公开(公告)号：WO2013040582A3

公开(公告)日：2013-05-10

申请号：PCT/US2012055799

申请日：2012-09-17

Applicant: PHOSEON TECHNOLOGY INC ,  CHILDERS DOUG

Inventor： CHILDERS DOUG

IPC: G02B6/44 ,  C03C25/12

CPC classification number: G21K5/00 ,  C03C25/12 ,  F26B3/28 ,  F26B13/00 ,  G21K1/067 ,  G21K2201/064 ,  G21K2201/065

Abstract: A device for UV curing a coating or printed ink on an workpiece such as an optical fiber comprises dual elliptical reflectors arranged to have a co-located focus. The workpiece is centered at the co-located focus such that the dual elliptical reflectors are disposed on opposing sides of the workpiece. Two separate light sources are positioned at a second focus of each elliptical reflector, wherein light irradiated from the light sources is substantially concentrated onto the surface of the workpiece at the co-located focus.

Abstract translation: 用于UV固化诸如光纤的工件上的涂层或印刷油墨的装置包括布置成具有共同定焦点的双椭圆形反射器。 工件在同一焦点处居中，使得双椭圆形反射器设置在工件的相对侧上。 两个单独的光源被定位在每个椭圆形反射器的第二焦点处，其中从光源照射的光在共同定位的焦点处基本集中在工件的表面上。

公开(公告)号：WO2013014182A1

公开(公告)日：2013-01-31

申请号：PCT/EP2012/064594

申请日：2012-07-25

Applicant: CARL ZEISS SMT GMBH ,  DIER, Oliver

Inventor： DIER, Oliver

IPC: G03F7/20 ,  G21K1/06 ,  G02B5/08

CPC classification number: G03F7/70958 ,  B82Y10/00 ,  G02B5/0891 ,  G03F7/70091 ,  G03F7/70316 ,  G03F7/70891 ,  G21K1/062 ,  G21K2201/065

Abstract: A mirror has a substrate (112), which consists of a substrate material having a specific thermal conductivity of less than 10W/(m*K), and a reflection coating (116) applied on the substrate, said reflection coating having a reflective effect for vacuum ultraviolet radiation or radiation from the extreme ultraviolet range. A heat distribution intermediate layer (120, 220) is arranged between the substrate (112) and the reflection coating (116), said heat distribution intermediate layer consisting of a layer material having a specific thermal conductivity that is at least 10 times the magnitude of the specific thermal conductivity of the substrate material. The heat distribution intermediate layer has a layer thickness of at least 1 µm.

Abstract translation: 反射镜具有基板（112），其由具有小于10W /（m * K）的比热导率的基板材料和施加在基板上的反射涂层（116）组成，所述反射涂层具有反射效应 用于真空紫外线辐射或来自极紫外线范围的辐射。 热分布中间层（120,220）布置在基板（112）和反射涂层（116）之间，所述热分布中间层由具有比其导热系数的至少10倍的比热导率的层材料组成 衬底材料的比热导率。 热分布中间层的层厚度为1μm以上。

公开(公告)号：WO2012020020A1

公开(公告)日：2012-02-16

申请号：PCT/EP2011/063700

申请日：2011-08-09

Applicant: CARL ZEISS LASER OPTICS GMBH ,  ANDERL, Willi ,  KIEREY, Holger ,  BAUER, Markus ,  KUGLER, Jens

Inventor： ANDERL, Willi ,  KIEREY, Holger ,  BAUER, Markus ,  KUGLER, Jens

IPC: G02B5/08 ,  G02B7/18 ,  G03F7/20 ,  G21K1/06

CPC classification number: G02B5/0891 ,  G02B5/0808 ,  G02B5/1861 ,  G02B7/1815 ,  G03F7/70891 ,  G21K1/067 ,  G21K2201/065 ,  G21K2201/067

Abstract: An EUV collector mirror shell of an EUV collector for EUV lithography comprises a body (42) which has a light incidence-side front part (44), having a reflective optically active area (48), and a rear part (46), and which has a cavity (50) between the front part (44) and the rear part (46), the cavity (50) extending essentially along the entire optically active area (48), and the cavity (50) serving for receiving a cooling medium, the body (42) having, furthermore, at least one inlet (54) and at least one outlet (56) for the cooling medium. A plurality of flow-influencing elements (52) are arranged, distributed, in the cavity (50), which extend from the front part (44) to the rear part (46), connect the front part (44) to the rear part (46) and are formed in one piece with the front part (44) and with the rear part (46).

