公开(公告)号：JP2005196180A

公开(公告)日：2005-07-21

申请号：JP2004375383

申请日：2004-12-27

Applicant: Asml Netherlands Bv ,  エイエスエムエル ネザランドズ ベスローテン フエンノートシャップ

Inventor： LUIJKX CORNELIS PETRUS ANDREAS ,  BANINE VADIM YEVGENYEVICH ,  BOTMA HAKO ,  VAN DUIJNHOVEN MARTINUS ,  MARKUS FRANCISCUS ANTONIUS EUR ,  KRIKKE JAN JAAP ,  MULDER HEINE MELLE ,  MUIJDERMAN JOHANNES HENDRIK EV ,  VAN DUIJN CORNELIS JACOBUS

IPC: G02B26/02 ,  G03F7/20

CPC classification number: G03F7/70191 ,  G03F7/70066 ,  G03F7/70116 ,  G03F7/70558

Abstract: PROBLEM TO BE SOLVED: To provide one or more optical attenuator elements that are symmetrical about the center line of a beam and that exist in a central part of the beam. SOLUTION: The attenuator device operates to remove a part of a beam of radiation having a higher than average intensity using at least one optical attenuator element. The device has application in a radiation system, and/or a lithographic apparatus, in particular a scanning lithographic apparatus, wherein the optical attenuator element(s) are provided in a central part of the beam, for example, perpendicularly to a scanning direction. COPYRIGHT: (C)2005,JPO&NCIPI

Abstract translation: 要解决的问题：提供一个或多个光束衰减器元件，其围绕光束的中心线对称并且存在于光束的中心部分中。 解决方案：衰减器装置使用至少一个光衰减器元件来操作以去除具有高于平均强度的辐射束的一部分。 该装置具有应用于辐射系统和/或光刻设备，特别是扫描光刻设备中，其中光学衰减器元件设置在例如垂直于扫描方向的光束的中心部分中。 版权所有（C）2005，JPO＆NCIPI

公开(公告)号：JP2008235941A

公开(公告)日：2008-10-02

申请号：JP2008172173

申请日：2008-07-01

Applicant: Asml Netherlands Bv ,  エーエスエムエル ネザーランズ ビー.ブイ.

Inventor： LUIJKX CORNELIS PETRUS ANDREAS ,  BANINE VADIM YEVGENYEVICH ,  BOTMA HAKO ,  VAN DUIJNHOVEN MARTINUS ,  MARKUS FRANCISCUS ANTONIUS EUR ,  KRIKKE JAN JAAP ,  MULDER HEINE MELLE ,  MUIJDERMAN JOHANNES HENDRIK EV ,  VAN DUIJN CORNELIS JACOBUS

IPC: G02B26/02 ,  H01L21/027 ,  G03F7/20

CPC classification number: G03F7/70191 ,  G03F7/70066 ,  G03F7/70116 ,  G03F7/70558

Abstract: PROBLEM TO BE SOLVED: To provide an optical attenuator having one optical attenuator element or a plurality of optical attenuator elements arranged symmetrically to a center line of a beam and in a central part of the beam. SOLUTION: The optical attenuator device operates to remove a part of a beam of radiation having intensity higher than average intensity by using at least one optical attenuator element. The device has applications in a radiation system, and/or a lithographic apparatus, in particular a scanning lithographic apparatus, wherein the optical attenuator element(s) are provided in a central part of the beam, for example perpendicularly to a scanning direction. COPYRIGHT: (C)2009,JPO&INPIT

Abstract translation: 要解决的问题：提供一种具有一个光衰减器元件或多个光束衰减器元件的光衰减器，所述光衰减器元件或对称地布置在梁的中心线和梁的中心部分中。 解决方案：光衰减器件通过使用至少一个光衰减器元件来操作以去除强度高于平均强度的辐射束的一部分。 该装置在辐射系统和/或光刻设备，特别是扫描光刻设备中具有应用，其中光学衰减器元件设置在光束的中心部分，例如垂直于扫描方向。 版权所有（C）2009，JPO＆INPIT

