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    DEFECT REDUCTION METHODS AND COMPOSITION FOR VIA FORMATION IN DIRECTED SELF-ASSEMBLY PATTERNING
    174.
    发明公开
    DEFECT REDUCTION METHODS AND COMPOSITION FOR VIA FORMATION IN DIRECTED SELF-ASSEMBLY PATTERNING 审中-公开
    在定向自组装图案中通过缺陷形成的缺陷减少方法和组合物

    公开(公告)号：EP3212564A1

    公开(公告)日：2017-09-06

    申请号：EP15795122.9

    申请日：2015-10-28

    Applicant: AZ Electronic Materials Luxembourg S.à.r.l.

    Inventor： HONG, SungEun ,  MATSUMOTO, Naoki ,  AKIYAMA, Yasushi ,  KUROSAWA, Kazunori ,  MIYAZAKI, Shinji ,  LIN, Guanyang

    IPC: B81C1/00

    CPC classification number: C09D153/00 ,  B81C1/00031 ,  B81C1/00396 ,  B81C2201/0149 ,  H01J37/32009 ,  H01L21/3081

    Abstract: The present invention relates to a two novel processes, "Dual Coating Process and Single Coating Process," for forming an array of via's by employing a graphoepitaxy approach, where an array of pillars the surface of the pillars has been modified by the formation of a hydrophobic poly(vinyl aryl) brush at the surface of the pillars. The present invention also relates to a composition comprising a poly(vinyl aryl) hydrophopic polymer brush precursor terminated at one chain end with a reactive functional group, a diblock copolymer comprising an etch resistant hydrophobic block and a highly etchable hydrophilic block, a thermal acid generator and a solvent.

    Abstract translation: 本发明涉及通过采用图形外延方法形成通孔阵列的两种新方法，即“双重涂覆方法和单一涂覆方法”，其中通过形成一种柱状外延方法来改变柱的表面 疏水聚（乙烯芳基）刷子在柱子的表面。 本发明还涉及一种组合物，其包含在一个链端被反应性官能团封端的聚（乙烯基芳基）疏水聚合物刷前体，包含抗蚀刻疏水嵌段和高度可蚀刻亲水嵌段的二嵌段共聚物，热酸产生剂 和溶剂。

    Method for fabricating microstructure to generate surface plasmon waves
    179.
    发明授权
    Method for fabricating microstructure to generate surface plasmon waves 有权
    制造一个微结构为表面等离激元波的产生的方法

    公开(公告)号：EP2860152B1

    公开(公告)日：2017-03-22

    申请号：EP14182597.6

    申请日：2014-08-28

    Applicant: Tsung, Cheng-Sheng

    Inventor： Tsung, Cheng-Sheng ,  Chuang, Shih-Hao

    IPC: B81C1/00 ,  G02B5/00

    CPC classification number: H01L33/44 ,  B81C1/00031 ,  B81C2201/0149 ,  G01N21/01 ,  G01N2201/02 ,  G02B5/008 ,  H01L33/60 ,  H01L2933/0058

    Abstract: A method for fabricating a microstructure to generate surface plasmon waves comprises steps of: (S1) preparing a substrate (10), and (S2) using a carrier material (22) to carry a plurality of metallic nanoparticles (21) and letting the metallic nanoparticles (21) undertake self-assembly to form a microstructure on the substrate (10), wherein the metallic nanoparticles (21) are separated from each other or partially agglomerated to allow the microstructure to be formed with a discontinuous surface. The present invention fabricates the microstructure having the discontinuous surface by a self-assembly method to generate the surface plasmon waves, thus exempts from using the expensive chemical vapor deposition (CVD) technology and is able to reduce the time and cost of fabrication. The present invention also breaks the structural limitation on generation of surface plasmon waves to enhance the effect of generating the surface plasmon waves.

    Abstract translation: 一种用于制造微结构，以产生表面等离子体激元波的方法包括以下步骤：使用载体材料（22）来进行金属纳米粒子（21）的多个部分并加以让金属制备底物（10）和（S2）（S1） 纳米颗粒（21）进行自我组装以形成在基板（10），worin金属纳米粒子（21）彼此分离或部分聚集，以允许微结构具有不连续表面上形成微观结构。 本发明编造具有由自组装方法来产生表面等离子体波的不连续表面的微观结构，因此，从使用昂贵的化学气相沉积（CVD）技术的免并且能够减少时间和制造成本。 因此，本发明打破上产生表面等离激元波的结构限制，以提高生成的表面等离子体激元波的影响。

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