Carbon materials
    11.
    发明专利

    公开(公告)号:GB201815535D0

    公开(公告)日:2018-11-07

    申请号:GB201815535

    申请日:2018-09-24

    Applicant: PLASMA APP LTD

    Abstract: There is described a carbon material comprising sp2 and sp3 hybridised carbon. Also described is a method of making a carbon material the method comprising: exposing a substrate to a flux of at least 1011 carbon ions per cm2 of substrate per 1 ms, a majority of the carbon ions having a kinetic energy of at least 10 eV. Further, electrodes comprising the carbon material are described. The electrodes may operate as an anode in Li ion battery characterised with improved specific capacity and operation life-time.

    Carbon materials
    13.
    发明专利

    公开(公告)号:GB2585621A

    公开(公告)日:2021-01-20

    申请号:GB201815535

    申请日:2018-09-24

    Applicant: PLASMA APP LTD

    Abstract: A carbon material comprises sp2 and sp3 hybridised carbon, especially for use in an electrochemical cell, e.g. as an electrode material. An electrode comprising the carbon material is also described, the electrode preferably operating as an anode in a Li-ion battery. Preferably, the carbon material comprises at least 25 wt% sp2-type carbon and at least 2 wt% sp3-type carbon, and the carbon material has a hierarchical pore morphology. The carbon material may comprise nanocrystals, and areas of regularly arranged layers of carbon embedded in amorphous carbon. The carbon material may be doped, e.g. with 0.1 to 30 wt% of one or more dopants selected from Si, P, Fe, Cu, Li, Al, N, O, S, B, Ti, Co, Ni, Na and/or K. In a further aspect, a method of making a carbon material comprises exposing a substrate to a flux of at least 1011 carbon ions per cm2 of substrate per 1 ms, a majority of the carbon ions having a kinetic energy of at least 10 eV. The flux may be pulsed and provided by a virtual cathode deposition (VCD) process. The process may utilise a hollow cathode 101, within which a plasma is supplied, a substrate 125 and a carbon target 117.

    Virtual cathode deposition (VCD) for thin film manufacturing

    公开(公告)号:GB2528141B

    公开(公告)日:2016-10-05

    申请号:GB201416497

    申请日:2014-09-18

    Applicant: PLASMA APP LTD

    Inventor: DMITRY YARMOLICH

    Abstract: A virtual cathode deposition apparatus utilises virtual plasma cathode for generation of high density electron beam to ablate a solid target. A high voltage electrical pulse ionizes gas to produce a plasma which temporarily appears in front of the target and serves as the virtual plasma cathode at the vicinity of target. This plasma then disappears allowing the ablated target material in a form of a plasma plume to propagate toward the substrate. Several virtual cathodes operating in parallel provide plumes that merge into a uniform plasma which when condensing on a nearby substrate leads to wide area deposition of a uniform thickness thin film.

    Virtual cathode deposition (VCD) for thin film manufacturing

    公开(公告)号:GB2528141A

    公开(公告)日:2016-01-13

    申请号:GB201416497

    申请日:2014-09-18

    Applicant: PLASMA APP LTD

    Inventor: YARMOLICH DMITRY

    Abstract: A virtual cathode deposition apparatus 1 utilises a virtual plasma cathode to generate a high density electron beam to ablate a solid target 115. A hollow cathode 101 is situated between a substrate holder and a target holder 117. Plasma is supplied on the side of the target 115 to be ablated. A high voltage pulse is applied to the hollow cathode 101, in such a way that when plasma is supplied to the hollow cathode 101, a virtual cathode (vircator) is formed, which generates an electron beam, which hits the target 115 comprising deposition material, which material is ablated and a plume of said material passes through the hollow cathode 101, to form a thin layer on the substrate 125. Plasma may be supplied by a hollow cap electrode 105 and gas supply 123, the gas being provided through a slit 129 in the gas chamber 127.

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