Abstract translation: 用于EUV光刻的EUV集电极的EUV收集器镜壳包括具有光入射侧前部（44），具有反射光学有效区（48）和后部（46）的主体（42），以及 其在前部（44）和后部（46）之间具有空腔（50），空腔（50）基本上沿整个光学有效区域（48）延伸，并且用于接收冷却 此外，主体（42）还具有用于冷却介质的至少一个入口（54）和至少一个出口（56）。 多个流量影响元件（52）分布在从前部（44）延伸到后部（46）的空腔（50）中，将前部（44）连接到后部 （46）并且与前部（44）和后部（46）成一体地形成。

公开(公告)号：WO2011113591A3

公开(公告)日：2011-12-01

申请号：PCT/EP2011001305

申请日：2011-03-16

Applicant: ETH ZUERICH ,  DIETERICH FRANZ ,  ABHARI REZA ,  GIOVANNINI ANDREA ,  AGA VIPLUV

Inventor： DIETERICH FRANZ ,  ABHARI REZA ,  GIOVANNINI ANDREA ,  AGA VIPLUV

IPC: G03F7/20 ,  G02B5/10 ,  G02B7/18

CPC classification number: G03F7/70891 ,  B82Y10/00 ,  G03F7/70175 ,  G21K1/06 ,  G21K2201/061 ,  G21K2201/065

Abstract: An optical collector (15) for collecting extreme ultraviolet radiation or EUV light generated at a central EUV production site comprises a reflective shell (25). To cope with the thermal loading of the collector and thereby avoid deformations, the reflective shell (25) preferably is mounted on and supported by a support structure (24), such that a cooling channel (29) is established between the back side of the reflective shell (25) and the support structure (24), the thickness of the reflective shell (25) is substantially reduced, such that the convective heat transfer between the back side of the reflective shell (25) and a cooling medium (26) flowing through the cooling channel (29) dominates the process of removing heat from the reflective shell (25) with respect to heat conduction, and a cooling circuit (33) is connected to the cooling channel (29) to supply a cooling medium (26) to the cooling channel (29) with a controlled coolant pressure and/or mass flow.

Abstract translation: 用于收集在中央EUV生产现场产生的极紫外辐射或EUV光的光学收集器（15）包括反射壳（25）。 为了应对集热器的热负荷并由此避免变形，反射壳体（25）优选地安装在支撑结构（24）上并由支撑结构（24）支撑，使得冷却通道（29）建立在支撑结构 （25）和所述支撑结构（24）之间的厚度，所述反射壳体（25）的厚度基本上减小，使得所述反射壳体（25）的背侧和冷却介质（26）之间的对流传热， 流过冷却通道29的过程支配着从反射壳25去除热量相对于热传导的过程，并且冷却回路33与冷却通道29连接以供应冷却介质26 ）以受控的冷却剂压力和/或质量流量流到冷却通道（29）。

公开(公告)号：WO2010051234A1

公开(公告)日：2010-05-06

申请号：PCT/US2009/061902

申请日：2009-10-23

Applicant: NIKON CORPORATION ,  PHILLIPS, Alton H.

Inventor： PHILLIPS, Alton H.

IPC: G02B5/08

CPC classification number: G02B7/1815 ,  G02B5/0891 ,  G03F7/70825 ,  G03F7/70891 ,  G21K1/06 ,  G21K2201/065

Abstract: Methods and apparatus for cooling mirrors in an extreme ultraviolet (EUV) lithography system using a liquid metal interface are described. According to one aspect of the present invention, an apparatus which may be used in an EUV lithography system includes a heat exchanger, a mirror assembly, and a first liquid metal interface. The heat exchanger including at least a first surface. The mirror assembly includes a first mirror block having a first mirrored surface, as well as at least a first well. Finally, the first liquid metal interface includes liquid metal which is contained in the first well. The first surface is in contact with the liquid metal such that heat may be transferred form the first mirror block to the heat exchanger.

