Variable impedance circuit controlled by the ferroelectric capacitor

    公开(公告)号:JP2013530482A

    公开(公告)日:2013-07-25

    申请号:JP2013514146

    申请日:2010-06-11

    CPC classification number: G11C11/22 G11C11/221

    Abstract: 強誘電体キャパシタ、可変インピーダンス素子および導電性負荷を含むメモリセルが開示される。 第1および第2の分極状態を特徴とする強誘電体キャパシタは、制御端子と第1のスイッチ端子との間に接続される。 可変インピーダンス素子は、制御端子上の信号によって決定される、第1および第2のスイッチ端子間のインピーダンスを有する。 導電性負荷は、第1の電力端子と第1のスイッチ端子との間に接続される。 第2のスイッチ端子は、第2の電力端子に接続される。 電位差が、第1および第2の電力端子間に印加された場合に、第1のスイッチ端子上の電位は、強誘電体キャパシタの分極状態によって決定された方法で変化する。
    【選択図】図1

    向上した温度範囲を有するアナログ強誘電体メモリ

    公开(公告)号:JP2019531570A

    公开(公告)日:2019-10-31

    申请号:JP2019510821

    申请日:2017-08-28

    Abstract: 強誘電体メモリおよび強誘電体メモリを動作させる方法が開示される。強誘電体メモリは、最大残留電荷Q max によって特徴付けられる強誘電体キャパシタを有する強誘電体メモリセルを含む。書き込み回路は、強誘電体キャパシタに保存するための3つ以上の状態を有するデータ値を受信する。書き込み回路は、強誘電体キャパシタのQ max を測定し、強誘電体キャパシタに保存される、測定されたQ max の分数である電荷を決定し、分数は、データ値によって決定される。書き込み回路は、Q max の分数倍に等しい電荷を強誘電体キャパシタに保存させる。読み出し回路は、強誘電体キャパシタに保存された電荷を測定し、強誘電体キャパシタのQ max を測定し、かつ測定された電荷および測定されたQ max からデータ値を決定することにより、強誘電体キャパシタに保存された値を決定する。 【選択図】図4

    CMOS Analog Memories Utilizing Ferroelectric Capacitors
    14.
    发明申请
    CMOS Analog Memories Utilizing Ferroelectric Capacitors 审中-公开
    使用铁电电容的CMOS模拟记忆体

    公开(公告)号:US20170011789A1

    公开(公告)日:2017-01-12

    申请号:US15271145

    申请日:2016-09-20

    Abstract: A memory cell and memories constructed from that memory cell are disclosed. A memory according to the present invention includes a ferroelectric capacitor, a charge source and a read circuit. The charge source receives a data value to be stored in the ferroelectric capacitor. The charge source converts the data value to a remanent charge to be stored in the ferroelectric capacitor and causes that remanent charge to be stored in the ferroelectric capacitor. The read circuit determines a charge stored in the ferroelectric capacitor. The data value has more than three distinct possible states, and the determined charge has more than three determined values. The memory also includes a reset circuit that causes the ferroelectric capacitor to enter a predetermined known reference state of polarization.

    Abstract translation: 公开了一种存储单元和由该存储单元构成的存储器。 根据本发明的存储器包括铁电电容器,电荷源和读取电路。 电荷源接收要存储在铁电电容器中的数据值。 电荷源将数据值转换为存储在铁电电容器中的剩余电荷,并使残留电荷存储在铁电体电容器中。 读取电路确定存储在铁电体电容器中的电荷。 数据值具有三个不同的可能状态,并且所确定的电荷具有多于三个确定的值。 存储器还包括使铁电电容器进入预定的已知参考偏振状态的复位电路。

    CMOS Analog Memories Utilizing Ferroelectric Capacitors
    15.
    发明申请
    CMOS Analog Memories Utilizing Ferroelectric Capacitors 有权
    使用铁电电容的CMOS模拟记忆体

