복사열에 의한 초전기 결정 고에너지 발생 방법 및 장치
    11.
    发明授权
    복사열에 의한 초전기 결정 고에너지 발생 방법 및 장치 有权
    使用辐射热源的热电晶体驱动的高能发电机的热电晶体的方法与装置

    公开(公告)号:KR101097834B1

    公开(公告)日:2011-12-23

    申请号:KR1020090077933

    申请日:2009-08-24

    Inventor: 최재호

    CPC classification number: Y02E10/50

    Abstract: 본발명은초전기결정에복사열을조사하여결정의양단면에유되되는표면전하에의한고에너지발생방법및 장치이다. 복사열을조사하여초전기결정의온도변화를유도함으로써초전기결정양 단면의길이방향과직경방향으로의온도편차를최소화하여종래기술에서사용하는초전기결정의크기한계및 구조한계를극복하여유도되는표면전하의수의증가에따른전위차를증가시켜고에너지전자및 이온발생및 가속장치의성능향상과이 방법및 장치를이용한 X-선발생장치, 중성자발생장치, 오존발생장치등 응용장치의성능을향상시킨다.

    플라즈몬 광을 이용한 엑스선 도파로 제조방법
    12.
    发明授权
    플라즈몬 광을 이용한 엑스선 도파로 제조방법 有权
    使用等离子体光的X射线波导的制造方法

    公开(公告)号:KR101091601B1

    公开(公告)日:2011-12-13

    申请号:KR1020090018948

    申请日:2009-03-05

    Inventor: 최재호

    Abstract: 본 발명은 플라즈몬에 의한 비정상적 광도파 현상을 이용하여 나노광식각 패턴용 나노선 마스크를 제조하고 이를 사용하여 엑스선 도파로의 코어를 형성하고 도파로의 크래드층을 증착함으로써 엑스선 도파로를 제조하는 방법에 관한 것이다. 수십나노미터 두께의 유전체를 금속박막 사이에 증착하여 나노선 마스크를 제조하고 기판에 포토레지스트를 스핀코팅 한 후 제조된 나노마스크를 정렬시키고 자외선을 조사하여 나노선을 형성하고 이를 엑스선 도파로의 코어로 사용하여 엑스선 도파로를 제조한다.
    플라즈몬, 비정상 광도파, X-선 도파로, 나노마스크, 나노선

    엑스선 직렬 격자 간섭계
    13.
    发明公开
    엑스선 직렬 격자 간섭계 有权
    X射线在线光栅干涉仪

    公开(公告)号:KR1020110129302A

    公开(公告)日:2011-12-01

    申请号:KR1020100048865

    申请日:2010-05-25

    Inventor: 최재호

    Abstract: PURPOSE: An X-rays serial lattice interferometer is provided to develop a field of biotechnology since the phase-difference images of X-rays can measure the inner structure of a body in a state a sample is mounted in the air. CONSTITUTION: An X-rays serial lattice interferometer comprises an X-rays source(10) and a light source lattice(20). The number of the light source lattice is at least three. The light source lattice is formed by combination of a plurality of openings. The shape of each opening has a 2D structure, such as a quadrate, rectangular or circular shape. The cycle of the light source lattice is smaller than that of a beam splitting lattice(30) or an interpretation lattice(40). The beam splitting lattice splits the beam of X-rays refracted from a sample(60). The interpretation lattice analyzes the split beam.

    Abstract translation: 目的:提供X射线串联晶格干涉仪来开发生物技术领域,因为X射线的相位差图像可以在样品安装在空气中的状态下测量身体的内部结构。 构成:X射线串联晶格干涉仪包括X射线源(10)和光源晶格(20)。 光源晶格的数量至少为3个。 光源晶格通过多个开口的组合形成。 每个开口的形状具有2D结构,例如正方形,矩形或圆形。 光源晶格的周期小于分束晶格(30)或解释晶格(40)的周期。 分束晶格将从样品(60)折射的X射线束分裂。 解释格子分析分束。

    X-선 복합굴절렌즈 제조방법
    14.
    发明授权
    X-선 복합굴절렌즈 제조방법 失效
    X-선복합굴절렌즈제법법

    公开(公告)号:KR100736230B1

    公开(公告)日:2007-07-06

    申请号:KR1020060005531

    申请日:2006-01-18

    Inventor: 최재호

    Abstract: Provided is a fabrication method of an X-ray compound refractive lens capable of suppressing generation of a grain interface to prevent X-ray from scattering and to reduce a loss in X-ray light speed to thus improve resolution of an X-ray image. The fabrication method of an X-ray compound refractive lens comprises the steps of: blending nano- particles in a monomer solution polymer solution(S101); stirring the mixed solution(S102); injecting the polymer solution into a centrifugal separator having a tube with a built-in compound refractive lens forming mold to allow the polymer solution to go through a centrifugal separation process at gravity acceleration of 6000-10000m/s^2(S103); forming two separate parts, a self-assembled mold on the compound refractive lens forming mold and the polymer solution layer on the self-assembled mold(S104); heating the self-assembled mold and the polymer solution layer(S105); removing the mold and the polymer solution layer(S106); and obtaining a compound refractive lens(S107).

