公开(公告)号：GB8506508D0

公开(公告)日：1985-04-17

申请号：GB8506508

申请日：1985-03-13

Applicant: RPC IND

IPC: B01J19/08 ,  C08F2/54 ,  G21K5/10

公开(公告)号：GB2203889B

公开(公告)日：1991-12-04

申请号：GB8806912

申请日：1988-03-23

Applicant: RPC IND

Inventor： FARRELL SHERMAN R ,  SMITH RICHARD R

IPC: H01J27/08 ,  H01J3/02 ,  H01J27/20 ,  H01J33/00 ,  H01J37/06 ,  H01J37/08

Abstract: An ion plasma electron gun for the generation of electron beams which exhibits electron beam dose uniformity and which is capable of varying the dose received by a material to be irradiated. Positive ions generated by a wire in a plasma discharge chamber are accelerated through an extraction grid onto a second chamber containing a high voltage cold cathode. These positive ions bombard a surface of the cathode, causing the cathode to emit secondary electrons which form an electron beam. After passing through the extraction grid in the plasma discharge chamber, the electron beam exits from the gun by way of a second grid and a foil window supported on the second grid. The gun is constructed so that the electron beam passing through the foil window has a relatively large area and uniform electron distribution which is subsantially the same as the ion distribution of the ion beam impinging upon the cathode. Means are provided for creating a pulse of secondary electrons by varying the period of time in which the secondary electrons are transmitted through the foil.

公开(公告)号：FR2615324A1

公开(公告)日：1988-11-18

申请号：FR8804080

申请日：1988-03-29

Applicant: RPC IND

Inventor： FARRELL SHERMAN R ,  SMITH RICHARD R

IPC: H01J27/08 ,  H01J3/02 ,  H01J27/20 ,  H01J33/00 ,  H01J37/06 ,  H01J37/08 ,  H01J1/32 ,  H01J7/44

Abstract: An ion plasma electron gun for the generation of electron beams which exhibits electron beam dose uniformity and which is capable of varying the dose received by a material to be irradiated. Positive ions generated by a wire in a plasma discharge chamber are accelerated through an extraction grid onto a second chamber containing a high voltage cold cathode. These positive ions bombard a surface of the cathode, causing the cathode to emit secondary electrons which form an electron beam. After passing through the extraction grid in the plasma discharge chamber, the electron beam exits from the gun by way of a second grid and a foil window supported on the second grid. The gun is constructed so that the electron beam passing through the foil window has a relatively large area and uniform electron distribution which is subsantially the same as the ion distribution of the ion beam impinging upon the cathode. Means are provided for creating a pulse of secondary electrons by varying the period of time in which the secondary electrons are transmitted through the foil.

公开(公告)号：FR2613533A1

公开(公告)日：1988-10-07

申请号：FR8804081

申请日：1988-03-29

Applicant: RPC IND

Inventor： WAKALOPULOS GEORGE ,  FARRELL SHERMAN R

IPC: H01J27/16 ,  H01J3/02 ,  H01J27/20 ,  H01J37/06 ,  H01J37/077 ,  H01J37/08 ,  H01S3/038 ,  H01S3/0959 ,  H01J1/32 ,  H01J33/00

Abstract: An ion plasma electron gun for the generation of large area electron beams with uniform electron distribution. Positive ions generated by a wire in a plasma discharge chamber are accelerated through an extraction grid into a second chamber containing a high voltage cold cathode. These positive ions bombard a surface of the cathode causing the cathode to emit secondary electrons which form an electron beam. After passage through an extraction grid and plasma discharge chamber, the electron beam exits from the gun by way of a second grid and a foil window supported on the second grid. The gun is constructed so that the electron beam passing through the foil window has a relatively large area and uniform electron distribution which is substantially the same as the ion distribution of the ion beam impinging upon the cathode. A target and comparison circuit are functionally connected to a current control power supply for the positive ion source which in combination are capable of maintaining the output of secondary electrons emitting from the foil window substantially constant.

公开(公告)号：DE3509484A1

公开(公告)日：1985-10-10

申请号：DE3509484

申请日：1985-03-15

Applicant: RPC IND

Inventor： RAMMLER WARREN J ,  DAIGLE RICHARD G

IPC: B01J19/08 ,  C08F2/54 ,  G21K5/10 ,  G21K5/00 ,  B29C59/16 ,  B29C71/00 ,  B29C71/04

公开(公告)号：GB2142210A

公开(公告)日：1985-01-09

申请号：GB8405431

申请日：1984-03-01

Applicant: RPC IND

Inventor： FARRELL SHERMAN RICHARD

IPC: B29C35/00 ,  B05D3/06 ,  B29C35/08 ,  B29C35/10 ,  B29C71/00 ,  B29C71/04 ,  B29D1/00 ,  C08J7/00 ,  G11B5/842 ,  B01J19/08

Abstract: A method for curing the coating on a magnetic tape comprises passing the tape with the uncured coating through an electron beam by means of one or more temperature controlled rollers made of a medium to high atomic numbered material which rebounds a portion of the electron beam back through the tape to increase the total dosage. In one embodiment the uncured web (10) is continuously passed through an electron beam (16) provided by an electron source (18) by engagement of the web with the periphery of a rotating cylindrical drum (14). The latter is formed of copper or equivalent metal so that a proportion of the electrons of the electron beam which pass through the web rebound and pass back through the web again.The temperature of the drum is controlled by admitting water to the inside surface of the drum. Meams (50-58) are provided for controlling the temperature of the drum. Preferably the temperature of the cooling water is measured after it has contact the drum and hot or cold water is admixed with the cooling water, dependent upon what adjustment is found necessary. In a second embodiment the web follows a serpentine path through the beam of electrons by being passed successively over the peripheries of the rollers of two staggered arrays of roller (26-38). The rollers are hollow, preferably formed of copper, and cooling water is admitted to their interiors so as to control the temperature of the web during curing. As before, means (60-68) are provided for controlling the temperature of the rollers by adding hot or cold water to the cooling water.

