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公开(公告)号：EP2094825A4
公开(公告)日：2012-03-21
申请号：EP07864023
申请日：2007-11-07
Applicant: ADVANCED TECH MATERIALS
Inventor： VISINTIN PAMELA M , KORZENSKI MICHAEL B
CPC classification number: C11D11/0047 , C11D3/0073 , C11D3/02 , C11D3/042 , C11D3/046 , C11D3/06 , C11D3/08 , C11D3/28 , C11D3/30 , C11D3/43 , C11D7/08 , C11D7/3209 , C11D7/3218 , C11D7/3281 , C11D7/5004 , H01L21/02074 , H01L21/02101 , H01L21/31111 , H01L27/10844
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12.发明公开COMPOSITIONS AND METHODS FOR THE REMOVAL OF PHOTORESIST FOR A WAFER REWORK APPLICATION 审中-公开组合物和方法除漆的照片，以晶圆返工
公开(公告)号：EP2082024A4
公开(公告)日：2010-11-17
申请号：EP07843089
申请日：2007-09-25
Applicant: ADVANCED TECH MATERIALS
Inventor： VISINTIN PAMELA M , KORZENSKI MICHAEL B
CPC classification number: C11D11/0047 , C11D1/008 , C11D3/044 , C11D3/2068 , C11D3/30 , G03F7/425
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13.发明公开REMOVAL OF HIGH-DOSE ION-IMPLANTED PHOTORESIST USING SELF-ASSEMBLED MONOLAYERS IN SOLVENT SYSTEMS 审中-公开在溶剂中的PHOTO HOCHIONENDOTIERTEM自组装膜除漆
公开(公告)号：EP1877530A4
公开(公告)日：2010-06-09
申请号：EP06749725
申请日：2006-04-10
Applicant: ADVANCED TECH MATERIALS
Inventor： KORZENSKI MICHAEL B , VISINTIN PAMELA M , BAUM THOMAS H
IPC: H01L21/311 , C11D1/00 , C11D1/02 , C11D1/72 , C11D3/20 , C11D3/30 , C11D3/43 , C11D3/44 , G03F7/42
CPC classification number: H01L21/31133 , B82Y30/00 , C11D3/162 , C11D3/28 , C11D3/30 , C11D3/43 , C11D7/22 , C11D7/3209 , C11D7/5004 , C11D11/0047 , G03F7/422 , G03F7/425 , H01L21/266
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