    Abstract translation: 本发明提供一种X射线复合折射透镜的制造方法,该X射线复合折射透镜的制造方法能够抑制颗粒界面的产生以防止X射线散射,并减少X射线光速的损失,从而提高X射线图像的分辨率。 X射线复合折射透镜的制造方法包括以下步骤:将纳米颗粒混入单体溶液聚合物溶液(S101)中; 搅拌混合溶液(S102); 将聚合物溶液注入具有内置复合折射透镜成型模的管的离心分离器中,使聚合物溶液在重力加速度为6000-10000m / s ^ 2时经过离心分离过程(S103); 形成两个独立的部件,复合折射透镜成型模具上的自组装模具和自组装模具上的聚合物溶液层(S104); 加热自组装模具和聚合物溶液层(S105); 去除模具和聚合物溶液层(S106); 并获得复合折射透镜(S107)。

    엑스선 위상차 영상 획득 방법
    15.
    发明授权
    엑스선 위상차 영상 획득 방법 有权
    X射线相位差分成像方法

    公开(公告)号:KR101316052B1

    公开(公告)日:2013-10-11

    申请号:KR1020120035232

    申请日:2012-04-05

    Inventor: 최재호

    Abstract: PURPOSE: An x-ray phase difference image obtaining method is provided to minimize a distance between an x-ray light source and a detector in order to maintain the brightness of the light source, and to allow the coherence of the light source to satisfy a condition for obtaining a phase image. CONSTITUTION: An x-ray phase difference image obtaining method includes: a step of mounting a specimen (50) between a knife-edge filter (30) and a light source grating (20), and precisely adjusting the specimen in an optical axial direction; a step of storing an absorption image detected by a detector (60) after removing the knife-edge filter; a step of moving the knife-edge filter certain distances in an X- and Y-axial direction perpendicular to the optical axial direction after returning the knife-edge filter to an initial position, and storing an image detected by the detector; and a step of digitizing the absorption image and the image obtained by moving the knife-edge filter, implementing a data processing process on the images, and then obtaining a final image.

    Abstract translation: 目的:提供一种x射线相位差图像获取方法,以便使x射线光源和检测器之间的距离最小化,以便保持光源的亮度,并且允许光源的一致性满足 获得相位图像的条件。 构成:X射线相位差图像获取方法包括:将样品(50)安装在刀刃式过滤器(30)和光源光栅(20)之间,并沿光轴方向精确调节样品的步骤 ; 去除刀刃式过滤器之后,存储由检测器(60)检测出的吸收图像的步骤; 在将刀刃式过滤器返回到初始位置之后,使刀刃式过滤器在垂直于光轴方向的X轴方向和Y轴方向上移动一定距离,并存储由检测器检测出的图像的步骤; 以及通过移动刀刃滤波器获得的吸收图像和图像数字化的步骤,对图像执行数据处理处理,然后获得最终图像。

    엑스선 위상차 영상 장치
    16.
    发明授权
    엑스선 위상차 영상 장치 有权
    X射线相差分成像装置

    公开(公告)号:KR101272902B1

    公开(公告)日:2013-06-11

    申请号:KR1020120035231

    申请日:2012-04-05

    Inventor: 최재호

    Abstract: PURPOSE: An X-ray phase difference imaging device is provided to easily manufacture a lattice which is a component of an interferometer and to obtain an X-ray lattice interferometer in which post-processing the images is convenient. CONSTITUTION: An X-ray phase difference imaging device comprises an X-ray light source(10), a light source lattice(20), and a knife-edge filter. The light source lattice is formed into a lattice form in which a plurality of strips is arranged in vertical and horizontal directions at a predetermined distance. The light source lattice includes a plurality of holes formed by crossing the strips. The light source lattice is arranged to be spaced from the X-ray light source in a progressing direction of X-rays. Strips which both ends are a knife shape are formed into a lattice form at a predetermined distance in the knife-edge filter. The knife-edge filter is arranged to be spaced from the light source in the progressing direction of the X-rays.

    Abstract translation: 目的:提供X射线相位差成像装置,以容易地制造作为干涉仪的组成部分的格子,并获得对图像进行后处理的X射线晶格干涉仪。 构成:X射线相位差成像装置包括X射线光源(10),光源格(20)和刀刃滤光器。 光源晶格形成格子状,其中多个条以垂直和水平方向以预定距离布置。 光源晶格包括穿过条形成的多个孔。 光源晶格被布置为在X射线的进行方向上与X射线光源间隔开。 刀刃形状的刀条在刀刃式过滤器中以规定的距离形成格子状。 刀刃式过滤器配置成在X射线的前进方向上与光源隔开。

    결맞음 엑스선 발생 엑스선 타깃과 제조방법
    17.
    发明授权
    결맞음 엑스선 발생 엑스선 타깃과 제조방법 有权
    X射线靶及其制备相干X射线的方法

