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    Illumination optical unit for microlithography
    174.
    发明授权
    Illumination optical unit for microlithography 有权
    用于微光刻的照明光学单元

    公开(公告)号：US09235137B2

    公开(公告)日：2016-01-12

    申请号：US13370829

    申请日：2012-02-10

    Applicant: Damian Fiolka ,  Ralf Stuetzle

    Inventor： Damian Fiolka ,  Ralf Stuetzle

    IPC: G03B27/72 ,  G03F7/20 ,  G02B27/09 ,  G21K1/06 ,  G21K1/16

    CPC classification number: G03F7/70233 ,  G02B27/0905 ,  G02B27/0977 ,  G03F7/70075 ,  G03F7/70116 ,  G03F7/70175 ,  G03F7/702 ,  G03F7/70566 ,  G21K1/06 ,  G21K1/16 ,  G21K2201/06 ,  G21K2201/064 ,  G21K2201/067

    Abstract: An illumination optical unit includes a collector mirror which produces a polarization distribution that is applied to the first faceted optical element during the operation of the illumination optical unit. There are at least two first facet elements to which radiation having a differing polarization is applied. The first faceted optical element has at least one first state in which the normal vectors of the reflective surfaces of the first facet elements are selected so that a first predetermined polarization distribution results at the location of the object field during the operation of the illumination optical unit.

    Abstract translation: 照明光学单元包括集光镜，其在照明光学单元的操作期间产生施加到第一刻面光学元件的偏振分布。 存在施加具有不同极化的辐射的至少两个第一小面元件。 第一刻面光学元件具有至少一个第一状态，其中第一面元件的反射表面的法向矢量被选择为使得在照明光学单元的操作期间在物场的位置处产生第一预定偏振分布 。

    Arrangement for transporting radicals
    175.
    发明申请
    Arrangement for transporting radicals 有权
    运输自由基的安排

    公开(公告)号：US20150332899A1

    公开(公告)日：2015-11-19

    申请号：US14805509

    申请日：2015-07-22

    Applicant: MAPPER LITHOGRAPHY IP B.V.

    Inventor： Pieter KRUIT ,  Marc SMITS

    IPC: H01J37/32 ,  H01J37/30 ,  H01J37/317

    CPC classification number: H01J37/3174 ,  B82Y10/00 ,  B82Y40/00 ,  F15D1/025 ,  G03F7/70925 ,  G21K2201/06 ,  H01J9/38 ,  H01J37/3007 ,  H01J37/3177 ,  H01J37/32862 ,  H01J2237/006 ,  H01J2237/022 ,  H01J2237/327 ,  Y10T137/2082 ,  Y10T137/87571

    Abstract: The invention relates to an arrangement for transporting radicals. An electron beam system is presented comprising a beamlet generator; a beamlet manipulator (204) comprising an array of apertures; a plasma generator comprising a chamber for forming a plasma, an inlet receiving input gas and outlets removing plasma or radicals created therein, the plasma generator further comprising outlets in flow connection with the plasma chamber outlets; and a hollow guiding body (309b) guiding radicals formed in the plasma towards the array of apertures for removing contaminant deposition. The hollow guiding body (309b) is removably connectable to an extended portion (307b) of the plasma generator outlet. A cover (400) can be placed over a connection between the hollow guiding body (309b) and the extended portion (307b). The extended portion (307b) of the plasma generator outlet and the hollow guiding body (309b) can be similarly formed as a slit.

    Abstract translation: 本发明涉及一种输送自由基的装置。 提出了一种电子束系统，包括一个小波发生器; 小梁操纵器（204），包括孔阵列; 等离子体发生器，其包括用于形成等离子体的腔室，接收输入气体的入口和去除其中产生的等离子体或自由基的出口，等离子体发生器还包括与等离子体室出口流动连接的出口; 以及空心引导体（309b），其将形成在等离子体中的自由基朝向孔阵列排出以除去污染物沉积物。 中空引导体（309b）可移除地连接到等离子体发生器出口的延伸部分（307b）。 盖（400）可以放置在中空引导体（309b）和延伸部分（307b）之间的连接处。 等离子体发生器出口的延伸部分（307b）和中空引导体（309b）可类似地形成为狭缝。

    Radiation imaging system
    176.
    发明授权
    Radiation imaging system 有权
    辐射成像系统

    公开(公告)号：US09001969B2

    公开(公告)日：2015-04-07

    申请号：US13522010

    申请日：2011-02-02

    Applicant: Dai Murakoshi ,  Takuji Tada ,  Toshitaka Agano ,  Kenji Takahashi

    Inventor： Dai Murakoshi ,  Takuji Tada ,  Toshitaka Agano ,  Kenji Takahashi

    IPC: G01N23/00 ,  G01N23/04 ,  A61B6/02 ,  A61B6/00 ,  G21K1/06 ,  A61B6/03 ,  A61B6/06

    CPC classification number: A61B6/484 ,  A61B6/022 ,  A61B6/03 ,  A61B6/06 ,  A61B6/4233 ,  A61B6/4291 ,  A61B6/4441 ,  A61B6/4464 ,  A61B6/502 ,  A61B6/5241 ,  G21K1/06 ,  G21K1/067 ,  G21K2201/06 ,  G21K2207/005

