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公开(公告)号:US20230273533A1
公开(公告)日:2023-08-31
申请号:US18300094
申请日:2023-04-13
Applicant: ASML NETHERLANDS B.V.
Inventor: NICOLAAS TEN KATE , Joost Jeroen Ottens , Bastiaan Andreas Wilhelmus Hubertus Knarren , Robbert Jan Voogd , Giovanni Francisco Nino , Marinus Jan Remie , Johannes Henricus Wilhelmus Jacobs , Thibault Simon Mathieu Laurent , Johan Gertrudis Cornelis Kunnen
IPC: G03F7/00
CPC classification number: G03F7/70875 , G03F7/7085
Abstract: A lithographic apparatus is disclosed that includes a substrate table configured to support a substrate on a substrate supporting area and a heater and/or temperature sensor on a surface adjacent the substrate supporting area.
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公开(公告)号:US11687007B2
公开(公告)日:2023-06-27
申请号:US17423325
申请日:2020-01-09
Applicant: ASML NETHERLANDS B.V.
Inventor: Arnaud Hubaux , Johan Franciscus Maria Beckers , Dylan John David Davies , Johan Gertrudis Cornelis Kunnen , Willem Richard Pongers , Ajinkya Ravindra Daware , Chung-Hsun Li , Georgios Tsirogiannis , Hendrik Cornelis Anton Borger , Frederik Eduard De Jong , Juan Manuel Gonzalez Huesca , Andriy Hlod , Maxim Pisarenco
IPC: G03F1/70 , G03F7/30 , G03F7/00 , G06F30/392
CPC classification number: G03F7/70508 , G03F1/70 , G03F7/70616 , G06F30/392 , G05B2219/45028 , G05B2219/45031
Abstract: A method for categorizing a substrate subject to a semiconductor manufacturing process including multiple operations, the method including: obtaining values of functional indicators derived from data generated during one or more of the multiple operations on the substrate, the functional indicators characterizing at least one operation; applying a decision model including one or more threshold values to the values of the functional indicators to obtain one or more categorical indicators; and assigning a category to the substrate based on the one or more categorical indicators.
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公开(公告)号:US10191377B2
公开(公告)日:2019-01-29
申请号:US15482526
申请日:2017-04-07
Applicant: ASML NETHERLANDS B.V.
Inventor: Hrishikesh Patel , Johannes Henricus Wilhelmus Jacobs , Gerardus Adrianus Antonius Maria Kusters , Thibault Simon Mathieu Laurent , Marcio Alexandre Cano Miranda , Ruud Hendricus Martinus Johannes Bloks , Peng Feng , Johan Gertrudis Cornelis Kunnen
IPC: G03F7/20 , G03F7/30 , H01L21/027 , H01L21/67
Abstract: An immersion lithographic apparatus is provided having a substrate table including a drain configured to receive immersion fluid which leaks into a gap between an edge of a substrate on the substrate table and an edge of a recess in which the substrate is located. A thermal conditioning system is provided to thermally condition at least the portion of the recess supporting the substrate by directing one or more jets of fluid onto a reverse side of the section supporting the substrate.
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4.
公开(公告)号:US09971252B2
公开(公告)日:2018-05-15
申请号:US15681679
申请日:2017-08-21
Applicant: ASML NETHERLANDS B.V.
Inventor: Johan Gertrudis Cornelis Kunnen , Martijn Houben , Thibault Simon Mathieu Laurent , Hendrikus Johannes Marinus Van Abeelen , Armand Rosa Jozef Dassen , Sander Catharina Reinier Derks
IPC: G03B27/52 , G03B27/58 , H02K41/02 , G03F7/20 , H01L21/687
CPC classification number: G03F7/70716 , G03F7/707 , G03F7/70875 , H01L21/68 , H01L21/6875
Abstract: A support table for a lithographic apparatus, the support table having a support section and a conditioning system, wherein the support section, the conditioning system, or both, is configured such that heat transfer to or from a substrate supported on the support table, resulting from the operation of the conditioning system, is greater in a region of the substrate adjacent an edge of the substrate than it is in a region of the substrate that is at the center of the substrate.
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公开(公告)号:US12204255B2
公开(公告)日:2025-01-21
申请号:US18300094
申请日:2023-04-13
Applicant: ASML NETHERLANDS B.V.
Inventor: Nicolaas Ten Kate , Joost Jeroen Ottens , Bastiaan Andreas Wilhelmus Hubertus Knarren , Robbert Jan Voogd , Giovanni Francisco Nino , Marinus Jan Remie , Johannes Henricus Wilhelmus Jacobs , Thibault Simon Mathieu Laurent , Johan Gertrudis Cornelis Kunnen
IPC: G03F7/00
Abstract: A lithographic apparatus is disclosed that includes a substrate table configured to support a substrate on a substrate supporting area and a heater and/or temperature sensor on a surface adjacent the substrate supporting area.
