公开(公告)号：EP2888632A1

公开(公告)日：2015-07-01

申请号：EP13832873.7

申请日：2013-07-19

Applicant: MacDermid Printing Solutions, LLC

Inventor： BALDWIN, Kyle, P.

IPC: G03F7/20

CPC classification number: G03F7/201

Abstract: A method of tailoring the shape of a plurality of relief printing dots created in a photosensitive printing blank during a platemaking process is provided. The photocurable layer is exposed to actinic radiation using an array of UV LED light assemblies and the use of the array of UV LED light assemblies produces relief printing dots having at least one geometric characteristic selected from the group consisting of a desired planarity of a top surface of the relief printing dots, a desired shoulder angle of the relief printing dots and a desired edge sharpness of the relief printing dots.

Abstract translation: 提供了一种在制版过程中定制在感光印刷坯料中产生的多个凸版印刷点的形状的方法。 使用UV LED灯组件的阵列将光固化层暴露于光化辐射，并且使用UV LED灯组件阵列产生具有至少一个几何特征的凸版印刷点，所述几何特征选自由顶表面的期望平面度 的凸版印刷点，凸版印刷点的期望的肩角和凸版印刷点的期望的边缘锐度。

公开(公告)号：EP2539667A4

公开(公告)日：2014-11-05

申请号：EP11747858

申请日：2011-02-11

Applicant: MACDERMID PRINTING SOLUTIONS

Inventor： RECCHIA DAVID A ,  GOTSICK TIMOTHY

IPC: G03F7/20 ,  G01B11/00 ,  G01N21/55 ,  G03F7/09

CPC classification number: B41N1/06 ,  B41C1/055 ,  B41M1/04 ,  B41N1/12 ,  G03F7/09 ,  G03F7/201 ,  G03F7/2012 ,  G03F7/202 ,  Y10T428/24521

Abstract: A method of making a relief image printing element from a photosensitive printing blank is provided. A photosensitive printing blank with a laser ablatable layer disposed on at least one photocurable layer is ablated with a laser to create an in situ mask. The printing blank is then exposed to at least one source of actinic radiation through the in situ mask to selectively cross link and cure portions of the photocurable layer. Diffusion of air into the at least one photocurable layer is limited during the exposing step and preferably at least one of the type, power and incident angle of illumination of the at least one source of actinic radiation is altered during the exposure step. The resulting relief image comprises a plurality of dots and a dot shape of the plurality of dots that provide optimal print performance on various substrates, including corrugated board.

Abstract translation: 提供了一种从感光印刷坯料制造浮雕图像打印元件的方法。 设置在至少一个光固化层上的具有激光烧蚀层的感光印刷坯料用激光烧蚀以产生原位掩模。 然后将印刷坯料通过原位掩模暴露于至少一种光化辐射源，以选择性地交联并固化可光固化层的部分。 空气进入至少一个可光固化层的扩散在曝光步骤期间被限制，并且优选地，在曝光步骤期间改变至少一种光化辐射源的类型，功率和入射角的至少一种。 所得到的浮雕图像包括多个点的多个点和点形状，其在包括瓦楞纸板的各种基底上提供最佳印刷性能。

公开(公告)号：EP2656146A1

公开(公告)日：2013-10-30

申请号：EP11830096.1

申请日：2011-12-20

Applicant: Eulitha A.G.

Inventor： SOLAK, Harun ,  CLUBE, Francis

IPC: G03F7/20

CPC classification number: G03F7/201 ,  G03F7/70408

Abstract: A method and apparatus for printing a pattern of periodic features into a photosensitive layer, including the steps of providing a substrate bearing the layer, providing a mask, arranging the substrate such that it has a tilt angle with respect to the substrate in a first plane orthogonal thereto, providing collimated light for illuminating the mask pattern so as to generate a transmitted light-field composed of a range of transversal intensity distributions between Talbot planes separated by a Talbot distance, and so that said transmitted light-field has an intensity envelope in the first plane, illuminating the mask with said light whilst displacing the substrate relative to the mask in a direction parallel to the first plane and to the substrate, wherein the tilt angle and the intensity envelope are arranged so that the layer is exposed to an average of the range of transversal intensity distributions.

