Abstract:
PURPOSE: A nonvolatile memory device using the hysteresis property of graphene, a manufacturing method thereof, and an operating method thereof are provided to improve the operation margin of a memory device by forming a graphene layer with a chemical vapor deposition method. CONSTITUTION: A data storage layer(36) is formed on a substrate. A gate electrode(40) is separated from the data storage layer. An insulation layer is formed between the gate electrode and the data storage layer. A source region and a drain region are formed on both sides of the data storage layer. A channel layer connects the source region to the drain region.