    公开(公告)号:US20150016175A1

    公开(公告)日:2015-01-15

    申请号:US14498911

    申请日:2014-09-26

    Abstract: A memory cell and memories constructed from that memory cell are disclosed. A memory according to the present invention includes a ferroelectric capacitor, a charge source and a read circuit. The charge source receives a data value to be stored in the ferroelectric capacitor. The charge source converts the data value to a remanent charge to be stored in the ferroelectric capacitor and causes that remanent charge to be stored in the ferroelectric capacitor. The read circuit determines a charge stored in the ferroelectric capacitor. The data value has more than three distinct possible states, and the determined charge has more than three determined values. The memory also includes a reset circuit that causes the ferroelectric capacitor to enter a predetermined known reference state of polarization.

    Abstract translation: 公开了一种存储单元和由该存储单元构成的存储器。 根据本发明的存储器包括铁电电容器,电荷源和读取电路。 电荷源接收要存储在铁电电容器中的数据值。 电荷源将数据值转换为存储在铁电电容器中的剩余电荷,并使残留电荷存储在铁电体电容器中。 读取电路确定存储在铁电体电容器中的电荷。 数据值具有三个不同的可能状态,并且所确定的电荷具有多于三个确定的值。 存储器还包括使铁电电容器进入预定的已知参考偏振状态的复位电路。

    VARIABLE IMPEDANCE CIRCUIT CONTROLLED BY A FERROELECTRIC CAPACITOR
    16.
    发明申请
    VARIABLE IMPEDANCE CIRCUIT CONTROLLED BY A FERROELECTRIC CAPACITOR 审中-公开
    由电磁电容器控制的可变阻抗电路

    公开(公告)号:WO2011155951A1

    公开(公告)日:2011-12-15

    申请号:PCT/US2010/038433

    申请日:2010-06-11

    CPC classification number: G11C11/22 G11C11/221

    Abstract: A memory cell comprising a ferroelectric capacitor, a variable impedance element and a conductive load is disclosed. The ferroelectric capacitor, characterized by first and second polarization states, is connected between a control terminal and a first switch terminal. The variable impedance element has an impedance between the first and second switch terminals that is determined by a signal on a control terminal. The conductive load is connected between a first power terminal and the first switch terminal. The second switch terminal is connected to a second power terminal. When a potential difference is applied between the first and second power terminals, a potential on the first switch terminal varies in a manner determined by the state of polarization of the ferroelectric capacitor.

    Abstract translation: 公开了一种包括铁电电容器,可变阻抗元件和导电负载的存储单元。 特征在于第一和第二极化状态的铁电电容器连接在控制端子和第一开关端子之间。 可变阻抗元件具有由控制端子上的信号确定的第一和第二开关端子之间的阻抗。 导电负载连接在第一电源端子和第一开关端子之间。 第二开关端子连接到第二电源端子。 当在第一和第二电源端子之间施加电位差时,第一开关端子上的电位以由铁电体电容器的极化状态确定的方式变化。

    METHOD FOR CONSTRUCTING FERROELECTRIC CAPACITOR-LIKE STRUCTURES ON SILICON DIOXIDE SURFACES
    18.
    发明申请
    METHOD FOR CONSTRUCTING FERROELECTRIC CAPACITOR-LIKE STRUCTURES ON SILICON DIOXIDE SURFACES 审中-公开
    在二氧化硅表面上构造电解电容器结构的方法

    公开(公告)号:WO1997035339A1

    公开(公告)日:1997-09-25

    申请号:PCT/US1997001880

    申请日:1997-02-06

    CPC classification number: H01L27/11502 H01L28/55 Y10S148/014

    Abstract: A method for fabricating an integrated circuit having at least one integrated circuit component (14) fabricated in a silicon substrate (12) and a second device (30) that is to be fabricated on a silicon oxide layer (16) that covers the integrated circuit component (14). The integrated circuit component (14) has a terminal that is to be connected to a corresponding terminal on the second device (30). The second device (30) includes an electrode structure (35) in contact with a dielectric component that includes a layer (33) of ferroelectric material. In the method of the present invention, a boundary layer comprising non-conducting polysilicon (17) is deposited over the silicon oxide layer (16). The electrode structure (35) is then fabricated by depositing one or more layers over the boundary layer (17). The ferroelectric layer (33) is then deposited over the electrode structure (35) and etched to provide the dielectric component. The boundary layer is then removed utilizing an etchant that etches silicon oxide much slower than polysilicon.

