公开(公告)号：WO2009156898A2

公开(公告)日：2009-12-30

申请号：PCT/IB2009/052562

申请日：2009-06-17

Applicant: KONINKLIJKE PHILIPS ELECTRONICS N.V. ,  PHILIPS INTELLECTUAL PROPERTY & STANDARDS GMBH ,  PROKSA, Roland

Inventor： PROKSA, Roland

CPC classification number: A61B6/4035 ,  A61B6/032 ,  A61B6/4014 ,  A61B6/4042 ,  A61B6/4241 ,  A61B6/481 ,  A61B6/482 ,  A61B6/504 ,  A61B6/507 ,  A61B6/583 ,  G21K2201/062 ,  G21K2201/064

Abstract: The present invention relates to a medical X-rayexamination apparatus and method for performing k-edge imaging of an object of interest including material showing k- edge absorption. To allow the use of conventional detector technology, which does not suffer from the limitation to provide very high k-rate capabilities a method is proposed comprising the steps of: -emitting polychromatic X-ray radiation (4; 4a, 4b), -Bragg filtering said polychromatic X-rayradiation by a Bragg filter such that radiation (16) transmitted through said Bragg filter (14; 14a, 14b) passes through said object (5), -detecting X-rayradiation after passing through said object (5), -acquiring projection data at at least two different Bragg reflection angles of said Bragg filter (14; 14a, 14b), and -reconstructing a k-edge image from the acquired projection data.

Abstract translation: 本发明涉及一种医用X射线检查装置和方法，用于进行感兴趣对象的k边缘成像，包括显示k边缘吸收的材料。 为了允许使用常规检测器技术，其不受限于提供非常高的k率能力的方法，提出了一种方法，其包括以下步骤： - 发射多色X射线辐射（4; 4a，4b），-Bragg 通过布拉格滤波器对所述多色X射线辐射进行滤波，使得透过所述布拉格滤波器（14; 14a，14b）的辐射（16）穿过所述物体（5）， - 在通过所述物体（5）之后检测X射线辐射， - 在所述布拉格滤波器（14; 14a，14b）的至少两个不同的布拉格反射角处获取投影数据，以及 - 从所获取的投影数据重新构造k边缘图像。

公开(公告)号：WO2009111454A1

公开(公告)日：2009-09-11

申请号：PCT/US2009/035847

申请日：2009-03-03

Applicant: X-RAY OPTICAL SYSTEMS, INC ,  CHEN, Zewu ,  GIBSON, David M. ,  GIBSON, Walter M. ,  BURDETT, John H. Jr. ,  BAILEY, Adam ,  SEMKEN, R. Scott ,  XIN, Kai

Inventor： CHEN, Zewu ,  GIBSON, David M. ,  GIBSON, Walter M. ,  BURDETT, John H. Jr. ,  BAILEY, Adam ,  SEMKEN, R. Scott ,  XIN, Kai

IPC: H01J37/252 ,  G01N23/225

CPC classification number: G21K1/06 ,  G01N23/20008 ,  G01N23/223 ,  G01N2223/076 ,  G01N2223/1003 ,  G01N2223/315 ,  G01N2223/423 ,  G21K2201/062 ,  G21K2201/064 ,  H05G1/04

Abstract: An x-ray analysis apparatus for illuminating a sample spot with an x-ray beam. An x-ray tube is provided having a source spot from which a diverging x-ray beam is produced having a characteristic first energy, and bremsstrahlung energy; a first x-ray optic receives the diverging x-ray beam and directs the beam toward the sample spot, while monochromating the beam; and a second x-ray optic receives the diverging x-ray beam and directs the beam toward the sample spot, while monochromating the beam to a second energy. The first x-ray optic may monochromate characteristic energy from the source spot, and the second x-ray optic may monochromate bremsstrahlung energy from the source spot. The x-ray optics may be curved diffracting optics, for receiving the diverging x-ray beam from the x-ray tube and focusing the beam at the sample spot. Detection is also provided to detect and measure various toxins in, e.g., manufactured products including toys and electronics.