公开(公告)号：EP2539667A1

公开(公告)日：2013-01-02

申请号：EP11747858.6

申请日：2011-02-11

Applicant: MacDermid Printing Solutions, LLC

Inventor： RECCHIA, David, A. ,  GOTSICK, Timothy

IPC: G01B11/00 ,  G01N21/55

CPC classification number: B41N1/06 ,  B41C1/055 ,  B41M1/04 ,  B41N1/12 ,  G03F7/09 ,  G03F7/201 ,  G03F7/2012 ,  G03F7/202 ,  Y10T428/24521

Abstract: A method of making a relief image printing element from a photosensitive printing blank is provided. A photosensitive printing blank with a laser ablatable layer disposed on at least one photocurable layer is ablated with a laser to create an in situ mask. The printing blank is then exposed to at least one source of actinic radiation through the in situ mask to selectively cross link and cure portions of the photocurable layer. Diffusion of air into the at least one photocurable layer is limited during the exposing step and preferably at least one of the type, power and incident angle of illumination of the at least one source of actinic radiation is altered during the exposure step. The resulting relief image comprises a plurality of dots and a dot shape of the plurality of dots that provide optimal print performance on various substrates, including corrugated board.

公开(公告)号：EP2367058A1

公开(公告)日：2011-09-21

申请号：EP10290142.8

申请日：2010-03-17

Applicant: Université Jean-Monnet

Inventor： Parriaux Olivier ,  Lyndin Nikolay ,  Tonchev Svetlen

IPC: G03F7/24 ,  G03F7/20 ,  G01D5/00

CPC classification number: G03F7/24 ,  G01D5/3473 ,  G03F7/201 ,  G03F7/703

Abstract: The present invention solves the stitching problem and the problem of a predetermine integer number of grating lines per closed circle of a cylindrical grating by resorting to a novel phase mask method which proposes to geometrically transform and to optically transfer a standard planar radial grating pattern (1) into a cylindrical photoresist pattern (9) at the circularly cylindrical wall (7) of a given element (3). The planar radial grating pattern can be easily written with an integer number of lines having strictly constant period without any stitching problem by means of the available tools of planar technologies such as a laser or electron beam generator and reactive ion etching. The photolithographic transfer is made by illumination means (19) which permit the needed geometrical transformation from a planar radial grating to a circularly cylindrical grating, in particular by providing a cylindrical wave having a non-zero axial component and the same central axis (A) as said circularly cylindrical wall or a spherical wave (B) with its center on this central axis.

Abstract translation: 本发明通过采用一种新颖的相位掩模方法解决了拼接问题和圆柱形光栅每个闭环预定整数光栅线的问题，该方法提出了几何变换和光学传输标准平面辐射光栅图案（1 ）到给定元件（3）的圆柱形壁（7）处的圆柱形光致抗蚀剂图案（9）。 通过诸如激光或电子束发生器和反应离子蚀刻的平面技术的可用工具，可以容易地用整数数目的具有严格恒定周期的行编写平面径向光栅图案，而无任何缝合问题。 光刻传输由照明装置（19）制成，其允许从平面径向光栅到圆柱形光栅的必要几何变换，特别是通过提供具有非零轴向分量和相同中心轴线（A）的圆柱波， 作为所述圆柱形壁或其中心在该中心轴上的球面波（B）。

公开(公告)号：EP2284581A1

公开(公告)日：2011-02-16

申请号：EP10171889.8

申请日：2010-08-04

Applicant: JDS Uniphase Corporation

Inventor： SHEMO, David M ,  TAN, Kim Leong

IPC: G02B5/30 ,  G02B27/48 ,  G03F7/00 ,  G03H1/32

CPC classification number: G02B27/48 ,  G02B5/3016 ,  G02B5/3083 ,  G03F7/201 ,  G03H2001/2276 ,  G03H2240/11 ,  G03H2250/38

Abstract: A method of fabricating an optical element including a liquid crystal layer having a spatially-varying tilt angle includes coating a substrate with a linearly photopolymerizable polymer layer, irradiating the linearly photopolymerizable polymer layer with linearly polarized ultra-violet light at a oblique angle, and coating a layer of liquid crystal material on a surface of the irradiated linearly photopolymerizable polymer layer. The liquid crystal material has a predetermined relationship between its tilt angle and a total dose of the linearly polarized ultra-violet light. The linearly photopolymerizable polymer layer is irradiated with at least one dose of linearly polarized ultra-violet light that is sufficient to induce formation of a plurality of discrete regions within the liquid crystal layer having a larger in-plane birefringence than an adjacent or surrounding region.

