公开(公告)号：US20120043188A1

公开(公告)日：2012-02-23

申请号：US13203624

申请日：2010-03-04

Applicant: Martijn Goossens ,  Hilco Suy ,  Peter Gerard Steeneken ,  Jozef Thomas Martinus van Beek

Inventor： Martijn Goossens ,  Hilco Suy ,  Peter Gerard Steeneken ,  Jozef Thomas Martinus van Beek

IPC: H01H59/00 ,  H01H11/00

CPC classification number: B81B3/0078 ,  B81B2201/014 ,  B81B2201/016 ,  H01G5/011 ,  H01G5/16

Abstract: A MEMS device comprises first and second opposing electrode arrangements (22,28), wherein the second electrode arrangement (28) is electrically movable to vary the electrode spacing between facing sides of the first and second electrode arrangements. At least one of the facing sides has a non-flat surface with at least one peak and at least one trough. The height of the peak and depth of the trough is between 0.01t and 0.1t where t is the thickness of the movable electrode.

Abstract translation: MEMS器件包括第一和第二相对电极布置（22,28），其中第二电极布置（28）可电可移动以改变第一和第二电极布置的相对侧之间的电极间距。 至少一个相对侧具有具有至少一个峰和至少一个槽的非平坦表面。 槽的高度和深度在0.01t到0.1t之间，其中t是可动电极的厚度。

公开(公告)号：US20110010136A1

公开(公告)日：2011-01-13

申请号：US12888217

申请日：2010-09-22

Applicant: Gerrit Klaasse ,  Hendrikus Tilmans

Inventor： Gerrit Klaasse ,  Hendrikus Tilmans

IPC: G06F17/50

CPC classification number: B81B3/0072 ,  B81B2201/016 ,  H01L41/0933 ,  H02N1/002

Abstract: Methods for designing a micro electromechanical device are disclosed. In one embodiment, the method comprises extending a floating element between a first anchor point and a second anchor point. The floating element includes a predetermined reference portion. The method further comprises determining a first location for a first stress relieving element on a first flexible section located between the first anchor point and the reference point, and determining a second location for a second stress relieving element on a second flexible section located between the second anchor point and the reference point. The method additionally comprises placing the first and second stress relieving elements at the first and second determined locations, respectively, thereby causing the reference portion to be located within a predetermined reference plane while in at least one predetermined state.

Abstract translation: 公开了一种用于设计微机电装置的方法。 在一个实施例中，该方法包括在第一锚定点和第二锚定点之间延伸浮动元件。 浮动元件包括预定的参考部分。 该方法还包括确定位于第一锚定点和参考点之间的第一柔性部分上的第一应力消除元件的第一位置，以及确定位于第二锚定点和参考点之间的第二柔性部分上的第二应力释放元件的第二位置 锚点和参考点。 该方法还包括将第一和第二应力释放元件分别放置在第一和第二确定位置处，从而使得参考部分在至少一个预定状态下位于预定参考平面内。

公开(公告)号：US20100213039A1

公开(公告)日：2010-08-26

申请号：US12704836

申请日：2010-02-12

Applicant: Tomohiro SAITO

Inventor： Tomohiro SAITO

IPC: H01H57/00 ,  H01H11/00

CPC classification number: B81B3/007 ,  B81B2201/016 ,  B81B2203/0109 ,  H01H59/0009 ,  H01H2001/0084 ,  H01H2059/0036

Abstract: A MEMS element of an aspect of the present invention including a first electrode provided on a substrate, a second electrode which is provided above the first electrode and which is driven toward the first electrode, an anchor provided on the substrate, a beam which supports the second electrode in midair, one end of the beam being connected to the anchor and the beam including a sidewall part provided at its end in the width direction, the sidewall part having a downward-facing protrusion.

Abstract translation: 本发明的一个方面的MEMS元件包括设置在基板上的第一电极，设置在第一电极上方并被朝向第一电极驱动的第二电极，设置在基板上的锚杆，支撑 第二电极在空中，梁的一端连接到锚杆，并且梁包括设置在其宽度方向上的端部的侧壁部分，侧壁部分具有向下的突起。

公开(公告)号：US07709757B2

公开(公告)日：2010-05-04

申请号：US11663737

申请日：2005-10-11

Applicant: Pierre-Louis Charvet

Inventor： Pierre-Louis Charvet

IPC: H01H57/00

CPC classification number: B81B3/0086 ,  B81B2201/016 ,  H01H59/0009

Abstract: The invention relates to a microsystem comprising a deformable bridge, the ends of which are connected to a substrate. According to the invention, at least one actuation electrode, which is solidly connected to the bridge, is disposed between the center of the bridge and one of the ends next to a counter electrode which is solidly connected to the substrate. The electrodes are intended to deform the deformable bridge such that a lower face of the bridge comes into contact with a contact element formed on the substrate.

