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公开(公告)号：US11029607B2
公开(公告)日：2021-06-08
申请号：US16330544
申请日：2017-08-28
Applicant: ASML NETHERLANDS B.V.
Inventor： Pepijn Van Den Eijnden , Cornelius Maria Rops , Theodorus Wilhelmus Polet , Floor Lodewijk Keukens , Gheorghe Tanasa , Rogier Hendrikus Magdalena Cortie , Koen Cuypers , Harold Sebastiaan Buddenberg , Giovanni Luca Gattobigio , Evert Van Vliet , Nicolaas Ten Kate , Mark Johannes Hermanus Frencken , Jantien Laura Van Erve , Marcel Maria Cornelius Franciscus Teunissen
IPC: G03F7/20
Abstract: A fluid handling structure for a lithographic apparatus, the structure having: an aperture for the passage therethrough of a beam; a first part; and a second part, wherein the first and/or second part define a surface for the extraction of immersion fluid, relative movement between the first and second parts is effective to change a position of fluid flow into or out of the surface relative to the aperture, and the first or second part has at least one through-hole for the fluid flow and the other of the first or second part has at least one opening for the fluid flow, the at least one through-hole and at least one opening being in fluid communication when aligned, the relative movement allowing alignment of the at least one opening with different ones of the through-hole to change the position of the fluid flow into or out of the surface.
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Patent Agency Ranking
公开(公告)号：US20150109592A1
公开(公告)日：2015-04-23
申请号：US14586390
申请日：2014-12-30
Applicant: ASML NETHERLANDS B.V.
Inventor： Ivo Adam Johannes THOMAS , Siebe Landheer , Arnout Johannes Meester , Marcio Alexandre Cano Miranda , Gheorghe Tanasa
IPC: G03F7/20
CPC classification number: G03F7/70341 , G03B27/52 , G03F7/70891
Abstract: A lithographic apparatus comprising a projection system, and a liquid confinement structure configured to at least partly confine immersion liquid to an immersion space defined by the projection system, the liquid confinement structure and a substrate and/or substrate table is disclosed wherein a measure is taken to reduce the effect of droplets and/or a liquid film on the last element of the projection system.
Abstract translation: 一种包括投影系统和液体限制结构的光刻设备，其被配置为至少部分地将浸没液体限制在由投影系统，液体限制结构和衬底和/或衬底台限定的浸没空间中，其中采取措施 以减少液滴和/或液膜对投影系统的最后一个元件的影响。
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公开(公告)号：US10725390B2
公开(公告)日：2020-07-28
申请号：US16249518
申请日：2019-01-16
Applicant: ASML Netherlands B.V.
Inventor： Seerwan Saeed , Petrus Martinus Gerardus Johannes Arts , Harold Sebastiaan Buddenberg , Erik Henricus Egidius Catharina Eummelen , Giovanni Luca Gattobigio , Floor Lodewijk Keukens , Ferdy Migchelbrink , Jeroen Arnoldus Leonardus Johannes Raaymakers , Arnoldus Johannes Martinus Jozeph Ras , Gheorghe Tanasa , Jimmy Matheus Wilhelmus Van De Winkel , Daan Daniel Johannes Antonius Van Sommeren , Marijn Wouters , Miao Yu
IPC: G03F7/20 , H01L21/66 , G01N21/95 , H01L27/146 , H01L27/148
Abstract: An inspection substrate for inspecting a component, such as a liquid confinement system, of an apparatus for processing production substrates is discussed. The inspection substrate includes a body having dimensions similar to a production substrate so that the inspection substrate is compatible with the apparatus, an illumination device, such as light emitting diodes, embedded in the body, a sensor, such as an imaging device or a pressure sensor, that is embedded in the body and configured to generate inspection information, such as image data, relating to a parameter of the component of the apparatus proximate to the inspection substrate, and a storage device embedded in the body and configured to store the inspection information.
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公开(公告)号：US10429741B2
公开(公告)日：2019-10-01
申请号：US16194567
申请日：2018-11-19
Applicant: ASML NETHERLANDS B.V.
Inventor： Jeroen Peter Johannes Bruijstens , Richard Joseph Bruls , Hans Jansen , Siebe Landheer , Laurentius Catrinus Jorritsma , Arnout Johannes Meester , Bauke Jansen , Ivo Adam Johannes Thomas , Marcio Alexandre Cano Miranda , Maurice Martinus Johannes Van Der Lee , Gheorghe Tanasa , Lambertus Dominicus Noordam
Abstract: A lithographic apparatus is disclosed that includes a projection system, and a liquid confinement structure configured to at least partly confine immersion liquid to an immersion space defined by the projection system, the liquid confinement structure and a substrate and/or substrate table. Measures are taken in the lithographic apparatus, for example, to reduce the effect of droplets on the final element of the projection system or to substantially avoid such droplet formation.
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公开(公告)号：US10151984B2
公开(公告)日：2018-12-11
申请号：US14928891
申请日：2015-10-30
Applicant: ASML NETHERLANDS B.V.
Inventor： Jeroen Peter Johannes Bruijstens , Richard Joseph Bruls , Hans Jansen , Siebe Landheer , Laurentius Catrinus Jorritsma , Arnout Johannes Meester , Bauke Jansen , Ivo Adam Johannes Thomas , Marcio Alexandre Cano Miranda , Maurice Martinus Johannes Van Der Lee , Gheorghe Tanasa , Lambertus Dominicus Noordam
Abstract: A lithographic apparatus is disclosed that includes a projection system, and a liquid confinement structure configured to at least partly confine immersion liquid to an immersion space defined by the projection system, the liquid confinement structure and a substrate and/or substrate table. Measures are taken in the lithographic apparatus, for example, to reduce the effect of droplets on the final element of the projection system or to substantially avoid such droplet formation.
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公开(公告)号：US10146139B2
公开(公告)日：2018-12-04
申请号：US15623091
申请日：2017-06-14
Applicant: ASML NETHERLANDS B.V.
Inventor： Ivo Adam Johannes Thomas , Siebe Landheer , Arnout Johannes Meester , Marcio Alexandre Cano Miranda , Gheorghe Tanasa
Abstract: A lithographic apparatus comprising a projection system, and a liquid confinement structure configured to at least partly confine immersion liquid to an immersion space defined by the projection system, the liquid confinement structure and a substrate and/or substrate table is disclosed wherein a measure is taken to reduce the effect of droplets and/or a liquid film on the last element of the projection system.
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