公开(公告)号：DE3700775C2

公开(公告)日：1998-09-17

申请号：DE3700775

申请日：1987-01-13

Applicant: RPC IND

Inventor： WAKALOPULOS GEORGE

IPC: H05H1/46 ,  H01J3/02 ,  H01J33/00 ,  H01J37/073 ,  H01J37/077 ,  H01S3/038 ,  H01S3/0959 ,  H05H1/48 ,  H01J33/02 ,  H01J7/26

Abstract: An ion plasma electron gun for the generation of large area electron beams with uniform electron distribution. Positive ions generated by a wire in a plasma discharge chamber are accelerated through an extraction grid into a second chamber containing a high voltage cold cathode. These positive ions bombard a surface of the cathode causing the cathode to emit secondary electrons which form an electron beam. After passing through the extraction grid and the plasma discharge chamber, the electron beam exits from the gun by way of a second grid and a foil window supported on the second grid. The gun is constructed so that the electron beam passing through the foil window has a relatively large area and a uniform electron distribution which is substantially the same as the ion distribution of the ion beam impinging upon the cathode. Control of the generated electron beam is achieved by applying a control voltage between the wire and the grounded housing of the plasma chamber to control the density of positive ions bombarding the cathode.

公开(公告)号：DE3810294C2

公开(公告)日：1997-06-12

申请号：DE3810294

申请日：1988-03-25

Applicant: RPC IND

Inventor： WAKALOPULOS GEORGE ,  FARRELL SHERMAN R

IPC: H01J27/16 ,  H01J3/02 ,  H01J27/20 ,  H01J37/06 ,  H01J37/077 ,  H01J37/08 ,  H01S3/038 ,  H01S3/0959 ,  H01J33/00

Abstract: An ion plasma electron gun for the generation of large area electron beams with uniform electron distribution. Positive ions generated by a wire in a plasma discharge chamber are accelerated through an extraction grid into a second chamber containing a high voltage cold cathode. These positive ions bombard a surface of the cathode causing the cathode to emit secondary electrons which form an electron beam. After passage through an extraction grid and plasma discharge chamber, the electron beam exits from the gun by way of a second grid and a foil window supported on the second grid. The gun is constructed so that the electron beam passing through the foil window has a relatively large area and uniform electron distribution which is substantially the same as the ion distribution of the ion beam impinging upon the cathode. A target and comparison circuit are functionally connected to a current control power supply for the positive ion source which in combination are capable of maintaining the output of secondary electrons emitting from the foil window substantially constant.

公开(公告)号：FR2609840B1

公开(公告)日：1995-06-23

申请号：FR8700502

申请日：1987-01-19

Applicant: RPC IND

Inventor： WAKALOPULOS GEORGE

IPC: H05H1/46 ,  H01J3/02 ,  H01J33/00 ,  H01J37/073 ,  H01J37/077 ,  H01S3/038 ,  H01S3/0959 ,  H05H1/48 ,  H01J33/02 ,  H01S3/22

Abstract: An ion plasma electron gun for the generation of large area electron beams with uniform electron distribution. Positive ions generated by a wire in a plasma discharge chamber are accelerated through an extraction grid into a second chamber containing a high voltage cold cathode. These positive ions bombard a surface of the cathode causing the cathode to emit secondary electrons which form an electron beam. After passing through the extraction grid and the plasma discharge chamber, the electron beam exits from the gun by way of a second grid and a foil window supported on the second grid. The gun is constructed so that the electron beam passing through the foil window has a relatively large area and a uniform electron distribution which is substantially the same as the ion distribution of the ion beam impinging upon the cathode. Control of the generated electron beam is achieved by applying a control voltage between the wire and the grounded housing of the plasma chamber to control the density of positive ions bombarding the cathode.

公开(公告)号：SE457758B

公开(公告)日：1989-01-23

申请号：SE8700017

申请日：1987-01-02

Applicant: RPC IND

Inventor： WAKALOPULOS G

IPC: H05H1/46 ,  H01J3/02 ,  H01J33/00 ,  H01J37/073 ,  H01J37/077 ,  H01S3/038 ,  H01S3/0959 ,  H05H1/48 ,  H01J15/00

Abstract: An ion plasma electron gun for the generation of large area electron beams with uniform electron distribution. Positive ions generated by a wire in a plasma discharge chamber are accelerated through an extraction grid into a second chamber containing a high voltage cold cathode. These positive ions bombard a surface of the cathode causing the cathode to emit secondary electrons which form an electron beam. After passing through the extraction grid and the plasma discharge chamber, the electron beam exits from the gun by way of a second grid and a foil window supported on the second grid. The gun is constructed so that the electron beam passing through the foil window has a relatively large area and a uniform electron distribution which is substantially the same as the ion distribution of the ion beam impinging upon the cathode. Control of the generated electron beam is achieved by applying a control voltage between the wire and the grounded housing of the plasma chamber to control the density of positive ions bombarding the cathode.