公开(公告)号：US20230050613A1

公开(公告)日：2023-02-16

申请号：US17792464

申请日：2020-12-15

Applicant: ASML NETHERLANDS B.V.

Inventor： Ties Wouter VAN DER WOORD ,  Volker Dirk HILDENBRAND ,  Inci DONMEZ NOYAN ,  Adrianus Johannes Maria GIESBERS ,  Alexander Ludwig KLEIN

IPC: G03F1/62 ,  G03F7/20

Abstract: A pellicle membrane for a lithographic apparatus, the membrane including a matrix including a plurality of inclusions distributed therein. A method of manufacturing the pellicle membrane, a lithographic apparatus including the pellicle membrane, a pellicle assembly for use in a lithographic apparatus including the membrane, as well as the use of the pellicle membrane in a lithographic apparatus or method.

公开(公告)号：US20230168577A1

公开(公告)日：2023-06-01

申请号：US17922768

申请日：2021-04-21

Applicant: ASML NETHERLANDS B.V.

Inventor： Zomer Silvester HOUWELING ,  Volker Dirk HILDENBRAND ,  Alexander Ludwig KLEIN ,  Paul Alexander VERMEULEN

IPC: G03F1/64 ,  G02B5/08 ,  G02B5/09 ,  G02B5/20

CPC classification number: G03F1/64 ,  G02B5/09 ,  G02B5/208 ,  G02B5/0891

Abstract: An optical element for a lithographic apparatus, the optical element including an anchor layer selected to support a top layer having self-terminating growth in an operating lithographic apparatus or plasma containing environment. Also described is a method of manufacturing an optical element, the method including depositing a top layer on anchor layer via exposure to plasma, preferably electromagnetically induced plasma. Lithographic apparatuses including such optical elements are also described.

公开(公告)号：US20240411233A1

公开(公告)日：2024-12-12

申请号：US18699358

申请日：2022-10-07

Applicant: ASML NETHERLANDS B.V.

Inventor： Gosse Charles DE VRIES ,  Sjoerd Nicolaas Lambertus DONDERS ,  Franciscus Johannes Joseph JANSSEN ,  Evgenia KURGANOVA ,  Abraham Jan WOLF ,  Ties Jan Willem BAKKER ,  Volker Dirk HILDENBRAND ,  Paul Alexander VERMEULEN ,  Michael ENGEL ,  Bernardus Antonius Johannes LUTTIKHUIS ,  Ronald VAN DER HAM ,  Jeroen Peterus Johannes VAN LIPZIG

IPC: G03F7/00 ,  G03F1/62

Abstract: A lithographic apparatus includes: an illumination system configured to condition a radiation beam; a support structure constructed to support a reticle and pellicle assembly for receipt of the radiation beam conditioned by the illumination system; a substrate table constructed to support a substrate; a projection system configured to receive the radiation beam from the reticle-pellicle assembly and to project it onto the substrate; and a heating system configured to heat a pellicle of the reticle-pellicle assembly supported by the support structure. A method for using a reticle-pellicle assembly including: illuminating the reticle-pellicle assembly with a radiation beam so as to form a patterned image on a substrate; and heating the pellicle of the reticle-pellicle assembly using a separate heat source.