公开(公告)号：US20230050613A1

公开(公告)日：2023-02-16

申请号：US17792464

申请日：2020-12-15

Applicant: ASML NETHERLANDS B.V.

Inventor： Ties Wouter VAN DER WOORD ,  Volker Dirk HILDENBRAND ,  Inci DONMEZ NOYAN ,  Adrianus Johannes Maria GIESBERS ,  Alexander Ludwig KLEIN

IPC: G03F1/62 ,  G03F7/20

Abstract: A pellicle membrane for a lithographic apparatus, the membrane including a matrix including a plurality of inclusions distributed therein. A method of manufacturing the pellicle membrane, a lithographic apparatus including the pellicle membrane, a pellicle assembly for use in a lithographic apparatus including the membrane, as well as the use of the pellicle membrane in a lithographic apparatus or method.

公开(公告)号：US20220269165A1

公开(公告)日：2022-08-25

申请号：US17629849

申请日：2020-07-24

Applicant: ASML NETHERLANDS B.V.

Inventor： Paul JANSSEN ,  Maxime BIRON ,  Inci DONMEZ NOYAN ,  Lourdes FERRE LLIN ,  Adrianus Johannes Maria GIESBERS ,  Johan Hendrik KLOOTWIJK ,  Jan Hendrik Willem KUNTZEL ,  Arnoud Willem NOTENBOOM ,  Anne-Sophie ROLLIER ,  Ties Wouter VAN DER WOORD ,  Pieter-Jan VAN ZWOL

IPC: G03F1/64 ,  G03F7/20

Abstract: A method of manufacturing a pellicle membrane, the method including: providing a first sacrificial layer on a planar substrate to form a stack; and providing, to at least a portion of the stack, at least one metal silicide or doped metal silicide pellicle core layer which forms at least part of the pellicle membrane is described. Also described is a pellicle membrane assembly having a substrate, a first sacrificial layer, and at least one metal silicide or doped metal silicide pellicle layer which forms at least part of a pellicle core, as well as a lithography apparatus including such a pellicle.

公开(公告)号：US20220008963A1

公开(公告)日：2022-01-13

申请号：US17294013

申请日：2019-11-22

Applicant: ASML NETHERLANDS B.V.

Inventor： Andrey NIKIPELOV ,  Dmitry KURILOVICH ,  Fabio SBRIZZAI ,  Marcus Adrianus VAN DE KERKHOF ,  Ties Wouter VAN DER WOORD ,  Willem Joan VAN DER ZANDE ,  Jeroen VAN DUIVENBODE ,  David Ferdinand VLES

IPC: B08B6/00 ,  B08B7/02 ,  B08B7/04 ,  G03F1/62 ,  G03F1/82

Abstract: A membrane cleaning apparatus for removing particles from a membrane, the apparatus including a membrane support and an electric field generating mechanism. The membrane support is for supporting the membrane. The electric field generating mechanism is for generating an electric field in the vicinity of the membrane when supported by the membrane support. The electric field generating mechanism may include: one or more collector electrodes; and a mechanism for applying a voltage across a membrane supported by the membrane support and the or each of the one or more collector electrodes.