Abstract translation: 描述了使用液态金属界面的极紫外（EUV）光刻系统中冷却反射镜的方法和装置。 根据本发明的一个方面，可以在EUV光刻系统中使用的装置包括热交换器，反射镜组件和第一液态金属界面。 所述热交换器至少包括第一表面。 镜组件包括具有第一镜面的第一镜块以及至少第一孔。 最后，第一液态金属界面包括容纳在第一井中的液态金属。 第一表面与液体金属接触，使得热量可以从第一镜块传递到热交换器。

公开(公告)号：WO2009095220A2

公开(公告)日：2009-08-06

申请号：PCT/EP2009/000539

申请日：2009-01-28

Applicant: MEDIA LARIO S.R.L. ,  WALLHEAD, Ian ,  ZOCCHI, Fabio

Inventor： WALLHEAD, Ian ,  ZOCCHI, Fabio

IPC: G03F7/20 ,  G21K1/06 ,  H05G2/00

CPC classification number: G03F7/70916 ,  B82Y10/00 ,  G03F7/70033 ,  G03F7/70166 ,  G21K1/062 ,  G21K1/067 ,  G21K2201/061 ,  G21K2201/064 ,  G21K2201/065 ,  G21K2201/067 ,  H05G2/003

Abstract: A collector optical system for extreme ultraviolet (EUV) or X-ray applications, including lithography and imaging, for example at 13 5 nm, comprising a grazing incidence collector in combination with a laser produced plasma (LPP) source In one embodiment, one or more further optical elements act upon one or more laser beams used to generate the EUV or X-ray plasma source, whereby said laser beam(s) ιmpact(s) on the fuel target from a side thereof on which an intermediate focus is disposed Also disclosed is a collector for EUV and X-ray applications, in which radiation from a laser produced plasma source is reflected by the collector to an intermediate focus, the line joining the source and intermediate focus defining an optical axis, a first direction on the optical axis being defined from the source to the intermediate focus, characterised by the collector comprising one or more grazing incidence mirrors, and by the collector comprising one or more further optical elements for redirecting a received laser beam so as to be incident upon the source (a) in a second direction, opposite to said first direction, or (b) at an acute angle to said second direction The further optical elements may comprise plane or spherical mirrors and/or lenses, for example disposed on the optical axis Also disclosed is a collector for application at about 13 5 nm with Laser Produced Plasma sources, the collector comprising between 5 and 16 concentrically aligned mirrors, and preferably between 6 and 12 mirrors, that operate at grazing incidence such that the maximum grazing angle between the incident radiation and the reflective surface of the mirrors is about 30°, and more preferably about 25°, in order to allow a maximum collection angle from the source of about 40° to about 85°, and preferably about 45° to about 75° Also disclosed is an EUV lithography system comprising a radiation source, for example a LPP source, the collector, an optical condenser, and a reflective mask

Abstract translation: 用于极紫外（EUV）或X射线应用的收集器光学系统，包括例如13 5nm的光刻和成像，包括与激光产生的等离子体（LPP）源组合的掠入射收集器。在一个实施例中，一个或 更多的光学元件作用于用于产生EUV或X射线等离子体源的一个或多个激光束，由此所述激光束从其上放置中间焦点的一侧在燃料靶上形成 还公开了一种用于EUV和X射线应用的收集器，其中来自激光器产生的等离子体源的辐射被集电器反射到中间焦点，连接源和中间焦点的线限定光轴，第一方向在 光轴从源极到中间焦点定义，其特征在于收集器包括一个或多个掠入射镜，并且由收集器包括一个或多个另外的用于重新发射的光学元件 接收的激光束以与所述第一方向相反的第二方向入射在源（a）上，或（b）与所述第二方向成锐角。另外的光学元件可以包括平面或球面镜， /或透镜，例如设置在光轴上。还公开了一种用于在约13 5nm处用激光产生的等离子体源施加的收集器，该收集器包括5至16个同心对准的反射镜，优选在6和12个反射镜之间，其操作 在掠射入射处，使得入射辐射与反射镜的反射表面之间的最大掠射角为约30°，更优选为约25°，以便允许来自约40°至约85°的源的最大收集角 °，优选约45°至约75°。还公开了一种EUV光刻系统，其包括辐射源，例如LPP源，收集器，光学冷凝器和反射掩模

公开(公告)号：WO2005091879A2

公开(公告)日：2005-10-06

申请号：PCT/US2005005935

申请日：2005-02-24

Applicant: CYMER INC ,  PARTLO WILLIAM N ,  BOWERING NORBERT R ,  ERSHOV ALEXANDER I ,  FOMENKOV IGOR V ,  OLIVER I ROGER ,  VIATELLA JOHN ,  JACQUES ROBERT N

