公开(公告)号：US10663872B2

公开(公告)日：2020-05-26

申请号：US16263429

申请日：2019-01-31

Applicant: ASML Netherlands B.V.

Inventor： Hans Butler

IPC: G03B27/62 ,  G03F7/20 ,  G03F9/00

Abstract: A lithographic apparatus includes a patterning device support to support a patterning device, the patterning device system including a moveable structure movably arranged relative to an object, a patterning device holder movably arranged relative to the movable structure to hold the patterning device, an actuator to move the movable structure relative to the object, and an ultra short stroke actuator to move the patterning device holder with respect to the movable structure; a substrate support to hold a substrate; a projection system to project a patterned radiation beam onto a target portion of the substrate; a transmission image sensor for measuring a position of the patterned radiation beam downstream of the projection system; and a calibrator for determining a relationship between magnitude of an applied control signal to the ultra short stroke actuator and resulting change in position of the patterned radiation beam and/or patterning device holder and/or patterning device.

公开(公告)号：US10649347B2

公开(公告)日：2020-05-12

申请号：US16219449

申请日：2018-12-13

Applicant: ASML Netherlands B.V.

Inventor： Michael Johannes Christiaan Ronde ,  Lucas Kuindersma ,  Niels Johannes Maria Bosch ,  Hans Butler ,  Cornelius Adrianus Lambertus De Hoon ,  Marc Wilhelmus Maria Van Der Wijst ,  Thijs Verhees ,  Sander Kerssemakers

IPC: G03B27/42 ,  G03F7/20 ,  H01J37/26

Abstract: An apparatus having: a system configured to measure an object; a base structure; an object support constructed to hold the object, the object support movably supported on the base structure; a balance mass configured to absorb a reaction force arising from movement of the object support; an actuator connected to the balance mass and the base structure, the actuator configured to apply a force to the balance mass and the base structure; a sensor configured to produce a signal for a measured characteristic of the base structure corresponding to a disturbance, or its effect, acting on the base structure; and a control system configured to determine, based on at least the signal for the measured characteristic of the base structure, a signal for the actuator to apply a force to the base structure and/or the balance mass.

公开(公告)号：US10551751B2

公开(公告)日：2020-02-04

申请号：US14395436

申请日：2013-03-18

Applicant: ASML Netherlands B.V.

Inventor： Hans Butler ,  Marc Wilhelmus Maria Van Der Wijst

IPC: G03B27/58 ,  G03F7/20 ,  G03F9/00

Abstract: A lithography apparatus and device manufacturing methods are disclosed. A lithography apparatus includes a support stage, and a measurement system including a sensor part and a reference part, the measurement system being configured to determine the position and/or orientation of the support stage, or of a component mounted on the support stage, relative to a reference frame by using the sensor part to interact with the reference part, wherein: the reference frame comprises N sub-frames coupled together so as to behave predominantly as a single rigid body with respect to vibrations below a first reference frequency and predominantly as an N-body system with respect to vibrations above a second reference frequency, where N is an integer greater than 1.

公开(公告)号：US20190384184A1

公开(公告)日：2019-12-19

申请号：US16431833

申请日：2019-06-05

Applicant: ASML Netherlands B.V.

Inventor： Nitesh Pandey ,  Arie Jeffrey Den Boef ,  Duygu Akbulut ,  Marinus Johannes Maria Van Dam ,  Hans Butler ,  Hugo Augustinus Joseph Cramer ,  Engelbertus Antonius Fransiscu Van Der Pasch ,  Ferry Zijp ,  Jeroen Arnoldus Leonardus Raaymakers ,  Marinus Petrus Reijnders

IPC: G03F7/20 ,  G01N21/956

Abstract: A metrology tool for determining a parameter of interest of a structure fabricated on a substrate, the metrology tool comprising: an illumination optical system for illuminating the structure with illumination radiation under a non-zero angle of incidence; a detection optical system comprising a detection optical sensor and at least one lens for capturing a portion of illumination radiation scattered by the structure and transmitting the captured radiation towards the detection optical sensor, wherein the illumination optical system and the detection optical system do not share an optical element.

