公开(公告)号：US20170038257A1

公开(公告)日：2017-02-09

申请号：US14817119

申请日：2015-08-03

Applicant: SpectraSensors, Inc.

Inventor： Xiang Liu ,  Gary Yeh ,  Adam S. Chaimowitz ,  William Jenko ,  Alfred Feitisch

IPC: G01J3/28

CPC classification number: G01J3/28 ,  G01J2003/283 ,  G01J2003/2866 ,  G01N21/274 ,  G01N21/39

Abstract: A frequency registration deviation is quantified for a field spectrum collected during analysis by a spectroscopic analysis system of a sample fluid when the spectroscopic analysis system has deviated from a standard calibration state. The field spectrum is corrected based on the frequency registration deviation using at least one spectral shift technique, and a concentration is calculated for at least one analyte represented by the field spectrum using the corrected field spectrum. Related systems, methods, and articles are described.

Abstract translation: 当光谱分析系统偏离标准校准状态时，通过样品流体的光谱分析系统在分析期间收集的场光谱量化频率对准偏差。 使用至少一个光谱偏移技术，基于频率配准偏差校正场频谱，并且使用校正的场频谱计算由场频谱表示的至少一个分析物的浓度。 描述相关系统，方法和文章。

公开(公告)号：US20160266034A1

公开(公告)日：2016-09-15

申请号：US15065783

申请日：2016-03-09

Applicant: SpectraSensors, Inc.

Inventor： Keith Benjamin Helbley ,  Juergen Dessecker ,  Harald Mueller ,  Nikolai Fink ,  William Boyle ,  Peter Dorn ,  Paulo Silva

IPC: G01N21/31 ,  G01N33/00

CPC classification number: G01N21/31 ,  G01J1/4257 ,  G01N21/3504 ,  G01N21/39 ,  G01N33/0004 ,  G01N2201/0236 ,  G01N2201/061 ,  G01N2201/0612 ,  G01N2201/127 ,  H02H9/008

Abstract: A laser spectrometer can be operated for analysis of one or more analytes present in a combustible gas mixture. The spectrometer can include one or more features that enable intrinsically safe operation. In other words, electrical, electronic, thermal, and/or optical energy sources can be limited within an hazardous are of the spectrometer where it is possible for an explosive gas mixture to exist. Methods, systems, articles and the like are described.

Abstract translation: 可以操作激光光谱仪用于分析存在于可燃气体混合物中的一种或多种分析物。 光谱仪可以包括一个或多个能够实现本质安全操作的特征。 换句话说，电气，电子，热能和/或光能源可以限制在可能存在爆炸性气体混合物的光谱仪的危险物质中。 描述了方法，系统，物品等。

公开(公告)号：TW201316633A

公开(公告)日：2013-04-16

申请号：TW101130004

申请日：2012-08-17

Applicant: 光譜感測股份有限公司 ,  SPECTRASENSORS, INC.

Inventor： 菲提區艾爾菲德 ,  FEITISCH, ALFRED ,  紐鮑爾加比 ,  NEUBAUER, GABI ,  許蘭堡瑪西亞斯 ,  SCHREMPEL, MATHIAS

IPC: H01S5/0687

CPC classification number: H01S5/02272 ,  H01L24/03 ,  H01L24/05 ,  H01L24/29 ,  H01L24/32 ,  H01L24/83 ,  H01L2224/0383 ,  H01L2224/04026 ,  H01L2224/05573 ,  H01L2224/05624 ,  H01L2224/05663 ,  H01L2224/05664 ,  H01L2224/05666 ,  H01L2224/05669 ,  H01L2224/0567 ,  H01L2224/0568 ,  H01L2224/05681 ,  H01L2224/05684 ,  H01L2224/05686 ,  H01L2224/29109 ,  H01L2224/29111 ,  H01L2224/29139 ,  H01L2224/29144 ,  H01L2224/32245 ,  H01L2224/83801 ,  H01L2924/12042 ,  H01L2924/15747 ,  H01S5/02212 ,  H01S5/0425 ,  H01L2924/04941 ,  H01L2924/01022 ,  H01L2924/053 ,  H01L2924/049 ,  H01L2924/00014 ,  H01L2924/01032 ,  H01L2924/01014 ,  H01L2924/014 ,  H01L2924/0105 ,  H01L2924/01029 ,  H01L2924/01082 ,  H01L2924/00

