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    Inspection Apparatus And Device Manufacturing Method
    12.
    发明申请
    Inspection Apparatus And Device Manufacturing Method 审中-公开
    检验装置及装置制造方法

    公开(公告)号：US20160091422A1

    公开(公告)日：2016-03-31

    申请号：US14850917

    申请日：2015-09-10

    Applicant: ASML Netherlands B.V.

    Inventor： Gerbrand Van Der Zouw

    IPC: G01N21/47

    CPC classification number: G01N21/4738 ,  G01N21/956 ,  G01N2021/95676 ,  G01N2201/061 ,  G01N2201/0636 ,  G01N2201/12 ,  G03F7/70625 ,  G03F7/70633

    Abstract: An inspection apparatus comprises an illumination system (12) for illuminating a target structure with illuminating radiation and a collection system for collecting the illuminating radiation after it has been scattered by the target structure. A programmable spatial light modulator (713) comprises an array of movable mirror elements (742) in a conjugate pupil plane (P″) of the illumination system. Between the array of mirror elements and the target a common optical path is defined forming part of the illumination system and the collection system. Each mirror element is movable between a first position where it reflects illuminating radiation into the common optical path and a second position where it reflects radiation from the common optical path toward a detector (19, 23). Various combinations of illumination aperture and collection aperture can be defined without the light losses associated with beam splitters and transmissive spatial light modulators.

    Abstract translation: 检查装置包括用于照射具有照射辐射的目标结构的照明系统（12）和用于在被目标结构散射之后收集照射辐射的收集系统。 可编程空间光调制器（713）包括在照明系统的共轭光瞳平面（P“）中的可移动镜元件阵列（742）。 在镜子阵列和目标之间，定义了形成照明系统和收集系统的一部分的公共光路。 每个镜元件可以在其将照射辐射反射到公共光路的第一位置和其中将来自公共光路的辐射反射到检测器（19,23）的第二位置之间移动。 可以定义照明孔径和收集孔径的各种组合，而不会与分束器和透射空间光调制器相关联的光损耗。

    Method of inspecting a substrate, metrology apparatus, and lithographic system
    15.
    发明授权
    Method of inspecting a substrate, metrology apparatus, and lithographic system 有权

    公开(公告)号：US10534274B2

    公开(公告)日：2020-01-14

    申请号：US15723820

    申请日：2017-10-03

    Applicant: ASML Netherlands B.V.

    Inventor： Teunis Willem Tukker ,  Amandev Singh ,  Gerbrand Van Der Zouw

    IPC: G03F7/20 ,  G01B11/27 ,  G01N21/956 ,  G01B9/02 ,  G01N21/95

    Abstract: Metrology apparatus and methods for inspecting a substrate are disclosed. A source beam of radiation emitted by a radiation source is split into a measurement beam and a reference beam. A first target on the substrate is illuminated with the measurement beam. A second target separated from the substrate is illuminated with the reference beam. First scattered radiation collected from the first target and second scattered radiation collected from the second target are delivered to the detector. The first scattered radiation interferes with the second scattered radiation at the detector. The first target comprises a first pattern. The second target comprises a second pattern, or a pupil plane image of the second pattern. The first pattern is geometrically identical to the second pattern, the first pattern and the second pattern are periodic and a pitch of the first pattern is identical to a pitch of the second pattern, or both.

    Measurement system, lithographic system, and method of measuring a target
    16.
    发明授权
    Measurement system, lithographic system, and method of measuring a target 有权

    公开(公告)号：US10437159B2

    公开(公告)日：2019-10-08

    申请号：US15802701

    申请日：2017-11-03

    Applicant: ASML Netherlands B.V.

    Inventor： Teunis Willem Tukker ,  Gerbrand Van Der Zouw ,  Amandev Singh

    IPC: G01N21/95 ,  G03F7/20 ,  G01N21/956 ,  G03F9/00

    Abstract: A measurement system is disclosed in which a first optical system splits an input radiation beam into a plurality of components. A modulator receives the plurality of components and applies a modulation to at least one of the components independently of at least one other of the components. A second optical system illuminates a target with the plurality of components and directs radiation scattered by the target to a detection system. The detection system distinguishes between each of one or more components, or between each of one or more groups of components, of the radiation directed to the detection system based on the modulation applied to each component or each group of components by the modulator.

    Metrology method and apparatus, computer program and lithographic system
    17.
    发明授权
    Metrology method and apparatus, computer program and lithographic system 有权

    公开(公告)号：US10423077B2

    公开(公告)日：2019-09-24

    申请号：US16223372

    申请日：2018-12-18

    Applicant: ASML Netherlands B.V.

    Inventor： Nitesh Pandey ,  Zili Zhou ,  Armand Eugene Albert Koolen ,  Gerbrand Van Der Zouw

    IPC: G03B27/42 ,  G01N21/55 ,  G03F7/20 ,  G01B11/27 ,  G01N21/47

    Abstract: Disclosed is a metrology apparatus for measuring a parameter of a lithographic process, and associated computer program and method. The metrology apparatus comprises an optical system for measuring a target on a substrate by illuminating the target with measurement radiation and detecting the measurement radiation scattered by the target; and an array of lenses. Each lens of the array is operable to focus the scattered measurement radiation onto a sensor, said array of lenses thereby forming an image on the sensor which comprises a plurality of sub-images, each sub-image being formed by a corresponding lens of the array of lenses. The resulting plenoptic image comprises image plane information from the sub-images, wavefront distortion information (from the relative positions of the sub-images) and pupil information from the relative intensities of the sub-images.

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