Abstract translation: 制造包括具有空间变化倾斜角的液晶层的光学元件的方法包括用线性可光聚合聚合物层涂覆基板，以线性偏振的紫外线以倾斜角度照射线性可光聚合聚合物层，以及涂布 在被照射线性可光聚合聚合物层的表面上的液晶材料层。 液晶材料的倾斜角与线偏振紫外光的总剂量之间具有预定的关系。 线性可光聚合聚合物层被照射至少一个线性偏振紫外光，其量足以引起在相邻或周围区域内具有较大面内双折射的液晶层内的多个离散区域的形成。

公开(公告)号：EP1519227A3

公开(公告)日：2008-03-12

申请号：EP04022611.0

申请日：2004-09-22

Applicant: INFM Istituto Nazionale per la Fisica della Materia

Inventor： Romanato, Filippo ,  Di Fabrizio, Enzo ,  Kumar, Rakesh

IPC: G03F7/00

CPC classification number: G03F7/00 ,  G03F7/095 ,  G03F7/201 ,  G03F7/2014 ,  G03F7/203

Abstract: What is described is a lithographic method for fabricating three-dimensional structures on the micrometric and submicro-metric scale, including the operations of:
- depositing a layer (L1) of a first resist (R1) on a substrate (S);
- depositing a layer (L') of a second resist (R2) on the layer (L1) of the first resist (R1);
- forming a pattern of the second resist (R2) by lithography;
- depositing a further layer (L2) of the first resist (R1) on the previous layers; and
- forming a pattern of the first resist (R1) by lithography.
The second resist (R2) is sensitive to exposure to charged particles or to electromagnetic radiation in a different way from the first (R1); in other words, it is transparent to the particles or to the electromagnetic radiation to which the first resist (R1) is sensitive, and therefore the processes of exposure and development of the two resists (R1, R2) are mutually incompatible to the extent that the exposure and development of one does not interfere with the exposure and development of the other.

公开(公告)号：EP0990239A4

公开(公告)日：2008-01-23

申请号：EP98930469

申请日：1998-06-19

Applicant: CREATV MICROTECH INC

Inventor： TANG CHA-MEI

IPC: G21K1/02 ,  G21K1/00

CPC classification number: G03F7/0007 ,  G03F7/201 ,  G21K1/025

Abstract: Disclosed are methods for making large area antiscatter grids consisting of focussed and unfocussed holes in sheets of metal. The grid consists of thin metal walls (30) surrounding hollow openings (31). The projections of all walls converge to a focal spot in the focussed grid, and are parallel in an unfocussed grid. A grid having a large area is made by interlocking together smaller grid pieces. A tall device is made by stacking layers of focussed grids. The openings of the grid can be filled with phosphor or other scintillating material (33) to make an integrated grid/scintillator structure.

公开(公告)号：EP0573281B1

公开(公告)日：2000-09-27

申请号：EP93304280.6

申请日：1993-06-02

Applicant: FUJITSU LIMITED

Inventor： Haruki, Tamae, c/o Fujitsu Limited ,  Nakagawa, Kenji, c/o Fujitsu Limited ,  Taguchi, Masao, c/o Fujitsu Limited ,  Tanaka, Hiroyuki, c/o Fujitsu Limited ,  Asai, Satoru, c/o Fujitsu Limited ,  Hanyu, Isamu, c/o Fujitsu Limited

IPC: G03F7/20

CPC classification number: G03F7/70566 ,  G03F7/201 ,  G03F7/70091 ,  G03F7/701 ,  G03F7/70125 ,  G03F7/70241 ,  G03F7/70283 ,  G03F7/70583

公开(公告)号：EP0486316B1

公开(公告)日：2000-04-19

申请号：EP91310550.8

申请日：1991-11-15

Applicant: NIKON CORPORATION

Inventor： Shiraishi, Naomasa

IPC: G03F7/20 ,  G02B27/00

CPC classification number: G03F9/7088 ,  G03F7/201 ,  G03F7/70066 ,  G03F7/70108 ,  G03F7/70141 ,  G03F7/70158 ,  G03F7/70208 ,  G03F7/70316 ,  G03F7/70333 ,  G03F7/70358