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公开(公告)号：KR101445878B1
公开(公告)日：2014-09-29
申请号：KR1020080031873
申请日：2008-04-04
CPC classification number: C09D183/16 , C08G77/045 , C08G77/16 , C08G77/18 , C08G77/62 , C08J7/042 , C08J2381/06 , C08J2483/04 , C08J2483/16 , C09D183/04 , Y10T428/31663
Abstract: 본 발명은 보호 필름 및 이를 포함하는 봉지 재료에 관한 것으로, 본 발명의 보호 필름은 저온에서 경화하여 실리카를 형성함으로써 고경도 및 우수한 광투과도를 갖는 실라잔계 중합체와 휨성(flexibility)을 갖는 실록산계 중합체를 교대로 코팅함으로써 계면에서의 접촉력이 향상되어, 수분 및 산소의 침투 억제 능력이 우수할 뿐 아니라, 저온/습식 공정으로 용이하게 제조할 수 있다.
보호 필름, 실라잔계 중합체, 실록산계 중합체, 투습도, 광투과도-
公开(公告)号：KR1020100053409A
公开(公告)日：2010-05-20
申请号：KR1020090021863
申请日：2009-03-13
Applicant: 삼성전자주식회사
IPC: B82B3/00
Abstract: PURPOSE: A photosensitive quantum dot is provided to constantly maintain light emission efficiency of quantum dot-containing pattern for a long time and to enhance hardening efficiency. CONSTITUTION: A photosensitivity quantum dot comprises a quantum dot and plural photosensitive moieties which is bound to the surface of the quantum dot and contains Si and photosensitive functional group. The photosensitive moieties have chemical formula 1 or 2. A composition for forming quantum dot-containing pattern contains the photosensitive quantum dot, photoinitiator, and solvent. A method for forming the quantum dot-containing pattern comprises: a step of preparing the composition for forming quantum dot-containing pattern; a step of providing a quantum dot-containing film; a step of selectively exposing the film to the light; and a step of developing the film.
Abstract translation: 目的：提供光敏量子点，以长期保持量子点图案的发光效率，提高硬化效率。 构成：光敏量子点包括量子点和多个光敏部分，其结合到量子点的表面并含有Si和光敏官能团。 感光部分具有化学式1或2.用于形成量子点含有图案的组合物包含光敏量子点，光引发剂和溶剂。 形成含量子点图案的方法包括：制备用于形成量子点含有图案的组合物的步骤; 提供含量子点的膜的步骤; 将膜选择性地暴露于光的步骤; 并开发电影的一个步骤。
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公开(公告)号：KR1020100052948A
公开(公告)日：2010-05-20
申请号：KR1020080111862
申请日：2008-11-11
Applicant: 삼성전자주식회사
IPC: G03F7/028
CPC classification number: G03F7/031 , G03F7/033 , G03F7/2053 , G03F7/028
Abstract: PURPOSE: A radical polymerization composition and a pattern formation method using thereof are provided to simply and easily control the size of a pattern by adjusting components of the composition. CONSTITUTION: A radical polymerization composition contains a photosensitive material, a photo initiator, a solvent, and a pattern size controlling material. The pattern size controlling material is selected from the group consisting of a polymer-containing radical scavenger, and a photo sensitizer. A polymer from the polymer-containing radical scavenger is selected from the group consisting of polystyrene, poly(methyl) methacrylate, polymethacrylate, poly acrylate, and polyacrylate. The radical polymerization composition additionally includes a quantum point or a two photon absorption material.
