公开(公告)号：US20060012343A1

公开(公告)日：2006-01-19

申请号：US10518737

申请日：2003-06-09

Applicant: Andrew Gallant

Inventor： Andrew Gallant

IPC: H02J7/00

CPC classification number: B81B3/0008 ,  B81C2201/115 ,  H01G4/2325 ,  H01G5/18

Abstract: A micro-electromechanical variable capacitor with first and second capacitor plates spaced apart to define a gap therebetween. The first plate has two control electrodes and an active electrode. The second plate is movable relative to first plate when a voltage is applied to produce a potential difference across the control electrode and the second capacitor plate. This has the effect of varying the capacitance of the capacitor. The facing surface of at least one of the plates is formed in such a way that it has a roughened surface. The degree of roughness is sufficient to prevent the facing surfaces adhering together through stiction.

Abstract translation: 一个微机电可变电容器，其具有间隔开的第一和第二电容器板，以在它们之间形成间隙。 第一板具有两个控制电极和一个有源电极。 当施加电压以产生跨越控制电极和第二电容器板的电位差时，第二板可相对于第一板移动。 这具有改变电容器的电容的效果。 至少一个板的面对表面形成为具有粗糙表面。 粗糙度足以防止面对表面通过粘性粘附在一起。

公开(公告)号：US06709604B2

公开(公告)日：2004-03-23

申请号：US09792752

申请日：2001-02-22

Applicant: Yu-Chong Tai ,  Xuan-Qi Wang

Inventor： Yu-Chong Tai ,  Xuan-Qi Wang

IPC: C23F100

CPC classification number: F16K99/0001 ,  B81B3/001 ,  B81B2201/054 ,  B81B2203/0127 ,  B81C2201/115 ,  F15C5/00 ,  F16K15/144 ,  F16K99/0009 ,  F16K99/0034 ,  F16K99/0057 ,  F16K2099/0074 ,  F16K2099/008 ,  F16K2099/0094 ,  Y10T137/7888 ,  Y10T137/7895

Abstract: The present disclosure describes a Parylene micro check valve including a micromachined silicon valve seat with a roughened top surface to which a membrane cap is anchored by twist-up tethers. The micro check valve is found to exhibit low cracking pressure, high reverse pressure, low reverse flow leakage, and negligible membrane-induced flow resistance when used as a valve over a micro orifice through which flow liquid and gas fluids.

Abstract translation: 本公开内容描述了一种Parylene微型止回阀，其包括具有粗糙顶表面的微加工硅阀座，膜帽通过扭绞系绳锚定在该顶部表面上。 发现微型止回阀在用作流动液体和气体流体的微孔时用作阀门时，具有低开启压力，高反向压力，低逆流泄漏以及可忽略的膜引起的流动阻力。

公开(公告)号：US5677783A

公开(公告)日：1997-10-14

申请号：US404139

申请日：1995-03-13

Applicant: David M. Bloom ,  Francisco S. A. Sandejas ,  Olav Solgaard ,  Raj B. Apte

Inventor： David M. Bloom ,  Francisco S. A. Sandejas ,  Olav Solgaard ,  Raj B. Apte

IPC: B81B3/00 ,  G02B5/18 ,  G02B26/08

CPC classification number: B81B3/001 ,  G02B26/0808 ,  G02B5/1828 ,  B81C2201/115 ,  Y10S359/90

Abstract: A modulator for modulating incident rays of light, the modulator comprising a plurality of equally spaced apart beam elements, each of which includes a light reflective planar surface. The elements are arranged parallel to each other with their light reflective surfaces parallel to each other. The modulator includes means for supporting the beam elements in relation to one another and means for moving the beam elements relative to one another so that the beams move between a first configuration wherein the modulator acts to reflect the incident rays of light as a plane mirror, and a second configuration wherein the modulator diffracts the incident rays of light as they are reflected therefrom. In operation, the light reflective surfaces of the beam elements remain parallel to each other in both the first and the second configurations and the perpendicular spacing between the reflective surfaces of adjacent beam elements is equal to m/4 times the wavelength of the incident rays of light, wherein m=an even whole number or zero when the beam elements are in the first configuration and m=an odd number when the beam elements are in the second configuration.

