광증폭 듀플렉서
    11.
    发明公开
    광증폭 듀플렉서 失效
    光学增强型电子倍增器

    公开(公告)号:KR1020070059816A

    公开(公告)日:2007-06-12

    申请号:KR1020060014685

    申请日:2006-02-15

    Abstract: An optically boosted electro-absorption duplexer is provided to realize a base station at low cost by performing monolithic integration through general photolithography, dry etching, and selective wet etching without using a selective area growth or butt-joint coupling method. An optically boosted electro-absorption duplexer includes a substrate(120E). A separation area(100) is formed with a first epitaxial layer composed of at least one material layer on the substrate(120E). The separation area(100) includes a first optical waveguide(100W). A photo-detecting modulating unit(200) is formed with a second epitaxial layer composed of at least one material layer on the first epitaxial layer. The photo-detecting modulating unit(200) detects and modulates an optical signal and includes a second optical waveguide(300W). An optical amplifying unit(300) is formed with a third epitaxial layer composed of at least one material layer on the second epitaxial layer. The optical amplifying unit(300) amplifies the optical signal and includes the second optical waveguide(300W) and a third optical waveguide(500W). The optical amplifying unit(300) and the photo-detecting modulating unit(200) are electrically separated from each other at the separation area(100). The optical amplifying unit(300) is formed on at least one side of the photo-detecting modulating unit(200).

    Abstract translation: 提供一种光学增强的电吸收双工器,以通过通常的光刻,干法蚀刻和选择性湿法蚀刻而不使用选择性区域生长或对接耦合方法来实现低成本的基站。 光学增强的电吸收双工器包括基板(120E)。 分离区(100)形成有由衬底(120E)上的至少一个材料层构成的第一外延层。 分离区域(100)包括第一光波导(100W)。 光检测调制单元(200)形成有由第一外延层上的至少一个材料层构成的第二外延层。 光检测调制单元(200)检测并调制光信号,并包括第二光波导(300W)。 光放大单元(300)形成有由第二外延层上的至少一个材料层构成的第三外延层。 光放大单元(300)放大光信号,并包括第二光波导(300W)和第三光波导(500W)。 光学放大单元(300)和光电检测调制单元(200)在分离区域(100)处彼此电分离。 光放大单元(300)形成在光检测调制单元(200)的至少一侧。

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