Abstract translation: 目的：提供自由基聚合组合物和使用其的图案形成方法，通过调节组合物的组分简单且容易地控制图案的尺寸。 构成：自由基聚合组合物含有感光材料，光引发剂，溶剂和图案尺寸控制材料。 图案尺寸控制材料选自含聚合物的自由基清除剂和光敏剂。 来自含聚合物的自由基清除剂的聚合物选自聚苯乙烯，聚（甲基）甲基丙烯酸酯，聚甲基丙烯酸酯，聚丙烯酸酯和聚丙烯酸酯。 自由基聚合组合物另外包括量子点或双光子吸收材料。
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公开(公告)号：KR1020170135449A
公开(公告)日：2017-12-08
申请号：KR1020160067401
申请日：2016-05-31
Applicant: 삼성전자주식회사
IPC: C07D405/06 , C07D403/06 , C07D407/06 , C07D409/06 , H01L51/00 , G02B5/22 , G01J1/42 , H04N5/30
CPC classification number: H01L51/0061 , C07D307/66 , C07D405/06 , H01L27/307 , H01L51/0046 , H01L51/0053 , H01L51/006 , H01L51/0065 , H01L51/0067 , H01L51/0068 , H01L51/4253 , H01L51/441 , H01L51/447
Abstract: 하기화학식 1의화합물및 이를포함하는유기광전소자, 이미지센서및 전자장치를제공한다: [화학식 1]상기화학식 1에서, 각치환기의정의는명세서에기재된바와같다.
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Patent Agency Ranking
公开(公告)号：KR1020170060488A
公开(公告)日：2017-06-01
申请号：KR1020150164996
申请日：2015-11-24
Applicant: 삼성전자주식회사
IPC: H01L51/00 , C07D421/06 , C07C211/54 , H01L51/50 , G02B5/20
CPC classification number: H01L51/0061 , C07D409/06 , C07D421/06 , H01L27/14621 , H01L27/288 , H01L27/307 , H01L51/0052 , H01L51/006 , H01L51/0062 , H01L51/0067 , H01L51/4253 , H01L51/44 , H01L51/525 , Y02E10/549
Abstract: 하기화학식 1의유기광전소자용화합물및 이를포함하는유기광전소자, 이미지센서및 전자장치를제공한다: [화학식 1]상기화학식 1에서, 각치환기의정의는명세서에기재된바와같다.
Abstract translation: 本发明提供由下式（1）表示的有机光电器件化合物和包含其的有机光电器件，图像传感器和电子器件：其中，在式（1）中，每个取代基如说明书中所定义。
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公开(公告)号：KR1020160122012A
公开(公告)日：2016-10-21
申请号：KR1020150052019
申请日：2015-04-13
Applicant: 삼성전자주식회사
IPC: C09K11/06 , H01L51/52 , H01L27/146
CPC classification number: H01L51/0071 , C07D495/22 , C09K11/06 , H01L27/307 , H01L51/0051 , H01L51/0053 , H01L51/006 , H01L51/0061 , H01L51/0078 , H01L51/4253 , H01L2251/308 , H05B33/14
Abstract: 서로마주하는제1 전극과제2 전극, 그리고상기제1 전극과상기제2 전극사이에위치하는활성층을포함하고, 상기활성층은화학식 1로표현되는 n 형반도체화합물및 약 500 nm 내지약 600 nm의녹색파장영역에서선택적광흡수도가높은 p 형반도체화합물을포함하는유기광전소자를제공한다.
