公开(公告)号：US10151984B2

公开(公告)日：2018-12-11

申请号：US14928891

申请日：2015-10-30

Applicant: ASML NETHERLANDS B.V.

Inventor： Jeroen Peter Johannes Bruijstens ,  Richard Joseph Bruls ,  Hans Jansen ,  Siebe Landheer ,  Laurentius Catrinus Jorritsma ,  Arnout Johannes Meester ,  Bauke Jansen ,  Ivo Adam Johannes Thomas ,  Marcio Alexandre Cano Miranda ,  Maurice Martinus Johannes Van Der Lee ,  Gheorghe Tanasa ,  Lambertus Dominicus Noordam

IPC: G03F7/20 ,  G03B27/52

Abstract: A lithographic apparatus is disclosed that includes a projection system, and a liquid confinement structure configured to at least partly confine immersion liquid to an immersion space defined by the projection system, the liquid confinement structure and a substrate and/or substrate table. Measures are taken in the lithographic apparatus, for example, to reduce the effect of droplets on the final element of the projection system or to substantially avoid such droplet formation.

公开(公告)号：US10146139B2

公开(公告)日：2018-12-04

申请号：US15623091

申请日：2017-06-14

Applicant: ASML NETHERLANDS B.V.

Inventor： Ivo Adam Johannes Thomas ,  Siebe Landheer ,  Arnout Johannes Meester ,  Marcio Alexandre Cano Miranda ,  Gheorghe Tanasa

IPC: G03B27/42 ,  G03F7/20 ,  G03B27/52

Abstract: A lithographic apparatus comprising a projection system, and a liquid confinement structure configured to at least partly confine immersion liquid to an immersion space defined by the projection system, the liquid confinement structure and a substrate and/or substrate table is disclosed wherein a measure is taken to reduce the effect of droplets and/or a liquid film on the last element of the projection system.