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    LITHOGRAPHIC APPARATUS
    1.
    发明申请
    LITHOGRAPHIC APPARATUS 审中-公开
    LITHOGRAPHIC设备

    公开(公告)号：WO2014001071A2

    公开(公告)日：2014-01-03

    申请号：PCT/EP2013061941

    申请日：2013-06-11

    Applicant: ASML NETHERLANDS BV

    Inventor： KLEEMANS NIEK ,  VAN ASTEN NICOLAAS ,  KOLESNYCHENKO ALEKSEY ,  VAN AERLE NICK ,  BAAS GERARDUS ,  EURLINGS MARKUS ,  BEIJSENS ROLF

    IPC: G03F7/20 ,  G01J1/02 ,  G01J1/42 ,  G01J5/10 ,  G02B5/18 ,  G02B27/44

    CPC classification number: G01J1/4257 ,  G01J1/4228 ,  G02B27/425 ,  G02B27/4294 ,  G03F7/70158 ,  G03F7/70175 ,  G03F7/70575 ,  G03F7/7085 ,  G03F7/70858 ,  G03F7/70891 ,  G03F7/70983

    Abstract: A collector module is disclosed comprising: a collector for collecting radiation generated by a radiation generating plasma, and for directing at least a portion of the generated radiation; a structure upstream of the focal point and extending at least partially around an expected position of a beam comprising the at least a portion of the collected radiation; a diffractive element being arranged to diffract infrared radiation that is reflected from the plasma formation location. When the plasma formation location is at an intended location, m = +1 diffracted infrared radiation is directed towards a first region of the structure. At m = -1 diffracted infrared radiation is directed towards a second region of the structure. Also disclosed is an infra-red detector with increased dynamic range obtained by providing a screen for forming an image of a hotspot and a camera directed on to the screen. The dynamic range of the detector is improved either by heating the screen such that a low intensity hotspot is raised above a camera threshold, or by dividing the image into multiple images of differing intensities.

    Abstract translation: 公开了一种收集器模块，包括：用于收集由辐射产生等离子体产生的辐射并用于引导所产生的辐射的至少一部分的收集器; 在所述焦点的上游的结构并且至少部分地围绕包含所述收集的辐射的所述至少一部分的束的预期位置延伸; 衍射元件被布置成衍射从等离子体形成位置反射的红外辐射。 当等离子体形成位置在预期位置时，m = +1衍射的红外辐射被引向结构的第一区域。 在m = -1处衍射的红外辐射被引导到结构的第二区域。 还公开了一种红外检测器，其具有通过提供用于形成热点图像的屏幕和指向屏幕的相机而获得的增加的动态范围。 检测器的动态范围通过加热屏幕而提高，使得低强度热点升高到相机阈值以上，或通过将图像分割成不同强度的多个图像。

    6.
    发明专利
    未知

    公开(公告)号：DE60028172D1

    公开(公告)日：2006-06-29

    申请号：DE60028172

    申请日：2000-12-11

    Applicant: ASML NETHERLANDS BV

    Inventor： EURLINGS MARKUS ,  KRIKKE JAN JAAP

    IPC: G02B5/18 ,  G03F7/20 ,  G02B3/00 ,  G02B3/08 ,  G02B5/32 ,  G02B19/00 ,  H01L21/027

    Abstract: An illuminator for controlling a beam of radiation for a lithographic projection apparatus includes a plurality of optical elements and an exchanger for inserting and removing the optical elements from the beam path. The intensity distribution of the beam at a pupil plane of the illuminator is determined by the optical elements. Different illumination settings (intensity distributions) can be obtained by the exchanger swapping between different optical elements, without the need for a zoom-axicon module.

    RADIATION SOURCE AND LITHOGRAPHIC APPARATUS.
    7.
    发明专利
    RADIATION SOURCE AND LITHOGRAPHIC APPARATUS. 未知

    公开(公告)号：NL2013246A

    公开(公告)日：2015-03-02

    申请号：NL2013246

    申请日：2014-07-24

    Applicant: ASML NETHERLANDS BV

    Inventor： NOORDMAN OSCAR ,  EURLINGS MARKUS

    IPC: G03F7/20 ,  H05G2/00

    Abstract: A radiation source includes a nozzle configured to direct a stream of fuel droplets along a droplet path towards a plasma formation location, and is configured to receive a gaussian radiation beam having gaussian intensity distribution, having a predetermined wavelength and propagating along a predetermined trajectory, and further configured to focus the radiation beam on a fuel droplet at the plasma formation location. The radiation source includes a phase plate structure including one or more phase plates. The phase plate structure has a first zone and a second zone. The zones are arranged such that radiation having the predetermined wavelength passing through the first zone and radiation having the predetermined wavelength passing through the second zone propagate along respective optical paths having different optical path lengths. A difference between the optical path lengths is an odd number of times half the predetermined wavelength.

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