Abstract translation: 一种用于调制入射光线的调制器，所述调制器包括多个等间隔开的光束元件，每个光束元件包括光反射平面。 元件彼此平行地布置，其光反射表面彼此平行。 调制器包括用于相对于彼此支撑光束元件的装置和用于相对于彼此移动光束元件的装置，使得光束在第一配置之间移动，其中调制器作为反射作为平面镜的入射光线， 以及第二配置，其中调制器衍射入射的光线，因为它们被反射。 在操作中，光束元件的光反射表面在第一和第二构造中保持彼此平行，并且相邻光束元件的反射表面之间的垂直间隔等于入射光线的波长的m / 光，其中当波束元素处于第一配置时，m =偶数或零，并且当波束元处于第二配置时m =奇数。

公开(公告)号：US5510156A

公开(公告)日：1996-04-23

申请号：US294389

申请日：1994-08-23

Applicant: Yang Zhao

Inventor： Yang Zhao

IPC: B81B3/00 ,  G01P15/08 ,  G01P15/13 ,  C23C14/02 ,  B05D1/32 ,  B05D1/36 ,  B65D6/08

CPC classification number: B81C1/0096 ,  B81B3/001 ,  G01P15/0802 ,  G01P15/131 ,  B81C2201/115 ,  G01P2015/0814 ,  G01P2015/0828 ,  H01J2209/0223 ,  Y10T428/24322 ,  Y10T428/24355 ,  Y10T428/24479

Abstract: A method for forming sub-micron sized bumps on the bottom surface of a suspended microstructure or the top surface of the underlying layer in order to reduce contact area and sticking between the two layers without the need for sub-micron standard photolithography capabilities and the thus-formed microstructure. The process involves the deposition of latex spheres on the sacrificial layer which will later temporarily support the microstructure, shrinking the spheres, depositing aluminum over the spheres, dissolving the spheres to leave openings in the metal layer, etching the sacrificial layer through the openings, removing the remaining metal and depositing the microstructure material over the now textured top surface of the sacrificial layer.

Abstract translation: 一种用于在悬浮的微结构的底表面或下层的顶表面上形成亚微米级的凸起的方法，以便减少接触面积和两层之间的粘附，而不需要亚微米标准的光刻能力，因此 形成微观结构。 该方法包括将胶乳球体沉积在牺牲层上，其将稍后暂时支撑微结构，收缩球体，在球体上沉积铝，溶解球体以在金属层中留下开口，通过开口蚀刻牺牲层，去除 剩余的金属并将微结构材料沉积在牺牲层的现在变形的顶部表面上。

公开(公告)号：US5311360A

公开(公告)日：1994-05-10

申请号：US876078

申请日：1992-04-28

Applicant: David M. Bloom ,  Francisco S. A. Sandejas ,  Olav Solgaard

Inventor： David M. Bloom ,  Francisco S. A. Sandejas ,  Olav Solgaard

IPC: B81B3/00 ,  G02B5/18 ,  G02B26/08 ,  H04N9/12

CPC classification number: B81B3/001 ,  G02B26/0808 ,  G02B5/1828 ,  B81C2201/115 ,  Y10S359/90

Abstract: A modulator for modulating an incident beam of light, the modulator comprising a plurality of equally spaced-apart elements, each of which includes a light-reflective planar surface. The elements are arranged parallel to each other with their light-reflective surfaces parallel to each other. The modulator includes means for supporting the elements in relation to one another and means for moving particular ones of the elements relative to others so that the moved elements transit between a first configuration wherein the modulator acts to reflect the incident beam of light as a plane mirror, and a second configuration wherein the modulator diffracts the light reflected therefrom. In operation the light-reflective surfaces of the elements remain parallel to each other in both the first and second configurations. The perpendicular spacing between the reflective surfaces of the respective elements is equal to m/4 .times. the wavelength of the incident beam of light, wherein m equals an even whole number or zero when the elements are in the first configuration and m equals an odd whole number when the elements are in the second configuration.

