公开(公告)号：EP3783636A1

公开(公告)日：2021-02-24

申请号：EP19192198.0

申请日：2019-08-19

Applicant: ASML Netherlands B.V.

Inventor： HUISMAN, Thomas, Jarik ,  HASAN, Shakeeb Bin

IPC: H01J37/22 ,  H01J37/28

Abstract: Systems and methods for image enhancement are disclosed. A method for enhancing an image may include acquiring a scanning electron microscopy (SEM) image. The method may also include simulating diffused charge associated with a position of the SEM image. The method may further include providing an enhanced SEM image based on the SEM image and the diffused charge.

公开(公告)号：EP3696846A1

公开(公告)日：2020-08-19

申请号：EP19157009.2

申请日：2019-02-13

Applicant: ASML Netherlands B.V.

Inventor： HASAN, Shakeeb Bin ,  REN, Yan

IPC: H01J37/04 ,  H01J37/05 ,  H01J37/26

Abstract: Disclosed among other aspects is a charged particle inspection system including a passive monochromator arranged to modify the energy distribution of electrons in a beam to reduce the energy spread of the electrons, with the passive monochromator including a metamaterial absorber configured as absorbing structures provided on a transparent conductive layer and a method using such a passive monochromator.