公开(公告)号：NL2006086A

公开(公告)日：2011-09-06

申请号：NL2006086

申请日：2011-01-28

Applicant: ASML NETHERLANDS BV

Inventor： LANGE GERBEN ,  MULKENS JOHANNES

IPC: G03F7/20

Abstract: A lithographic apparatus includes an illumination system configured to provide a first beam of radiation, which forms a first mask illumination region, and configured to substantially simultaneously provide a second beam of radiation, which forms a second mask illumination region. The first and second illumination regions being configured to substantially simultaneously illuminate a same mask. The lithographic apparatus also includes a projection system configured to project the first radiation beam such that it forms a first substrate illumination region and configured to simultaneously project the second radiation beam such that it forms a second substrate illumination region.

公开(公告)号：NL2003638A

公开(公告)日：2010-06-07

申请号：NL2003638

申请日：2009-10-14

Applicant: ASML NETHERLANDS BV

Inventor： MULKENS JOHANNES ,  KATE NICOLAAS

IPC: G03F7/20

Abstract: A difficulty of contamination interfering with a grid plate positional measurement system is addressed. In one embodiment contamination is prevented from coming into contact with the grating or the sensor. In an embodiment, surface acoustic waves are used to detach contamination from a surface of the grating or sensor.

公开(公告)号：DE60036185T2

公开(公告)日：2008-05-21

申请号：DE60036185

申请日：2000-11-16

Applicant: ASML NETHERLANDS BV

Inventor： MULKENS JOHANNES

IPC: G02B5/28 ,  G03F7/20 ,  H01L21/027

Abstract: The filter comprises alternating layers of relatively high and relatively low refractive index media. The layers are formed as a coating on an optical component in the projection lens system of a lithographic projection apparatus. The filter transmits radiation at a wavelength of 157 nm for exposing an image of a mask pattern on a resist-coated substrate whilst attenuating radiation resulting from fluorescence in optical components of the lithographic projection apparatus, caused by the imaging radiation, and which if not attenuated would reduce the contrast of the image exposed in the resist.