Abstract:
As a jig material to use under plasma reaction for producing semiconductors, the present invention provides a quartz glass having resistance against plasma corrosion, particularly corrosion resistance against fluorine-based plasma gases, and which is usable without causing anomalies to silicon wafers; the present invention furthermore provides a quartz glass jig, and a method for producing the same. A quartz glass containing 0.1 to 20 wt % in total of two or more types of metallic elements, said metallic elements comprising at least one type of metallic element selected from Group 3B of the periodic table as a first metallic element and at least one type of metallic element selected from the group consisting of Mg, Ca, Sr, Ba, Sc, Y, Ti, Zr, Hf, lanthanoids, and actinoids as a second metallic element, provided that the maximum concentration of each of the second metallic elements is 1.0 wt % or less.
Abstract:
The invention relates to a method for doping material, the method being characterized by depositing at least one dopant deposition layer or a part thereof on the surface of the material and/or on a surface of a part or parts thereof with the atom layer deposition (ALD) method, and further processing the material coated with a dopant in such a manner that the original structure of the dopant layer is changed to obtain new properties for the doped material. The material to be doped is preferably glass, ceramic, polymer, metal, or a composite material made thereof, and the further processing of the material coated with the dopant is a mechanical, chemical, radiation, or heat treatment, whereby the aim is to change the refraction index, absorbing power, electrical and/or heat conductivity, colour, or mechanical or chemical durability of the doped material.
Abstract:
A preform for a low loss fiber optic cable and method and apparatus for fabricating such a preform is provided. The method includes providing AlCl3 and CVD precursors and locally doping CaCl3. Alkali and/or alkaline earth fluxing agents can be introduced. The alkali and/or alkaline earths are doped along with the aluminum into the silica glass core.
Abstract:
An optical fiber comprising: (i) a silica based, rare earth doped core having a first index of refraction n1; (ii) a silica based inner cladding surrounding the core having a second index of refraction n2, such that n1>n2; (iii) a silica based outer cladding surrounding the inner cladding having a third index of refraction n3 such that n2>n3, wherein inner cladding diameter is at least 125 μm.
Abstract translation:一种光纤,包括:(i)具有第一折射率n 1的二氧化硅基稀土掺杂的核; (ii)围绕所述芯的基于二氧化硅的内包层,具有第二折射率n 2 2,使得n 1 2> n 2; (iii)围绕所述内包层的基于二氧化硅的外包层,其具有第三折射率n 3 3,使得n 2 2 N 3 N 3,其中 内包层直径至少为125μm。
Abstract:
An optical fiber, comprising: (i) a rare earth doped silica based elongated core with a first refractive index (n1) with an aspect ratio of 1:5 to 1; (ii) a silica based moat abutting and at least substantially surrounding the core, the moat having a refractive index n2, wherein n2 n3; and n3>n2; (iv) a silica based outer cladding surrounding said inner cladding, the outer cladding having a fourth refractive index (n4), such that n4
Abstract translation:一种光纤,包括:(i)具有长宽比为1:5至1的第一折射率(n <1> 1)的稀土掺杂二氧化硅基细长芯; (ii)邻接并且至少基本上围绕所述芯的基于二氧化硅的护城河,所述护城河具有折射率n 2 N 2,其中n 2 ; (iii)围绕所述护城河的基于二氧化硅的内包层,所述内包层具有第三折射率(n 3/3),其中n 1 <3> n 3 < SUB>; 和n 3 3 sub> n 2; (iv)围绕所述内包层的基于二氧化硅的外包层,所述外包层具有第四折射率(n≥4 sub>),使得n 4 光纤在工作波长带表现出单极化。
Abstract:
As a jig material to use under plasma reaction for producing semiconductors the present invention provides a quartz glass having resistance against plasma corrosion, particularly corrosion resistance against fluorine-based plasma gases, and which is usable without causing anomalies to silicon wafers; the present invention furthermore provides a quartz glass jig, and a method for producing the same. A quartz glass containing 0.1 to 20 wt % in total of two or more types of metallic elements, said metallic elements comprising at least one type of metallic element selected from Group 3B of the periodic table as a first metallic element and at least one type of metallic element selected from the group consisting of Mg, Ca, Sr, Ba, Sc, Y, Ti, Zr, Hf, lanthanoids, and actinoids as a second metallic element, provided that the maximum concentration of each of the second metallic elements is 1.0 wt % or less.
Abstract:
A preform for a low loss fiber optic cable and method and apparatus for fabricating such a preform is provided. The method includes providing AlCl3 and CVD precursors and locally doping CaCl3. Alkali and/or alkaline earth fluxing agents can be introduced. The alkali and/or alkaline earths are doped along with the aluminum into the silica glass core.
Abstract:
A germanium-free co-doped silicate optical waveguide in accordance with the present invention includes a core material comprising silica, and oxides of aluminum, lanthanum, erbium and thulium, wherein the concentration of Er is from 15 ppm to 3000 ppm; Al is from 0.5 mol % to 15 mol %; La is less than 2 mol %; and Tm is from 150 ppm to 10000 ppm. In an exemplary specific embodiment the concentration of Al is from 4 mol % to 10 mol %; and the concentration of Tm is from 150 ppm to 3000 ppm. The core may further include F. In an exemplary embodiment, the concentration of F is less than or equal to 6 mol %. The waveguide may be an optical fiber, a shaped fiber or other light-guiding waveguides. An amplifier according to the present invention includes the optical fiber described above.
Abstract:
A co-doped silicate optical waveguide having a core including silica, and oxides of aluminum, germanium, erbium and thulium. The composition concentrations are: Er from 15 ppm to 3000 ppm; Al from 0.5 mol % to 12 mol %; Tm from 15 ppm to 10000 ppm; and Ge from 1 mol % to 20 mol %. In a specific embodiment, the concentration of Er is from 150 ppm to 1500 ppm; Al is from 2 mol % to 8 mol %; and Tm is from 15 ppm to 3000 ppm. A boron-less cladding surrounds the core.
Abstract:
The present invention discloses a method of fabricating rare earth-doped preforms for optical fibers. A silica soot is deposited as a layer with high porosity on an inner surface of a silica-based tube by a modified chemical vapor deposition (MCVD) process at a temperature high enough to produce the silica soot but low enough to avoid sintering of the soot into the silica-based tube. The silica-based tube is then immersed in a solution including a rare earth element and a codopant element for impregnation. The excess solution is drained and the silica-based tube is dried in a stream of chlorine and inert gas at an elevated temperature. Then, the rare earth element and the codopant element are oxidized under an oxygen partial pressure at a temperature high enough to overcome kinetic limitations against oxidation. Finally, the soot layer is consolidated while flowing a mixture of chlorides of a second codopant element and oxygen at a sintering temperature at which the second codopant element reacts with oxygen to form codopant oxide which is delivered around the rare earth element oxide deposited in the soot layer. In the method of the current invention, one or more rare earth elements are codoped with preferred codopants including but not limited to Ge, Al, P and/or B to enhance the performance of the rare earth ions. Other dopants may also be used in conjunction with the preferred dopants for modifying the refractive index of the core.