPC: G02B7/195 ,  G02B5/08

CPC classification number: G03F7/70891 ,  B82Y10/00 ,  G03F7/70175 ,  G21K1/06 ,  G21K2201/061 ,  G21K2201/065

Abstract: An optical collector (15) for collecting extreme ultraviolet radiation or EUV light generated at a central EUV production site comprises a reflective shell (25). To cope with thermal loading of the collector and avoid deformations, the reflective shell (25) is mounted on a support structure (24), such that a cooling channel (29) is established between the back side of the reflective shell (25) and the support structure (24), the thickness of the reflective shell (25) is substantially reduced, such that the convective heat transfer between the back side of the reflective shell (25) and a cooling medium (26) flowing through the cooling channel (29) dominates the process of removing heat from the reflective shell (25) with respect to heat conduction, and a cooling circuit (33) is connected to the cooling channel (29); to supply a cooling medium (26) to the cooling channel (29) with a controlled coolant pressure and/or mass flow.

Abstract translation: 用于收集在中央EUV生产地点产生的极紫外辐射或EUV光的光学收集器（15）包括反射壳（25）。 为了应对收集器的热负荷并避免变形，反射壳体（25）安装在支撑结构（24）上，使得在反射壳体（25）的背面和 支撑结构（24），反射壳体（25）的厚度被大大减小，使得反射壳体（25）的背面与流过冷却通道的冷却介质（26）之间的对流热传递 29）支配相对于热传导从反射壳体（25）去除热量的过程，并且冷却回路（33）连接到冷却通道（29）; 以受控的冷却剂压力和/或质量流量将冷却介质（26）供应到冷却通道（29）。

公开(公告)号：US08338809B2

公开(公告)日：2012-12-25

申请号：US13164745

申请日：2011-06-20

Applicant: Yao-Hung Yang ,  Tuan Anh Nguyen ,  Sanjeev Baluja ,  Andrzej Kaszuba ,  Juan Carlos Rocha ,  Thomas Nowak ,  Dustin W. Ho

Inventor： Yao-Hung Yang ,  Tuan Anh Nguyen ,  Sanjeev Baluja ,  Andrzej Kaszuba ,  Juan Carlos Rocha ,  Thomas Nowak ,  Dustin W. Ho

IPC: G01N21/33 ,  B01J19/08 ,  B29C35/08

CPC classification number: G21K1/062 ,  B82Y10/00 ,  G21K2201/064 ,  G21K2201/065 ,  G21K2201/067

Abstract: A reflector for an ultraviolet lamp can be used in a substrate processing apparatus. The reflector comprises a centrally positioned longitudinal strip and first and second side reflectors to form a parabolic-type surface. The longitudinal strip and first and second side reflectors have curved reflective surfaces with dichroic coatings and the longitudinal strip comprises a plurality of through holes to direct a coolant gas toward the ultraviolet lamp. A chamber that uses an ultraviolet lamp module with the reflector, and a method of ultraviolet treatment are also described.

Abstract translation: 用于紫外灯的反射器可用于基板处理装置。 反射器包括中心定位的纵向条和第一和第二侧反射器以形成抛物线型表面。 纵向条和第一和第二侧反射器具有带有二向色涂层的弯曲反射表面，并且纵向条带包括多个通孔以将冷却剂气体引向紫外线灯。 还描述了使用具有反射器的紫外线灯模块的室以及紫外线处理方法。

公开(公告)号：US07965456B2

公开(公告)日：2011-06-21

申请号：US12241640

申请日：2008-09-30

Applicant: Wilhelm Egle ,  Wolfgang Hafner ,  Willi Anderl ,  Ulrich Bingel ,  Holger Muenz ,  Thomas Neidhardt

Inventor： Wilhelm Egle ,  Wolfgang Hafner ,  Willi Anderl ,  Ulrich Bingel ,  Holger Muenz ,  Thomas Neidhardt

