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公开(公告)号：US20190086814A1
公开(公告)日：2019-03-21
申请号：US16194567
申请日：2018-11-19
Applicant: ASML NETHERLANDS B.V.
Inventor： Jeroen Peter Johannes Bruijstens , Richard Joseph Bruls , Hans Jansen , Siebe Landheer , Laurentinus Catrinus Jorritsma , Arnout Johannes Meester , Bauke Jansen , Ivo Adam Johannes Thomas , Marcio Alexandre Cano Miranda , Maurice Martinus Johannes Van Der Lee , Gheorghe Tanasa , Lambertus Dominicus Noordam
CPC classification number: G03F7/70341 , G03B27/52
Abstract: A lithographic apparatus is disclosed that includes a projection system, and a liquid confinement structure configured to at least partly confine immersion liquid to an immersion space defined by the projection system, the liquid confinement structure and a substrate and/or substrate table. Measures are taken in the lithographic apparatus, for example, to reduce the effect of droplets on the final element of the projection system or to substantially avoid such droplet formation.
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公开(公告)号：US10175585B2
公开(公告)日：2019-01-08
申请号：US14473643
申请日：2014-08-29
Applicant: ASML NETHERLANDS B.V.
Inventor： Robert Douglas Watso , Youri Johannes Laurentius Maria Van Dommelen , Johannes Henricus Wilhelmus Jacobs , Hans Jansen , Martinus Hendrikus Antonius Leenders , Jeroen Johannes Sophia Maria Mertens , Peter Paul Steijaert , Antonius Martinus Cornelis Petrus De Jong , Jimmy Matheus Wilhelmus Van De Winkel , Joao Paulo Da Paz Sena , Maurice Martinus Johannes Van Der Lee , Henricus Martinus Dorotheus Van Lier , Gheorghe Tanasa
Abstract: A lithographic projection apparatus is disclosed which includes a cleaning station. Several embodiments of the cleaning station are disclosed. In an embodiment, measures are taken to avoid contact of a cleaning fluid with the final element of the projection system. In an embodiment, measures are taken to avoid foaming of the cleaning fluid. The use of a thermally isolated island is also disclosed as well as its optimal position.
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公开(公告)号：US10216100B2
公开(公告)日：2019-02-26
申请号：US15738701
申请日：2016-06-16
Applicant: ASML Netherlands B.V.
Inventor： Seerwan Saeed , Petrus Martinus Gerardus Johannes Arts , Harold Sebastiaan Buddenberg , Erik Henricus Egidius Catharina Eummelen , Giovanni Luca Gattobigio , Floor Lodewijk Keukens , Ferdy Migchelbrink , Jeroen Arnoldus Leonardus Johannes Raaymakers , Arnoldus Johannes Martinus Jozeph Ras , Gheorghe Tanasa , Jimmy Matheus Wilhelmus Van De Winkel , Daan Daniel Johannes Antonius Van Sommeren , Marijn Wouters , Miao Yu
IPC: G01N21/00 , G03F7/20 , H01L21/66 , G01N21/95 , H01L27/146 , H01L27/148
Abstract: An inspection substrate for inspecting a component, such as a liquid confinement system, of an apparatus for processing production substrates is discussed. The inspection substrate includes a body having dimensions similar to a production substrate so that the inspection substrate is compatible with the apparatus, an illumination device, such as light emitting diodes, embedded in the body, a sensor, such as an imaging device or a pressure sensor, that is embedded in the body and configured to generate inspection information, such as image data, relating to a parameter of the component of the apparatus proximate to the inspection substrate, and a storage device embedded in the body and configured to store the inspection information.
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公开(公告)号：US20160124319A1
公开(公告)日：2016-05-05
申请号：US14928891
申请日：2015-10-30
Applicant: ASML NETHERLANDS B.V.