Abstract translation: 一种用于调制入射光束的调制器，所述调制器包括多个等间隔开的元件，每个元件包括光反射平面表面。 元件彼此平行配置，其光反射表面彼此平行。 调制器包括用于相对于彼此支撑元件的装置和用于相对于其它元件移动元件中的特定元件的装置，使得移动元件在第一配置之间转换，其中调制器作用以将入射光束反射为平面镜 以及其中调制器衍射从其反射的光的第二配置。 在操作中，元件的光反射表面在第一和第二构造中保持彼此平行。 各个元件的反射表面之间的垂直间距等于入射光束的波长m / 4x，其中当元件处于第一配置时，m等于偶数整数或零，并且m等于奇数整数 当元素处于第二配置时的数字。

公开(公告)号：WO2014197232A1

公开(公告)日：2014-12-11

申请号：PCT/US2014/039441

申请日：2014-05-23

Applicant: INVENSENSE, INC. ,  ZHANG, Cerina ,  TEA, Nim

Inventor： ZHANG, Cerina ,  TEA, Nim

IPC: B81B7/02

CPC classification number: B81C1/00984 ,  B81B3/0008 ,  B81B2207/015 ,  B81C1/00976 ,  B81C2201/115 ,  H01L21/76838 ,  H01L23/48 ,  H01L2924/0002 ,  H01L2924/00

Abstract: A method of the invention includes reducing stiction of a MEMS device by providing a conductive path for electric charge collected on a bump stop formed on a substrate. The bump stop is formed by depositing and patterning a dielectric material on the substrate, and the conductive path is provided by a conductive layer deposited on the bump stop. The conductive layer can also be roughened to reduce stiction.

Abstract translation: 本发明的一种方法包括通过为形成在衬底上的凸点块上收集的电荷提供导电路径来减少MEMS器件的静电。 通过在衬底上沉积和图案化介电材料形成凹凸块，并且通过沉积在凸块上的导电层提供导电路径。 导电层也可以被粗糙化以减少粘性。

公开(公告)号：WO2010136654A1

公开(公告)日：2010-12-02

申请号：PCT/FI2010/050434

申请日：2010-05-28

Applicant: VALTION TEKNILLINEN TUTKIMUSKESKUS ,  BLOMBERG, Martti

Inventor： BLOMBERG, Martti

IPC: G01J3/26 ,  G02B5/28

CPC classification number: G02B26/001 ,  B81B3/0013 ,  B81B2201/042 ,  B81C2201/115 ,  G01J3/26

Abstract: The invention relates to controllable Fabry-Perot interferometers which are produced with micromechanical (MEMS) technology. Producing prior art interferometers includes a risk of deterioration of mirrors during the etching of the sacrificial layer (123). According to the solution according to the invention at least one layer (103, 105, 114, 116) of the mirrors is made of silicon-rich silicon nitride. In the inventive Fabry-Perot interferometer it is possible to avoid or reduce using silicon oxide in the mirror layers whereby the risk of deterioration of the mirrors is reduced. It is also possible to use mirror surfaces with higher roughness, whereby the risk of the mirrors sticking to each other is reduced.

Abstract translation: 本发明涉及用微机械（MEMS）技术制造的可控法布里 - 珀罗干涉仪。 生产现有技术的干涉仪包括在蚀刻牺牲层（123）期间反射镜劣化的风险。 根据本发明的解决方案，反射镜的至少一层（103,105,114,116）由富硅的氮化硅制成。 在本发明的法布里 - 珀罗干涉仪中，可以避免或减少使用反射镜层中的氧化硅，从而降低反射镜劣化的风险。 还可以使用具有较高粗糙度的镜面，从而降低了彼此粘附的镜子的风险。

公开(公告)号：WO2009149213A2

公开(公告)日：2009-12-10

申请号：PCT/US2009/046176

申请日：2009-06-03

Applicant: QUALCOMM MEMS TECHNOLOGIES, INC. ,  WEBSTER, James, Randolph ,  TU, Thanh, Nghia ,  YAN, Xiaoming ,  CHUNG, Won, Suk

Inventor： WEBSTER, James, Randolph ,  TU, Thanh, Nghia ,  YAN, Xiaoming ,  CHUNG, Won, Suk

IPC: B81C1/00

CPC classification number: B81B3/0008 ,  B81B2201/042 ,  B81C2201/0107 ,  B81C2201/0109 ,  B81C2201/115 ,  G02B26/001 ,  Y10T428/24917

Abstract: Methods of fabricating an electromechanical systems device that mitigate permanent adhesion, or stiction, of the moveable components of the device are provided. The methods provide an amorphous silicon sacrificial layer with improved and reproducible surface roughness. The amorphous silicon sacrificial layers further exhibit excellent adhesion to common materials used in electromechanical systems devices.

