公开(公告)号：US10935895B2

公开(公告)日：2021-03-02

申请号：US16539487

申请日：2019-08-13

Applicant: ASML Netherlands B.V.

Inventor： Adrianus Hendrik Koevoets ,  Erik Johan Arlemark ,  Sander Catharina Reinier Derks ,  Sjoerd Nicolaas Lambertus Donders ,  Wilfred Edward Endendijk ,  Franciscus Johannes Joseph Janssen ,  Raymond Wilhelmus Louis Lafarre ,  Leon Martin Levasier ,  Jim Vincent Overkamp ,  Nicolaas Ten Kate ,  Jacobus Cornelis Gerardus Van Der Sanden

IPC: G03B27/52 ,  G03F7/20 ,  H01L21/67 ,  H01L21/683

Abstract: A lithographic apparatus comprising a projection system configured to project a patterned radiation beam to form an exposure area on a substrate held on a substrate table, the lithographic apparatus further comprising a cooling apparatus for cooling the substrate, wherein the cooling apparatus comprises a cooling element located above the substrate table and adjacent to the exposure area, the cooling element being configured to remove heat from the substrate.

公开(公告)号：US09971252B2

公开(公告)日：2018-05-15

申请号：US15681679

申请日：2017-08-21

Applicant: ASML NETHERLANDS B.V.

Inventor： Johan Gertrudis Cornelis Kunnen ,  Martijn Houben ,  Thibault Simon Mathieu Laurent ,  Hendrikus Johannes Marinus Van Abeelen ,  Armand Rosa Jozef Dassen ,  Sander Catharina Reinier Derks

IPC: G03B27/52 ,  G03B27/58 ,  H02K41/02 ,  G03F7/20 ,  H01L21/687

CPC classification number: G03F7/70716 ,  G03F7/707 ,  G03F7/70875 ,  H01L21/68 ,  H01L21/6875

Abstract: A support table for a lithographic apparatus, the support table having a support section and a conditioning system, wherein the support section, the conditioning system, or both, is configured such that heat transfer to or from a substrate supported on the support table, resulting from the operation of the conditioning system, is greater in a region of the substrate adjacent an edge of the substrate than it is in a region of the substrate that is at the center of the substrate.

公开(公告)号：US11982947B2

公开(公告)日：2024-05-14

申请号：US18070155

申请日：2022-11-28

Applicant: ASML Netherlands B.V.

Inventor： Sander Catharina Reinier Derks ,  Daniel Jozef Maria Direcks ,  Maurice Wilhelmus Leonardus Hendricus Feijts ,  Pieter Gerardus Mathijs Hoeijmakers ,  Katja Cornelia Joanna Clasina Moors ,  Violeta Navarro Paredes ,  William Peter Van Drent ,  Jan Steven Christiaan Westerlaken

IPC: G03F7/00 ,  H05G2/00

CPC classification number: G03F7/70916 ,  G03F7/70033 ,  G03F7/70891 ,  H05G2/005 ,  H05G2/008

Abstract: A contamination trap for use in a debris mitigation system of a radiation source, the contamination trap comprising a plurality of vanes configured to trap fuel debris emitted from a plasma formation region of the radiation source; wherein at least one vane or each vane of the plurality of vanes comprises a material comprising a thermal conductivity above 30 W m−1 K−1.

公开(公告)号：US10520837B2

公开(公告)日：2019-12-31

申请号：US15932215

申请日：2018-02-16

Applicant: ASML NETHERLANDS B.V.

Inventor： Johan Gertrudis Cornelis Kunnen ,  Johannes Henricus Wilhelmus Jacobs ,  Coen Cornelis Wilhelmus Verspaget ,  Ronald Van Der Ham ,  Ivo Adam Johannes Thomas ,  Martijn Houben ,  Thibault Simon Mathieu Laurent ,  Gregory Martin Mason Corcoran ,  Ruud Hendrikus Martinus Johannes Bloks ,  Gerben Pieterse ,  Pieter Lein Joseph Gunter ,  Marinus Jan Remie ,  Sander Catharina Reinier Derks

IPC: G03F7/20

Abstract: A support table configured to support a substrate, the support table having a support section to support a substrate and a conditioning system to supply heat energy to and/or remove heat energy from the support section, wherein the conditioning system comprises a plurality of conditioning units that are independently controllable.

公开(公告)号：US10416574B2

公开(公告)日：2019-09-17

申请号：US15568122

申请日：2016-04-04

Applicant: ASML Netherlands B.V.

Inventor： Adrianus Hendrik Koevoets ,  Sander Catharina Reinier Derks ,  Franciscus Johannes Joseph Janssen ,  Jim Vincent Overkamp ,  Jacobus Cornelis Gerardus Van Der Sanden

IPC: G03B27/52 ,  G03F7/20 ,  H01L21/67 ,  H01L21/683

Abstract: A lithographic apparatus comprising a projection system configured to project a patterned radiation beam to form an exposure area on a substrate held on a substrate table, the lithographic apparatus further comprising a cooling apparatus (40) for cooling the substrate, wherein the cooling apparatus comprises a cooling element (42, 44) located above the substrate table and adjacent to the exposure area, the cooling element being configured to remove heat from the substrate.