Inventor： Jeroen Peter Johannes Bruijstens , Richard Joseph Bruls , Hans Jansen , Siebe Landheer , Laurentius Catrinus Jorritsma , Arnout Johannes Meester , Bauke Jansen , Ivo Adam Johannes Thomas , Marcio Alexandre Cano Miranda , Maurice Martinus Johannes Van Der Lee , Gheorghe Tanasa , Lambertus Dominicus Noordam
IPC: G03F7/20
CPC classification number: G03F7/70341 , G03B27/52
Abstract: A lithographic apparatus is disclosed that includes a projection system, and a liquid confinement structure configured to at least partly confine immersion liquid to an immersion space defined by the projection system, the liquid confinement structure and a substrate and/or substrate table. Measures are taken in the lithographic apparatus, for example, to reduce the effect of droplets on the final element of the projection system or to substantially avoid such droplet formation.
Abstract translation: 公开了一种光刻设备，其包括投影系统和液体限制结构，其被配置为至少部分地将浸没液体限制在由投影系统，液体限制结构和基板和/或基板台所限定的浸没空间中。 例如，在光刻设备中采取措施来减少液滴对投影系统的最终元件的影响或基本避免这种液滴的形成。
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公开(公告)号：US20150055102A1
公开(公告)日：2015-02-26
申请号：US14473643
申请日：2014-08-29
Applicant: ASML NETHERLANDS B.V.
Inventor： Robert Douglas WATSO , Youri Johannes Laurentius Maria Van Dommelen , Johannes Henricus Wilhelmus Jacobs , Hans Jansen , Martinus Hendrikus Antonius Leenders , Jeroen Johannes Sophia Maria Mertens , Peter Paul Steijaert , Antonius Martinus Cornelis Petrus De Jong , Jimmy Matheus Wilhelmus Van De Winkel , Joao Paulo Da Paz Sena , Maurice Martinus Johannes Van Der Lee , Henricus Martinus Dorotheus Van Lier , Gheorghe Tanasa
IPC: G03F7/20
CPC classification number: G03F7/70341 , G03F7/70925
Abstract: A lithographic projection apparatus is disclosed which includes a cleaning station. Several embodiments of the cleaning station are disclosed. In an embodiment, measures are taken to avoid contact of a cleaning fluid with the final element of the projection system. In an embodiment, measures are taken to avoid foaming of the cleaning fluid. The use of a thermally isolated island is also disclosed as well as its optimal position.
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Patent Agency Ranking
公开(公告)号：US20190146352A1
公开(公告)日：2019-05-16
申请号：US16249518
申请日：2019-01-16
Applicant: ASML Netherlands B.V.
Inventor： Seerwan Saeed , Petrus Martinus Gerardus Johannes Arts , Harold Sebastiaan Buddenberg , Erik Henricus Egidius Catharina Eummelen , Giovanni Luca Gattobigio , Floor Lodewijk Keukens , Ferdy Migchelbrink , Jeroen Arnoldus Leonardus Johannes Raaymakers , Arnoldus Johannes Martinus Jozeph Ras , Gheorghe Tanasa , Jimmy Matheus Wilhelmus Van De Winkel , Daan Daniel Johannes Antonius Van Sommeren , Marijn Wouters , Miao Yu
Abstract: An inspection substrate for inspecting a component, such as a liquid confinement system, of an apparatus for processing production substrates is discussed. The inspection substrate includes a body having dimensions similar to a production substrate so that the inspection substrate is compatible with the apparatus, an illumination device, such as light emitting diodes, embedded in the body, a sensor, such as an imaging device or a pressure sensor, that is embedded in the body and configured to generate inspection information, such as image data, relating to a parameter of the component of the apparatus proximate to the inspection substrate, and a storage device embedded in the body and configured to store the inspection information.
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公开(公告)号：US09709901B2
公开(公告)日：2017-07-18
申请号：US14586390
申请日：2014-12-30
Applicant: ASML NETHERLANDS B.V.
Inventor： Ivo Adam Johannes Thomas , Siebe Landheer , Arnout Johannes Meester , Marcio Alexandre Cano Miranda , Gheorghe Tanasa
CPC classification number: G03F7/70341 , G03B27/52 , G03F7/70891
Abstract: A lithographic apparatus comprising a projection system, and a liquid confinement structure configured to at least partly confine immersion liquid to an immersion space defined by the projection system, the liquid confinement structure and a substrate and/or substrate table is disclosed wherein a measure is taken to reduce the effect of droplets and/or a liquid film on the last element of the projection system.