Abstract: 半導體雷射晶片之第一接觸表面可形成至目標表面粗糙度，該目標表面粗糙度經選擇以具有最大峰至谷高度，該最大峰至谷高度實質上小於阻障層厚度。可將阻障層施加於第一接觸表面，該阻障層包括非金屬導電化合物且具有阻障層厚度，且可藉由將焊接組合物加熱至小於一臨限溫度，使用焊接組合物沿著第一接觸表面將半導體雷射晶片焊接至載體座架，在該臨限溫度下發生阻障層溶解於焊接組合物中。本發明亦描述相關系統、方法、製品及類似物。

Abstract in simplified Chinese: 半导体激光芯片之第一接触表面可形成至目标表面粗糙度，该目标表面粗糙度经选择以具有最大峰至谷高度，该最大峰至谷高度实质上小于阻障层厚度。可将阻障层施加于第一接触表面，该阻障层包括非金属导电化合物且具有阻障层厚度，且可借由将焊接组合物加热至小于一临限温度，使用焊接组合物沿着第一接触表面将半导体激光芯片焊接至载体座架，在该临限温度下发生阻障层溶解于焊接组合物中。本发明亦描述相关系统、方法、制品及类似物。

公开(公告)号：TW200900680A

公开(公告)日：2009-01-01

申请号：TW097103566

申请日：2008-01-30

Applicant: 光譜感測股份有限公司 SPECTRASENSORS, INC.

Inventor： 劉祥 LIU, XIANG ,  周信 ZHOU, XIN ,  菲提區艾爾菲德 FEITISCH, ALFRED ,  山格葛列格里M SANGER, GREGORY M.

IPC: G01N

CPC classification number: G01N21/3504 ,  G01N21/274 ,  G01N21/314 ,  G01N21/39 ,  G01N2201/1215

Abstract: 在含有一或多種可能具有干擾吸光光譜特徵之背景分析物的氣體混合物中,可以藉由在目標波長下補償背景分析物之吸收度,計算目標分析物之濃度,以定量該目標分析物。可在選擇用於定量該背景分析物濃度的參考波長下,測量吸收度。使用背景氣體調節係數或函數,在參考波長下測量的吸收度可用來計算目標波長下因背景分析物所造成的吸收度,並因此補償該背景吸收度,以更精確地即時計算或接近即時計算該目標分析物濃度。藉由採用一或多種額外的參考波長,可視情況補償額外背景分析物。

Abstract in simplified Chinese: 在含有一或多种可能具有干扰吸光光谱特征之背景分析物的气体混合物中,可以借由在目标波长下补偿背景分析物之吸收度,计算目标分析物之浓度,以定量该目标分析物。可在选择用于定量该背景分析物浓度的参考波长下,测量吸收度。使用背景气体调节系数或函数,在参考波长下测量的吸收度可用来计算目标波长下因背景分析物所造成的吸收度,并因此补偿该背景吸收度,以更精确地实时计算或接近实时计算该目标分析物浓度。借由采用一或多种额外的参考波长,可视情况补偿额外背景分析物。

公开(公告)号：US10746655B2

公开(公告)日：2020-08-18

申请号：US15832690

申请日：2017-12-05

Applicant: SpectraSensors, Inc.

Inventor： Xiang Liu ,  Alfred Feitisch ,  Xin Zhou

IPC: G01J3/433 ,  G01J3/02 ,  G01J3/42 ,  G01N21/3504 ,  G01N21/39 ,  G01N21/03 ,  G01N21/27 ,  G01N21/05

Abstract: Detector data representative of an intensity of light that impinges on a detector after being emitted from a light source and passing through a gas over a path length can be analyzed using a first analysis method to obtain a first calculation of an analyte concentration in the volume of gas and a second analysis method to obtain a second calculation of the analyte concentration. The second calculation can be promoted as the analyte concentration upon determining that the analyte concentration is out of a first target range for the first analysis method.

公开(公告)号：US10309828B2

公开(公告)日：2019-06-04

申请号：US15730548

申请日：2017-10-11

Applicant: SpectraSensors, Inc.

