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公开(公告)号：US10191377B2
公开(公告)日：2019-01-29
申请号：US15482526
申请日：2017-04-07
Applicant: ASML NETHERLANDS B.V.
Inventor： Hrishikesh Patel , Johannes Henricus Wilhelmus Jacobs , Gerardus Adrianus Antonius Maria Kusters , Thibault Simon Mathieu Laurent , Marcio Alexandre Cano Miranda , Ruud Hendricus Martinus Johannes Bloks , Peng Feng , Johan Gertrudis Cornelis Kunnen
IPC: G03F7/20 , G03F7/30 , H01L21/027 , H01L21/67
Abstract: An immersion lithographic apparatus is provided having a substrate table including a drain configured to receive immersion fluid which leaks into a gap between an edge of a substrate on the substrate table and an edge of a recess in which the substrate is located. A thermal conditioning system is provided to thermally condition at least the portion of the recess supporting the substrate by directing one or more jets of fluid onto a reverse side of the section supporting the substrate.
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公开(公告)号：US09709901B2
公开(公告)日：2017-07-18
申请号：US14586390
申请日：2014-12-30
Applicant: ASML NETHERLANDS B.V.
Inventor： Ivo Adam Johannes Thomas , Siebe Landheer , Arnout Johannes Meester , Marcio Alexandre Cano Miranda , Gheorghe Tanasa
CPC classification number: G03F7/70341 , G03B27/52 , G03F7/70891
Abstract: A lithographic apparatus comprising a projection system, and a liquid confinement structure configured to at least partly confine immersion liquid to an immersion space defined by the projection system, the liquid confinement structure and a substrate and/or substrate table is disclosed wherein a measure is taken to reduce the effect of droplets and/or a liquid film on the last element of the projection system.
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公开(公告)号：US20190086814A1
公开(公告)日：2019-03-21
申请号：US16194567
申请日：2018-11-19
Applicant: ASML NETHERLANDS B.V.
Inventor： Jeroen Peter Johannes Bruijstens , Richard Joseph Bruls , Hans Jansen , Siebe Landheer , Laurentinus Catrinus Jorritsma , Arnout Johannes Meester , Bauke Jansen , Ivo Adam Johannes Thomas , Marcio Alexandre Cano Miranda , Maurice Martinus Johannes Van Der Lee , Gheorghe Tanasa , Lambertus Dominicus Noordam
CPC classification number: G03F7/70341 , G03B27/52
Abstract: A lithographic apparatus is disclosed that includes a projection system, and a liquid confinement structure configured to at least partly confine immersion liquid to an immersion space defined by the projection system, the liquid confinement structure and a substrate and/or substrate table. Measures are taken in the lithographic apparatus, for example, to reduce the effect of droplets on the final element of the projection system or to substantially avoid such droplet formation.
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公开(公告)号：US20160124319A1
公开(公告)日：2016-05-05
申请号：US14928891
申请日：2015-10-30
Applicant: ASML NETHERLANDS B.V.
Inventor： Jeroen Peter Johannes Bruijstens , Richard Joseph Bruls , Hans Jansen , Siebe Landheer , Laurentius Catrinus Jorritsma , Arnout Johannes Meester , Bauke Jansen , Ivo Adam Johannes Thomas , Marcio Alexandre Cano Miranda , Maurice Martinus Johannes Van Der Lee , Gheorghe Tanasa , Lambertus Dominicus Noordam
IPC: G03F7/20
CPC classification number: G03F7/70341 , G03B27/52
Abstract: A lithographic apparatus is disclosed that includes a projection system, and a liquid confinement structure configured to at least partly confine immersion liquid to an immersion space defined by the projection system, the liquid confinement structure and a substrate and/or substrate table. Measures are taken in the lithographic apparatus, for example, to reduce the effect of droplets on the final element of the projection system or to substantially avoid such droplet formation.
Abstract translation: 公开了一种光刻设备，其包括投影系统和液体限制结构，其被配置为至少部分地将浸没液体限制在由投影系统，液体限制结构和基板和/或基板台所限定的浸没空间中。 例如，在光刻设备中采取措施来减少液滴对投影系统的最终元件的影响或基本避免这种液滴的形成。
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公开(公告)号：US20140098353A1
公开(公告)日：2014-04-10
申请号：US14106403
申请日：2013-12-13
Applicant: ASML NETHERLANDS B.V.
Inventor： Michel RIEPEN , Christiaan Alexander Hoogendam , Paulus Martinus Maria Liebregts , Ronald Van Der Ham , Wilhelmus Franciscus Johannes Simons , Daniël Jozef Maria Direcks , Paul Petrus Joannes Berkvens , Eva Mondt , Gert-Jan Gerardus Johannes Thomas Brands , Koen Steffens , Han Henricus Aldegonda Lempens , Mathieus Anna Karel Van Lierop , Christophe De Metsenaere , Marcio Alexandre Cano Miranda , Patrick Johannes Wilhelmus Spruytenburg , Joris Johan Anne-Marie Verstraete
IPC: G03F7/20
CPC classification number: G03F7/70866 , G03F7/70341
Abstract: A liquid confinement system for use in immersion lithography is disclosed in which the meniscus of liquid between the liquid confinement system and the substrate is pinned substantially in place by a meniscus pinning feature. The meniscus pinning feature comprises a plurality of discrete outlets arranged in a polygonal shape.