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公开(公告)号：US11860546B2
公开(公告)日：2024-01-02
申请号：US17952119
申请日：2022-09-23
Applicant: ASML NETHERLANDS B.V.
Inventor： Pepijn Van Den Eijnden , Cornelius Maria Rops , Theodorus Wilhelmus Polet , Floor Lodewijk Keukens , Gheorghe Tanasa , Rogier Hendrikus Magdalena Cortie , Koen Cuypers , Harold Sebastiaan Buddenberg , Giovanni Luca Gattobigio , Evert Van Vliet , Nicolaas Ten Kate , Mark Johannes Hermanus Frencken , Jantien Laura Van Erve , Marcel Maria Cornelius Franciscus Teunissen
IPC: G03F7/00
CPC classification number: G03F7/70341 , G03F7/70525
Abstract: A fluid handling structure for a lithographic apparatus, the structure having: an aperture for the passage therethrough of a beam; a first part; and a second part, wherein the first and/or second part define a surface for the extraction of immersion fluid, relative movement between the first and second parts is effective to change a position of fluid flow into or out of the surface relative to the aperture, and the first or second part has at least one through-hole for the fluid flow and the other of the first or second part has at least one opening for the fluid flow, the at least one through-hole and at least one opening being in fluid communication when aligned, the relative movement allowing alignment of the at least one opening with different ones of the through-hole to change the position of the fluid flow into or out of the surface.
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公开(公告)号：US11454892B2
公开(公告)日：2022-09-27
申请号：US17315650
申请日：2021-05-10
Applicant: ASML NETHERLANDS B.V.
Inventor： Pepijn Van Den Eijnden , Cornelius Maria Rops , Theodorus Wilhelmus Polet , Floor Lodewijk Keukens , Gheorghe Tanasa , Rogier Hendrikus Magdalena Cortie , Koen Cuypers , Harold Sebastiaan Buddenberg , Giovanni Luca Gattobigio , Evert Van Vliet , Nicolaas Ten Kate , Mark Johannes Hermanus Frencken , Jantien Laura Van Erve , Marcel Maria Cornelius Franciscus Teunissen
IPC: G03F7/20
Abstract: A fluid handling structure for a lithographic apparatus, the structure having: an aperture for the passage therethrough of a beam; a first part; and a second part, wherein the first and/or second part define a surface for the extraction of immersion fluid, relative movement between the first and second parts is effective to change a position of fluid flow into or out of the surface relative to the aperture, and the first or second part has at least one through-hole for the fluid flow and the other of the first or second part has at least one opening for the fluid flow, the at least one through-hole and at least one opening being in fluid communication when aligned, the relative movement allowing alignment of the at least one opening with different ones of the through-hole to change the position of the fluid flow into or out of the surface.
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公开(公告)号：US11086239B2
公开(公告)日：2021-08-10
申请号：US16981813
申请日：2019-03-13
Applicant: ASML NETHERLANDS B.V.
Inventor： Miao Yu , Petrus Martinus Gerardus Johannes Arts , Erik Henricus Egidius Catharina Eummelen , Giovanni Luca Gattobigio , Maarten Holtrust , Han Henricus Aldegonda Lempens , Ferdy Migchelbrink , Theodorus Wilhelmus Polet , Gheorghe Tanasa
IPC: G03F7/20
Abstract: A cleaning device for an apparatus for processing production substrates, the cleaning device including: a body having dimensions similar to the production substrates so that the cleaning device is compatible with the apparatus, the body having a first major surface and a second major surface facing in the opposite direction to the first major surface; a chamber within the body configured to accommodate contaminants; an inlet from the first major surface to the chamber and configured to allow contaminants to be drawn into the chamber by a flow of fluid; and an outlet from the chamber to the second major surface, the cleaning device being configured to allow the fluid to exit the chamber but to prevent a contaminant leaving the chamber.
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