公开(公告)号：USRE48668E1

公开(公告)日：2021-08-03

申请号：US15711901

申请日：2017-09-21

Applicant: ASML NETHERLANDS B.V.

Inventor： Thibault Simon Mathieu Laurent ,  Gerardus Adrianus Antonius Maria Kusters ,  Johan Gertrudis Cornelis Kunnen ,  Sander Catharina Reinier Derks

IPC: G03B27/52 ,  G01K13/00 ,  G03F7/20 ,  G03B27/42

Abstract: A temperature sensing probe including a temperature sensor in an elongate housing wherein the elongate housing of the probe is elongate in a first direction and the elongate housing is comprised of a material which has a thermal conductivity of at least 500 W/mK at 20° C. in at least one direction.

公开(公告)号：US10775707B2

公开(公告)日：2020-09-15

申请号：US16339948

申请日：2017-09-21

Applicant: ASML Netherlands B.V.

Inventor： Güneş Nakìbo{hacek over (g)}lu ,  Manon Elise Will ,  Sander Catharina Reinier Derks ,  Johannes Wilhelmus Mollen

IPC: G03F7/20 ,  G03F9/00

Abstract: A method of performing a lithographic exposure of a substrate, the substrate being held on a substrate table, the substrate table comprising a cooling system operative to cool the substrate table, the method comprising performing an alignment measurement of the substrate, applying heat to the substrate table to reduce cooling of the substrate table provided by the cooling system, the heat being applied between a time at which the alignment measurement is performed and a time at which the lithographic exposure is performed and performing the lithographic exposure of the substrate.

公开(公告)号：US10747126B2

公开(公告)日：2020-08-18

申请号：US16437760

申请日：2019-06-11

Applicant: ASML NETHERLANDS B.V.

Inventor： Johan Gertrudis Cornelis Kunnen ,  Martijn Houben ,  Thibault Simon Mathieu Laurent ,  Hendrikus Johannes Marinus Van Abeelen ,  Armand Rosa Jozef Dassen ,  Sander Catharina Reinier Derks

IPC: G03F7/20 ,  H01L21/68 ,  H01L21/687

Abstract: A support table for a lithographic apparatus, the support table having a support section and a conditioning system, wherein the support section, the conditioning system, or both, is configured such that heat transfer to or from a substrate supported on the support table, resulting from the operation of the conditioning system, is greater in a region of the substrate adjacent an edge of the substrate than it is in a region of the substrate that is at the center of the substrate.

公开(公告)号：US10324382B2

公开(公告)日：2019-06-18

申请号：US15958714

申请日：2018-04-20

Applicant: ASML NETHERLANDS B.V.

Inventor： Johan Gertrudis Cornelis Kunnen ,  Martijn Houben ,  Thibault Simon Mathieu Laurent ,  Hendrikus Johannes Marinus Van Abeelen ,  Armand Rosa Jozef Dassen ,  Sander Catharina Reinier Derks

IPC: G03F7/20 ,  H01L21/68 ,  H01L21/687

Abstract: A support table for a lithographic apparatus, the support table having a support section and a conditioning system, wherein the support section, the conditioning system, or both, is configured such that heat transfer to or from a substrate supported on the support table, resulting from the operation of the conditioning system, is greater in a region of the substrate adjacent an edge of the substrate than it is in a region of the substrate that is at the center of the substrate.

公开(公告)号：US09778574B2

公开(公告)日：2017-10-03

申请号：US15033580

申请日：2014-11-04

Applicant: ASML Netherlands B.V.

Inventor： Sander Catharina Reinier Derks ,  Eric Willem Felix Casimiri ,  Marcel Mathijs Theodore Dierichs ,  Sumant Sukdew Ramanujan Oemrawsingh ,  Wilhelmus Theodorus Anthonius Johannes Van Den Einden ,  Johannes Fransiscus Maria Velthuis ,  Alexander Nikolov Zdravkov ,  Wassim Zein Eddine

IPC: G03B27/52 ,  G03F7/20 ,  G02B5/00 ,  G02B5/20 ,  G02B5/22 ,  H05G2/00 ,  H01J5/18

CPC classification number: G03F7/70033 ,  G02B5/003 ,  G02B5/208 ,  G02B5/22 ,  G03F7/70191 ,  G03F7/70575 ,  G03F7/70633 ,  G03F7/70875 ,  G03F7/70883 ,  G03F7/70933 ,  H01J5/18 ,  H05G2/001

Abstract: An apparatus comprising at least one sealing aperture (40) comprising a hollow part (41), having an inner surface (42), extending at an interface between different zones (50;60) of the apparatus; and a member (43) positioned in the hollow part configured to substantially transmit EUV radiation and to substantially filter non-EUV radiation at the interface; wherein the inner surface of the hollow part has a surface treatment configured to increase absorption of the non-EUV radiation that is transferred by the member to the hollow part.