Inventor： Alfred Feitisch ,  Xiang Liu ,  Keith Benjamin Helbley ,  Douglas Beyer

IPC: G01J3/02 ,  G01J3/42 ,  G01N21/31

Abstract: A spectrometer includes a light source that emits a beam into a sample volume comprising an absorbing medium. Thereafter, at least one detector detects at least a portion of the beam emitted by the light source. It is later determined, based on the detected at least a portion of the beam and by a controller, that a position and/or an angle of the beam should be changed. The beam emitted by the light source is then actively steered by an actuation element under control of the controller. In addition, a concentration of the absorbing media can be quantified or otherwise calculated (using the controller or optionally a different processor that can be local or remote). The actuation element(s) can be coupled to one or more of the light source, a detector or detectors, and a reflector or reflectors intermediate the light source and the detector(s).

公开(公告)号：US10180353B2

公开(公告)日：2019-01-15

申请号：US15640119

申请日：2017-06-30

Applicant: SpectraSensors, Inc.

Inventor： Xiang Liu ,  Gary Yeh ,  Adam S. Chaimowitz ,  William Jenko ,  Alfred Feitisch

IPC: G01J3/00 ,  G01J3/28 ,  G01N21/27 ,  G01N21/39

Abstract: A frequency registration deviation is quantified for a field spectrum collected during analysis by a spectroscopic analysis system of a sample fluid when the spectroscopic analysis system has deviated from a standard calibration state. The field spectrum is corrected based on the frequency registration deviation using at least one spectral shift technique, and a concentration is calculated for at least one analyte represented by the field spectrum using the corrected field spectrum. Related systems, methods, and articles are described.

公开(公告)号：US10024788B2

公开(公告)日：2018-07-17

申请号：US14703616

申请日：2015-05-04

Applicant: SpectraSensors, Inc.

Inventor： Alfred Feitisch ,  Peter Dorn ,  James Tedesco ,  Xiang Liu

IPC: G01J3/28 ,  G01N21/39 ,  G01N21/3504 ,  G01N21/03 ,  G01J3/02

Abstract: A spectrometer includes a light source configured to emit a beam along a beam path through a sample volume comprising an analyte. Also included is at least one detector positioned to detect at least a portion of the beam emitted by the light source, and at least one reflector positioned along the beam path intermediate the light source and the at least one detector having a surface roughness greater than a predefined level such as 20 Å RMS.

公开(公告)号：US20180120159A1

公开(公告)日：2018-05-03

申请号：US15640119

申请日：2017-06-30

Applicant: SpectraSensors, Inc.

Inventor： XIANG LIU ,  Gary Yeh ,  Adam S. Chaimowitz ,  William Jenko ,  Alfred Feitisch

IPC: G01J3/28

CPC classification number: G01J3/28 ,  G01J2003/283 ,  G01J2003/2866 ,  G01N21/274 ,  G01N21/39

Abstract: A frequency registration deviation is quantified for a field spectrum collected during analysis by a spectroscopic analysis system of a sample fluid when the spectroscopic analysis system has deviated from a standard calibration state. The field spectrum is corrected based on the frequency registration deviation using at least one spectral shift technique, and a concentration is calculated for at least one analyte represented by the field spectrum using the corrected field spectrum. Related systems, methods, and articles are described.

公开(公告)号：US20170248466A1

公开(公告)日：2017-08-31

申请号：US15376541

申请日：2016-12-12

Applicant: SpectraSensors, Inc.

Inventor： ALFRED FEITISCH ,  Xiang Liu ,  Chih-Husan Chang ,  Hsu-Hung Huang

IPC: G01J3/02 ,  G01J3/42

CPC classification number: G01J3/0291 ,  G01J3/027 ,  G01J3/42

Abstract: At least one light source is configured to emit at least one beam into a sample volume of an absorbing medium. In addition, at least one detector is positioned to detect at least a portion of the beam emitted by the at least one light source. Further, at least one beam modification element is positioned between the at least one detector and the at least one light source to selectively change at least one of (i) a power intensity of, or (ii) a shape of the beam emitted by the at least one light source as detected by the at least one detector. A control circuit is coupled to the beam modification element. Related apparatus methods, articles of manufacture, systems, and the like are described.