Abstract translation: 提供了减轻设备的可移动部件的永久性粘附或静电的机电系统装置的制造方法。 该方法提供了具有改进和可再现的表面粗糙度的非晶硅牺牲层。 非晶硅牺牲层对于机电系统器件中常用的材料进一步表现出优异的附着性。

公开(公告)号：WO2009113063A8

公开(公告)日：2009-11-26

申请号：PCT/IL2009000269

申请日：2009-03-10

Applicant: YEDA RES & DEV COMPANY LTD N ,  NAAMAN RON ,  GOLAN BEN ,  FRADKLIN ZEEV ,  WINKLEMAN ADAM ,  ORON DAN

Inventor： NAAMAN RON ,  GOLAN BEN ,  FRADKLIN ZEEV ,  WINKLEMAN ADAM ,  ORON DAN

IPC: B81C1/00

CPC classification number: B81C1/00206 ,  B81C1/00031 ,  B81C2201/0132 ,  B81C2201/115 ,  G03F7/40

Abstract: A method for fabrication of substrate having a nano-scale surface roughness is presented. The method comprises: patterning a surface of a substrate to create an array of spaced-apart regions of a light sensitive material; applying a controllable etching to the patterned surface, said controllable etching being of a predetermined duration selected so as to form a pattern with nano-scale features; and removing the light sensitive material, thereby creating a structure with the nano-scale surface roughness. Silanizing such nano-scale roughness surface with hydrophobic molecules results in the creation of super- hydrophobic properties characterized by both a large contact angle and a large tilting angle. Also, deposition of a photo-active material on the nano-scale roughness surface results in a photocathode with enhanced photoemission yield. This method also provides for fabrication of a photocathode insensitive to polarization of incident light.

Abstract translation: 提出了一种制造具有纳米级表面粗糙度的基板的方法。 该方法包括：图案化衬底的表面以形成光敏材料的间隔开的区域的阵列; 对图案化表面施加可控蚀刻，所述可控蚀刻具有预定的持续时间，以便形成具有纳米级特征的图案; 并去除光敏材料，从而形成具有纳米级表面粗糙度的结构。 用疏水分子将这种纳米级粗糙表面硅烷化导致产生以大接触角和大倾角为特征的超疏水特性。 而且，在纳米级粗糙表面上沉积光敏材料导致光电阴极具有增强的光电发射产率。 该方法还提供了制造对入射光的偏振不敏感的光电阴极。

公开(公告)号：WO2009113063A2

公开(公告)日：2009-09-17

申请号：PCT/IL2009/000269

申请日：2009-03-10

Applicant: YEDA RESEARCH & DEVELOPMENT COMPANY LTD. N ,  NAAMAN, Ron ,  GOLAN, Ben ,  FRADKLIN, Zeev ,  WINKLEMAN, Adam ,  ORON, Dan

Inventor： NAAMAN, Ron ,  GOLAN, Ben ,  FRADKLIN, Zeev ,  WINKLEMAN, Adam

IPC: B81C1/00

CPC classification number: B81C1/00206 ,  B81C1/00031 ,  B81C2201/0132 ,  B81C2201/115 ,  G03F7/40

Abstract: A method for fabrication of substrate having a nano-scale surface roughness is presented. The method comprises: patterning a surface of a substrate to create an array of spaced-apart regions of a light sensitive material; applying a controllable etching to the patterned surface, said controllable etching being of a predetermined duration selected so as to form a pattern with nano-scale features; and removing the light sensitive material, thereby creating a structure with the nano-scale surface roughness. Silanizing such nano-scale roughness surface with hydrophobic molecules results in the creation of super- hydrophobic properties characterized by both a large contact angle and a large tilting angle. Also, deposition of a photo-active material on the nano-scale roughness surface results in a photocathode with enhanced photoemission yield. This method also provides for fabrication of a photocathode insensitive to polarization of incident light.

Abstract translation: 提出了一种具有纳米级表面粗糙度的基板的制造方法。 该方法包括：图案化基板的表面以产生光敏材料的间隔开的区域的阵列; 对所述图案化表面施加可控制的蚀刻，所述可控蚀刻具有预定的持续时间，以便形成具有纳米尺度特征的图案; 并去除感光材料，从而产生具有纳米级表面粗糙度的结构。 用疏水性分子对这样的纳米级粗糙表面进行硅烷化，导致产生了以接触角大和倾斜角大的特征的超疏水特性。 而且，在纳米级粗糙度表面上沉积光活性材料导致光电阴极具有增强的光电转换率。 该方法还提供对入射光的偏振不敏感的光电阴极的制造。