Abstract translation: 本发明涉及一种微系统，其包括可变形桥，其可变形桥的端部连接到基板。 根据本发明，至少一个牢固地连接到桥的致动电极设置在桥的中心和紧邻与基板牢固连接的对电极之间的一个端部之间。 电极旨在使可变形桥变形，使得桥的下表面与形成在基板上的接触元件接触。

公开(公告)号：US07709285B2

公开(公告)日：2010-05-04

申请号：US10578026

申请日：2004-10-26

Applicant: Jozef Thomas Martinus Van Beek ,  Mathieu Joseph Emmanuel Ulenaers

Inventor： Jozef Thomas Martinus Van Beek ,  Mathieu Joseph Emmanuel Ulenaers

IPC: H01L21/00

CPC classification number: H01G5/18 ,  B81B3/0078 ,  B81B2201/016 ,  B81B2201/038 ,  B81B2203/04 ,  B81B2203/053 ,  H01H59/0009 ,  H01H2057/006 ,  H01H2239/01

Abstract: A method for manufacturing a micro-electromechanical systems (MEMS) device, comprising providing a base layer (10) and a mechanical layer (12) on a substrate (14), providing a sacrificial layer (16) between the base layer (10) and the mechanical layer (12), providing an etch stop layer (18) between the sacrificial layer (16) and the substrate (14), and removing the sacrificial layer (16) by means of dry chemical etching, wherein the dry chemical etching is performed using a fluorine-containing plasma, and the etch stop layer (18) comprises a substantially non-conducting, fluorine chemistry inert material, such as HfO2, ZrO2, Al2O3 or TiO2.

Abstract translation: 一种用于制造微机电系统（MEMS）装置的方法，包括在基底（14）上提供基底层（10）和机械层（12），在基底层（10）之间提供牺牲层（16） 和所述机械层（12），在所述牺牲层（16）和所述衬底（14）之间提供蚀刻停止层（18），以及通过干法化学蚀刻去除所述牺牲层（16），其中所述干化学蚀刻 使用含氟等离子体进行，并且蚀刻停止层（18）包括基本上不导电的氟化学惰性材料，例如HfO 2，ZrO 2，Al 2 O 3或TiO 2。

公开(公告)号：US20090321232A1

公开(公告)日：2009-12-31

申请号：US12304757

申请日：2007-06-14

Applicant: Yasuyuki Naito ,  Yoshito Nakanishi

Inventor： Yasuyuki Naito ,  Yoshito Nakanishi

IPC: H01H59/00 ,  H01L41/04 ,  H02N11/00

CPC classification number: B81B3/0078 ,  B81B2201/016 ,  H01H59/0009 ,  H01H69/01

Abstract: A quick response/low voltage driven electromechanical switch equipped with a mechanism for adjusting a spring constant of a movable electrode is provided. The electromechanical element includes a first electrode formed on a substrate, a second electrode formed at a predetermined interval to the first electrode so that the interval is changed, and supporting portions for supporting the second electrode, wherein the supporting portions of the second electrode are able to be displaced.

Abstract translation: 提供一种具有用于调节可动电极的弹簧常数的机构的快速响应/低压驱动机电开关。 机电元件包括​​形成在基板上的第一电极，以第一电极以预定间隔形成的间隔改变的第二电极和用于支撑第二电极的支撑部分，其中第二电极的支撑部分能够 被流离失所

公开(公告)号：US20090236114A1

公开(公告)日：2009-09-24

申请号：US12399348

申请日：2009-03-06

Applicant: Susumu Obata ,  Michinobu Inoue ,  Takeshi Miyagi

Inventor： Susumu Obata ,  Michinobu Inoue ,  Takeshi Miyagi

IPC: H05K5/06 ,  H05K7/02

CPC classification number: B81B3/0078 ,  B81B2201/016 ,  B81B2203/0109 ,  H01H1/50 ,  H01H3/60 ,  H01H59/0009 ,  Y10T29/49002

Abstract: An example of the present invention is a micromechanical device including, a substrate in which a signal line is provided, a micromachine which is mounted on the substrate, is formed of a conductive material into a beam-like shape, is elastically deformed by a function of an electric field in such a manner that the beam-like part moves closer to or apart from the signal line, and changes the electric characteristics concomitantly with the deformation, a deformation restraint section constituted of a material having a higher viscosity coefficient than the conductive material, provided on the opposite side of the micromachine to the signal line, for restraining deformation of the micromachine in a direction in which the micromachine is separated from the signal line, and a sealing body provided on the principal surface of the substrate, for covering the micromachine with a hollow section located therebetween.