Inventor： PARTLO WILLIAM N ,  BOWERING NORBERT R ,  ERSHOV ALEXANDER I ,  FOMENKOV IGOR V ,  OLIVER I ROGER ,  VIATELLA JOHN ,  JACQUES ROBERT N

IPC: G03F7/20 ,  G21K1/06 ,  H01J35/20 ,  H05G2/00

CPC classification number: G03F7/70033 ,  B82Y10/00 ,  G03F7/70175 ,  G03F7/70916 ,  G21K1/062 ,  G21K2201/061 ,  G21K2201/065 ,  G21K2201/067 ,  H05G2/003 ,  H05G2/005 ,  H05G2/006 ,  H05G2/008

Abstract: An apparatus and method for EUV light production is disclosed which may comprise a laser produced plasma ("LPP") extreme ultraviolet ("EUV") light source control system comprising a target delivery system adapted to deliver moving plasma initiation targets and an EUV light collection optic having a focus defining a desired plasma initiation site, comprising: a target tracking and feedback system comprising: at least one imaging device providing as an output an image of a target stream track, wherein the target stream track results from the imaging speed of the camera being too slow to image individual plasma formation targets forming the target stream imaged as the target stream track; a stream track error detector detecting an error in the position of the target stream track in at least one axis generally perpendicular to the target stream track from a desired stream track intersecting the desired plasma initiation site. At least one target crossing detector may be aimed at the target track and detecting the passage of a plasma formation target through a selected point in the target track. A drive laser triggering mechanism utilizing an output of the target crossing detector to determine the timing of a drive laser trigger in order for a drive laser output pulse to intersect the plasma initiation target at a selected plasma initiation site along the target track at generally its closest approach to the desired plasma initiation site. A plasma initiation detector may be aimed at the target track and detecting the location along the target track of a plasma initiation site for a respective target. An intermediate focus illuminator may illuminate an aperture formed at the intermediate focus to image the aperture in the at least one imaging device. The at least one imaging device may be at least two imaging devices each providing an error signal related to the separation of the target track from the vertical centerline axis of the image of the intermediate focus based upon an analysis of the image in the respective one of the at least two imaging devices. A target delivery feedback and control system may comprise a target delivery unit; a target delivery displacement control mechanism displacing the target delivery mechanism at least in an axis corresponding to a first displacement error signal derived from the analysis of the image in the first imaging device and at least in an axis corresponding to a second displacement error signal derived from the analysis of the image in the second imaging device.

Abstract translation: 公开了一种用于EUV光产生的装置和方法，其可以包括激光产生的等离子体（“LPP”）极紫外（“EUV”）光源控制系统，其包括适于递送移动等离子体引发靶的目标传送系统和EUV光收集 光学元件具有限定期望的等离子体起始位置的焦点，包括：目标跟踪和反馈系统，包括：至少一个成像装置，其提供目标流轨迹的图像作为输出，其中，所述目标流轨迹来自所述目标流轨迹的成像速度 摄像机太慢，不能成像形成被作为目标流轨迹成像的目标流的各个等离子体形成目标; 流轨迹误差检测器，从与期望的等离子体起始位置相交的期望的流轨道检测在大致垂直于目标流轨迹的至少一个轴上的目标流轨迹位置的误差。 至少一个目标交叉检测器可以瞄准目标轨道并且检测等离子体形成目标通过目标轨道中的选定点的通过。 驱动激光触发机构利用目标交叉检测器的输出来确定驱动激光触发的定时，以便驱动激光输出脉冲在等离子体引发目标处沿着目标轨道在一般最接近的等离子体起始位置处相交 接近所需的等离子体引发位点。 等离子体起始检测器可以瞄准目标轨道并且检测针对相应目标的等离子体起始位置沿着目标轨迹的位置。 中间焦点照明器可以照亮形成在中间焦点处的孔，以对至少一个成像装置中的孔进行成像。 所述至少一个成像装置可以是至少两个成像装置，每个成像装置基于对所述中间焦点的图像的图像的分析，提供与所述目标轨道与所述中间焦点的图像的垂直中心线轴线分离相关的误差信号 所述至少两个成像装置。 目标传送反馈和控制系统可以包括目标传送单元; 目标传送位移控制机构至少在对应于从第一成像装置中的图像的分析导出的第一位移误差信号的轴上移动目标传送机构，并且至少在与由第二位移误差信号 对第二成像装置中的图像进行分析。

公开(公告)号：WO2005047980A2

公开(公告)日：2005-05-26

申请号：PCT/US2004/037393

申请日：2004-11-10

Applicant: UNIVERSITY OF CENTRAL FLORIDA RESEARCH FOUNDATION ,  ARENBERG, Jonathan, W. ,  HASSELL, Frank, R.