Abstract translation: 一种用X射线束照射样品斑点的X射线分析装置。 提供具有源极点的X射线管，从该源点产生具有特征的第一能量和bre致辐射能量的发散X射线束; 第一x射线光学器件接收发散的X射线束并将光束引向样品斑点，同时对光束进行单色; 并且第二x射线光学器件接收发散的X射线束并将光束引向样品斑点，同时将光束单色为第二能量。 第一个X射线光学元件可以对来自源点的特征能量进行单色化，而第二个X射线光学元件可以从源点单色bre致辐射能量。 x射线光学元件可以是弯曲的衍射光学器件，用于从X射线管接收发散的X射线束并将光束聚焦在样品点。 还提供检测以检测和测量例如包括玩具和电子产品在内的制造产品中的各种毒素。

公开(公告)号：WO2009108628A2

公开(公告)日：2009-09-03

申请号：PCT/US2009034982

申请日：2009-02-24

Applicant: X RAY OPTICAL SYS INC ,  CHEN ZEWU ,  DELANEY RORY ,  XIN KAI

Inventor： CHEN ZEWU ,  DELANEY RORY ,  XIN KAI

IPC: G01N23/20 ,  G01N1/28 ,  G01N21/85 ,  G01N23/12

CPC classification number: G01N23/223 ,  G01N2223/076 ,  G21K2201/064

Abstract: An x-ray analysis system with an x-ray source for producing an x-ray excitation beam directed toward an x-ray analysis focal area; and a sample chamber for presenting a fluid sample to the x-ray analysis focal area. The x- ray excitation beam is generated by an x-ray engine and passes through an x- ray transparent barrier on a wall of the chamber, to define an analysis focal area within space defined by the chamber. The fluid sample is presented as a stream suspended in the space and streaming through the focal area, using a laminar air flow and/or pressure to define the stream. The chamber's barrier is therefore separated from both the focal area and the sample, resulting in lower corruption of the barrier.

Abstract translation: 一种具有用于产生指向X射线分析聚焦区域的X射线激励束的X射线源的X射线分析系统; 以及用于向X射线分析聚焦区域提供流体样本的样本室。 X射线激发束由X射线引擎产生，并穿过腔室壁上的X射线透明屏障，以在由腔室限定的空间内限定分析聚焦区域。 流体样本呈现为悬浮在空间中并通过焦点区域流动的流，使用层流空气流和/或压力来限定流。 因此，腔室的屏障与焦点区域和样品都是分开的，从而降低了屏障的腐蚀。

公开(公告)号：WO2009095220A2

公开(公告)日：2009-08-06

申请号：PCT/EP2009/000539

申请日：2009-01-28

Applicant: MEDIA LARIO S.R.L. ,  WALLHEAD, Ian ,  ZOCCHI, Fabio

Inventor： WALLHEAD, Ian ,  ZOCCHI, Fabio

IPC: G03F7/20 ,  G21K1/06 ,  H05G2/00

CPC classification number: G03F7/70916 ,  B82Y10/00 ,  G03F7/70033 ,  G03F7/70166 ,  G21K1/062 ,  G21K1/067 ,  G21K2201/061 ,  G21K2201/064 ,  G21K2201/065 ,  G21K2201/067 ,  H05G2/003

Abstract: A collector optical system for extreme ultraviolet (EUV) or X-ray applications, including lithography and imaging, for example at 13 5 nm, comprising a grazing incidence collector in combination with a laser produced plasma (LPP) source In one embodiment, one or more further optical elements act upon one or more laser beams used to generate the EUV or X-ray plasma source, whereby said laser beam(s) ιmpact(s) on the fuel target from a side thereof on which an intermediate focus is disposed Also disclosed is a collector for EUV and X-ray applications, in which radiation from a laser produced plasma source is reflected by the collector to an intermediate focus, the line joining the source and intermediate focus defining an optical axis, a first direction on the optical axis being defined from the source to the intermediate focus, characterised by the collector comprising one or more grazing incidence mirrors, and by the collector comprising one or more further optical elements for redirecting a received laser beam so as to be incident upon the source (a) in a second direction, opposite to said first direction, or (b) at an acute angle to said second direction The further optical elements may comprise plane or spherical mirrors and/or lenses, for example disposed on the optical axis Also disclosed is a collector for application at about 13 5 nm with Laser Produced Plasma sources, the collector comprising between 5 and 16 concentrically aligned mirrors, and preferably between 6 and 12 mirrors, that operate at grazing incidence such that the maximum grazing angle between the incident radiation and the reflective surface of the mirrors is about 30°, and more preferably about 25°, in order to allow a maximum collection angle from the source of about 40° to about 85°, and preferably about 45° to about 75° Also disclosed is an EUV lithography system comprising a radiation source, for example a LPP source, the collector, an optical condenser, and a reflective mask