公开(公告)号：US10338483B2

公开(公告)日：2019-07-02

申请号：US16070848

申请日：2017-01-30

Applicant: ASML NETHERLANDS B.V.

Inventor： Robbert Edgar Van Leeuwen ,  Hans Butler

IPC: G03F7/20 ,  H01L41/00 ,  H01L41/02 ,  H01L41/04 ,  G01B9/02

Abstract: An actuator system configured to position an object, the actuator system includes a piezo actuator having an actuator contact surface. The piezo actuator is configured to exert a force via the actuator contact surface onto the object. The piezo actuator includes a transparent piezo material. The actuator system further has an optical position sensor configured to measure a position of the actuator contact surface. The optical position sensor is configured to transmit an optical beam through the transparent piezo material to the actuator contact surface. The optical position sensor may form an interferometer.

公开(公告)号：US10261428B2

公开(公告)日：2019-04-16

申请号：US15185626

申请日：2016-06-17

Applicant: ASML NETHERLANDS B.V.

Inventor： Joeri Lof ,  Erik Theodorus Maria Bijlaart ,  Hans Butler ,  Sjoerd Nicolaas Lambertus Donders ,  Christiaan Alexander Hoogendam ,  Aleksey Yurievich Kolesnychenko ,  Erik Roelof Loopstra ,  Hendricus Johannes Maria Meijer ,  Jeroen Johannes Sophia Maria Mertens ,  Johannes Catharinus Hubertus Mulkens ,  Roelof Aeilko Siebrand Ritsema ,  Frank Van Schaik ,  Timotheus Franciscus Sengers ,  Klaus Simon ,  Joannes Theodoor De Smit ,  Alexander Straaijer ,  Bob Streefkerk ,  Helmar Van Santen

IPC: G03B27/58 ,  G03F7/20

Abstract: A lithographic projection apparatus is disclosed in which a space between the projection system and the substrate is filled with a liquid. An edge seal member at least partly surrounds the substrate or other object on a substrate table to prevent liquid loss when edge portions of the substrate or other object are, for example, imaged or illuminated. A lithographic projection apparatus includes a support structure configured to hold a patterning device, the patterning device configured to pattern a beam of radiation according to a desired pattern; a substrate table configured to hold a substrate; a projection system configured to project the patterned beam onto a target portion of the substrate; a liquid supply system configured to provide liquid to a space between the projection system and the substrate; and a shutter configured to isolate the space from the substrate or a space to be occupied by a substrate.

公开(公告)号：US10216093B2

公开(公告)日：2019-02-26

申请号：US14762190

申请日：2013-12-12

Applicant: ASML Netherlands B.V.

Inventor： Marcus Adrianus Van De Kerkhof ,  Anton Bernhard Van Oosten ,  Hans Butler ,  Erik Roelof Loopstra ,  Marc Wilhelmus Maria Van Der Wijst ,  Koen Jacobus Johannes Maria Zaal

IPC: G03F7/20 ,  G02B7/182 ,  G02B26/08

Abstract: Disclosed is a system configured to project a beam of radiation onto a target portion of a substrate within a lithographic apparatus. The system comprises a mirror (510) having an actuator (500) for positioning the mirror and/or configuring the shape of the mirror, the actuator also providing active damping to the mirror, and a controller (515a, 515b) for generating actuator control signals for control of said actuator(s). A first coordinate system is used for control of said actuator(s) when positioning said mirror and/or configuring the shape of said mirror and a second coordinate system is used for control of said actuator(s) when providing active damping to said mirror.

公开(公告)号：US09946168B2

公开(公告)日：2018-04-17

申请号：US14396027

申请日：2013-04-05

Applicant: ASML NETHERLANDS B.V.

