Abstract:
The invention is directed to large LCD image masks having a final flatness of less than 40 nm and a method of making such LCD image masks by utilizing subaperture deterministic grinding/lapping /polishing. In one preferred embodiment the final flatness is
Abstract:
A glass wafer (100) having a first major surface (110), a second major surface (120) that is parallel to and opposite of the first major surface (110), a thickness between the first major surface (110) and the second major surface (120), and an annular edge portion (130) that extends from an outermost diameter of the glass wafer (100) toward the geometrical center of the glass wafer (100). The glass wafer (100) has a diameter from greater than or equal to 175 mm to less than or equal to 325 mm and a thickness of less than 0.350 mm. A width of the edge portion (130) is less than 10 mm.
Abstract:
A glass sheet having enhanced edge strength. The glass sheet is down-drawn and has at least one laser-formed edge having a minimum edge strength of at least about 90 MPa. The laser-formed edge is substantially free of a chamfer or a bevel. The glass sheet can be strengthened after formation of the edge and is adaptable for use as a cover plate for display and touch screen applications, or as a display or touch screen for information-related terminal (IT) devices; as well as in other applications.
Abstract:
An alkali aluminosilicate glass article, said alkali aluminosilicate glass having a surface compressive stress of at least about 200 MPa, a surface compressive layer having a depth of at least about 30 µm, a thickness of at least about 0.3 mm and an amphiphobic fluorine-based surface layer chemically bonded to the surface of the glass. In one embodiment the glass has an anti reflective coating applied to one surface of the glass between the chemically strengthened surface of the glass and the amphiphobic coating. In another embodiment the surface of the chemically strengthened glass is acid treated using a selected acid (e.g., HCL, H 2 SO 4 , HClO 4 , acetic acid and other acids as described) prior to placement of the amphiphobic coating or the anti reflective coating.
Abstract translation:一种碱性铝硅酸盐玻璃制品,所述碱性铝硅酸盐玻璃具有至少约200MPa的表面压缩应力,具有至少约30μm深度的表面压缩层,至少约0.3mm的厚度和两性氟基 化学键合到玻璃表面的表面层。 在一个实施方案中,玻璃具有在玻璃的化学强化表面和两性涂层之间施加到玻璃的一个表面的抗反射涂层。 在另一个实施方案中,在放置两性涂层或抗反射涂层之前,使用选定的酸(例如,HCL,H 2 SO 4,HClO 4,乙酸和其它酸)对化学强化玻璃的表面进行酸处理。
Abstract:
The invention is directed to a method for cleaning surfaces of optical elements made from metal fluoride single crystals of formula MF2, where M is calcium, barium, magnesium, or strontium, or mixtures of the foregoing, prior to coating the elements with films of protective materials. The method has at least the steps of: (a) immersing the optical element in at least one selected liquid and utilizing sonication at megasonic frequencies to remove particulates, polishing slurry residue and the damaged top layer of the optical element; (b) cleaning in a gas phase cleaning process whereby hydrocarbons are removed from the surface of the optical element using UV/ozone cleaning; and (c) exposing, in a gas phase process, of the optical element's surface to a low-energy plasma containing argon and oxygen in a vacuum environment.
Abstract:
A method of screen printing on 3D glass articles includes providing a 3D glass article having a first 3D surface with a first surface profile and a second 3D surface with a second surface profile, the first 3D surface and the second 3D surface being separated by a thickness of glass. The method includes providing a fixture having a 3D fixture surface with a fixture surface profile matching the second surface profile. The method includes providing a screen having a design, a squeegee, and an ink. The 3D glass article is supported on the fixture by mating the second 3D surface with the 3D fixture surface. The screen is positioned at a plane a distance above the first 3D surface. The ink is deposited on the screen. The squeegee is positioned at a selected orientation relative to the plane. The ink is pushed through the screen onto the first 3D surface by simultaneously contacting the squeegee with the screen, traversing the squeegee in a linear direction, maintaining the orientation of the squeegee relative to the plane, locally deflecting the screen from the plane to the first 3D surface, and locally conforming the screen to the first surface profile.
Abstract:
A print press system and a method are described herein that print an electronic circuit onto a material (e.g., glass substrate, plastic film, plastic film-glass substrate laminate). In exemplary applications, the print press system can print an electronic circuit onto a material to form, for instance, a flexible Liquid Crystal Display, a retail point of purchase sign and an e-book.
Abstract:
A glass article having an anti-glare surface. The anti-glare surface has a distinctness-of-reflected image of less than 95, and a haze of less than or equal to 50%. In one embodiment, the glass article further includes a smudge-resistant surface disposed on the anti-glare surface. Methods of making the glass article and anti-glare surface are also described.
Abstract:
A low expansion glass substrate includes titania and silica and has a thermal expansivity with an average gradient less than 1 ppb/°C /°C in a temperature range of 19°C to 25°C.
Abstract:
Disclosed are photo or electron beam curable polymerizable compositions, and preparation thereof and devices (101)containing such cured material. The composition contains completely or substantially completely hydrogenated hydrocarbon-based material completely free or substantially free of carbon-carbon double and triple bonds containing photo or electron beam curable terminal or pendant groups, low-outgassing photoinitiators, an optional viscosity adjustment component and an optional filler. The composition is visible light, UV or electron beam curable. It cures into a low-modulus, low outgassing polymer material. The composition can be used as an adhesive, sealant or lens potting material (103,107). It is ideal for use in lithographic tools and other optical devices involving deep or vacuum ultraviolet radiations, in particular, as lens potting materials (107,103) for 248 nm, 193 nm and 157 nm lithographic tools, as well as other optical devices involving using high fluence irradiation.