Abstract:
A method is provided for inspecting the surface of an object such as a wafer having tridimensional structures, using a confocal chromatic device with a plurality of optical measurement channels and a chromatic lens allowing optical wavelengths of a broadband light source to be focused at different axial distances defining a chromatic measurement range. The method includes a step of obtaining an intensity information corresponding to the intensity of the light actually focused on an interface of the object within the chromatic measurement range at a plurality of measurement points on the object by measuring a total intensity over the full spectrum of the light collected by at least some of the optical measurement channels in a confocal configuration.
Abstract:
A confocal chromatic device is provided, including at least one chromatic lens with an extended axial chromatism; at least one broadband light source; at least one optical detector; and at least one measurement channel with a planar Y-junction made with a planar waveguide optics technology, and arranged for transferring light from the at least one light source towards the at least one chromatic lens and for transferring light reflected back through the at least one chromatic lens towards the at least one optical detector.
Abstract:
An adhering detection apparatus includes a light source to emit probe light to a light translucent object during an emission period, and to stop an emission of the probe light to the light translucent object during a non-emission period, a light receiver to receive light coming from the light translucent object during the emission period and the non-emission period of the light source, and an adhering detection processor to perform an adhering detection processing for detecting a substance adhering to the light translucent object based on light quantity of the light coming from the light translucent object and received by the light receiver, and to output a detection result of the adhering detection processing. The adhering detection processor selectively performs one or more processes depending on the light quantity of the light received by the light receiver during the non-emission period of the light source.
Abstract:
According to one embodiment, a defect inspection device includes a first beam splitter configured to branch light into a first optical path and a second optical path, a first optical system on the first optical path, a second optical system on the second optical path, a first aperture configured to form an illumination field of an inspection sample by light from the first optical system, a second aperture configured to form an illumination field of the inspection sample by light from the second optical system, and a third optical system configured to illuminate, with a first illumination, an image of the first aperture on a first area of the inspection sample, and to illuminate, with a second illumination, an image of the second aperture on a second area of the inspection sample.
Abstract:
Technologies are generally described for operating and manufacturing optomechanical accelerometers. In some examples, an optomechanical accelerometer device is described that uses a cavity resonant displacement sensor based on a zipper photonic crystal nano-cavity to measure the displacement of an integrated test mass generated by acceleration applied to the chip. The cavity-resonant sensor may be fully integrated on-chip and exhibit an enhanced displacement resolution due to its strong optomechanical coupling. The accelerometer structure may be fabricated in a silicon nitride thin film and constitute a rectangular test mass flexibly suspended on high aspect ratio inorganic nitride nano-tethers under high tensile stress. By increasing the mechanical Q-factors through adjustment of tether width and tether length, the noise-equivalent acceleration (NEA) may be reduced, while maintaining a large operation bandwidth. The mechanical Q-factor may be improved with thinner (e.g.,
Abstract:
A method of fabricating a gas sensor on a substrate and a gas sensor fabricated on a substrate that includes optical and electronic components are described. The method includes fabricating a laser to output light over a range of wavelengths within a waveguide, fabricating a splitter to split the light output by the laser to a reference waveguide and to a detection waveguide, fabricating a reference cell to house the reference waveguide and a reference gas. An output of the reference waveguide is coupled to a first optical detector and an output of the detection waveguide is coupled to a second optical detector to identify or quantify an ambient gas.
Abstract:
A structured illumination device includes: a diffraction unit that diffracts light beams of a plurality of wavelengths that are emitted simultaneously or sequentially by a light source into a plurality of diffracted beams; and an optical system that forms interference fringes on a surface of a sample using the plurality of diffracted beams diffracted by the diffraction unit, the optical system including a first optical system and a second optical system that focuses the plurality of diffracted beams at positions on or near a pupil plane of the first optical system, and a magnification characteristic dY(λ) of the second optical system satisfying the condition of (fo·nw−afλ/P)≦dY(λ)≦(fo·NA−afλ/P), where a=1 (for M=1, 2) or a=2 (for M=3).
Abstract:
An adhering detection apparatus includes a light source to emit probe light to a light translucent object during an emission period, and to stop an emission of the probe light to the light translucent object during a non-emission period, a light receiver to receive light coming from the light translucent object during the emission period and the non-emission period of the light source, and an adhering detection processor to perform an adhering detection processing for detecting a substance adhering to the light translucent object based on light quantity of the light coming from the light translucent object and received by the light receiver, and to output a detection result of the adhering detection processing. The adhering detection processor selectively performs one or more processes depending on the light quantity of the light received by the light receiver during the non-emission period of the light source.
Abstract:
A polarized light imaging apparatus is provided. In an embodiment, the apparatus comprises a light source for producing light beams; an illumination optic coupled to the light source for guiding the light beams towards the sample; a linear polarizer coupled to the illumination optic and configured to produce a linearly polarized light towards the sample respective of the light beams; a TIR birefringent polarizing prism (BPP) coupled to the sample to maximize a refraction difference between ordinary waves and extraordinary waves of light returning from the sample; and a detection optic unit coupled to the non-TIR BPP for guiding the light waves returning from the sample towards a single polarization sensitive sensor element (SE), the SE is configured to capture at least one frame of the sample respective of the light waves returning from the superficial single-scattering layer of the sample apart from the deeper diffuse layer.
Abstract:
The disclosed device, which, using an electron microscope or the like, minutely observes defects detected by an optical appearance-inspecting device or an optical defect-inspecting device, can reliably insert a defect to be observed into the field of an electron microscope or the like, and can be a device of a smaller scale. The electron microscope, which observes defects detected by an optical appearance-inspecting device or by an optical defect-inspecting device, has a configuration wherein an optical microscope that re-detects defects is incorporated, and a spatial filter and a distribution polarization element are inserted at the pupil plane when making dark-field observations using this optical microscope. The electron microscope, which observes defects detected by an optical appearance-inspecting device or an optical defect-inspecting device, has a configuration wherein an optical microscope that re-detects defects is incorporated, and a distribution filter is inserted at the pupil plane when making dark-field observations using this optical microscope.