Inventor： Hans Butler

IPC: G03B27/62 ,  G03B27/42 ,  G03F7/20

CPC classification number: G03F7/70725 ,  G03F7/70191 ,  G03F7/70516 ,  G03F7/70758 ,  G03F7/70775 ,  G03F7/70783 ,  G03F7/70825

Abstract: A lithographic apparatus includes a patterning device support to support a patterning device to form a patterned radiation beam, the patterning device support including a moveable structure movably arranged with respect to an object, a patterning device holder movably arranged relative to the movable structure and holding the patterning device, an actuator to move the movable structure relative to the object, and an ultra short stroke actuator to move the patterning device holder relative to the movable structure; a substrate support to hold a substrate; and a projection system to project the patterned radiation beam onto the substrate, a position measurement system for measuring a substrate positional error which is a difference between a desired position and an actual position of the substrate relative to a reference object; and a controller to move the actuator and the ultra short stroke actuator based on the substrate positional error.

公开(公告)号：US20160004170A1

公开(公告)日：2016-01-07

申请号：US14852952

申请日：2015-09-14

Applicant: ASML Netherlands B.V. ,  Carl Zeiss SMT GmbH

Inventor： Marc Wilhelmus Maria VAN DER WIJST ,  Hans Butler ,  Erik Roelof Loopstra ,  Bernhard Geuppert ,  Marco Hendrikus Hermanus Oude Nijhuis ,  Rodolfo Guglielmi Rabe ,  Yim Bun Patrick Kwan ,  Dick Antonius Hendrikus Laro

IPC: G03F7/20 ,  F16F15/02 ,  F16F15/08

CPC classification number: G03F7/70141 ,  F16F15/022 ,  F16F15/08 ,  G03F7/708 ,  G03F7/709

Abstract: Lithography apparatus and device manufacturing methods are disclosed in which means are provided for reducing the extent to which vibrations propagate between a first element of a projection system and a second element of a projection system. Approaches disclosed include the use of plural resilient members in series as part of a vibration isolation system, plural isolation frames for separately supporting first and second projection system frames, and modified connection positions for the interaction between the first and second projection system frames and the isolation frame(s).

Abstract translation: 公开了平版印刷设备和设备制造方法，其中提供了用于减少振动在投影系统的第一元件和投影系统的第二元件之间传播的程度的装置。 所公开的方法包括使用多个弹性构件串联作为隔振系统的一部分，用于分开支撑第一和第二投影系统框架的多个隔离框架以及用于第一和第二投影系统框架之间的相互作用的修改的连接位置以及隔离 框架。

公开(公告)号：US20150153661A1

公开(公告)日：2015-06-04

申请号：US14388773

申请日：2013-02-15

Applicant: ASML Netherlands B.V.

Inventor： Bastiaan Lambertus Wilhelmus Marinus Van De Ven ,  Antonius Franciscus Johannes De Groot ,  Christiaan Alexander Hoogendam ,  Erik Roelof Loopstra ,  Hans Butler

IPC: G03F9/00 ,  H02K41/02

CPC classification number: G03F7/70758 ,  G03F7/70716 ,  G03F7/70725 ,  G03F7/70733 ,  G03F9/70 ,  H02K41/02

Abstract: A substrate table system includes a substrate table and a dual directional motor for moving the substrate table in a plane of movement that is defined by a first direction and a second direction. The dual directional motor includes: a first pusher structure extending in the first direction, the substrate table being movable in respect of the first pusher structure, the first pusher structure and the substrate table being arranged to cooperate to form a first motor to exert a force between the first pusher structure and the substrate table in the first direction; and a second pusher structure extending in the first direction, the substrate table being movable in respect of the second pusher structure, the second pusher structure and the substrate table to cooperate to form a second motor to exert a force between the second pusher structure and the substrate table in the second direction.

Abstract translation: 衬底台系统包括衬底台和用于在由第一方向和第二方向限定的运动平面中移动衬底台的双向电动机。 双向电动机包括：沿第一方向延伸的第一推动器结构，所述衬底台相对于第一推动器结构可移动，第一推动器结构和衬底台布置成协作以形成第一电动机以施加力 在所述第一推动器结构和所述基板台之间沿所述第一方向; 以及沿所述第一方向延伸的第二推动器结构，所述衬底台可相对于所述第二推动器结构，所述第二推动器结构和所述衬底台移动以协作以形成第二电动机，以在所述第二推动器结构和所述第二推动器结构之间施加力 衬底台在第二个方向。