    Abstract: An X-ray imaging system is provided with an X-ray source (11), first and second absorption gratings (31, 32), and a flat panel detector (FPD) (30), and obtains a phase contrast image of an object H by performing imaging while moving the second absorption grating (32) in x direction relative to the first absorption grating (31). The following mathematical expression is satisfied where p1′ denotes a period of a first pattern image at a position of the second absorption grating (32), and p2′ denotes a substantial grating pitch of the second absorption grating (32), and DX denotes a dimension, in the x-direction, of an X-ray imaging area of each pixel of the FPD (30). Here, “n” denotes a positive integer. DX≠n×(p1′×p2′)/|p1′−p2′|

    Abstract translation: X射线成像系统设置有X射线源（11），第一和第二吸收光栅（31,32）和平板检测器（FPD）（30），并且获得物体的相位对比图像 H，通过在相对于第一吸收光栅（31）的x方向上移动第二吸收光栅（32）的同时执行成像。 满足以下数学表达式，其中p1'表示第二吸收光栅（32）的位置处的第一图案图像的周期，p2'表示第二吸收光栅（32）的实质光栅间距，DX表示 在所述FPD（30）的每个像素的X射线成像区域的x方向上的尺寸。 这里，“n”表示正整数。 DX≠n×（p1'×p2'）/ | p1'-p2'|

    Ultrafast transient grating radiation to optical image converter
    177.
    发明授权
    Ultrafast transient grating radiation to optical image converter 有权
    超快速瞬态光栅辐射到光学图像转换器

    公开(公告)号：US08879137B2

    公开(公告)日：2014-11-04

    申请号：US13423498

    申请日：2012-03-19

    Applicant: Richard E. Stewart ,  Stephen P. Vernon ,  Paul T. Steel ,  Mark E. Lowry

    Inventor： Richard E. Stewart ,  Stephen P. Vernon ,  Paul T. Steel ,  Mark E. Lowry

    IPC: G02B26/00 ,  G02F1/03 ,  G02F1/29 ,  G02F1/015 ,  H04B10/50 ,  G21K4/00

    CPC classification number: G02F1/293 ,  G02B26/001 ,  G02F1/015 ,  G02F2201/30 ,  G02F2202/10 ,  G02F2202/13 ,  G21K4/00 ,  G21K2201/06 ,  H04B10/505

    Abstract: A high sensitivity transient grating ultrafast radiation to optical image converter is based on a fixed transmission grating adjacent to a semiconductor substrate. X-rays or optical radiation passing through the fixed transmission grating is thereby modulated and produces a small periodic variation of refractive index or transient grating in the semiconductor through carrier induced refractive index shifts. An optical or infrared probe beam tuned just below the semiconductor band gap is reflected off a high reflectivity mirror on the semiconductor so that it double passes therethrough and interacts with the radiation induced phase grating therein. A small portion of the optical beam is diffracted out of the probe beam by the radiation induced transient grating to become the converted signal that is imaged onto a detector.

    Abstract translation: 对光学图像转换器的高灵敏度瞬态光栅超快辐射基于与半导体衬底相邻的固定透射光栅。 因此通过固定透射光栅的X射线或光学辐射被调制，并且通过载流子引起的折射率偏移在半导体中产生折射率或瞬态光栅的小的周期性变化。 调谐在半导体带隙正下方的光学或红外探测光束从半导体上的高反射率镜反射，使得其双重通过，并与其中的辐射诱导相位光栅相互作用。 光束的一小部分被辐射诱导的瞬态光栅衍射出探测光束，成为被成像到检测器上的转换信号。

    Extreme ultraviolet light source and positioning method of light focusing optical means
    178.
    发明授权
    Extreme ultraviolet light source and positioning method of light focusing optical means 有权
    极紫外光源和光聚焦光学手段的定位方法

    公开(公告)号：US08785893B2

    公开(公告)日：2014-07-22

    申请号：US13636086

    申请日：2011-03-02

    Applicant: Daiki Yamatani

    Inventor： Daiki Yamatani

    IPC: H01L21/027 ,  G03F7/20 ,  H05G2/00

    CPC classification number: H01L21/0274 ,  G03F7/2004 ,  G03F7/70033 ,  G03F7/70133 ,  G03F7/70141 ,  G03F7/70166 ,  G03F7/7085 ,  G21K1/067 ,  G21K2201/06 ,  H05G2/00 ,  H05G2/003 ,  H05G2/005 ,  H05G2/008

    Abstract: In an extreme ultraviolet (“EUV”) light source apparatus, uneven angle distribution images of EUV light are detected prior to an adjustment function by a detector, and angle distribution image data is recorded. Movement data corresponding to the recorded angle distribution image data is also recorded. The movement data corresponds to a movement amount and direction that the optical focusing means is moved from a position in which the angle distribution is even to the position in which the corresponding uneven angle distribution image is obtained. For the adjustment, a current angle distribution property image is detected by the detector and is compared with the uneven angle distribution property image data stored, and image data which is most closely matched with the current angle distribution property is selected. The movement data that corresponds to the selected image data is read out, and the light focusing optical means is moved based thereon.

