Abstract:
A high performance semiconductor device that can realize surface protection and surface inactivation and is fabricated using a film formation method and technique that enable improvement of high frequency characteristics, and an electronic device for a communication system including the semiconductor device, are provided. The semiconductor device is characterized in that a film having boron, carbon, and nitrogen as main components and to which sulfur is added serves as a surface protection film, and at least part of a surface is covered.
Abstract:
PROBLEM TO BE SOLVED: To provide a vaporizer for MOCVD, which can obtain a vaporized gas in which a material solution is uniformly dispersed, and to provide a method for vaporizing the material solution. SOLUTION: The vaporizer has: (1) a dispersion part 8 having a gas introducing port 4 for introducing a pressurized carrier gas 3 to a gas passage, a means for supplying a material solution 5a to the gas passage, and a gas exit 7 for sending the carrier gas containing the material solution to a vaporization part 22; (2) a vaporization part 22 including a vaporization tube 20, one end of which is connected to a reaction tube of an MOCVD system and the other end of which is connected to the gas exit 7, and a heating means for heating the vaporization tube 20, and for heating and vaporizing the carrier gas containing the material solution sent from the distribution part 8; and (3) the distribution part 8 having a main body 1 of the dispersion part having a cylindrical hollow part, a rod 10 having an outer diameter smaller than an inner diameter of the cylindrical hollow part, and a spiral groove 60 on the side of the vaporization part 22 in the periphery of the rod 10, wherein the rod 10 is inserted into the cylindrical hollow part. COPYRIGHT: (C)2009,JPO&INPIT
Abstract:
PROBLEM TO BE SOLVED: To provide a workpiece processor capable of holding a plurality of workpieces on the same axis under the state separating the workpieces in the vertical direction having little restrictions such as a mounting space orthogonal to the carrying direction (the horizontal direction) and capable of processing a large number of the workpieces at the same time. SOLUTION: The workpiece processor has a workpiece processing section 10 interiorly housing a lot 13 vertically supporting multiple workpieces W under a separated state and processing the workpieces under the multiple supporting state, a workpiece introducing section 20 connected to the upper or lower section of the workpiece processing section 10 and a workpieces discharging section 30 connected to the lower or upper section of the workpiece processing section 10. Shutter members 23 and 33 interrupting communication with the atmospheric side are fitted to an introducing port 22 and a discharge opening 32 formed to the workpiece introducing section 20 and the workpiece discharging section 30. COPYRIGHT: (C)2009,JPO&INPIT
Abstract:
PROBLEM TO BE SOLVED: To provide an electrostatic charge neutralization device for a floating carrying device capable of completely neutralizing electrostatic charge of a plate-like base body, when the plate-like base body is electrostatically charged by gas striking on the plate-like base body, when making the plate-like base body move, stop, stand still and directionally change in a floated state, by putting the plate-like base body in a floating state by jetting of the gas to the plate-like base body, and a floating carrying system. SOLUTION: This electrostatic charge neutralization device for the floating carrying device is arranged in the floating carrying device for carrying the plate-like base body in a floated state by the gas jetting from a plurality of jetting holes 11 bored in a carrying surface 1A, and is provided with a groove part (a first storage part 31A, a quartz plate 31B and a second storage part 31C) arranged on the carrying surface 1A, and an electrostatic charge neutralization part (a UV lamp 32 and a control part 33) arranged in this groove part and outputting an electromagnetic wave for ionizing the gas toward a carrying space on the carrying surface 1A from the groove part. COPYRIGHT: (C)2008,JPO&INPIT