    HIGH-TEMPERATURE ELECTRICAL CONTACT FOR MAKING CONTACT TO CERAMIC MATERIALS AND IMPROVED CIRCUIT ELEMENT USING THE SAME
    19.
    发明申请
    HIGH-TEMPERATURE ELECTRICAL CONTACT FOR MAKING CONTACT TO CERAMIC MATERIALS AND IMPROVED CIRCUIT ELEMENT USING THE SAME 审中-公开
    用于制造与陶瓷材料接触的高温电气接点和改进的电路元件

    公开(公告)号:WO1995008187A1

    公开(公告)日:1995-03-23

    申请号:PCT/US1994008681

    申请日:1994-07-28

    Abstract: A method for connecting a silicon substrate to an electrical component via a platinum conductor. A capacitor (40) can be built over the source (34) of a transistor (32). Cell (30) is constructed by first constructing a CMOS transistor (32) having a drain (33), gate region consisting of gate oxide (35) and gate electrode (36), and source (34). The gate structures are insulated with a glass layer (37). A capacitor (40) is then constructed by depositing a bottom electrode (42) on source (34). A ceramic layer (43) is then deposited and sintered. Finally, the top electrode (41) is deposited. The resulting structure may be heated in the presence of oxygen to a temperature in excess of 800 DEG C without destroying the electrical connection between the silicon substrate and components connected to the platinum conductor. The present invention utilizes a TiN or TiW buffer layer to connect the platinum conductor to the silicon substrate. The buffer layer is deposited as a single crystal on the silicon substrate. The platinum layer is then deposited on the buffer layer. The region of the platinum layer in contact with the buffer layer is also a single crystal.

    Abstract translation: 一种通过铂导体将硅衬底连接到电气部件的方法。 可以在晶体管(32)的源极(34)上构建电容器(40)。 通过首先构造具有漏极(33),由栅极氧化物(35)和栅极电极(36)构成的栅极区域以及源极(34)的CMOS晶体管(32)构成单元(30)。 栅极结构与玻璃层(37)绝缘。 然后通过在源极(34)上沉积底部电极(42)来构造电容器(40)。 然后沉积陶瓷层(43)并烧结。 最后,沉积顶部电极(41)。 所得到的结构可以在氧的存在下加热到超过800℃的温度,而不会破坏硅衬底和连接到铂导体的组件之间的电连接。 本发明利用TiN或TiW缓冲层将铂导体连接到硅衬底。 缓冲层作为单晶沉积在硅衬底上。 然后将铂层沉积在缓冲层上。 与缓冲层接触的铂层的区域也是单晶。

    Ferroelectric based memory devices utilizing hydrogen barriers and getters

    公开(公告)号:AU4037300A

    公开(公告)日:2000-10-16

    申请号:AU4037300

    申请日:2000-03-27

    Abstract: A ferroelectric memory cell for storing information. The information is stored in the remnant polarization of a ferroelectric dielectric layer by setting the direction of the remnant polarization. The ferroelectric memory cell is designed to store the information at a temperature less than a first temperature. The memory cell includes top and bottom contacts that sandwich the dielectric layer which includes a ferroelectric material having a Curie point greater than the first temperature and less than 400 DEG C. The dielectric layer is encapsulated in an oxygen impermeable material such that the encapsulating layer prevents oxygen from entering or leaving the dielectric layer. The memory also includes a hydrogen barrier layer that inhibits the flow of oxygen to the top and bottom electrodes when the memory cell is placed in a gaseous environment containing hydrogen. In one embodiment of the invention, a hydrogen absorbing layer is included. In the preferred embodiment of the present invention, the hydrogen barrier layer is constructed from a material that will also bind hydrogen ions.

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