Abstract translation: 用于极紫外（EUV）或X射线应用的收集器光学系统，包括例如13 5nm的光刻和成像，包括与激光产生的等离子体（LPP）源组合的掠入射收集器。在一个实施例中，一个或 更多的光学元件作用于用于产生EUV或X射线等离子体源的一个或多个激光束，由此所述激光束从其上放置中间焦点的一侧在燃料靶上形成 还公开了一种用于EUV和X射线应用的收集器，其中来自激光器产生的等离子体源的辐射被集电器反射到中间焦点，连接源和中间焦点的线限定光轴，第一方向在 光轴从源极到中间焦点定义，其特征在于收集器包括一个或多个掠入射镜，并且由收集器包括一个或多个另外的用于重新发射的光学元件 接收的激光束以与所述第一方向相反的第二方向入射在源（a）上，或（b）与所述第二方向成锐角。另外的光学元件可以包括平面或球面镜， /或透镜，例如设置在光轴上。还公开了一种用于在约13 5nm处用激光产生的等离子体源施加的收集器，该收集器包括5至16个同心对准的反射镜，优选在6和12个反射镜之间，其操作 在掠射入射处，使得入射辐射与反射镜的反射表面之间的最大掠射角为约30°，更优选为约25°，以便允许来自约40°至约85°的源的最大收集角 °，优选约45°至约75°。还公开了一种EUV光刻系统，其包括辐射源，例如LPP源，收集器，光学冷凝器和反射掩模

公开(公告)号：WO2008012111B1

公开(公告)日：2008-03-20

申请号：PCT/EP2007006736

申请日：2007-07-30

Applicant: MEDIA LARIO SRL ,  ZOCCHI FABIO ,  BENEDETTI ENRICO

Inventor： ZOCCHI FABIO ,  BENEDETTI ENRICO

IPC: G03F7/20 ,  G02B17/00

CPC classification number: G03F7/70233 ,  B82Y10/00 ,  G02B17/06 ,  G03F7/70166 ,  G03F7/70175 ,  G21K1/06 ,  G21K2201/064

Abstract: A reflective optical system, in which radiation from a radiation source (e.g. laser produced plasma, or source at infinity) is directed to an image focus or intermediate focus, comprising: one or more mirrors (symmetric about the optical axis), the or each mirror having at least first and second reflective surfaces whereby, in use, radiation from the source undergoes successive grazing incidence reflections in an optical path at said first and second reflective surfaces; and wherein said at least first and second reflective surfaces are formed such that the angles of incidence of said successive grazing incidence reflections at said first and second reflective surfaces are substantially equal. A formula for the preferred geometry of the reflective surface is disclosed. The or each mirror may be formed as an electroformed monolithic component, wherein the first and second reflective surfaces are each provided on a respective one of two contiguous sections of the mirror. The reflective optical system may be embodied in a collector optical system for EUV lithography, or in an EUV or X-ray telescope or imaging optical system.

Abstract translation: 反射光学系统，其中来自辐射源（例如，激光产生的等离子体或无限远的源）的辐射被引导到图像焦点或中间焦点，包括：一个或多个反射镜（关于光轴对称），或者每个 反射镜具有至少第一和第二反射表面，由此在使用中，来自源的辐射在所述第一和第二反射表面处的光路中经历连续的掠入射反射; 并且其中所述至少第一和第二反射表面形成为使得在所述第一和第二反射表面处的所述连续掠入射反射的入射角基本相等。 公开了用于反射表面的优选几何形状的公式。 该或每个反射镜可以形成为电铸单块部件，其中第一和第二反射表面各自设置在反射镜的两个相邻部分中的相应的一个上。 反射光学系统可以体现在用于EUV光刻的收集器光学系统中，或者在EUV或X射线望远镜或成像光学系统中。

公开(公告)号：WO2007016484A3

公开(公告)日：2007-04-19

申请号：PCT/US2006029732

申请日：2006-07-31

Applicant: UNIV NEW YORK STATE RES FOUND ,  X RAY OPTICAL SYS INC ,  MACDONALD CAROLYN A ,  MAIL NOOR ,  CHEN ZEWU

Inventor： MACDONALD CAROLYN A ,  MAIL NOOR ,  CHEN ZEWU

IPC: G21K7/00 ,  G21K1/06

CPC classification number: B82Y10/00 ,  G21K1/06 ,  G21K7/00 ,  G21K2201/061 ,  G21K2201/062 ,  G21K2201/064

Abstract: An x-ray imaging system includes an optical device having at least one point-focusing, curved monochromating optic 320 for directing x-rays from an x-ray source 300 towards a focal point 360. The at least one point-focusing, curved monochromating optic provides a focused monochromatic x-ray beam directed towards the focal point, and a detector 350 is aligned with the focused monochromatic x-ray beam. The optical device facilitates x-ray imaging of an object 340 when the object is located between the optical device and the detector within the focused monochromatic x-ray beam. In various embodiments: each point-focusing, curved monochromatic optic has an optical surface that is doubly-curved; the optical device facilitates passive image demagnification or magnification depending upon placement of the object and detector relative to the focal point; and at least one second point-focusing, curved monochromatic optic can be employed to facilitate refractive index or polarized beam imaging of the object.

