182.
    发明专利
    未知

    公开(公告)号:DE3576096D1

    公开(公告)日:1990-03-29

    申请号:DE3576096

    申请日:1985-11-13

    Applicant: PHILIPS NV

    Abstract: A device for recording or displaying images or for electron lithographic or electron microscopic uses, comprising in an evacuated envelope (1) a target (7) on which at least one electron beam (6) is focussed. This beam is generated by means of a semiconductor device (10) which comprises an electrically insulating layer (42) having an aperture (38) through which passes the beam. The said carries at least four beam-forming electrodes (43 up to and including 50) which are situated at regular intervals around the aperture (38), each of which electrodes has such a potential that an n-pole field or a combination of n-pole fields is generated in which n is an even integer greater than or equal to 4 and smaller than or equal to 16. A suitable choice of the n-pole field will make it possible to impart substantially any desired shape to the beam (6) and thus the focus on the target.

    Electrostatic quadrupole lens system for focusing particle beams in a vacuum tube

    公开(公告)号:DE3734620C1

    公开(公告)日:1988-12-22

    申请号:DE3734620

    申请日:1987-10-13

    Inventor: MUELLER ROLF DR

    Abstract: An electrostatic quadrupole lens system for focusing particle beams in a vacuum tube, in which for the high voltage inside the vacuum tube 6 four rods 1 and 1' which are placed symmetrically with respect to each other are continuously arranged and are conductively interconnected at defined spacings by metal rings 2. To the cage thus formed, the high voltage is applied from outside the vacuum tube via a connecting cross-piece 6 by means of a contact spring or the like. The cage formed is mechanically supported by means of insulators 4 only on the electrodes 5 which have the other polarity, these electrodes 5 having the other polarity, in general earth potential. The entire system of rods 1, rings 2, insulators 4, electrodes 3 and 5 is both electrically and mechanically asymmetric in terms of the two transversal spatial directions.

    188.
    发明专利
    未知

    公开(公告)号:FR2522440A1

    公开(公告)日:1983-09-02

    申请号:FR8303173

    申请日:1983-02-25

    Applicant: SONY CORP

    Abstract: An electron gun of uni-potential type is disclosed, which includes a main electron lens system consisting of a front electron lens system formed of a third grid and a fourth grid and a rear electron lens system formed of the fourth grid and a fifth grid of which the electron lens action regions are separated from each other. In this case, the electron lens diameter of the front electron lens system is selected smaller than that of the rear electron lens system, and the aperture diameter of the fifth grid in the rear electron lens system is selected larger than that of the fourth grid, and may be nearly as large as the inner diameter of the tube in which it is placed for use.

    MICRO LENS ARRAY AND MICRO DEFLECTOR ASSEMBLY FOR FLY'S EYE ELECTRON BEAM TUBES

    公开(公告)号:GB2035680B

    公开(公告)日:1982-12-08

    申请号:GB7936795

    申请日:1979-10-23

    Abstract: A combined fine focusing micro lens array and micro deflector assembly for use in electron beam tubes of the fly's eye type is provided. The assembly comprises a fine focusing micro lens array sub-assembly formed from a plurality of spaced-apart stacked parallel thin planar apertured silicon semiconductor lens plates each having an array of micro lens aperture openings. The lens plates each have highly conductive surfaces and are secured to glass rods for holding the plates in stacked parallel spaced-apart relationship with the apertures axially aligned in parallel. A micro deflector assembly is adjacent to the micro lens array sub-assembly. A micro deflector element axially aligned with each respective fine focusing lens element serves for deflecting an electron beam passing through along orthogonal x-y directional axes of movement normal to the electron beam path. The deflector elements are comprised by two orthogonally arrayed sets of parallel spaced-apart deflector bars with alternate bars of each set of deflector bars being interconnected electrically for common connection to a respective source of fine x-y deflection potential. The thin planar apertured silicon lens plates comprising the micro lens array are held together in stacked parallel assembled relationship by spaced-apart glass support rods whose longitudinal axes extend at right angles to the plates and to which the planar silicon lens plates are secured at their periphery. The two orthogonally arrayed sets of parallel spaced-apart deflection bars forming the sets of micro-deflector elements likewise preferably comprise parallel plates or bars of polycrystalline silicon having a highly conductive metalized surface. The micro deflector bars likewise are held in assembled spaced-apart parallel relationship by respective sets of spaced-apart parallel supporting glass rods whose longitudinal axes extend in a plane parallel to the plane of the deflector bars but at right angles thereto and to which the ends of the deflector bars are thermally bonded. The fine focusing micro lens array and micro deflector sub-assembly thus comprised, are secured together in assembled relation by additional glass support rods being disposed about the outer peripheries of the micro lens and micro deflector sub-assemblies and being secured thereto by thermal bonding such as by fusion.

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