公开(公告)号：US20190212657A1

公开(公告)日：2019-07-11

申请号：US16351771

申请日：2019-03-13

Applicant: ASML Netherlands B.V.

Inventor： Sudhir SRIVASTAVA ,  Sander Bas Roobol ,  Simon Gijsbert Josephus Mathijssen ,  Nan Lin ,  Sjoerd Nicolaas Lambertus Donders ,  Krijn Frederik Bustraan ,  Petrus Wilhelmus Smorenburg ,  Gerrit Jacobus Hendrik Brussaard

IPC: G03F7/20 ,  G01N21/956 ,  G03F1/84

CPC classification number: G03F7/7085 ,  G01N21/8806 ,  G01N21/956 ,  G02F2001/354 ,  G03F1/84 ,  G03F7/70616 ,  G03F7/7065 ,  G03F7/70883 ,  H01S3/00 ,  H01S3/0092 ,  H05G2/008

Abstract: Disclosed is a high harmonic generation (HHG) radiation source which may be used to generate measurement radiation for an inspection apparatus. In such a radiation source, a pump radiation source is operable to emit pump radiation at a high harmonic generation gas medium thereby exciting the high harmonic generation gas medium within a pump radiation interaction region so as to generate the high harmonic radiation and an ionization radiation source is operable to emit ionization radiation at the high harmonic generation gas medium to ionize a gas at an ionization region between the pump radiation interaction region and an optical output of the illumination source.

公开(公告)号：US10330606B2

公开(公告)日：2019-06-25

申请号：US15683216

申请日：2017-08-22

Applicant: ASML Netherlands B.V.

Inventor： Peter Danny Van Voorst ,  Nan Lin ,  Sander Bas Roobol ,  Simon Gijsbert Josephus Mathijssen ,  Sietse Thijmen Van Der Post

IPC: G01N21/88 ,  G03F7/20 ,  G01N21/95 ,  H05G2/00 ,  G01N21/956

Abstract: Disclosed is an inspection apparatus and associated method for measuring a target structure on a substrate. The inspection apparatus comprises an illumination source for generating measurement radiation; an optical arrangement for focusing the measurement radiation onto said target structure; and a compensatory optical device. The compensatory optical device may comprise an SLM operable to spatially modulate the wavefront of the measurement radiation so as to compensate for a non-uniform manufacturing defect in said optical arrangement. In alternative embodiments, the compensatory optical device may be located in the beam of measurement radiation, or in the beam of pump radiation used to generate high harmonic radiation in a HHG source. Where located in in the beam of pump radiation, the compensatory optical device may be used to correct pointing errors, or impart a desired profile or varying illumination pattern in a beam of the measurement radiation.

公开(公告)号：US20190049861A1

公开(公告)日：2019-02-14

申请号：US16037734

申请日：2018-07-17

Applicant: ASML Netherlands B.V.

Inventor： Peter Danny VAN VOORST ,  Teunis Willem Tukker ,  Nan Lin ,  Han-Kwang Nienhuys

IPC: G03F7/20 ,  G01B11/27 ,  G06T7/70

Abstract: A beam (542, 556) of inspection radiation is generated by focusing infrared (IR) radiation (540) at a source location so as to generate the inspection radiation (542) by high-harmonic generation in a gas cell (532). An illumination optical system (512) focuses the inspection radiation into a spot (S) of radiation by imaging the source location onto a metrology target (T). In one embodiment, the same illumination optical system forms a spot of the IR radiation onto a target material. A spot of visible radiation is generated by second harmonic generation at the metrology target. The visible spot is observed by an alignment camera (564). A special alignment target (592) may be provided, or material present in or near the metrology target can be used. In another embodiment, the spot is imaged using a portion (758) of the inspection radiation reflected by the target.

公开(公告)号：US10067068B2

公开(公告)日：2018-09-04

申请号：US15388463

申请日：2016-12-22

Applicant: ASML Netherlands B.V.