Abstract translation: x射线成像系统包括具有至少一个点聚焦的光学装置，用于将X射线从X射线源300引导到焦点360的弯曲单色光学器件320.至少一个点聚焦，弯曲单色 光学器件提供指向焦点的聚焦单色x射线束，并且检测器350与聚焦的单色x射线束对准。 当物体位于聚焦的单色X射线束内的光学装置和检测器之间时，该光学装置便于物体340的X射线成像。 在各种实施例中：每个点聚焦，弯曲单色光学器件具有双曲弯曲的光学表面; 光学装置根据物体和检测器相对于焦点的放置而促进被动图像缩小或放大; 并且可以使用至少一个第二点聚焦弯曲单色光学器件来促进物体的折射率或偏振光束成像。

公开(公告)号：WO2004111624A2

公开(公告)日：2004-12-23

申请号：PCT/US2004017454

申请日：2004-06-02

Applicant: X RAY OPTICAL SYS INC ,  CHEN ZEWU ,  GIBSON WALTER

Inventor： CHEN ZEWU ,  GIBSON WALTER

IPC: G01N23/06 ,  G01N23/00

CPC classification number: G01N23/02 ,  G01N23/06 ,  G21K2201/062 ,  G21K2201/064

Abstract: Compact, low-power-consuming systems and methods for exposing samples to high-energy radiation, for example, for exposing samples to x-rays for implementing x-ray absorption near edge analysis (XANES). The systems and methods include a low-power-consuming radiation source, such as an x-ray tube; one or more tunable crystal optics for directing and varying the energy of the radiation onto a sample under analysis; and a radiation detecting device, such as an x-ray detector, for detecting radiation emitted by the sample. The one or more tunable crystal optics may be doubly-curved crystal optics. The components of the system may be arranged in a collinear fashion. The disclosed systems and methods are particularly applicable to XANES analysis, for example, XANES analysis of the chemical state of chromium or another transition metal in biological processes.

Abstract translation: 用于将样品暴露于高能辐射的紧凑，低功耗系统和方法，例如将样品暴露于X射线以实现近边缘分析（XANES）的X射线吸收。 该系统和方法包括低功耗辐射源，例如x射线管; 一个或多个可调晶体光学器件，用于将辐射的能量引导和分析到分析的样品上; 以及用于检测样品发射的辐射的诸如x射线检测器的放射线检测装置。 一个或多个可调晶体光学器件可以是双曲面晶体光学器件。 系统的组件可以以共线的方式布置。 所公开的系统和方法特别适用于XANES分析，例如，XANES分析生物过程中铬或其他过渡金属的化学状态。

公开(公告)号：WO2004001769A1

公开(公告)日：2003-12-31

申请号：PCT/FR2003/001879

申请日：2003-06-19

Applicant: XENOCS ,  HOGHOJ, Peter ,  DARIEL, Aurélien ,  RODRIGUES, Sergio

Inventor： HOGHOJ, Peter ,  DARIEL, Aurélien ,  RODRIGUES, Sergio

IPC: G21K1/06

CPC classification number: B82Y10/00 ,  G21K1/06 ,  G21K2201/061 ,  G21K2201/062 ,  G21K2201/064

Abstract: L'invention concerne un dispositif optique destiné à traiter un faisceau incident de rayons X, ledit dispositif comprenant : un monochromateur et un élément optique de conditionnement du faisceau incident dont la surface réfléchissante est apte à produire un effet optique bidimensionnel pour adapter un faisceau à destination du monochromateur, ledit élément optique comprenant une surface réfléchissante aux rayons X de type structure multicouche,caractérisé par le fait que ladite surface réfléchissante est constituée d'une surface unique, ladite surface réfléchissante étant conformée selon deux courbures correspondant à deux directions différentes.

