公开(公告)号：DE60028172T2

公开(公告)日：2007-03-15

申请号：DE60028172

申请日：2000-12-11

Applicant: ASML NETHERLANDS BV

Inventor： EURLINGS MARKUS ,  KRIKKE JAN JAAP

IPC: G02B5/18 ,  G03F7/20 ,  G02B3/00 ,  G02B3/08 ,  G02B5/32 ,  G02B19/00 ,  H01L21/027

Abstract: An illuminator for controlling a beam of radiation for a lithographic projection apparatus includes a plurality of optical elements and an exchanger for inserting and removing the optical elements from the beam path. The intensity distribution of the beam at a pupil plane of the illuminator is determined by the optical elements. Different illumination settings (intensity distributions) can be obtained by the exchanger swapping between different optical elements, without the need for a zoom-axicon module.