Abstract translation: 公开了一种用于浸没式光刻术的液体限制系统，其中液体限制系统和衬底之间的液体弯液面通过弯液面钉扎特征基本上固定就位。 弯液面钉扎特征包括以多边形形式布置的多个分立出口。
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Patent Agency Ranking
公开(公告)号：USRE49297E1
公开(公告)日：2022-11-15
申请号：US16656627
申请日：2019-10-18
Applicant: ASML NETHERLANDS B.V.
Inventor： Hrishikesh Patel , Johannes Henricus Wilhelmus Jacobs , Gerardus Adrianus Antonius Maria Kusters , Thibault Simon Mathieu Laurent , Marcio Alexandre Cano Miranda , Ruud Hendricus Martinus Johannes Bloks , Peng Feng , Johan Gertrudis Cornelis Kunnen
IPC: G03F7/20 , G03F7/30 , H01L21/027 , H01L21/67
Abstract: An immersion lithographic apparatus is provided having a substrate table including a drain configured to receive immersion fluid which leaks into a gap between an edge of a substrate on the substrate table and an edge of a recess in which the substrate is located. A thermal conditioning system is provided to thermally condition at least the portion of the recess supporting the substrate by directing one or more jets of fluid onto a reverse side of the section supporting the substrate.
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公开(公告)号：US09645506B2
公开(公告)日：2017-05-09
申请号：US14106403
申请日：2013-12-13
Applicant: ASML NETHERLANDS B.V.
Inventor： Michel Riepen , Christiaan Alexander Hoogendam , Paulus Martinus Maria Liebregts , Ronald Van Der Ham , Wilhelmus Franciscus Johannes Simons , Daniël Jozef Maria Direcks , Paul Petrus Joannes Berkvens , Eva Mondt , Gert-Jan Gerardus Johannes Thomas Brands , Koen Steffens , Han Henricus Aldegonda Lempens , Mathieus Anna Karel Van Lierop , Christophe De Metsenaere , Marcio Alexandre Cano Miranda , Patrick Johannes Wilhelmus Spruytenburg , Joris Johan Anne-Marie Verstraete , Franciscus Johannes Joseph Janssen
CPC classification number: G03F7/70866 , G03F7/70341
Abstract: A liquid confinement system for use in immersion lithography is disclosed in which the meniscus of liquid between the liquid confinement system and the substrate is pinned substantially in place by a meniscus pinning feature. The meniscus pinning feature comprises a plurality of discrete outlets arranged in a polygonal shape.
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公开(公告)号：US20150109592A1
公开(公告)日：2015-04-23
申请号：US14586390
申请日：2014-12-30
Applicant: ASML NETHERLANDS B.V.
Inventor： Ivo Adam Johannes THOMAS , Siebe Landheer , Arnout Johannes Meester , Marcio Alexandre Cano Miranda , Gheorghe Tanasa
IPC: G03F7/20
CPC classification number: G03F7/70341 , G03B27/52 , G03F7/70891
Abstract: A lithographic apparatus comprising a projection system, and a liquid confinement structure configured to at least partly confine immersion liquid to an immersion space defined by the projection system, the liquid confinement structure and a substrate and/or substrate table is disclosed wherein a measure is taken to reduce the effect of droplets and/or a liquid film on the last element of the projection system.
Abstract translation: 一种包括投影系统和液体限制结构的光刻设备，其被配置为至少部分地将浸没液体限制在由投影系统，液体限制结构和衬底和/或衬底台限定的浸没空间中，其中采取措施 以减少液滴和/或液膜对投影系统的最后一个元件的影响。
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公开(公告)号：US10429741B2
公开(公告)日：2019-10-01
申请号：US16194567
申请日：2018-11-19
Applicant: ASML NETHERLANDS B.V.
Inventor： Jeroen Peter Johannes Bruijstens , Richard Joseph Bruls , Hans Jansen , Siebe Landheer , Laurentius Catrinus Jorritsma , Arnout Johannes Meester , Bauke Jansen , Ivo Adam Johannes Thomas , Marcio Alexandre Cano Miranda , Maurice Martinus Johannes Van Der Lee , Gheorghe Tanasa , Lambertus Dominicus Noordam
Abstract: A lithographic apparatus is disclosed that includes a projection system, and a liquid confinement structure configured to at least partly confine immersion liquid to an immersion space defined by the projection system, the liquid confinement structure and a substrate and/or substrate table. Measures are taken in the lithographic apparatus, for example, to reduce the effect of droplets on the final element of the projection system or to substantially avoid such droplet formation.
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公开(公告)号：US10268127B2
公开(公告)日：2019-04-23
申请号：US15589705
申请日：2017-05-08
Applicant: ASML NETHERLANDS B.V.
Inventor： Michel Riepen , Christiaan Alexander Hoogendam , Paulus Martinus Maria Liebregts , Ronald Van Der Ham , Wilhelmus Franciscus Johannes Simons , Daniël Jozef Maria Direcks , Paul Petrus Joannes Berkvens , Eva Mondt , Gert-Jan Gerardus Johannes Thomas Brands , Koen Steffens , Han Henricus Aldegonda Lempens , Mathieus Anna Karel Van Lierop , Christophe De Metsenaere , Marcio Alexandre Cano Miranda , Patrick Johannes Wilhelmus Spruytenburg , Joris Johan Anne-Marie Verstraete , Franciscus Johannes Joseph Janssen
IPC: G03F7/20
Abstract: A liquid confinement system for use in immersion lithography is disclosed in which the meniscus of liquid between the liquid confinement system and the substrate is pinned substantially in place by a meniscus pinning feature. The meniscus pinning feature comprises a plurality of discrete outlets arranged in a polygonal shape.
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