    公开(公告)号:KR101144748B1

    公开(公告)日:2012-05-24

    申请号:KR1020090039523

    申请日:2009-05-07

    Inventor: 최재호

    Abstract: PURPOSE: An X-ray target and its fabrication methods for generation of coherent x-rays are provided to maintain sufficient X-rays photon by forming an X-rays lattice and a target to be one body. CONSTITUTION: A substrate(10) installs to a sputtering device. A buffer layer is formed by evaporating a tungsten thin film(20) by 200 nanometer thickness. The reflecting layer(30) of a lattice is evaporated by 20 nanometer thickness. A beryllium(40) which is used for X-rays transmittance materials is evaporated by 20 nanometer thickness. An X-rays diffraction grating is manufactured by periodically laminating the reflecting layer and the transmission layer.

    결맞음 엑스선 발생 엑스선 타깃과 제조방법
    18.
    发明公开
    결맞음 엑스선 발생 엑스선 타깃과 제조방법 有权
    X射线目标及其生成相似X射线的制造方法

    公开(公告)号:KR1020100120733A

    公开(公告)日:2010-11-17

    申请号:KR1020090039523

    申请日:2009-05-07

    Inventor: 최재호

    CPC classification number: H05G1/02 H01J35/08 H01J2235/06 H05G1/52

    Abstract: PURPOSE: An X-ray target and its fabrication methods for generation of coherent x-rays are provided to maintain sufficient X-rays photon by forming an X-rays lattice and a target to be one body. CONSTITUTION: A substrate(10) installs to a sputtering device. A buffer layer is formed by evaporating a tungsten thin film(20) by 200 nanometer thickness. The reflecting layer(30) of a lattice is evaporated by 20 nanometer thickness. A beryllium(40) which is used for X-rays transmittance materials is evaporated by 20 nanometer thickness. An X-rays diffraction grating is manufactured by periodically laminating the reflecting layer and the transmission layer.

    Abstract translation: 目的:提供一种用于产生相干X射线的X射线靶及其制造方法,以通过将X射线晶格和靶标形成为一体来维持足够的X射线光子。 构成:将衬底(10)安装到溅射装置。 通过使钨薄膜(20)蒸发200纳米厚度形成缓冲层。 晶格的反射层(30)蒸发20纳米厚。 用于X射线透射材料的铍(40)蒸发20纳米厚。 通过周期性地层叠反射层和透射层来制造X射线衍射光栅。

    플라즈몬 광을 이용한 엑스선 도파로 제조방법
    19.
    发明公开
    플라즈몬 광을 이용한 엑스선 도파로 제조방법 有权
    使用等离子体光的X射线波长的制造方法

    公开(公告)号:KR1020100100199A

    公开(公告)日:2010-09-15

    申请号:KR1020090018948

    申请日:2009-03-05

    Inventor: 최재호

    CPC classification number: G02B6/13 B82Y40/00 G02B6/1226 G03F1/50

    Abstract: PURPOSE: A manufacturing method of x-ray waveguides using plasmonic light is provided to manufacture a core of the X-rays waveguide by using a nano channel. CONSTITUTION: A nano wire pattern mask for a photolithography manufactures the core of X-rays wave guide. The nano wire pattern mask has the line width of nano millimeters and the length of millimeters. A dielectric nano thin film(10) is evaporated between a metallic foil(20). The nano wire pattern mask uses abnormal light guiding mode through a plasmon.

    Abstract translation: 目的:提供使用等离子体激发光的x射线波导的制造方法,以通过使用纳米通道制造X射线波导的芯。 构成:用于光刻的纳米线图案掩模制造X射线波导的核心。 纳米线图案掩模具有毫米毫米的线宽和毫米的长度。 电介质纳米薄膜(10)在金属箔(20)之间蒸发。 纳米线图案掩模通过等离子体激光器使用异常光导模式。

    식각을 이용한 엑스선 도파로 구조체 및 그 형성 방법
    20.
    发明授权
    식각을 이용한 엑스선 도파로 구조체 및 그 형성 방법 失效
    使用蚀刻的X射线波导结构及其形成方法

    公开(公告)号:KR100962284B1

    公开(公告)日:2010-06-11

    申请号:KR1020080021795

    申请日:2008-03-10

    Inventor: 최재호

    Abstract: 본 발명은 나노해상도를 갖는 엑스선 간섭 영상을 획득하기 위한 엑스선 간섭계의 엑스선광원을 제조하는 공정이다. 엑스선 간섭계의 광원은 결맞음성을 갖는 광원을 다층박막을 선택적으로 식각한 후 엑스선 발생 물질을 식각된 부위에 증착하고 이 소스 앞단의 다층박막을 식각하여 엑스선 도파로를 형성함으로써 준결맞음성을 갖는 엑스선 소스를 제조한다.
    결맞음엑스선광원, 엑스선 도파로, 어레이X-선광원

Patent Agency Ranking