公开(公告)号：KR1020110030321A

公开(公告)日：2011-03-23

申请号：KR1020100086471

申请日：2010-09-03

Applicant: 도쿄엘렉트론가부시키가이샤

Inventor： 미즈노츠요시 ,  남바히로미츠

IPC: H01L21/306

CPC classification number: H01L21/6708 ,  H01L21/02087 ,  H01L21/32134

Abstract: PURPOSE: A substrate liquid processing method, a substrate liquid process apparatus, and a record medium are provided to remove the native oxide film formed on the peripheral part of a substrate by supplying the hydrofluoric acid to the peripheral part of the substrate while rotating the substrate. CONSTITUTION: A holding part(10) holds the substrate. A rotation driving unit(20) rotates the holding part. A hydrofluoric acid feeding port(54) supplies the hydrofluoric acid to the peripheral part of the substrate held by the holding part. The fluoric acid feed port(52) supplies the fluoric acid to the peripheral part of the substrate held by the holding part.

Abstract translation: 目的：提供基板液体处理方法，基板液体处理装置和记录介质，以通过在旋转基板的同时将氢氟酸供给到基板的周边部分来除去形成在基板的周边部分上的自然氧化膜 。 构成：保持部（10）保持基板。 旋转驱动单元（20）使保持部旋转。 氢氟酸供给口（54）将氢氟酸供给到由保持部保持的基板的周边部。 氟酸供给口（52）将氟酸供给到由保持部保持的基板的周边部。