公开(公告)号：US20170248466A1

公开(公告)日：2017-08-31

申请号：US15376541

申请日：2016-12-12

Applicant: SpectraSensors, Inc.

Inventor： ALFRED FEITISCH ,  Xiang Liu ,  Chih-Husan Chang ,  Hsu-Hung Huang

IPC: G01J3/02 ,  G01J3/42

CPC classification number: G01J3/0291 ,  G01J3/027 ,  G01J3/42

Abstract: At least one light source is configured to emit at least one beam into a sample volume of an absorbing medium. In addition, at least one detector is positioned to detect at least a portion of the beam emitted by the at least one light source. Further, at least one beam modification element is positioned between the at least one detector and the at least one light source to selectively change at least one of (i) a power intensity of, or (ii) a shape of the beam emitted by the at least one light source as detected by the at least one detector. A control circuit is coupled to the beam modification element. Related apparatus methods, articles of manufacture, systems, and the like are described.

公开(公告)号：AU2008242467B2

公开(公告)日：2011-09-29

申请号：AU2008242467

申请日：2008-01-24

Applicant: SPECTRASENSORS INC

Inventor： ALFRED FEITISCH ,  SANGER GREGORY M ,  XIANG LIU ,  XIN ZHOU

IPC: G01N21/31 ,  G01N21/35 ,  G01N21/39

Abstract: Concentrations of a target analyte in a gas mixture containing one or more background analytes having potentially interfering spectral absorption features can be calculated by compensating for background analyte absorption at a target wavelength used to quantify the target analyte. Absorption can be measured at a reference wavelength (302) chosen to quantify the concentration of the background analyte. Using a background gas adjustment factor or function, the absorption measured at the reference wavelength can be used to calculate absorption due to the background analyte at the target wavelength (304) and thereby compensate for this background absorption to more accurately calculate the target analyte concentration in real or near real time (306). Additional background analytes can optionally be compensated for by using one or more additional reference wavelengths.

公开(公告)号：AU2009333000A1

公开(公告)日：2011-08-18

申请号：AU2009333000

申请日：2009-12-24

Applicant: SPECTRASENSORS INC

Inventor： XUEJIAO HU ,  ALFRED FEITISCH

IPC: G01N21/39 ,  G01N21/53

Abstract: Thermally controlled enclosures that can be used with gas analyzers are described. The enclosures incorporate one or more phase changing materials that buffer ambient and internal heat loads to reduce the power consumption demand of mechanical or electronic heating apparatus. Maintenance of gas analyzer equipment at a consistent temperature can be important to achieving stable and reproducible results. Related systems, apparatus, methods, and/or articles are also described.