Inventor： ARENBERG, Jonathan, W. ,  HASSELL, Frank, R.

IPC: G03F7/20

CPC classification number: G03F7/70891 ,  B82Y10/00 ,  F24S23/71 ,  F28F3/12 ,  G03F7/70033 ,  G03F7/70175 ,  G21K1/06 ,  G21K2201/065

Abstract: A collector optic assembly (40) for an EUV radiation source (10). The collector optic assembly (40) includes an elleptical meniscus (42) having a reflective Si/Mo coating (44) for collecting and reflecting EUV radiation (32) generated by the source (10). The meniscus (42) is machined from a single piece of silicon. The collector optic assembly (40) further includes a heat exchanger (48) that includes cooling channels (62) through which flows a liquid coolant. The heat exchanger (48) is fabricated from a plurality of machined silicon sections fused together by a glass frit bonding process. The meniscus (42) is fused to a front side of the heat exchanger (48) by a glass frit bonding process. A liquid coolant inlet manifold (70) and a liquid coolant outlet manifold (86) are also each machined from a single silicon block and are mounted to a back side of the heat exchanger (48).

Abstract translation: 一种用于EUV辐射源（10）的收集器光学组件（40）。 收集器光学组件（40）包括具有用于收集和反射由源（10）产生的EUV辐射（32）的反射Si / Mo涂层（44）的光学弯月面（42）。 弯液面（42）由单片硅加工而成。 收集器光学组件（40）还包括热交换器（48），其包括冷却通道（62），液体冷却剂通过该通道流动。 热交换器（48）由通过玻璃料接合工艺熔合在一起的多个加工的硅部分制成。 弯液面（42）通过玻璃料接合工艺熔合到热交换器（48）的前侧。 液体冷却剂入口歧管（70）和液体冷却剂出口歧管（86）也分别从单个硅块加工而成，并安装在热交换器（48）的后侧。

公开(公告)号：WO2005040925A1

公开(公告)日：2005-05-06

申请号：PCT/EP2003/010761

申请日：2003-09-27

Applicant: CARL ZEISS SMT AG ,  DINGER, Udo ,  EISERT, Frank ,  KOEHLER, Stefan ,  OCHSE, Andreas ,  ZELLNER, Johannes ,  LOWISCH, Martin ,  LAUFER, Timo

Inventor： DINGER, Udo ,  EISERT, Frank ,  KOEHLER, Stefan ,  OCHSE, Andreas ,  ZELLNER, Johannes ,  LOWISCH, Martin ,  LAUFER, Timo

IPC: G03F7/20

CPC classification number: G03F7/70958 ,  B82Y10/00 ,  G02B1/00 ,  G02B5/0891 ,  G02B7/181 ,  G03F7/70891 ,  G21K1/062 ,  G21K2201/065

Abstract: Ein Projektionsobjektiv (1) für kurze Wellenlängen, insbesondere für Wellenlängen λ

Abstract translation: 投影透镜（1），用于短的波长，特别是对于波长的λ<具有多个反射镜（M1，M2，M3，M4，M5和M6），其位于精确地定位于光轴（5）的157纳米，提供。 反射镜（M1，M2，M3，M4，M5和M6）包括多层涂层。 至少两种不同的反射镜的材料作为温度的在过零的热膨胀系数的范围内的功能，特别是在尺寸的符号，不同之处设置系数的热膨胀的斜率。

公开(公告)号：JP5989011B2

公开(公告)日：2016-09-07

申请号：JP2013558405

申请日：2012-03-13

Applicant: カール ツァイス レーザー オプティックス ゲゼルシャフト ミット ベシュレンクテル ハフツング ,  カール・ツァイス・エスエムティー・ゲーエムベーハー

Inventor： キーレイ ホルガー ,  ジークマン ハイコ ,  ブレザン アンドレ

IPC: G02B5/08 ,  G02B5/18 ,  G03F7/20

CPC classification number: G02B5/208 ,  B24B13/00 ,  G02B1/10 ,  G02B5/0891 ,  G02B5/10 ,  G02B5/1838 ,  G02B5/1852 ,  G02B5/1857 ,  G03F7/70316 ,  G21K2201/064 ,  G21K2201/065 ,  G21K2201/067