    Abstract translation: 在极紫外（“EUV”）光源装置中，通过检测器在调节功能之前检测到EUV光的不均匀角度分布图像，并记录角度分布图像数据。 还记录与记录角度分布图像数据对应的运动数据。 运动数据对应于光学聚焦装置从角度分布均匀的位置移动到获得相应的不均匀角度分布图像的位置的移动量和方向。 对于调整，由检测器检测当前的角度分布特性图像，并将其与存储的不均匀角度分布特性图像数据进行比较，并且选择与当前角度分布特性最紧密匹配的图像数据。 读取对应于所选择的图像数据的移动数据，并且基于此移动聚焦光学装置。

    Analysis method, radiation imaging apparatus using analysis method, and analysis program for executing analysis method
    179.
    发明授权
    Analysis method, radiation imaging apparatus using analysis method, and analysis program for executing analysis method 失效
    分析方法，辐射成像仪使用分析方法，分析程序执行分析方法

    公开(公告)号：US08681934B2

    公开(公告)日：2014-03-25

    申请号：US13943932

    申请日：2013-07-17

    Applicant: Canon Kabushiki Kaisha

    Inventor： Kentaro Nagai ,  Toru Den

    IPC: G03H5/00

    CPC classification number: G06T7/0002 ,  A61B6/4291 ,  A61B6/484 ,  G01J9/02 ,  G01N23/04 ,  G01N23/20075 ,  G01N2223/401 ,  G21K1/06 ,  G21K2201/06 ,  G21K2201/067

    Abstract: An analysis method for use in a radiation imaging apparatus employing intensity information of interference fringes of radiation rays that have passed through a detected object includes the steps of generating first phase information of the detected object wrapped into a range of 2π from the intensity information of the interference fringes; generating information on an absorption intensity gradient of the detected object from the intensity information of the interference fringes; generating a weighting function on the basis of an absolute value of a gradient in the information on the absorption intensity gradient; and generating second phase information by unwrapping the first phase information by using the weighting function.

    Abstract translation: 一种在使用已经通过检测对象的辐射线的干涉条纹的强度信息的放射线成像装置中的分析方法包括以下步骤：产生被检测物体的第一相位信息，包含在2＆amp; 从干涉条纹的强度信息; 根据干涉条纹的强度信息生成关于被检测物体的吸收强度梯度的信息; 基于关于吸收强度梯度的信息中的梯度的绝对值生成加权函数; 以及通过使用所述加权函数展开所述第一相位信息来产生第二相位信息。

    ANALYSIS METHOD, RADIATION IMAGING APPARATUS USING ANALYSIS METHOD, AND ANALYSIS PROGRAM FOR EXECUTING ANALYSIS METHOD
    180.
    发明申请
    ANALYSIS METHOD, RADIATION IMAGING APPARATUS USING ANALYSIS METHOD, AND ANALYSIS PROGRAM FOR EXECUTING ANALYSIS METHOD 失效
    分析方法，使用分析方法的放射成像装置和执行分析方法的分析程序

    公开(公告)号：US20130301795A1

    公开(公告)日：2013-11-14

    申请号：US13943932

    申请日：2013-07-17

    Applicant: CANON KABUSHIKI KAISHA

    Inventor： Kentaro Nagai ,  Toru Den

    IPC: G06T7/00 ,  G01N23/20

    CPC classification number: G06T7/0002 ,  A61B6/4291 ,  A61B6/484 ,  G01J9/02 ,  G01N23/04 ,  G01N23/20075 ,  G01N2223/401 ,  G21K1/06 ,  G21K2201/06 ,  G21K2201/067

    Abstract: An analysis method for use in a radiation imaging apparatus employing intensity information of interference fringes of radiation rays that have passed through a detected object includes the steps of generating first phase information of the detected object wrapped into a range of 2π from the intensity information of the interference fringes; generating information on an absorption intensity gradient of the detected object from the intensity information of the interference fringes; generating a weighting function on the basis of an absolute value of a gradient in the information on the absorption intensity gradient; and generating second phase information by unwrapping the first phase information by using the weighting function.

    Abstract translation: 一种用于使用已经通过检测对象的辐射线的干涉条纹的强度信息的放射线成像设备的分析方法包括以下步骤：从被检测到的物体的强度信息生成包含在2pi范围内的检测对象的第一相位信息 干涉条纹; 根据干涉条纹的强度信息生成关于被检测物体的吸收强度梯度的信息; 基于关于吸收强度梯度的信息中的梯度的绝对值生成加权函数; 以及通过使用所述加权函数展开所述第一相位信息来产生第二相位信息。

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