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公开(公告)号：US20190072863A1
公开(公告)日：2019-03-07
申请号：US16177585
申请日：2018-11-01
Applicant: ASML Netherlands B.V.
Inventor： Raymond Wilhelmus Louis Lafarre , Adrianus Hendrik Koevoets , Sjoerd Nicolaas Lambertus Donders , Menno Fien , Antonius Franciscus Johannes De Groot , Christiaan Alexander Hoogendam , Johannes Henricus Wilhelmus Jacobs , Nicolaas Ten Kate , Martijn Houben , Jan Steven Christiaan Westerlaken , Jim Vincent Overkamp , Maarten Van Beijnum
IPC: G03F7/20
Abstract: A support apparatus for a lithographic apparatus has an object holder and an extraction body radially outward of the object holder. The object holder is configured to support an object. The extraction body includes an extraction opening configured to extract fluid from a top surface of the support apparatus. The extraction body is spaced from the object holder such that the extraction body is substantially decoupled from the object holder. The extraction body comprises a projection configured such that it surrounds the object holder and such that, in use, a layer of liquid is retained on the projection and in contact with an object supported on the object holder.
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12.发明授权公开(公告)号：US09971252B2
公开(公告)日：2018-05-15
申请号：US15681679
申请日：2017-08-21
Applicant: ASML NETHERLANDS B.V.
Inventor： Johan Gertrudis Cornelis Kunnen , Martijn Houben , Thibault Simon Mathieu Laurent , Hendrikus Johannes Marinus Van Abeelen , Armand Rosa Jozef Dassen , Sander Catharina Reinier Derks
IPC: G03B27/52 , G03B27/58 , H02K41/02 , G03F7/20 , H01L21/687
CPC classification number: G03F7/70716 , G03F7/707 , G03F7/70875 , H01L21/68 , H01L21/6875
Abstract: A support table for a lithographic apparatus, the support table having a support section and a conditioning system, wherein the support section, the conditioning system, or both, is configured such that heat transfer to or from a substrate supported on the support table, resulting from the operation of the conditioning system, is greater in a region of the substrate adjacent an edge of the substrate than it is in a region of the substrate that is at the center of the substrate.
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公开(公告)号：US09946172B2
公开(公告)日：2018-04-17
申请号：US15039795
申请日：2014-11-14
Applicant: ASML Netherlands B.V.
Inventor： Peter Paul Hempenius , Martijn Houben , Nicolaas Rudolf Kemper , Robertus Mathijs Gerardus Rijs , Paul Corné Henri De Wit , Stijn Willem Boere , Youssef Karel Maria De Vos , Frits Van Der Meulen
CPC classification number: G03F7/70875 , G03F7/70775 , G03F7/709
Abstract: A lithographic apparatus includes: an object that is moveable in at least one direction; a control system to move the object in the at least one direction, wherein the control system is arranged to control movement of the object in the at least one direction in a frequency range of interest; and a conduit provided with a fluid, wherein the conduit is arranged on or in the object in a pattern, and wherein the pattern is such that an acceleration of the object in the at least one direction causes an acceleration pressure profile in the fluid along the conduit, the acceleration pressure profile not matching with a resonance pressure profile that corresponds to a standing wave mode in the fluid with a resonance frequency in the frequency range of interest.
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14.发明申请公开(公告)号：US20170351187A1
公开(公告)日：2017-12-07
申请号：US15681679
申请日：2017-08-21
Applicant: ASML NETHERLANDS B.V.
Inventor： Johan Gertrudis Cornelis KUNNEN , Martijn Houben , Thibault Simon Mathieu Laurent , Hendrikus Johannes Marinus VAN ABEELEN , Armand Rosa Jozef DASSEN , Sander Catharina Reinier DERKS
IPC: G03F7/20 , H01L21/687
CPC classification number: G03F7/70716 , G03F7/707 , G03F7/70875 , H01L21/68 , H01L21/6875
Abstract: A support table for a lithographic apparatus, the support table having a support section and a conditioning system, wherein the support section, the conditioning system, or both, is configured such that heat transfer to or from a substrate supported on the support table, resulting from the operation of the conditioning system, is greater in a region of the substrate adjacent an edge of the substrate than it is in a region of the substrate that is at the center of the substrate.
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15.发明授权公开(公告)号：US09835957B2
公开(公告)日：2017-12-05
申请号：US15021240
申请日：2014-09-02
Applicant: ASML Netherlands B.V.
Inventor： Martijn Houben , Alwin De Kock , Hendrikus Johannes Marinus Van Abeelen , Marco Adrianus Peter Van Den Heuvel
CPC classification number: G03F7/70716 , G03F7/707 , G03F7/70875 , H01L21/6875
Abstract: A support table to support a surface of a substrate, wherein the support table includes: a base surface substantially parallel to the surface of the substrate, a plurality of burls protruding above the base surface, each of the burls having a respective distal end and a first height above the base surface, the burls arranged such that, when the substrate is supported by the support table, the substrate is supported by the respective distal ends, and a plurality of elongate raised protrusions separated by gaps, each of the elongate raised protrusions having a second height above the base surface, wherein the elongate raised protrusions protrude above the base surface between the burls, and the second height is less than the first height; wherein the protrusions are arranged such that a plurality of the gaps are aligned to form a straight gas flow path towards an edge of the base surface.
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Patent Agency Ranking
公开(公告)号：US09785055B2
公开(公告)日：2017-10-10
申请号：US14399137
申请日：2013-05-07
Applicant: ASML Netherlands B.V.