公开(公告)号：SG113028A1

公开(公告)日：2005-07-28

申请号：SG200407785

申请日：2004-12-28

Applicant: ASML NETHERLANDS BV

Inventor： LUIJKX CORNELIS PETRUS ANDREAS ,  BANINE VADIM YEVGENYEVICH ,  BOTMA HAKO ,  VAN DUIJNHOVEN MARTINUS ,  EURLINGS MARKUS FRANCISCUS ANT ,  KRIKKE JAN JAAP ,  MULDER HEINE MELLE ,  MUIJDERMAN JOHANNES HENDRIK EV ,  VAN DUIJN CORNELIS JACOBUS

IPC: G02B26/02 ,  G03F7/20

Abstract: An optical attenuator device operates to remove a part of a beam of radiation having a higher than average intensity using at least one optical attenuator element (4). The device has application in a radiation system, and/or a lithographic apparatus, in particular a scanning lithographic apparatus, wherein the optical attenuator element(s) are provided in a central part of the beam, for example perpendicularly to a scanning direction.

公开(公告)号：DE60120282D1

公开(公告)日：2006-07-20

申请号：DE60120282

申请日：2001-07-03

Applicant: ASML NETHERLANDS BV

Inventor： KRIKKE JAN JAAP ,  EURLINGS MARKUS FRANCISCUS ANT ,  HOEGEE JAN ,  VAN DER VEEN PAUL

IPC: G03F7/20 ,  H01L21/027

Abstract: A lithographic projection system has an optical element provided in the illumination system for changing an elliptically symmetric intensity anomaly of the projection beam in a pupil of the projection apparatus, the optical element being rotated about the optical axis of the projection apparatus such that the change in intensity anomaly introduced by it counteracts an elliptically symmetric intensity anomaly present in the projection beam or introduced by another optical element traversed by the projection beam.

公开(公告)号：DE60028172D1

公开(公告)日：2006-06-29

申请号：DE60028172

申请日：2000-12-11

Applicant: ASML NETHERLANDS BV

Inventor： EURLINGS MARKUS ,  KRIKKE JAN JAAP

IPC: G02B5/18 ,  G03F7/20 ,  G02B3/00 ,  G02B3/08 ,  G02B5/32 ,  G02B19/00 ,  H01L21/027

Abstract: An illuminator for controlling a beam of radiation for a lithographic projection apparatus includes a plurality of optical elements and an exchanger for inserting and removing the optical elements from the beam path. The intensity distribution of the beam at a pupil plane of the illuminator is determined by the optical elements. Different illumination settings (intensity distributions) can be obtained by the exchanger swapping between different optical elements, without the need for a zoom-axicon module.

公开(公告)号：DE60028172T2

公开(公告)日：2007-03-15

申请号：DE60028172

申请日：2000-12-11

Applicant: ASML NETHERLANDS BV

Inventor： EURLINGS MARKUS ,  KRIKKE JAN JAAP

IPC: G02B5/18 ,  G03F7/20 ,  G02B3/00 ,  G02B3/08 ,  G02B5/32 ,  G02B19/00 ,  H01L21/027

Abstract: An illuminator for controlling a beam of radiation for a lithographic projection apparatus includes a plurality of optical elements and an exchanger for inserting and removing the optical elements from the beam path. The intensity distribution of the beam at a pupil plane of the illuminator is determined by the optical elements. Different illumination settings (intensity distributions) can be obtained by the exchanger swapping between different optical elements, without the need for a zoom-axicon module.

公开(公告)号：DE60120282T2

公开(公告)日：2007-05-31

申请号：DE60120282

申请日：2001-07-03

Applicant: ASML NETHERLANDS BV

Inventor： KRIKKE JAN JAAP ,  EURLINGS MARKUS FRANCISCUS ANT ,  HOEGEE JAN ,  VAN DER VEEN PAUL

IPC: G03F7/20 ,  H01L21/027

Abstract: A lithographic projection system has an optical element provided in the illumination system for changing an elliptically symmetric intensity anomaly of the projection beam in a pupil of the projection apparatus, the optical element being rotated about the optical axis of the projection apparatus such that the change in intensity anomaly introduced by it counteracts an elliptically symmetric intensity anomaly present in the projection beam or introduced by another optical element traversed by the projection beam.