Abstract:
PURPOSE: A remote controller, a remotely-controlled electronic device, and a remote control system for an electronic device and a method therefor are provided to prevent the malfunction of an electronic device by selectively controlling a corresponding electronic device by displaying unit IDs of electronic devices by using a remote controller and inputting a unit ID of one electronic device desired to be controlled. CONSTITUTION: An electronic device includes a receiving unit(210), a storing unit(220), a controller(230) and an output unit(240). The electronic device(200) is an electronic product having a unit which can receive a control code outputted from a remote controller, such as a display monitor, a TV set or an air-conditioner. The receiving unit(210) receives a unit ID and/or a control code from the remote controller. The storing unit(220) stores the unit ID set by the remote controller. The controller(230) checks whether the received unit ID is identical to a previously stored unit ID and determines whether to perform an operation corresponding to the control code received from the remote controller. The output unit(240) displays the unit ID and/or an operation being performed.
Abstract:
PURPOSE: Ion implantation equipment is provided to minimize an exposure of contaminated materials on an insulating body by using a protecting insulation body capable of overlapping an exposed portion of a cup support extraction of the insulating body included on a manipulator assembly. CONSTITUTION: The ion implantation equipment comprises a panel(40) formed with a through-hole for connection, a suppression electrode, a plate, a mounting, a suppressor, a cup support extraction(42), a support extraction(50), a shield electrode(52), and insulating bodies(44a) formed among the plate, the mounting, the suppressor and the support extraction(50) for insulating the assemblies one another in an ion implantation processing. The ion implantation equipment further includes protecting insulation bodies(44b) for preventing the insulating bodies(44a) from being contaminated by residual materials after the ion implantation processing.
Abstract:
An ion generating unit and a maintenance method thereof are provided to prevent a substrate from being damaged due to ions by preventing the ions from being deposited on an inner wall of a source chamber. An ion generating unit is used for an ion implanting process performed on a semiconductor substrate and includes a source head(120), a source chamber(110), and protective plates(140a,140b,140e,140f). The source head generates ions from a gas. The source chamber includes a manipulator for extracting the positive ions from the ions. An aperture for providing the extracted ions to an analysis unit is formed on the source chamber. The analysis unit is arranged behind the ion generating unit. The protective plate is installed on an inner wall of the source chamber, such that the ions are prevented from being deposited on the inner wall of the source chamber.
Abstract:
PURPOSE: An input/output line structure for an extraction stack of an ion implanter is provided to attain stable connection and grounding, and thereby to prevent undesirable arcing phenomena. CONSTITUTION: An input/output line structure is employed for an oil box(300) equipped with an extraction stack. A tube(400) is longitudinally formed in the oil box(300). A first connection line(100) is set in the tube(400) and connected with inner electronic devices of the oil box(300). The first connection line(100) has a length approximately equal to the tube(400). On the other hand, a second connection line(200) having a relatively shorter length is inserted into the tube(300) and then grounded with the first connection line(100). Therefore, the second connection line(200) is not easy to bend, so that an exact and stable connection is made between the first and second connection lines(100,200).
Abstract:
A digital broadcasting processing apparatus and a control method therefor are provided to improve an interface picture so that it is possible for a user to easily select a conversion object channel when channel conversion information about a plurality of conversion object channels is received by a DCC(Directed Channel Change) function. A signal receiving unit(10) receives information for a DCC function. When channel conversion information about a plurality of conversion object channels is included in the information for the DCC function, an image processor(30) outputs the information about the channel object channel. The image processor(30) outputs the information to display the information about the conversion object channel on a display unit(50).
Abstract:
PURPOSE: A pressure changeover valve of a cryo pump is provided to smoothly regenerate a cryo pump even in increase of friction force caused by the rust of a pressure changeover valve. CONSTITUTION: A pressure changeover valve(170) includes a valve support body(135), a pressure changeover valve cap(172) and an on/off valve body(174). The valve support body forms a male screw unit(135a) on the outer circumference as a part of a cryo pump(130) is protruded in a circular shape. The pressure changeover valve cap has a female screw unit in the inner circumference, and the on/off valve body is closely adhered/displaced from the pressure changeover valve cap. The inner pressure of the cryo pump is kept regular by injecting high-temperature dry nitrogen gas into the pump. Therefore, the cryo pump is protected from damage and explosion by preventing the abnormal action of the valve.
Abstract:
PURPOSE: An equipment for fabricating a semiconductor is provided to prevent breakage of a wafer by automatically checking if the wafer is accurately loaded/unloaded in a wafer cassette while sliding the wafer. CONSTITUTION: A medium current ion injector is composed of a process chamber(12), a transfer chamber(14), a load lock(16), a junction(18), and a sensor(30). Ion, which is accelerated with voltage, is mechanically implanted on a wafer(50) for a semiconductor device to have an electric characteristic in the process chamber. A base plate(16a) where a wafer cassette(40) is put is established at the load lock. On one hand, the sensor is established in the end of the junction near the transfer chamber. And, the sensor detects the movement of the wafer loaded/unloaded to the transfer chamber from the load lock through the junction. Herein, the sensor is consisted of a sensor emitter(30a) and a sensor light receiver(30b). When the wafer is not loaded/unloaded accurately on the wafer cassette, the sensor detects the position of the wafer to prevent breakage of the wafer caused by an interception valve or a collis ion with another wafer.