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公开(公告)号:USRE48668E1
公开(公告)日:2021-08-03
申请号:US15711901
申请日:2017-09-21
Applicant: ASML NETHERLANDS B.V.
Inventor: Thibault Simon Mathieu Laurent , Gerardus Adrianus Antonius Maria Kusters , Johan Gertrudis Cornelis Kunnen , Sander Catharina Reinier Derks
Abstract: A temperature sensing probe including a temperature sensor in an elongate housing wherein the elongate housing of the probe is elongate in a first direction and the elongate housing is comprised of a material which has a thermal conductivity of at least 500 W/mK at 20° C. in at least one direction.
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7.
公开(公告)号:US10747126B2
公开(公告)日:2020-08-18
申请号:US16437760
申请日:2019-06-11
Applicant: ASML NETHERLANDS B.V.
Inventor: Johan Gertrudis Cornelis Kunnen , Martijn Houben , Thibault Simon Mathieu Laurent , Hendrikus Johannes Marinus Van Abeelen , Armand Rosa Jozef Dassen , Sander Catharina Reinier Derks
IPC: G03F7/20 , H01L21/68 , H01L21/687
Abstract: A support table for a lithographic apparatus, the support table having a support section and a conditioning system, wherein the support section, the conditioning system, or both, is configured such that heat transfer to or from a substrate supported on the support table, resulting from the operation of the conditioning system, is greater in a region of the substrate adjacent an edge of the substrate than it is in a region of the substrate that is at the center of the substrate.
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8.
公开(公告)号:US10324382B2
公开(公告)日:2019-06-18
申请号:US15958714
申请日:2018-04-20
Applicant: ASML NETHERLANDS B.V.
Inventor: Johan Gertrudis Cornelis Kunnen , Martijn Houben , Thibault Simon Mathieu Laurent , Hendrikus Johannes Marinus Van Abeelen , Armand Rosa Jozef Dassen , Sander Catharina Reinier Derks
IPC: G03F7/20 , H01L21/68 , H01L21/687
Abstract: A support table for a lithographic apparatus, the support table having a support section and a conditioning system, wherein the support section, the conditioning system, or both, is configured such that heat transfer to or from a substrate supported on the support table, resulting from the operation of the conditioning system, is greater in a region of the substrate adjacent an edge of the substrate than it is in a region of the substrate that is at the center of the substrate.
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公开(公告)号:US10281830B2
公开(公告)日:2019-05-07
申请号:US15742179
申请日:2016-06-17
Applicant: ASML Netherlands B.V. , ASML Holding N.V.
Inventor: Laurentius Johannes Adrianus Van Bokhoven , Christopher Charles Ward , Marc Léon Van Der Gaag , Johan Gertrudis Cornelis Kunnen
IPC: G03F7/20
Abstract: A lithographic apparatus (100) includes a patterning device support structure (104) configured to support a patterning device (110), a gas inlet (116) configured to provide a gas flow (114) across a surface of the patterning device, and a temperature conditioning device (134) configured to condition the temperature of the gas flow based on a set point. The apparatus also includes a sensor (132) configured to measure a parameter indicative of an amount of heat added to at least one of the patterning device and a volume (126) between the patterning device and a lens (124) of a projection system (106) during operational use of the lithographic system. Further, the apparatus includes a controller (130) operatively coupled to the sensor and configured to adjust the set point based on the parameter measured by the sensor to control a temperature of the patterning device.
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公开(公告)号:USRE49297E1
公开(公告)日:2022-11-15
申请号:US16656627
申请日:2019-10-18
Applicant: ASML NETHERLANDS B.V.
Inventor: Hrishikesh Patel , Johannes Henricus Wilhelmus Jacobs , Gerardus Adrianus Antonius Maria Kusters , Thibault Simon Mathieu Laurent , Marcio Alexandre Cano Miranda , Ruud Hendricus Martinus Johannes Bloks , Peng Feng , Johan Gertrudis Cornelis Kunnen
IPC: G03F7/20 , G03F7/30 , H01L21/027 , H01L21/67
Abstract: An immersion lithographic apparatus is provided having a substrate table including a drain configured to receive immersion fluid which leaks into a gap between an edge of a substrate on the substrate table and an edge of a recess in which the substrate is located. A thermal conditioning system is provided to thermally condition at least the portion of the recess supporting the substrate by directing one or more jets of fluid onto a reverse side of the section supporting the substrate.
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