公开(公告)号：NL2011760A

公开(公告)日：2014-01-13

申请号：NL2011760

申请日：2013-11-08

Applicant: ASML NETHERLANDS BV ,  ZEISS CARL SMT GMBH

Inventor： LOOPSTRA ERIK ,  BEERENS RUUD ,  BIELING STIG ,  CADEE THEODORUS PETRUS MARIA ,  DONDERS SJOERD ,  FRIJNS OLAV ,  KEMPEN ANTONIUS ,  SCHEEPERS MARCUS ,  STRUYCKEN ALEXANDER ,  KATE NICOLAAS ,  LIESHOUT RICHARD HENRICUS ADRIANUS ,  VANDERHALLEN IVO

IPC: G03F7/20 ,  H05G2/00

公开(公告)号：NL2007182A

公开(公告)日：2012-02-27

申请号：NL2007182

申请日：2011-07-26

Applicant: ASML NETHERLANDS BV

Inventor： WILLEMS PAUL ,  KATE NICOLAAS ,  KOELINK STEPHAN ,  KRAMER PIETER ,  KUIJPER ANTHONIE ,  ZDRAVKOV ALEXANDER ,  CORTIE ROGIER

IPC: G03F7/20

公开(公告)号：NL2006244A

公开(公告)日：2011-09-19

申请号：NL2006244

申请日：2011-02-18

Applicant: ASML NETHERLANDS BV

Inventor： ROSET NIEK ,  KATE NICOLAAS ,  SHULEPOV SERGEI ,  LAFARRE RAYMOND

IPC: G03F7/20 ,  G03F9/00

公开(公告)号：NL2009858A

公开(公告)日：2013-07-01

申请号：NL2009858

申请日：2012-11-22

Applicant: ASML NETHERLANDS BV

Inventor： TROMP SIEGFRIED ,  KATE NICOLAAS ,  LAFARRE RAYMOND

IPC: G03F7/20 ,  H01L21/683

Abstract: A substrate holder for use in a lithographic apparatus. The substrate holder comprises a main body, a plurality of burls and a heater and/or a temperature sensor. The main body has a surface. The plurality of burls project from the surface and have end surfaces to support a substrate. The heater and/or temperature sensor is provided on the main body surface. The substrate holder is configured such that when a substrate is supported on the end surfaces, a thermal conductance between the heater and/or temperature sensor and the substrate is greater than a thermal conductance between the heater and/or temperature sensor and the main body surface.

公开(公告)号：NL2008980A

公开(公告)日：2013-01-14

申请号：NL2008980

申请日：2012-06-12

Applicant: ASML NETHERLANDS BV

Inventor： CORTIE ROGIER ,  KATE NICOLAAS ,  ROSET NIEK ,  RIEPEN MICHEL ,  CASTELIJNS HENRICUS ,  ROPS CORNELIUS ,  OVERKAMP JIM

IPC: G03F7/20

公开(公告)号：NL2006648A

公开(公告)日：2011-12-06

申请号：NL2006648

申请日：2011-04-20

Applicant: ASML NETHERLANDS BV

Inventor： BOKHOVEN LAURENTIUS ,  KATE NICOLAAS ,  KRAMER PIETER

IPC: G03F7/20

公开(公告)号：NL2004807A

公开(公告)日：2011-01-04

申请号：NL2004807

申请日：2010-06-03

Applicant: ASML NETHERLANDS BV

Inventor： LAFARRE RAYMOND ,  BENSCHOP JOZEF ,  KATE NICOLAAS ,  ROSET NIEK ,  KUSTERS GERARDUS ,  ZDRAVKOV ALEXANDER ,  PATEL HRISHIKESH ,  OPSTAL SANDER

IPC: G03F7/20

公开(公告)号：NL2011909A

公开(公告)日：2014-06-19

申请号：NL2011909

申请日：2013-12-06

Applicant: ASML NETHERLANDS BV

Inventor： ARLEMARK ERIK ,  KOEVOETS ADRIANUS ,  LAFARRE RAYMOND ,  KATE NICOLAAS ,  LUIJTEN CARLO ,  NIENHUYS HAN-KWANG

IPC: G03F7/20 ,  H01L21/683

Abstract: Disclosed is a substrate support for an apparatus of the type which projects a beam of EUV radiation onto a target portion of a substrate (400). The substrate support comprises a substrate table constructed to hold the substrate, a support block (420) for supporting the substrate table, and a cover plate (450′) disposed around the substrate table. The top surface of the cover plate and the top surface of a substrate mounted on the substrate table are all substantially at the same level. At least one sensor unit (430) is located on the substrate support and its top surface is also at the same level as that of the cover plate and substrate. Also disclosed is an EUV lithographic apparatus comprising such a substrate support.

公开(公告)号：NL2010139A

公开(公告)日：2013-08-06

申请号：NL2010139

申请日：2013-01-17

Applicant: ASML NETHERLANDS BV

Inventor： LAFARRE RAYMOND ,  DONDERS SJOERD ,  KATE NICOLAAS ,  DZIOMKINA NINA ,  KARADE YOGESH ,  RODENBURG ELISABETH

IPC: G03F7/20 ,  H01L21/683

Abstract: Substrate holder (100) for use in a lithographic apparatus, the substrate holder comprising a main body having a first surface and a second surface opposite the first surface.A plurality of first burls are provided on the first surface, the first burls having end surfaces to support a substrate. A plurality of second burls are provided on the second surface to support the substrate holder on a structure. The plurality of first burls each comprise a lower body portion protruding from the first surface and an upper body portion above the lower body portion, the lower body portions comprise a different material from the upper body portions, and the upper body portions comprise diamond-like carbon.

公开(公告)号：NL2004523A

公开(公告)日：2010-11-09

申请号：NL2004523

申请日：2010-04-08

Applicant: ASML NETHERLANDS BV

Inventor： BOKHOVEN LAURENTIUS ,  KATE NICOLAAS ,  LAFARRE RAYMOND ,  CASTELIJNS HENRICUS ,  ARTS PETRUS

IPC: G03F7/20