公开(公告)号：US20250004362A1

公开(公告)日：2025-01-02

申请号：US18293851

申请日：2022-07-28

Applicant: ASML NETHERLANDS B.V.

Inventor： Franciscus Theodorus AGRICOLA ,  Lourdes FERRE LLIN ,  Dennis DE GRAAF ,  Chaitanya Krishna ANDE ,  Inci DONMEZ NOYAN ,  Fai Tong SI ,  Ties Wouter VAN DER WOORD ,  Anne-Sophie ROLLIER ,  Maxime BIRON ,  Adrianus Johannes Maria GIESBERS

IPC: G03F1/62 ,  G03F1/24

Abstract: A pellicle membrane for a lithographic apparatus, wherein the pellicle membrane includes metal silicide and a reinforcing network. The reinforcing network can be located between metal silicide layers. The reinforcing network can be irregular. The reinforcing network includes windows with a maximum dimension of up to 20 microns. The reinforcing network includes windows having an average size of at least 5 microns.

公开(公告)号：US20220269165A1

公开(公告)日：2022-08-25

申请号：US17629849

申请日：2020-07-24

Applicant: ASML NETHERLANDS B.V.

Inventor： Paul JANSSEN ,  Maxime BIRON ,  Inci DONMEZ NOYAN ,  Lourdes FERRE LLIN ,  Adrianus Johannes Maria GIESBERS ,  Johan Hendrik KLOOTWIJK ,  Jan Hendrik Willem KUNTZEL ,  Arnoud Willem NOTENBOOM ,  Anne-Sophie ROLLIER ,  Ties Wouter VAN DER WOORD ,  Pieter-Jan VAN ZWOL

IPC: G03F1/64 ,  G03F7/20

Abstract: A method of manufacturing a pellicle membrane, the method including: providing a first sacrificial layer on a planar substrate to form a stack; and providing, to at least a portion of the stack, at least one metal silicide or doped metal silicide pellicle core layer which forms at least part of the pellicle membrane is described. Also described is a pellicle membrane assembly having a substrate, a first sacrificial layer, and at least one metal silicide or doped metal silicide pellicle layer which forms at least part of a pellicle core, as well as a lithography apparatus including such a pellicle.