IPC: G02B7/02

CPC classification number: B82Y10/00 ,  G03F7/70166 ,  G03F7/70175 ,  G03F7/70858 ,  G21K1/06 ,  G21K2201/065 ,  G21K2201/067

Abstract: An optical component comprises at least one optically effective optical element which heats up when irradiated with light, and at least one holding element for the at least one optical element for holding the at least one optical element in a carrier structure, wherein the at least one optical element is connected to the at least one holding element in heat conducting fashion, and wherein the at least one holding element is at least partially provided with an active cooling system for carrying off heat from the at least one optical element. Additionally or alternatively, a temperature control device is provided which controls the temperature of at least a part of the mount of the optical element.

Abstract translation: 光学部件包括至少一个在用光照射时加热的光学有效光学元件，以及至少一个用于至少一个光学元件的保持元件，用于将至少一个光学元件保持在载体结构中，其中至少一个 光学元件以热传导方式连接到所述至少一个保持元件，并且其中所述至少一个保持元件至少部分地设置有用于从所述至少一个光学元件传递热量的主动冷却系统。 附加地或替代地，提供了一种控制光学元件的至少一部分的温度的温度控制装置。

公开(公告)号：US20090103063A1

公开(公告)日：2009-04-23

申请号：US12253099

申请日：2008-10-16

Applicant: Jin Nishikawa

Inventor： Jin Nishikawa

IPC: G03B27/52 ,  G03B27/32

CPC classification number: G02B7/008 ,  B82Y10/00 ,  B82Y40/00 ,  G03F1/24 ,  G03F7/70891 ,  G21K1/062 ,  G21K2201/065

Abstract: An optical member cooling apparatus for cooling an optical member such as a mirror. The optical member cooling apparatus includes a cooling member fixed to the rear surface of the mirror by an engagement mechanisms. The rear surface of the mirror and the contact surface of the cooling mirror have a high flatness. A locking portion including a groove and an extended portion is formed in the rear surface of the mirror. A shaft of the engagement mechanism is hooked to the extended portion of the locking portion. The engagement member is urged toward the cooling member by a spring.

Abstract translation: 一种用于冷却诸如反射镜的光学构件的光学构件冷却装置。 光学构件冷却装置包括通过接合机构固定到反射镜的后表面的冷却构件。 反射镜的后表面和冷却镜的接触表面具有高的平坦度。 包括凹槽和延伸部分的锁定部分形成在反射镜的后表面中。 接合机构的轴钩在锁定部分的延伸部分上。 接合构件通过弹簧被推向冷却构件。

公开(公告)号：US07449704B2

公开(公告)日：2008-11-11

申请号：US11647024

申请日：2006-12-27

Applicant: Igor V. Fomenkov ,  Alexander I. Ershov

Inventor： Igor V. Fomenkov ,  Alexander I. Ershov

IPC: H01J35/20

CPC classification number: G03F7/70033 ,  B82Y10/00 ,  G03F7/70175 ,  G03F7/70916 ,  G21K1/062 ,  G21K2201/061 ,  G21K2201/065 ,  G21K2201/067 ,  H05G2/003 ,  H05G2/005 ,  H05G2/006 ,  H05G2/008

Abstract: An EUV light source apparatus and method for producing EUV light, which includes a plasma generation chamber for generating EUV plasma; an EUV light collector having a reflective portion irradiated by EUV light produced in the EUV plasma; a target sample having reflective portion comprised of the same materials as the EUV light collector reflective portion; a first EUV detector for detecting EUV light produced in the EUV plasma; and a second EUV detector for detecting EUV light reflected from the target sample.

Abstract translation: EUV光源装置及其制造方法，其包括：产生EUV等离子体的等离子体产生室; 具有在EUV等离子体中产生的EUV光照射的反射部的EUV集光体; 具有由与EUV集光反射部相同的材料构成的反射部的目标样品; 用于检测在EUV等离子体中产生的EUV光的第一EUV检测器; 以及用于检测从目标样品反射的EUV光的第二EUV检测器。