Abstract translation: 本发明的一个实例是一种微机械装置，其特征在于，包括：设置有信号线的基板，安装在基板上的微机械，由导电材料形成为梁状，通过功能弹性变形 电场的方式使得束状部分靠近信号线或离开信号线移动，并且随着变形而改变电特性，变形抑制部分由具有比导电性更高的粘度系数的材料构成 材料，其设置在所述微机械相对于所述信号线的相反侧，用于限制所述微机械从所述微机械与所述信号线分离的方向上的变形;以及设置在所述基板主表面上的密封体， 具有位于其间的中空部分的微机械。

公开(公告)号：US07312677B2

公开(公告)日：2007-12-25

申请号：US10878330

申请日：2004-06-29

Applicant: Tadashi Nakatani ,  Tsutomu Miyashita

Inventor： Tadashi Nakatani ,  Tsutomu Miyashita

IPC: H01H51/22

CPC classification number: H01H59/0009 ,  B81B2201/016 ,  B81B2203/0127 ,  B81C1/00142 ,  B81C2201/0109

Abstract: A method is provided for making a micro-switching element. The switching element includes a substrate, two supporting members fixed to the substrate, and a movable beam bridging between the supporting members. The beam includes a membrane, a movable contact electrode and a movable driving electrode, both disposed on the membrane. The switching element also includes a pair of stationary contact electrodes facing the movable contact electrode, and a stationary driving electrode cooperating with the movable driving electrode for generation of electrostatic force. The method includes the steps of making a sacrifice layer on the substrate, making the membrane on the sacrifice layer, and subjecting the sacrifice layer to etching with the membrane intervening, so that the supporting members are formed as remaining portions of the sacrifice layer between the substrate and the membrane.

Abstract translation: 提供了一种制造微型开关元件的方法。 开关元件包括基板，固定到基板的两个支撑构件和桥接在支撑构件之间的可移动梁。 梁包括设置在膜上的膜，可动接触电极和可移动​​驱动电极。 开关元件还包括面对可动接触电极的一对固定接触电极，以及与可动驱动电极配合以产生静电力的固定驱动电极。 该方法包括以下步骤：在基底上制备牺牲层，使膜处于牺牲层上，并使牺牲层进行介入蚀刻，使得支撑构件形成为牺牲层的剩余部分 底物和膜。

公开(公告)号：US20070222007A1

公开(公告)日：2007-09-27

申请号：US10578026

申请日：2004-10-26

Applicant: Jozef Van Beek ,  Mathieu Joseph Ulenaers

Inventor： Jozef Van Beek ,  Mathieu Joseph Ulenaers

IPC: H01L29/84 ,  H01L21/00

CPC classification number: H01G5/18 ,  B81B3/0078 ,  B81B2201/016 ,  B81B2201/038 ,  B81B2203/04 ,  B81B2203/053 ,  H01H59/0009 ,  H01H2057/006 ,  H01H2239/01

Abstract: A method for manufacturing a micro-electromechanical systems (MEMS) device, comprising providing a base layer (10) and a mechanical layer (12) on a substrate (14), providing a sacrificial layer (16) between the base layer (10) and the mechanical layer (12), providing an etch stop layer (18) between the sacrificial layer (16) and the substrate (14), and removing the sacrificial layer (16) by means of dry chemical etching, wherein the dry chemical etching is performed using a fluorine-containing plasma, and the etch stop layer (18) comprises a substantially non-conducting, fluorine chemistry inert material, such as HfO2, ZrO2, Al2O3 or TiO2.

Abstract translation: 一种用于制造微机电系统（MEMS）装置的方法，包括在基底（14）上提供基底层（10）和机械层（12），在基底层（10）之间提供牺牲层（16） 和所述机械层（12），在所述牺牲层（16）和所述衬底（14）之间提供蚀刻停止层（18），以及通过干法化学蚀刻去除所述牺牲层（16），其中所述干化学蚀刻 使用含氟等离子体进行，并且蚀刻停止层（18）包括基本上不导电的氟化学惰性材料，例如HfO 2，ZrO 2， ，Al 2 O 3 3或TiO 2。

公开(公告)号：US20070035200A1

公开(公告)日：2007-02-15

申请号：US11388213

申请日：2006-03-23

Applicant: Fabrice Casset ,  Karim Segueni ,  Arnaud De Grave ,  Nicolas Abele

Inventor： Fabrice Casset ,  Karim Segueni ,  Arnaud De Grave ,  Nicolas Abele

IPC: H01H57/00 ,  C23F1/00 ,  H02N1/00

CPC classification number: H03H9/2463 ,  B81B3/007 ,  B81B2201/016 ,  B81B2201/0271 ,  B81B2203/0118 ,  H03H3/0076 ,  H03H9/2447

Abstract: A microelectromechanical system comprises a beam and an electrode coupled to the beam via electrostatic interaction. The beam is designed to undergo elastic flexural deformation and has an approximately constant cross section. The beam consists of several flat faces that extend over the length of the beam, each having a thickness of less than an external dimension of the cross section. A flexural vibration frequency of the beam is then increased compared with a solid beam of the same external dimensions. Such a microelectromechanical system is suitable for applications requiring very short transition times, or for producing high-frequency oscillators and resonators.

Abstract translation: 微机电系统包括通过静电相互作用耦合到束的光束和电极。 梁被设计成经历弹性弯曲变形并且具有大致恒定的横截面。 梁包括在梁的长度上延伸的多个平面，每个平面具有小于横截面的外部尺寸的厚度。 然后与相同外部尺寸的实心束相比，梁的弯曲振动频率增加。 这样的微机电系统适用于需要非常短的转换时间或用于产生高频振荡器和谐振器的应用。