Abstract translation: 本发明涉及一种旨在处理入射的X射线束的光学装置。 本发明的装置包括：单色仪; 以及具有能够产生二维光学效果的反射面的光入射光束调节元件，以适应朝向单色仪的光束，上述光学元件包括多层的X射线反射表面。 本发明的特征在于，反射表面包括单个表面，所述反射表面在两个不同的方向上弯曲。

公开(公告)号：WO2003083579A1

公开(公告)日：2003-10-09

申请号：PCT/EP2003/002115

申请日：2003-03-01

Applicant: CARL ZEISS SMT AG ,  WEISS, Markus

Inventor： WEISS, Markus

IPC: G03F7/20

CPC classification number: B82Y10/00 ,  G03F7/70166 ,  G21K1/06 ,  G21K2201/064

Abstract: Die Erfindung betrifft eine Kollektoreinheit für Beleuchtungssysteme mit einer Wellenlänge ≤ 193 nm bevorzugt im Bereich der EUV-Wellenlängen mit mindestens einer Spiegelschale, die eine optische Wirkung aufweist, wobei die Strahlen unter einem Winkel - ≤ 20° zur Oberflächentangente der Spiegelschale auftreffen, und auf mindestens einem Teil der Spiegelschale eine periodische Struktur mit mindestens einer Gitterperiode aufgebracht ist.

Abstract translation: 本发明涉及一种用于照明系统的收集器单元，其具有波长<= 193纳米，优选在具有至少一个反射镜壳具有光学效应的EUV波长范围内，以一定角度的光线 - <=撞击20°的反射镜外壳的表面正切，和 周期性结构设置有至少一个在反射镜壳的至少一部分的光栅周期。

公开(公告)号：WO0227406A3

公开(公告)日：2002-07-04

申请号：PCT/EP0111232

申请日：2001-09-28

Applicant: ZEISS CARL ,  ZEISS STIFTUNG ,  ANTONI MARTIN ,  SINGER WOLFGANG ,  WANGLER JOHANNES

Inventor： ANTONI MARTIN ,  SINGER WOLFGANG ,  WANGLER JOHANNES

IPC: F21V5/00 ,  F21V7/00 ,  F21V13/04 ,  G02B13/18 ,  G02B17/00 ,  G02B17/08 ,  G02B19/00 ,  G03F7/20 ,  G21K1/06 ,  G21K5/00 ,  G21K5/02 ,  G21K5/04 ,  H01L21/027

CPC classification number: G21K1/06 ,  B82Y10/00 ,  G03F7/70075 ,  G03F7/70083 ,  G03F7/70091 ,  G03F7/70108 ,  G03F7/70166 ,  G03F7/702 ,  G03F7/70233 ,  G03F7/70358 ,  G03F7/708 ,  G03F7/70891 ,  G21K1/067 ,  G21K2201/06 ,  G21K2201/064

Abstract: The invention concerns an illumination system, particularly for microlithography with wavelengths ≤ 93 nm, comprising: a primary light source; a first optical component; a second optical component; an image plane; and an exit pupil; wherein said first optical component transforms said primary light source into a plurality of secondary light sources that are imaged by said second optical component in said exit pupil, wherein said first optical component includes a first optical element having a plurality of first raster elements, that are imaged into said image plane, producing a plurality of images being superimposed at least partially on a field in said image plane, wherein said plurality of first raster elements are rectangular, wherein said filed is a segment of an annulus, and wherein said second optical component includes a first field mirror with negative optical power for shaping said field to said segment of said annulus and a second field mirror with positive optical power, wherein each of a plurality of rays intersects said first field mirror with an incidence angel greater than 70 DEG and wherein each of a plurality of rays intersects said second field mirror with an incidence angle of less than 25 DEG .

Abstract translation: 本发明涉及一种照明系统，特别是对于波长≤93nm的微光刻技术，包括：初级光源; 第一光学部件; 第二光学部件; 图像平面; 和退学生; 其中所述第一光学部件将所述初级光源转换成由所述出射光瞳中的所述第二光学部件成像的多个次级光源，其中所述第一光学部件包括具有多个第一光栅元件的第一光学元件， 成像到所述图像平面中，产生至少部分地叠加在所述图像平面中的场上的多个图像，其中所述多个第一光栅元素是矩形的，其中所述场是环的一段，并且其中所述第二光学部件 包括具有负光焦度的第一场反射镜，用于将所述场成形为所述环带的所述段，以及具有正光焦度的第二场反射镜，其中多个光线中的每一个与所述第一场反射镜相交，入射角大于70°， 其中多个光线中的每一个与所述第二场反射镜相交，入射角小于25° 。