Inventor： Thibault Simon Mathieu Laurent , Johannes Henricus Wilhelmus Jacobs , Wilhelmus Franciscus Johannes Simons , Martijn Houben , Raymond Wilhelmus Louis Lafarre , Koen Steffens , Han Henricus Aldegonda Lempens , Rogier Hendrikus Magdalena Cortie , Ruud Hendrikus Martinus Johannes Bloks , Gerben Pieterse , Siegfried Alexander Tromp , Theodorus Wilhelmus Polet , Jim Vincent Overkamp , Van Vuong Vy
CPC classification number: G03F7/70341 , G03F7/70716 , G03F7/70875 , G03F7/7095 , H01L21/682
Abstract: An object table to support an object, the object table having a support body, an object holder to hold an object, an opening adjacent an edge of the object holder, and a channel in fluid communication with the opening via a passageway, wherein the channel is defined by a first material which is different to a second material defining the passageway.
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公开(公告)号：US10481502B2
公开(公告)日：2019-11-19
申请号：US15918478
申请日：2018-03-12
Applicant: ASML Netherlands B.V.
Inventor： Thibault Simon Mathieu Laurent , Johannes Henricus Wilhelmus Jacobs , Wilhelmus Franciscus Johannes Simons , Martijn Houben , Raymond Wilhelmus Louis Lafarre , Koen Steffens , Han Henricus Aldegonda Lempens , Rogier Hendrikus Magdalena Cortie , Ruud Hendrikus Martinus Johannes Bloks , Gerben Pieterse , Siegfried Alexander Tromp , Theodorus Wilhelmus Polet , Jim Vincent Overkamp , Van Vuong Vy
Abstract: An object table to support an object, the object table having a support body, an object holder to hold an object, an opening adjacent an edge of the object holder, and a channel in fluid communication with the opening via a passageway, wherein the channel is defined by a first material which is different to a second material defining the passageway.
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公开(公告)号：US10453734B2
公开(公告)日：2019-10-22
申请号：US15580601
申请日：2016-06-01
Applicant: ASML Netherlands B.V.
Inventor： Thomas Poiesz , Martijn Houben , Abraham Alexander Soethoudt
IPC: G03B27/52 , H01L21/687 , G03F7/20 , B23H7/26 , H01L21/027 , H01L21/683
Abstract: A substrate holder for use in a lithographic apparatus and configured to support a substrate, the substrate holder including: a main body having a main body surface; and a plurality of burls projecting from the main body surface; wherein each burl has a distal end configured to engage with the substrate; the distal ends of the burls substantially conform to a support plane whereby a substrate can be supported in a substantially flat state on the burls; a frictional force between the distal end of each burl and a substrate engaged therewith arises in a direction parallel to the support plane in the event of a relative movement of the substrate and substrate holder in the direction; and distal end surfaces of the burls are provided with a release structure configured so that the frictional force is less than would arise in the absence of the release structure.
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19.发明授权公开(公告)号：US09507275B2
公开(公告)日：2016-11-29
申请号：US14403114
申请日：2013-05-17
Applicant: ASML Netherlands B.V.
Inventor： Raymond Wilhelmus Louis Lafarre , Adrianus Hendrik Koevoets , Sjoerd Nicolaas Lambertus Donders , Menno Fien , Antonius Franciscus Johannes De Groot , Christiaan Alexander Hoogendam , Johannes Henricus Wilhelmus Jacobs , Nicolaas Ten Kate , Martijn Houben , Jan Steven Christiaan Westerlaken , Jim Vincent Overkamp , Maarten Van Beijnum
CPC classification number: G03F7/70716 , G03F7/70341 , G03F7/707 , G03F7/70733
Abstract: A support apparatus for a lithographic apparatus has an object holder and an extraction body radially outward of the object holder. The object holder is configured to support an object. The extraction body includes an extraction opening configured to extract fluid from a top surface of the support apparatus. The extraction body is spaced from the object holder such that the extraction body is substantially decoupled from the object holder. The extraction body comprises a projection configured such that it surrounds the object holder and such that, in use, a layer of liquid is retained on the projection and in contact with an object supported on the object holder.
Abstract translation: 用于光刻设备的支撑设备具有物体保持器和物体保持器径向外侧的提取体。 对象持有者被配置为支持对象。 提取体包括提取开口，其构造成从支撑装置的顶表面提取流体。 提取体与物体保持器间隔开，使得提取体基本上与物体保持器分离。 提取体包括突出部，其被构造为使得其围绕物体保持器并且使得在使用中一层液体保持在突出部上并与支撑在物体保持器上的物体接触。
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公开(公告)号：US20150131064A1
公开(公告)日：2015-05-14
申请号：US14399137
申请日：2013-05-07
Applicant: ASML Netherlands B.V.
Inventor： Thibault Simon Mathieu Laurent , Johannes Henricus Wilhelmus Jacobs , Wilhelmus Franciscus Johannes Simons , Martijn Houben , Raymond Wilhelmus Louis Lafarre , Koen Steffens , Han Henricus Aldegonda Lempens , Rogier Hendrikus Magdalena Cortie , Ruud Hendrikus Martinus Johannes Bloks , Gerben Pieterse , Siegfried Alexander Tromp , Theodorus Wilhelmus Polet , Jim Vincent Overkamp , Van Vuong Vy
IPC: G03F7/20
CPC classification number: G03F7/70341 , G03F7/70716 , G03F7/70875 , G03F7/7095 , H01L21/682
Abstract: An object table to support an object, the object table having a support body, an object holder to hold an object, an opening adjacent an edge of the object holder, and a channel in fluid communication with the opening via a passageway, wherein the channel is defined by a first material which is different to a second material defining the passageway.
Abstract translation: 一种用于支撑物体的物体表，具有支撑体的物体表，用于保持物体的物体保持器，邻近物体保持器的边缘的开口以及经由通道与开口流体连通的通道，其中通道 由与限定通道的第二材料不同的第一材料限定。
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