Abstract translation: 有机光电装置包括彼此面对的第一电极和第二电极以及第一电极和第二电极之间的有源层，所述有源层包括由化学式1表示的n型半导体化合物和p型半导体 在约500nm至约600nm的绿色波长区域中具有选择性光吸收的化合物。
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公开(公告)号：KR1020160018029A
公开(公告)日：2016-02-17
申请号：KR1020140101908
申请日：2014-08-07
Applicant: 삼성전자주식회사
IPC: C09K11/06 , H01L51/50 , H01L27/146
CPC classification number: H01L51/008 , H01L27/307 , H01L51/0046 , H01L51/0078 , H01L51/4253 , H01L51/442 , H01L2251/308
Abstract: 서로마주하는제1 전극과제2 전극, 그리고상기제1 전극과상기제2 전극사이에위치하고제1 화합물을포함하는활성층을포함하고, 상기제1 화합물은하기화학식 1 또는 2로표현되고, [화학식 1] [화학식 2]상기제1 화합물은용액상태와박막상태에서의파장에따른흡광곡선의반치폭의비율이하기관계식 1을만족하는유기광전소자및 이를포함하는이미지센서와전자장치에관한것이다. [관계식 1] FWHM2/FWHM1
Abstract translation: 本发明涉及有机光电装置，包括该有机光电装置的图像传感器和电子装置。 有机光电器件包括彼此面对的第一电极和第二电极以及位于第一电极和第二电极之间的有源层，并且包括第一化合物，其中第一化合物由化学式1或2表示，并且具有 根据溶液状态的波长和薄膜状态的满足式1的光吸收曲线的半值的比率。 [相互作用式1] FWHM2 / FWHM1 <2.5在式1中，FWHM1是根据溶液状态的波长的光吸收曲线的半值宽度，FWHM2是根据光吸收曲线的半值宽度 波长处于薄膜状态。
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公开(公告)号：KR1020100006422A
公开(公告)日：2010-01-19
申请号：KR1020080066639
申请日：2008-07-09
Applicant: 삼성전자주식회사
IPC: B82B3/00
CPC classification number: B82Y30/00 , C23C16/401 , Y10S977/707 , Y10T428/24355 , Y10T428/24372
Abstract: PURPOSE: A nano structure thin film which is easy to control physical characteristic, surface energy and optical characteristic is provided. CONSTITUTION: A nano structure thin film comprises: a nanoparticle layer containing plural nanoparticle, and micro concave and convex which is formed on the surface of the nanoparticle. The size of the micro concave and convex is smaller than nanoparticle. The micro concave and convex is plural. The nanoparticle layer is single layer or multi-layer. The nanoparticle is single nanoparticle comprising inorganic, metal, semiconductor or polymer or double nanoparticle having core-shell structure. The nanoparticle contains a material selected from gold, silver, chrome, molybdenum, nickel, iron, cobalt, titanium, zinc oxide, alumina, silicon, and poly stylene.
Abstract translation: 目的：提供易于控制物理特性，表面能和光学特性的纳米结构薄膜。 构成：纳米结构薄膜包括：包含多个纳米颗粒的纳米颗粒层，以及形成在纳米颗粒表面上的微凹凸。 微凹凸的尺寸小于纳米颗粒。 微凹凸是复数。 纳米颗粒层是单层或多层。 纳米颗粒是包含具有核 - 壳结构的无机，金属，半导体或聚合物或双重纳米颗粒的单一纳米颗粒。 纳米颗粒含有选自金，银，铬，钼，镍，铁，钴，钛，氧化锌，氧化铝，硅和聚苯乙烯的材料。
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公开(公告)号：KR1020090106277A
公开(公告)日：2009-10-08
申请号：KR1020080031873
申请日：2008-04-04
CPC classification number: C09D183/16 , C08G77/045 , C08G77/16 , C08G77/18 , C08G77/62 , C08J7/042 , C08J2381/06 , C08J2483/04 , C08J2483/16 , C09D183/04 , Y10T428/31663
Abstract: PURPOSE: A protective film and a bag material comprising the same are provided to be produced in a low-temperature wet process. CONSTITUTION: A protective film comprises a first coating film including silazane-based compound, and a second coating film including siloxane-based compound. The silazane-based compound is represented by the formula 1 of (SiR1R2-NR3)n. In the formula 1, the R1, R2, and R3 can be the same or independently different ones among hydrogen atom, C1-C5 alkyl groups, alkenyl groups, or alkynyl groups; and the n is an integer of 500 to 1,000,000.
Abstract translation: 目的：提供一种保护膜和包含该保护膜的袋材料，以在低温湿法中制备。 构成：保护膜包括含有硅氮烷类化合物的第一涂膜和含硅氧烷类化合物的第二涂膜。 基于硅氮烷的化合物由（SiR1R2-NR3）n的式1表示。 在式1中，R 1，R 2和R 3可以是氢原子，C 1 -C 5烷基，链烯基或炔基中相同或不同的基团; n为500〜1,000,000的整数。
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