Inventor： Arie Jeffrey Den Boef ,  Simon Gijsbert Josephus Mathijssen ,  Nan Lin ,  Sander Bas Roobol

IPC: G03F7/20 ,  G03F9/00 ,  G01N21/88

Abstract: A lithographic apparatus is a machine that applies a desired pattern onto a substrate, usually onto a target portion of the substrate. A lithographic apparatus can be used, for example, in the manufacture of integrated circuits (ICs). The lithographic apparatus has an inspection apparatus with an illumination system that utilizes illuminating radiation with a wavelength of 2-40 nm. The illumination system includes an optical element that splits the illuminating radiation into a first and a second illuminating radiation and induces a time delay to the first or the second illuminating radiation. A detector detects the radiation that has been scattered by a target structure. The inspection apparatus has a processing unit operable to control a time delay between the first scattered radiation and the second scattered radiation so as to optimize a property of the combined first and second scattered radiation.

公开(公告)号：US10816906B2

公开(公告)日：2020-10-27

申请号：US16254896

申请日：2019-01-23

Applicant: ASML Netherlands B.V.

Inventor： Nan Lin ,  Arie Jeffrey Den Boef ,  Sander Bas Roobol ,  Simon Gijsbert Josephus Mathijssen ,  Niels Geypen

IPC: G03F7/20 ,  G01N21/95 ,  G01N21/956 ,  G01B11/24 ,  G02F1/355 ,  G02F1/37 ,  H01S3/00 ,  H01S3/13 ,  H01S3/16 ,  G01N21/88

Abstract: Disclosed is a method of performing a measurement in an inspection apparatus, and an associated inspection apparatus and HHG source. The method comprises configuring one or more controllable characteristics of at least one driving laser pulse of a high harmonic generation radiation source to control the output emission spectrum of illumination radiation provided by the high harmonic generation radiation source; and illuminating a target structure with said illuminating radiation. The method may comprise configuring the driving laser pulse so that the output emission spectrum comprises a plurality of discrete harmonic peaks. Alternatively the method may comprise using a plurality of driving laser pulses of different wavelengths such that the output emission spectrum is substantially monochromatic.

公开(公告)号：US10451559B2

公开(公告)日：2019-10-22

申请号：US16102178

申请日：2018-08-13

Applicant: ASML Netherlands B.V.

Inventor： Peter Danny Van Voorst ,  Nan Lin ,  Sander Bas Roobol ,  Simon Gijsbert Josephus Mathijssen ,  Sietse Thijmen Van Der Post

IPC: G01N21/88 ,  G03F7/20 ,  G01N21/95 ,  H05G2/00 ,  G01N21/956

Abstract: Disclosed is an inspection apparatus and associated method for measuring a target structure on a substrate. The inspection apparatus comprises an illumination source for generating measurement radiation; an optical arrangement for focusing the measurement radiation onto said target structure; and a compensatory optical device. The compensatory optical device may comprise an SLM operable to spatially modulate the wavefront of the measurement radiation so as to compensate for a non-uniform manufacturing defect in said optical arrangement. In alternative embodiments, the compensatory optical device may be located in the beam of measurement radiation, or in the beam of pump radiation used to generate high harmonic radiation in a HHG source. Where located in the beam of pump radiation, the compensatory optical device may be used to correct pointing errors, or impart a desired profile or varying illumination pattern in a beam of the measurement radiation.

公开(公告)号：US20180011029A1

公开(公告)日：2018-01-11

申请号：US15641579

申请日：2017-07-05

Applicant: ASML Netherlands B.V.

Inventor： Patricius Aloysius Jacobus TINNEMANS ,  Nan Lin ,  Sander Bas Roobol ,  Simon Gijsbert Josephus Mathijssen

IPC: G01N21/88 ,  G02F1/35 ,  G01N21/47 ,  G01N21/956

CPC classification number: G01N21/8806 ,  G01N21/4788 ,  G01N21/956 ,  G01N2021/95676 ,  G01N2201/0697 ,  G02F1/353 ,  G03F7/70008 ,  G03F7/70616

Abstract: Disclosed is an illumination source for generating measurement radiation for an inspection apparatus. The source generates at least first measurement radiation and second measurement radiation such that the first measurement radiation and the second measurement radiation interfere to form combined measurement radiation modulated with a beat component. The illumination source may be a HHG source. Also disclosed is an inspection apparatus comprising such a source and an associated inspection method.